Optical waveguide device and display device
By setting a protective layer on the sides of the optical waveguide device and bonding it to block light propagation, the problem of insufficient wear resistance of the resin material is solved, and the wear resistance and service life of the equipment are improved.
Patent Information
- Application Number
- CN202411441016.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-15
- Publication Date
- 2025-01-07
AI Technical Summary
The resin material of optical waveguide devices is insufficient to wear resistance and is easily scratched, which affects the display performance and service life.
The first protective layer and the second protective layer are respectively provided on the first and second sides of the optical waveguide device, and the protective layers are at least partially bonded to the waveguide layer through the first adhesive layer and the second adhesive layer, so as to be at least partially bonded to the waveguide layer. Blocks light from spreading, prevents scratches and disperses stress.
It effectively avoids scratches of the waveguide layer, improves the wear resistance and service life of the optical waveguide device, and ensures the stability of display performance.
Smart Images

Figure CN119270416A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of optical waveguide technology, and in particular to an optical waveguide device and a display apparatus. Background Art
[0002] An optical waveguide is a device that can bind signal light inside it and transmit the signal light in a specific direction. At the same time, the optical waveguide has good light transmittance. Based on these characteristics, the optical waveguide can be used as a display for augmented reality (AR) near-eye display devices. The optical waveguide transmits the signal light projected by the projection light engine (including the micro display screen and the projection lens group) to the human eye in a direction, so the human eye can see the image to be displayed. Because the optical waveguide has good light transmittance, the human eye can also clearly see the real environment behind the waveguide, so what the human eye ultimately sees is a fusion of the image to be displayed and the real environment.
[0003] Optical waveguides are generally made of resin materials, but the resin materials have poor wear resistance and scratch resistance, which results in insufficient wear resistance of the optical waveguides. Scratches on the optical waveguides will affect their display performance, thus affecting the service life of the product. Summary of the invention
[0004] In view of this, the present application proposes an optical waveguide device and a display apparatus, which can prevent the waveguide layer from being scratched, thereby avoiding affecting the display performance of the optical waveguide device and improving the service life of the product.
[0005] In a first aspect, the present application provides an optical waveguide device, comprising:
[0006] A waveguide layer having a first side surface and a second side surface opposite to each other, the waveguide layer comprising a substrate and an in-coupling grating and an out-coupling grating arranged on the substrate, the in-coupling grating and the out-coupling grating being located on the first side surface, the in-coupling grating being used to receive incident light and couple it into the substrate so that the light propagates in the substrate, and the out-coupling grating being used to couple the light out;
[0007] A first protective layer, disposed on the first side surface;
[0008] a first adhesive layer disposed between the waveguide layer and the first protective layer to at least partially adhere the first protective layer to the first side surface of the waveguide layer;
[0009] A second protective layer, disposed on the second side surface;
[0010] The second adhesive layer is disposed between the waveguide layer and the second protective layer to at least partially adhere the second protective layer to the second side surface of the waveguide layer.
[0011] In some embodiments, the first adhesive layer is configured to completely adhere the first protective layer to the first side of the waveguide layer, and the first adhesive layer is used to block the light from propagating in the first protective layer; and / or, the second adhesive layer is configured to completely adhere the second protective layer to the second side of the waveguide layer, and the second adhesive layer is used to block the light from propagating in the second protective layer.
[0012] In some embodiments, the refractive index of the first adhesive layer is 1.0-1.4; and / or, the refractive index of the second adhesive layer is 1.0-1.4; and / or, the material of the first adhesive layer is mainly composed of acrylate or epoxy resin or silica, and the material of the first adhesive layer contains micropores inside; and / or, the material of the second adhesive layer is mainly composed of acrylate or epoxy resin or silica, and the material of the second adhesive layer contains micropores inside; and / or, the thickness of the first adhesive layer is 0.001mm-0.1mm; and / or, the thickness of the second adhesive layer is 0.001mm-0.1mm.
[0013] In some embodiments, the Mohs hardness of the first protective layer is greater than the Mohs hardness of the waveguide layer; and / or, the Mohs hardness of the second protective layer is greater than the Mohs hardness of the waveguide layer; and / or, the first protective layer is made of UTG glass material or resin material; and / or, the second protective layer is made of UTG glass material or resin material; and / or, the Mohs hardness of the first protective layer is 5 to 7; and / or, the Mohs hardness of the second protective layer is 5 to 7; and / or, the thickness of the first protective layer is 30 μm to 70 μm; and / or, the thickness of the first protective layer is 30 μm to 70 μm.
[0014] In some embodiments, the optical waveguide device further includes a first functional layer, the first functional layer covers the side of the first protective layer facing away from the waveguide layer, the first functional layer is a hardening layer, a transmittance-enhancing layer or an anti-fingerprint layer; and / or, the optical waveguide device further includes a second functional layer, the second functional layer covers the side of the second protective layer facing away from the waveguide layer, the second functional layer is a hardening layer, a transmittance-enhancing layer or an anti-fingerprint layer.
[0015] In some embodiments, the waveguide layer is a single-layer structure or a multi-layer structure; and / or, the waveguide layer is made of resin material.
[0016] In some embodiments, the first protective layer includes a first sublayer and a second sublayer, the first sublayer is arranged on the first side surface, and the second sublayer is arranged on the side of the first sublayer facing away from the first side surface; the first bonding layer includes a first glue layer and a second glue layer, the first glue layer is arranged in an edge area between the first sublayer and the waveguide layer to adhere the edge area of the first sublayer to the edge area of the first side surface, and the second glue layer is arranged in at least a portion of the area between the first sublayer and the second sublayer to at least partially adhere the second sublayer to the side of the first sublayer facing away from the first side surface.
[0017] In some embodiments, the Mohs hardness of the first sublayer is greater than or equal to the Mohs hardness of the waveguide layer; and / or, the Mohs hardness of the second sublayer is greater than the Mohs hardness of the waveguide layer; and / or, the first sublayer is made of UTG glass material or resin material; and / or, the second sublayer is made of UTG glass material; and / or, the Mohs hardness of the second sublayer is 5 to 7; and / or, the thickness of the second sublayer is 30 μm to 70 μm.
[0018] In some embodiments, the refractive index of the first adhesive layer is 1.0 to 1.7; and / or the refractive index of the second adhesive layer is 1.0 to 1.7; and / or the thickness of the first adhesive layer is 0.001 mm to 0.1 mm; and / or the thickness of the second adhesive layer is 0.001 mm to 0.1 mm.
[0019] In some embodiments, the second protective layer includes a third sublayer and a fourth sublayer, the third sublayer is arranged on the second side surface, and the fourth sublayer is arranged on the side of the third sublayer facing away from the second side surface; the second adhesive layer includes a third glue layer and a fourth glue layer, the third glue layer is arranged in an edge area between the third sublayer and the waveguide layer to adhere the edge area of the third sublayer to the edge area of the second side surface, and the fourth glue layer is arranged in at least a portion of the area between the third sublayer and the fourth sublayer to at least partially adhere the fourth sublayer to the side of the third sublayer facing away from the second side surface.
[0020] In some embodiments, the Mohs hardness of the third sublayer is greater than or equal to the Mohs hardness of the waveguide layer; and / or, the Mohs hardness of the fourth sublayer is greater than the Mohs hardness of the waveguide layer; and / or, the third sublayer is made of UTG glass material or resin material; and / or, the fourth sublayer is made of UTG glass material; and / or, the Mohs hardness of the fourth sublayer is 5 to 7; and / or, the thickness of the fourth sublayer is 30 μm to 70 μm.
[0021] In some embodiments, the refractive index of the third adhesive layer is 1.0-1.7; and / or the refractive index of the fourth adhesive layer is 1.0-1.7; and / or the thickness of the third adhesive layer is 0.001mm-0.1mm; and / or the thickness of the fourth adhesive layer is 0.001mm-0.1mm.
[0022] A second aspect of the present application provides a display device, comprising the above-mentioned optical waveguide device.
[0023] The optical waveguide device proposed in the present application can more comprehensively protect the waveguide layer by respectively arranging the first protective layer and the second protective layer on the first side and the second side of the waveguide layer, thereby preventing the first side or the second side of the waveguide layer from being scratched and causing scratches to cause serious scattering of light, thereby avoiding reducing the display performance such as the display resolution of the optical waveguide device and improving the service life of the product. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained like these drawings without paying any creative work.
[0025] Figure 1 A schematic diagram of the structure of the optical waveguide device proposed in this application;
[0026] Figure 2 A schematic diagram of light transmission of the optical waveguide device proposed in this application;
[0027] Figure 3 A schematic structural diagram of another embodiment of the optical waveguide device proposed in the present application;
[0028] Figure 4 This is a schematic structural diagram of another embodiment of the optical waveguide device proposed in this application.
[0029] Description of reference numerals:
[0030] 100. optical waveguide device; 10. waveguide layer; 11. first side surface; 12. second side surface; 20. first protective layer; 21. first sublayer; 22. second sublayer; 30. second protective layer; 31. third sublayer; 32. fourth sublayer; 40. first bonding layer; 41. first glue layer; 42. second glue layer; 50. second bonding layer; 51. third glue layer; 52. fourth glue layer; 60. first functional layer; 70. second functional layer. DETAILED DESCRIPTION
[0031] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0032] It should be understood that all directional indications in the embodiments of the present application (such as up, down, left, right, front, back, etc.) are only used to explain the relative position relationship, movement status, etc. between the components in a certain specific posture. If the specific posture changes, the directional indication will also change accordingly.
[0033] It should also be understood that when an element is referred to as being "fixed" or "disposed on" another element, it can be directly on the other element or there may be an intermediate element at the same time. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or it can be indirectly connected to the other element through an intermediate element.
[0034] The terms used in this specification of the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application. For example, the descriptions of "first", "second", etc. in the present application are only for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" or "second" may explicitly or implicitly include at least one of the features.
[0035] It should be further understood that the term “and / or” used in the specification and appended claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes these combinations.
[0036] See also Figure 1The embodiment of the present application provides an optical waveguide device 100, comprising a waveguide layer 10, a first protective layer 20, a second protective layer 30, a first adhesive layer 40 and a second adhesive layer 50. The waveguide layer 10 has a first side surface 11 and a second side surface 12 opposite to each other. The waveguide layer 10 comprises a substrate and an in-coupling grating and an out-coupling grating arranged on the substrate. The in-coupling grating and the out-coupling grating are located on the first side surface 11. The in-coupling grating is used to receive incident light and couple it into the substrate so that the light propagates in the substrate. The out-coupling grating is used to couple the light out. The first protective layer 20 is arranged on the first side surface 11 to protect the first side surface 11 of the waveguide layer 10 and prevent the waveguide layer 10 from being scratched. The first adhesive layer 40 is arranged between the waveguide layer 10 and the first protective layer 20 to at least partially adhere the first protective layer 20 to the first side surface 11 of the waveguide layer 10. The second protective layer 30 is disposed on the second side surface 12 to protect the second side surface 12 of the waveguide layer 10 and prevent the waveguide layer 10 from being scratched. The second adhesive layer 50 is disposed between the waveguide layer 10 and the second protective layer 30 to at least partially adhere the second protective layer 30 to the second side surface 12 of the waveguide layer 10.
[0037] The optical waveguide device 100 proposed in the embodiment of the present application can more comprehensively protect the waveguide layer 10 by respectively disposing the first protection layer 20 and the second protection layer 30 on the first side surface 11 and the second side surface 12 of the waveguide layer 10, thereby preventing the first side surface 11 or the second side surface 12 of the waveguide layer 10 from being scratched and causing scratches to cause serious scattering of light, thereby avoiding reduction in display performance such as display resolution of the optical waveguide device 100 and improving the service life of the product.
[0038] Exemplarily, the first protective layer 20 is at least partially adhered to the first side surface 11 of the waveguide layer 10. It can be in a full-adhesion manner so that the first protective layer 20 is completely adhered to the first side surface 11 of the waveguide layer 10, or it can be in a frame-adhesion manner so that the edge area of the first protective layer 20 is adhered to the edge area of the first side surface 11.
[0039] Exemplarily, the second protective layer 30 is at least partially adhered to the second side surface 12 of the waveguide layer 10. It can be in a fully adhered manner so that the second protective layer 30 is completely adhered to the second side surface 12 of the waveguide layer 10, or it can be in a frame-adhered manner so that the edge area of the second protective layer 30 is adhered to the edge area of the second side surface 12.
[0040] In an optional embodiment, the waveguide layer 10 can be a single layer or a multi-layer. The structure of a single-layer waveguide layer is relatively simple, and the manufacturing and integration costs are low. Figures 1 to 4 As shown, the multi-layer waveguide layer 10 can improve the performance of the optical waveguide device 100 by introducing a multi-layer structure.
[0041] In some embodiments, the waveguide layer 10 is made of a resin material. Specifically, the substrate serves as a supporting structure of the waveguide layer 10. The use of a resin material can achieve high transparency, high refractive index, and high heat resistance, ensuring effective transmission of light in the substrate and meeting the requirements of the optical waveguide device 100 for stability and reliability. The coupling-in grating and the coupling-out grating are formed by photoresist, which is made of a resin material with photosensitive properties. These resin materials generally contain photosensitizers, resins, solvents, and other additives. The resin serves as the skeleton of the photoresist, providing the necessary mechanical strength and chemical stability.
[0042] See also Figure 1 and Figure 2 In some embodiments, the first adhesive layer 40 is configured to completely adhere the first protective layer 20 to the first side surface 11 of the waveguide layer 10, and the first adhesive layer 40 is used to block the light from propagating in the first protective layer 20. Therefore, by setting the first adhesive layer 40, it is possible to block the light from propagating in the first protective layer 20, so that even if the first protective layer 20 is scratched, it will not affect the display performance of the optical waveguide device 100, thereby improving the service life of the product.
[0043] It can be understood that the first protective layer 20 is completely adhered to the first side surface 11 of the waveguide layer 10 by the first adhesive layer 40, that is, the waveguide layer 10 and the first protective layer 20 are fixed in a fully adhered manner, which can eliminate the air layer between the waveguide layer 10 and the first protective layer 20. Since the waveguide layer 10 and the first protective layer 20 are closely adhered to each other, the stress can be better dispersed when impacted by external force, thereby reducing the risk of breakage.
[0044] In some usage scenarios, light usually enters the waveguide layer 10 at a large incident angle and then propagates by total reflection in the substrate. At this time, due to the blocking effect of the first adhesive layer 40, the light will not propagate by total reflection in the first protective layer 20. When the light propagates to the out-coupling grating, it is diffracted by the out-coupling grating to couple the light out to the human eye.
[0045] In some embodiments, the second adhesive layer 50 is configured to completely adhere the second protective layer 30 to the second side surface 12 of the waveguide layer 10, and the second adhesive layer 50 is used to block light from propagating in the second protective layer 30. Therefore, by setting the second adhesive layer 50, it is possible to block light from propagating in the second protective layer 30, so that even if the second protective layer 30 is scratched, it will not affect the display performance of the optical waveguide device 100, thereby improving the service life of the product.
[0046] It can be understood that the second protective layer 30 is completely adhered to the second side surface 12 of the waveguide layer 10 by the second adhesive layer 50, that is, the waveguide layer 10 and the second protective layer 30 are fixed in a fully adhered manner, which can eliminate the air layer between the waveguide layer 10 and the second protective layer 30. Since the waveguide layer 10 and the second protective layer 30 are closely adhered to each other, the stress can be better dispersed when impacted by external force, thereby reducing the risk of breakage.
[0047] The optical waveguide device 100 of the embodiment of the present application can more comprehensively protect the waveguide layer 10 by respectively disposing the first protective layer 20 and the second protective layer 30 on the first side surface 11 and the second side surface 12 of the waveguide layer 10, and blocking the light from propagating in the first protective layer 20 and the second protective layer 30 by disposing the first adhesive layer 40 and the second adhesive layer 50. Whether the first protective layer 20 and the second protective layer 30 are scratched, it has no effect on the propagation of light and will not affect the display performance of the optical waveguide device 100, thereby improving the service life of the product.
[0048] In some embodiments, the first adhesive layer 40 is an optical adhesive with a low refractive index, and the refractive index of the first adhesive layer 40 is 1.0 to 1.4. Therefore, the first protective layer 20 is attached to the waveguide layer 10 using an optical adhesive with a refractive index in the range of 1.0 to 1.4, and the first protective layer 20 is isolated from the waveguide layer 10, thereby blocking light from propagating in the first protective layer 20, so that even if the first protective layer 20 is scratched, it will not affect the display performance of the optical waveguide device 100, thereby improving the service life of the product.
[0049] For example, the refractive index of the first adhesive layer 40 may be 1.0, 1.1, 1.2, 1.3, 1.4, or the like.
[0050] In some embodiments, the material of the first adhesive layer 40 may be mainly composed of acrylate, epoxy resin or silicon dioxide, and the material of the first adhesive layer 40 contains micropores. Since it is difficult for general materials to achieve the required lower refractive index, the embodiment of the present application adds micropores to the above material so that the material and air are mixed together (the refractive index of vacuum or air is very low) to reduce the refractive index of the material of the first adhesive layer 40, thereby satisfying the low refractive index in the range of 1.0 to 1.4.
[0051] In some embodiments, the thickness of the first adhesive layer 40 is 0.001 mm to 0.1 mm. A thicker first adhesive layer 40 may result in greater haze, which may adversely affect the performance of the optical waveguide device 100. Therefore, the embodiment of the present application limits the thickness of the first adhesive layer 40 to a range of 0.001 mm to 0.1 mm, which can block the light from propagating in the first protective layer 20 without affecting the performance of the optical waveguide device 100.
[0052] Illustratively, the thickness of the first adhesive layer 40 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0053] In some embodiments, the Mohs hardness of the first protective layer 20 is greater than the Mohs hardness of the waveguide layer 10. Since the wear resistance is directly affected by the hardness and density of the material, the wear resistance of the first protective layer 20 is higher than that of the waveguide layer 10, so it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0054] In some embodiments, the first protective layer 20 is made of UTG glass material. It can be understood that UTG glass material, namely Ultra-Thin Glass, not only has high light transmittance, but also has high mechanical strength and wear resistance, and has higher hardness and denser structure than resin material, so it is not easy to be scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0055] Of course, in other embodiments, the first protection layer 20 may also be other transparent materials having a Mohs hardness greater than that of the waveguide layer 10 .
[0056] In some embodiments, the Mohs hardness of the first protective layer 20 is 5 to 7. For example, the Mohs hardness of the first protective layer 20 may be 5, 6, 7, or the like.
[0057] Since the Mohs hardness of the resin is generally 2-3, that is, the Mohs hardness of the waveguide layer 10 is 2-3, the Mohs hardness of the first protective layer 20 is 5-7. For example, UTG glass material is used, and the Mohs hardness of the UTG glass material is generally 5-7, so that the wear resistance of the first protective layer 20 is higher than that of the waveguide layer 10, and therefore it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0058] In addition, when the waveguide layer 10 is made of resin material, since the water absorption rate of the resin material is relatively high, adding UTG glass material to the outer surface of the resin waveguide layer 10 can significantly reduce the water absorption of the resin waveguide layer 10. If the resin material contains a high amount of water, it will seriously affect the resolution of the waveguide layer 10, and scratches on the surface of the waveguide layer 10 will also affect the performance of the optical waveguide device 100. Therefore, adding UTG glass material can improve the stability of the performance of the optical waveguide device 100.
[0059] In some embodiments, the first protective layer 20 is mainly composed of silicon dioxide or silicon nitride. As one of the main components of glass, silicon dioxide has good optical properties, mechanical properties and chemical stability. Silicon nitride is a high-hardness, high-wear-resistant and corrosion-resistant ceramic material, and is also often used to prepare ultra-thin glass. Its excellent physical and chemical properties enable silicon nitride ultra-thin glass to maintain good performance in extreme environments.
[0060] In some embodiments, the thickness of the first protective layer 20 is 30 μm to 70 μm. Thus, the first protective layer 20 has a very thin thickness, and adding the first protective layer 20 on the surface of the waveguide sheet will not significantly increase the weight of the optical waveguide device 100, thereby significantly improving the wear resistance while maintaining the advantage of lightweight of the optical waveguide device 100.
[0061] For example, the thickness of the first protection layer 20 may be 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, or the like.
[0062] For example, since UTG glass material is usually very thin, the first protective layer 20 may be made of UTG glass material. Of course, other transparent materials with a thickness of 30 μm to 70 μm and a Mohs hardness greater than that of the waveguide layer 10 may also be used.
[0063] It should be noted that the first protective layer 20 is not limited to the UTG glass material. For example, in other embodiments, the first protective layer 20 can also be made of resin material. For example, the first protective layer 20 can be mainly composed of epoxy resin, polyimide or polycarbonate. Using resin material as the first protective layer 20 is easier to process, has a simpler process and lowers the cost.
[0064] See also Figure 3In some embodiments, the optical waveguide device 100 further includes a first functional layer 60, which covers the side of the first protective layer 20 facing away from the waveguide layer 10. The first functional layer 60 is a hardening layer, an anti-reflection layer or an anti-fingerprint layer. Thus, the hardness of the first protective layer 20 can be further improved by setting the hardening layer, and the light transmittance of the first protective layer 20 can be improved by setting the anti-reflection layer (AR layer), so that the display effect is clearer and brighter. The anti-fingerprint layer (AF layer) can improve the anti-fouling property of the first protective layer 20, and reduce the friction coefficient between the friction material and the first protective layer 20, thereby reducing the shear force during friction, thereby achieving the effect of improving wear resistance.
[0065] In some embodiments, the hardened layer can be formed by spray coating, dip coating or transfer. For example, spray coating is to spray the hardener evenly on the surface of the first protective layer 20 through a nozzle, while dip coating is to immerse the first protective layer 20 in the hardener. Subsequently, the hardener is rapidly cured by heating or ultraviolet irradiation to form a hard hardened layer. The transfer method generally involves uniformly transferring a material with enhanced hardness and wear resistance (such as a special hardener or coating) to the surface of the first protective layer 20 through transfer technology. This material can form a hard protective layer after curing, thereby effectively preventing the surface of the first protective layer 20 from scratches, wear and other damage.
[0066] In some embodiments, the anti-reflection layer or the anti-fingerprint layer may be formed by physical vapor deposition. For example, physical vapor deposition is to vaporize the surface of a material source (solid or liquid) into gaseous atoms, molecules or partially ionize them into ions under vacuum conditions by physical methods, and then deposit a thin film with special functions (such as anti-fingerprint properties and anti-reflection properties) on the surface of the first protective layer 20 through a low-pressure gas (or plasma) process.
[0067] In some embodiments, the second adhesive layer 50 is an optical glue with a low refractive index, and the refractive index of the second adhesive layer 50 is 1.0-1.4. Therefore, the second protective layer 30 is attached to the second side surface 12 of the waveguide layer 10 using an optical glue with a refractive index in the range of 1.0-1.4, and the second protective layer 30 is isolated from the waveguide layer 10, thereby blocking light from propagating in the second protective layer 30, so that even if the second protective layer 30 is scratched, it will not affect the display performance of the optical waveguide device 100, thereby improving the service life of the product.
[0068] For example, the refractive index of the second adhesive layer 50 may be 1.0, 1.1, 1.2, 1.3, 1.4, or the like.
[0069] In some embodiments, the material of the second adhesive layer 50 may be mainly composed of acrylate, epoxy resin or silicon dioxide, and the material of the second adhesive layer 50 contains micropores. Since it is difficult for general materials to achieve the required lower refractive index, the embodiment of the present application adds micropores to the above material so that the material and air are mixed together (the refractive index of vacuum or air is very low) to reduce the refractive index of the material of the second adhesive layer 50, thereby meeting the low refractive index in the range of 1.0 to 1.4.
[0070] In some embodiments, the thickness of the second adhesive layer 50 is 0.001 mm to 0.1 mm. A thicker second adhesive layer 50 may result in greater haze, which may adversely affect the performance of the optical waveguide device 100. Therefore, the embodiment of the present application limits the thickness of the second adhesive layer 50 to a range of 0.001 mm to 0.1 mm, which can block light from propagating in the second protective layer 30 without affecting the performance of the optical waveguide device 100.
[0071] Illustratively, the thickness of the second adhesive layer 50 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0072] In some embodiments, the Mohs hardness of the second protective layer 30 is greater than the Mohs hardness of the waveguide layer 10. Since the wear resistance is directly affected by the hardness and density of the material, the wear resistance of the second protective layer 30 is higher than that of the waveguide layer 10, so it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0073] In some embodiments, the second protective layer 30 is made of UTG glass material. It can be understood that UTG glass material, namely Ultra-Thin Glass, not only has high light transmittance, but also has high mechanical strength and wear resistance. Compared with resin materials, it has higher hardness and denser structure, so it is not easy to be scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches. Of course, in other embodiments, the second protective layer 30 can also be other transparent materials with a Mohs hardness greater than the Mohs hardness of the waveguide layer 10.
[0074] In some embodiments, the Mohs hardness of the second protective layer 30 is 5 to 7. For example, the Mohs hardness of the second protective layer 30 may be 5, 6, 7, or the like.
[0075] Since the Mohs hardness of the resin is generally 2-3, that is, the Mohs hardness of the waveguide layer 10 is 2-3, the Mohs hardness of the second protective layer 30 is 5-7. For example, UTG glass material is used, and the Mohs hardness of the UTG glass material is generally 5-7, so that the wear resistance of the second protective layer 30 is higher than that of the waveguide layer 10, and therefore it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0076] In some embodiments, the second protective layer 30 is mainly composed of silicon dioxide or silicon nitride. As one of the main components of glass, silicon dioxide has good optical properties, mechanical properties and chemical stability. Silicon nitride is a high-hardness, high-wear-resistant and corrosion-resistant ceramic material, and is also often used to prepare ultra-thin glass. Its excellent physical and chemical properties enable silicon nitride ultra-thin glass to maintain good performance in extreme environments.
[0077] In some embodiments, the thickness of the second protective layer 30 is 30 μm to 70 μm. Thus, the second protective layer 30 has a very thin thickness, and adding the second protective layer 30 on the surface of the waveguide sheet will not significantly increase the weight of the optical waveguide device 100, thereby significantly improving the wear resistance while maintaining the advantage of lightweight optical waveguide device 100.
[0078] For example, the thickness of the second protection layer 30 may be 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, or the like.
[0079] For example, since UTG glass material is usually very thin, the second protective layer 30 may be made of UTG glass material. Of course, other transparent materials with a thickness of 30 μm to 70 μm and a Mohs hardness greater than that of the waveguide layer 10 may also be used.
[0080] It should be noted that the second protective layer 30 is not limited to UTG glass material. For example, in other embodiments, the second protective layer 30 can also be made of resin material. For example, the second protective layer 30 can be mainly composed of epoxy resin, polyimide or polycarbonate.
[0081] See also Figure 3In some embodiments, the optical waveguide device 100 further includes a second functional layer 70, and the second functional layer 70 covers the side of the second protective layer 30 facing away from the waveguide layer 10. The second functional layer 70 is a hardening layer, an anti-reflection layer or an anti-fingerprint layer. Thus, the hardness of the second protective layer 30 can be further improved by setting the hardening layer, and the light transmittance of the second protective layer 30 can be improved by setting the anti-reflection layer (AR layer), so that the display effect is clearer and brighter. The anti-fouling property of the second protective layer 30 can be improved by setting the anti-fingerprint layer (AF layer), and the friction coefficient between the friction material and the first protective layer 20 can be reduced, thereby reducing the shear force during friction, and achieving the effect of improving wear resistance. The processing methods of the hardening layer, the anti-reflection layer and the anti-fingerprint layer can refer to the above embodiments, and will not be repeated here.
[0082] In an optional embodiment, the first protective layer 20 and the second protective layer 30 can be a single layer or a multi-layer. When the first protective layer 20 and the second protective layer 30 are a single layer (such as Figure 1 As shown in FIG. 1 ), it can be a UTG glass material or a resin material. When the first protective layer 20 and the second protective layer 30 are multiple layers (as shown in FIG. 1 ), the first protective layer 20 and the second protective layer 30 can be a UTG glass material or a resin material. Figure 4 As shown in FIG. 1 , for example, when both the first protective layer 20 and the second protective layer 30 are two layers, one layer may be a UTG glass material and the other layer may be a resin material. Of course, one of the first protective layer 20 and the second protective layer 30 may be a single layer and the other may be a multi-layer.
[0083] See also Figure 4 In some embodiments, the first protective layer 20 includes a first sublayer 21 and a second sublayer 22, wherein the first sublayer 21 is disposed on the first side surface 11, and the second sublayer 22 is disposed on the side of the first sublayer 21 that is opposite to the first side surface 11. The first adhesive layer 40 includes a first glue layer 41 and a second glue layer 42, wherein the first glue layer 41 is disposed in the edge region between the first sublayer 21 and the waveguide layer 10 to fit the edge region of the first sublayer 21 to the edge region of the first side surface 11, and the second glue layer 42 is disposed in at least a portion of the region between the first sublayer 21 and the second sublayer 22 to fit the second sublayer 22 at least partially to the side of the first sublayer 21 that is opposite to the first side surface 11. Thus, the first sublayer 21 is fixed to the first side surface 11 by frame pasting, which can reduce the area of the first glue layer 41, thereby reducing the cost, and in the case of frame pasting, the first protective layer 20 is set to a double-layer structure, which can improve the structural stability and wear resistance, thereby protecting the waveguide layer 10 from being affected by scratches, thereby improving the service life of the product.
[0084] In an optional embodiment, the second adhesive layer 42 can fully adhere the second sublayer 22 to the first sublayer 21 in a full-fitting manner, or the second adhesive layer 42 can adhere the edge area of the first sublayer 21 to the edge area of the second sublayer 22 in a frame-fitting manner.
[0085] In some embodiments, the Mohs hardness of the first sublayer 21 is greater than or equal to the Mohs hardness of the waveguide layer 10. Exemplarily, the Mohs hardness of the first sublayer 21 can be the same as the Mohs hardness of the waveguide layer 10, that is, the first sublayer 21 can be made of resin material, which is convenient for processing, simpler in process, and reduces costs. Exemplarily, the Mohs hardness of the first sublayer 21 can also be greater than the Mohs hardness of the waveguide layer 10, that is, the first sublayer 21 can be made of a material with a higher Mohs hardness than the Mohs hardness of the waveguide layer 10, such as UTG glass material, so that the wear resistance of the first sublayer 21 is higher than that of the waveguide layer 10.
[0086] In some embodiments, the Mohs hardness of the second sub-layer 22 is greater than the Mohs hardness of the waveguide layer 10. Exemplarily, the second sub-layer 22 may be made of a material having a higher Mohs hardness than the waveguide layer 10, such as a UTG glass material. Thus, the wear resistance of the second sub-layer 22 is higher than that of the waveguide layer 10, and the wear resistance of the optical waveguide device 100 can be improved, so that it is not easily scratched, and the poor appearance of the optical waveguide device 100 caused by surface scratches can be avoided. By setting the outermost second sub-layer 22, the waveguide layer 10 can be protected from scratches, so that the projection and scattering path of the light will not be affected, so that the performance of the optical waveguide device 100, such as resolution and contrast, will not be affected by scratches.
[0087] In some embodiments, the second sublayer 22 is made of UTG glass material. It can be understood that the UTG glass material, namely Ultra-Thin Glass, not only has high light transmittance, but also has high mechanical strength and wear resistance. Compared with resin materials, it has higher hardness and denser structure, so it is not easy to be scratched, which can avoid the poor appearance of the optical waveguide device 100 due to surface scratches. Of course, in other embodiments, the second sublayer 22 can also be other transparent materials with a Mohs hardness greater than the Mohs hardness of the waveguide layer 10.
[0088] In some embodiments, the Mohs hardness of the second sub-layer 22 is 5 to 7. For example, the Mohs hardness of the second sub-layer 22 may be 5, 6, 7, or the like.
[0089] Since the Mohs hardness of the resin is generally 2-3, that is, the Mohs hardness of the waveguide layer 10 is 2-3, the Mohs hardness of the second sub-layer 22 is 5-7. For example, UTG glass material is used. The Mohs hardness of the UTG glass material is generally 5-7, so that the wear resistance of the second sub-layer 22 is higher than that of the waveguide layer 10, and therefore it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0090] In some embodiments, the second sublayer 22 is mainly composed of silicon dioxide or silicon nitride. As one of the main components of glass, silicon dioxide has good optical properties, mechanical properties and chemical stability. Silicon nitride is a high-hardness, high-wear-resistant and corrosion-resistant ceramic material, and is also often used to prepare ultra-thin glass. Its excellent physical and chemical properties enable silicon nitride ultra-thin glass to maintain good performance in extreme environments.
[0091] In some embodiments, the thickness of the second sublayer 22 is 30 μm to 70 μm. Thus, the second protective layer 30 has a very thin thickness, and adding the second sublayer 22 on the surface of the waveguide sheet will not significantly increase the weight of the optical waveguide device 100, thereby significantly improving the wear resistance while maintaining the advantage of lightweight of the optical waveguide device 100.
[0092] By way of example, the thickness of the second sub-layer 22 may be 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, or the like.
[0093] For example, since UTG glass material is usually very thin, the second sub-layer 22 may be made of UTG glass material. Of course, other transparent materials with a thickness of 30 μm to 70 μm and a Mohs hardness greater than that of the waveguide layer 10 may also be used.
[0094] In an optional embodiment, the first adhesive layer 41 may be an optical adhesive with a low refractive index or a conventional optical adhesive. The second adhesive layer 42 may be an optical adhesive with a low refractive index or a conventional optical adhesive.
[0095] In some embodiments, the refractive index of the first adhesive layer 41 is 1.0-1.7. For example, the refractive index of the first adhesive layer 41 may be 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6 or 1.7.
[0096] In some embodiments, the first adhesive layer 41 is a conventional optical adhesive, and the refractive index of the first adhesive layer 41 is 1.4 to 1.7, such as OCA (Optical Clear Adhesive, i.e., optically clear adhesive, usually in solid or semi-solid state) or OCR (Liquid Optical Clear Adhesive, a special adhesive mainly used for bonding transparent optical elements, usually in liquid state). Therefore, using conventional optical adhesive can reduce production costs.
[0097] For example, the refractive index of the first adhesive layer 41 may be 1.4, 1.5, 1.6 or 1.7.
[0098] In some embodiments, the refractive index of the second adhesive layer 42 is 1.0-1.7. For example, the refractive index of the second adhesive layer 42 may be 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6 or 1.7.
[0099] In some embodiments, the second adhesive layer 42 is a conventional optical adhesive, and the refractive index of the second adhesive layer 42 is 1.4 to 1.7, such as OCA (Optical Clear Adhesive, i.e., optically clear adhesive, usually in solid or semi-solid state) or OCR (Liquid Optical Clear Adhesive, a special adhesive mainly used for bonding transparent optical elements, usually in liquid state). Therefore, using conventional optical adhesive can reduce production costs.
[0100] For example, the refractive index of the second adhesive layer 42 may be 1.4, 1.5, 1.6, 1.7, or the like.
[0101] In some embodiments, the thickness of the first adhesive layer 41 is 0.001 mm to 0.1 mm. A thicker first adhesive layer 41 may result in greater haze, which may adversely affect the performance of the optical waveguide device 100. Therefore, the embodiment of the present application limits the thickness of the first adhesive layer 41 to a range of 0.001 mm to 0.1 mm, so as not to affect the performance of the optical waveguide device 100.
[0102] Illustratively, the thickness of the first adhesive layer 41 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0103] In some embodiments, the thickness of the second adhesive layer 42 is 0.001 mm to 0.1 mm. A thicker second adhesive layer 42 may result in greater haze, which may adversely affect the performance of the optical waveguide device 100. Therefore, the thickness of the second adhesive layer 42 is limited to a range of 0.001 mm to 0.1 mm in the embodiment of the present application, so as not to affect the performance of the optical waveguide device 100.
[0104] Illustratively, the thickness of the second adhesive layer 42 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0105] See also Figure 4 In some embodiments, the second protective layer 30 includes a third sublayer 31 and a fourth sublayer 32, the third sublayer 31 is disposed on the second side surface 12, and the fourth sublayer 32 is disposed on the side of the third sublayer 31 facing away from the second side surface 12. The second adhesive layer 50 includes a third glue layer 51 and a fourth glue layer 52, the third glue layer 51 is disposed in the edge region between the third sublayer 31 and the waveguide layer 10, so as to fit the edge region of the third sublayer 31 with the edge region of the second side surface 12, and the fourth glue layer 52 is disposed in at least a portion of the region between the third sublayer 31 and the fourth sublayer 32, so as to fit the fourth sublayer 32 at least partially to the side of the third sublayer 31 facing away from the second side surface 12. Thus, the third sublayer 31 is fixed to the second side surface 12 by frame pasting, which can reduce the area of the third glue layer 51, thereby reducing the cost, and in the case of frame pasting, the second protective layer 30 is set as a double-layer structure, which can improve the structural stability and wear resistance, thereby protecting the waveguide layer 10 from being affected by scratches, thereby improving the service life of the product.
[0106] In an optional embodiment, the fourth adhesive layer 52 can fully bond the fourth sublayer 32 to the third sublayer 31 in a full bonding manner, or the fourth adhesive layer 52 can bond the edge area of the fourth sublayer 32 to the edge area of the third sublayer 31 in a frame bonding manner.
[0107] In some embodiments, the Mohs hardness of the third sublayer 31 is greater than or equal to the Mohs hardness of the waveguide layer 10. Exemplarily, the Mohs hardness of the third sublayer 31 can be the same as the Mohs hardness of the waveguide layer 10, that is, the third sublayer 31 can be made of resin material, which is convenient for processing, simpler in process, and reduces costs. Exemplarily, the Mohs hardness of the third sublayer 31 can also be greater than the Mohs hardness of the waveguide layer 10, that is, the third sublayer 31 can be made of a material with a higher Mohs hardness than the Mohs hardness of the waveguide layer 10, such as UTG glass material, so that the wear resistance of the third sublayer 31 is higher than that of the waveguide layer 10.
[0108] In some embodiments, the Mohs hardness of the fourth sublayer 32 is greater than the Mohs hardness of the waveguide layer 10. Exemplarily, the fourth sublayer 32 may be made of a material having a higher Mohs hardness than the waveguide layer 10, such as a UTG glass material. Thus, the wear resistance of the fourth sublayer 32 is higher than that of the waveguide layer 10, and the wear resistance of the optical waveguide device 100 can be improved, so that it is not easily scratched, and the poor appearance of the optical waveguide device 100 caused by surface scratches can be avoided. By setting the outermost fourth sublayer 32, the waveguide layer 10 can be protected from scratches, so that the projection and scattering path of the light will not be affected, so that the performance of the optical waveguide device 100, such as resolution and contrast, will not be affected by scratches.
[0109] In some embodiments, the fourth sublayer 32 is made of UTG glass material. It can be understood that the UTG glass material, namely Ultra-Thin Glass, not only has high light transmittance, but also has high mechanical strength and wear resistance. Compared with resin materials, it has higher hardness and denser structure, so it is not easy to be scratched, which can avoid the poor appearance of the optical waveguide device 100 due to surface scratches. Of course, in other embodiments, the fourth sublayer 32 can also be other transparent materials with a Mohs hardness greater than the Mohs hardness of the waveguide layer 10.
[0110] In some embodiments, the Mohs hardness of the fourth sub-layer 32 is 5 to 7. For example, the Mohs hardness of the fourth sub-layer 32 may be 5, 6, 7, or the like.
[0111] Since the Mohs hardness of the resin is generally 2-3, that is, the Mohs hardness of the waveguide layer 10 is 2-3, the Mohs hardness of the fourth sublayer 32 is 5-7. For example, UTG glass material is used. The Mohs hardness of the UTG glass material is generally 5-7, so that the wear resistance of the fourth sublayer 32 is higher than that of the waveguide layer 10, and therefore it is not easily scratched, which can avoid the poor appearance of the optical waveguide device 100 caused by surface scratches.
[0112] In some embodiments, the fourth sublayer 32 is mainly composed of silicon dioxide or silicon nitride. As one of the main components of glass, silicon dioxide has good optical properties, mechanical properties and chemical stability. Silicon nitride is a ceramic material with high hardness, high wear resistance and corrosion resistance, and is also often used to prepare ultra-thin glass. Its excellent physical and chemical properties enable silicon nitride ultra-thin glass to maintain good performance in extreme environments.
[0113] In some embodiments, the thickness of the fourth sublayer 32 is 30 μm to 70 μm. Thus, the second protective layer 30 has a very thin thickness, and adding the fourth sublayer 32 on the surface of the waveguide sheet will not significantly increase the weight of the optical waveguide device 100, thereby significantly improving the wear resistance while maintaining the advantage of lightweight optical waveguide device 100.
[0114] By way of example, the thickness of the fourth sub-layer 32 may be 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, or the like.
[0115] For example, since UTG glass material is usually very thin, the fourth sublayer 32 may be made of UTG glass material. Of course, other transparent materials with a thickness of 30 μm to 70 μm and a Mohs hardness greater than that of the waveguide layer 10 may also be used.
[0116] In an optional embodiment, the third adhesive layer 51 may be an optical adhesive with a low refractive index or a conventional optical adhesive. The fourth adhesive layer 52 may be an optical adhesive with a low refractive index or a conventional optical adhesive.
[0117] In some embodiments, the refractive index of the third adhesive layer 51 is 1.0-1.7. For example, the refractive index of the third adhesive layer 51 may be 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6 or 1.7.
[0118] In some embodiments, the third adhesive layer 51 is a conventional optical adhesive, and the refractive index of the third adhesive layer 51 is 1.4 to 1.7, such as OCA (Optical Clear Adhesive, i.e., optically clear adhesive, usually in solid or semi-solid state) or OCR (Liquid Optical Clear Adhesive, a special adhesive mainly used for bonding transparent optical elements, usually in liquid state). Therefore, using conventional optical adhesive can reduce production costs.
[0119] By way of example, the refractive index of the third adhesive layer 51 may be 1.4, 1.5, 1.6 or 1.7, etc.
[0120] In some embodiments, the refractive index of the fourth adhesive layer 52 is 1.0-1.7. For example, the refractive index of the fourth adhesive layer 52 may be 1.0, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6 or 1.7.
[0121] In some embodiments, the fourth adhesive layer 52 is a conventional optical adhesive, and the refractive index of the fourth adhesive layer 52 is 1.4-1.7, such as OCA (Optical Clear Adhesive, i.e., optically clear adhesive, usually in solid or semi-solid state) or OCR (Liquid Optical Clear Adhesive, a special adhesive mainly used for bonding transparent optical elements, usually in liquid state). Therefore, using conventional optical adhesive can reduce production costs.
[0122] For example, the refractive index of the fourth adhesive layer 52 may be 1.4, 1.5, 1.6, 1.7, or the like.
[0123] In some embodiments, the thickness of the third adhesive layer 51 is 0.001 mm to 0.1 mm. A thicker third adhesive layer 51 may result in greater haze, which in turn has an adverse effect on the performance of the optical waveguide device 100. Therefore, the thickness of the third adhesive layer 51 is limited to a range of 0.001 mm to 0.1 mm in the embodiment of the present application, so as not to affect the performance of the optical waveguide device 100.
[0124] Illustratively, the thickness of the third adhesive layer 51 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0125] In some embodiments, the thickness of the fourth adhesive layer 52 is 0.001 mm to 0.1 mm. A thicker fourth adhesive layer 52 may result in greater haze, which may adversely affect the performance of the optical waveguide device 100. Therefore, the thickness of the fourth adhesive layer 52 is limited to a range of 0.001 mm to 0.1 mm in the embodiment of the present application, so as not to affect the performance of the optical waveguide device 100.
[0126] Illustratively, the thickness of the fourth adhesive layer 52 may be 0.001 mm, 0.002 mm, 0.003 mm, 0.004 mm, 0.005 mm, 0.006 mm, 0.007 mm, 0.008 mm, 0.009 mm, 0.01 mm, 0.02 mm, 0.03 mm, 0.04 mm, 0.05 mm, 0.06 mm, 0.07 mm, 0.08 mm, 0.09 mm or 0.1 mm, etc.
[0127] The embodiment of the present application further provides a display device, comprising the above-mentioned optical waveguide device 100 .
[0128] In some embodiments, the display device may be an AR display device, which further includes an optical machine, the optical machine is used to emit light corresponding to the image to be displayed, and the optical waveguide device 100 is used to transmit the light emitted by the optical machine to a target area in a directional manner, and to allow the light to enter the eyes of a user wearing the AR display device in the target area, so that the user can observe the corresponding image. Specifically, the AR display device is, for example, AR glasses.
[0129] The structure and function of the optical waveguide device in the display device proposed in the embodiment of the present application are the same as those in the above embodiment. For details, please refer to the description of the above embodiment, and this embodiment will not be repeated.
[0130] Those skilled in the art may combine and associate different embodiments or examples and features of different embodiments or examples described in this specification without mutual contradiction.
[0131] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in the present application, and these modifications or replacements should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.
Claims
1. An optical waveguide device, characterized in that: include: A waveguide layer having a first side surface and a second side surface opposite to each other, the waveguide layer comprising a substrate and an in-coupling grating and an out-coupling grating arranged on the substrate, the in-coupling grating and the out-coupling grating being located on the first side surface, the in-coupling grating being used to receive incident light and couple it into the substrate so that the light propagates in the substrate, and the out-coupling grating being used to couple the light out; A first protective layer, disposed on the first side surface; a first adhesive layer disposed between the waveguide layer and the first protective layer to at least partially adhere the first protective layer to the first side surface of the waveguide layer; A second protective layer, disposed on the second side surface; The second adhesive layer is disposed between the waveguide layer and the second protective layer to at least partially adhere the second protective layer to the second side surface of the waveguide layer.
2. The optical waveguide device according to claim 1, wherein The first adhesive layer is configured to completely adhere the first protective layer to the first side surface of the waveguide layer, and the first adhesive layer is used to block the light from propagating in the first protective layer; and / or, The second adhesive layer is configured to completely adhere the second protective layer to the second side surface of the waveguide layer, and the second adhesive layer is used to block the light from propagating in the second protective layer.
3. The optical waveguide device according to claim 1, wherein The refractive index of the first adhesive layer is 1.0 to 1.4; and / or, The refractive index of the second adhesive layer is 1.0 to 1.4; and / or, The material of the first adhesive layer is mainly composed of acrylate, epoxy resin or silicon dioxide, and the material of the first adhesive layer contains micropores; and / or, The material of the second adhesive layer is mainly composed of acrylate, epoxy resin or silicon dioxide, and the material of the second adhesive layer contains micropores; and / or, The thickness of the first adhesive layer is 0.001 mm to 0.1 mm; and / or, The thickness of the second adhesive layer is 0.001 mm to 0.1 mm.
4. The optical waveguide device according to claim 1, wherein The Mohs hardness of the first protective layer is greater than the Mohs hardness of the waveguide layer; and / or, The Mohs hardness of the second protective layer is greater than the Mohs hardness of the waveguide layer; and / or, The first protective layer is made of UTG glass material or resin material; and / or, The second protective layer is made of UTG glass material or resin material; and / or, The Mohs hardness of the first protective layer is 5 to 7; and / or, The Mohs hardness of the second protective layer is 5 to 7; and / or, The thickness of the first protective layer is 30 μm to 70 μm; and / or, The thickness of the first protective layer is 30 μm to 70 μm.
5. The optical waveguide device according to claim 1, wherein The optical waveguide device further comprises a first functional layer, the first functional layer covers the side of the first protective layer facing away from the waveguide layer, the first functional layer is a hardening layer, an anti-reflection layer or an anti-fingerprint layer; and / or, The optical waveguide device further includes a second functional layer, which covers a side of the second protective layer facing away from the waveguide layer, and the second functional layer is a hardening layer, a transmittance-enhancing layer or an anti-fingerprint layer.
6. The optical waveguide device according to claim 1, wherein The waveguide layer is a single-layer structure or a multi-layer structure; and / or, The waveguide layer is made of resin material.
7. The optical waveguide device according to claim 1, wherein: The first protective layer includes a first sublayer and a second sublayer, the first sublayer is arranged on the first side surface, and the second sublayer is arranged on a side of the first sublayer facing away from the first side surface; The first adhesive layer includes a first glue layer and a second glue layer, the first glue layer is arranged in an edge area between the first sub-layer and the waveguide layer to adhere the edge area of the first sub-layer to the edge area of the first side surface, and the second glue layer is arranged in at least a portion of the area between the first sub-layer and the second sub-layer to adhere the second sub-layer at least partially to a side of the first sub-layer facing away from the first side surface.
8. The optical waveguide device according to claim 7, wherein: The Mohs hardness of the first sub-layer is greater than or equal to the Mohs hardness of the waveguide layer; and / or, The Mohs hardness of the second sub-layer is greater than the Mohs hardness of the waveguide layer; and / or, The first sub-layer is made of UTG glass material or resin material; and / or, The second sub-layer is made of UTG glass material; and / or, The Mohs hardness of the second sub-layer is 5 to 7; and / or, The second sublayer has a thickness of 30 μm to 70 μm.
9. The optical waveguide device according to claim 7, wherein: The refractive index of the first adhesive layer is 1.0 to 1.7; and / or, The refractive index of the second adhesive layer is 1.0 to 1.7; and / or, The thickness of the first adhesive layer is 0.001 mm to 0.1 mm; and / or, The thickness of the second adhesive layer is 0.001 mm to 0.1 mm.
10. The optical waveguide device according to claim 1, wherein The second protective layer includes a third sublayer and a fourth sublayer, the third sublayer is arranged on the second side surface, and the fourth sublayer is arranged on a side of the third sublayer facing away from the second side surface; The second adhesive layer includes a third adhesive layer and a fourth adhesive layer, the third adhesive layer is arranged in an edge area between the third sub-layer and the waveguide layer to adhere the edge area of the third sub-layer to the edge area of the second side surface, and the fourth adhesive layer is arranged in at least a portion of the area between the third sub-layer and the fourth sub-layer to adhere the fourth sub-layer at least partially to a side of the third sub-layer facing away from the second side surface.
11. The optical waveguide device according to claim 10, wherein The Mohs hardness of the third sub-layer is greater than or equal to the Mohs hardness of the waveguide layer; and / or, The Mohs hardness of the fourth sub-layer is greater than the Mohs hardness of the waveguide layer; and / or, The third sub-layer is made of UTG glass material or resin material; and / or, The fourth sub-layer is made of UTG glass material; and / or, The Mohs hardness of the fourth sublayer is 5 to 7; and / or, The thickness of the fourth sublayer is 30 μm to 70 μm.
12. The optical waveguide device according to claim 10, wherein: The refractive index of the third adhesive layer is 1.0 to 1.7; and / or, The refractive index of the fourth adhesive layer is 1.0 to 1.7; and / or, The thickness of the third adhesive layer is 0.001 mm to 0.1 mm; and / or, The thickness of the fourth adhesive layer is 0.001 mm to 0.1 mm.
13. A display device, characterized in that: Comprising the optical waveguide device according to any one of claims 1 to 12.
Citation Information
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