Vacuum arc-extinguishing chamber cleaning method and vacuum plasma cleaning machine

Abstract

The invention belongs to the technical field of vacuum arc-extinguishing chamber cleaning, and discloses a vacuum arc-extinguishing chamber cleaning method and a vacuum plasma cleaning machine, and the method comprises the following steps: S1, placing a plurality of parts of a vacuum arc-extinguishing chamber or the whole vacuum arc-extinguishing chamber into a cleaning chamber of the vacuum plasma cleaning machine; s2, a cleaning chamber of the vacuum plasma cleaning machine is vacuumized; s3, a plasma generator of the vacuum plasma cleaning machine is started for cleaning; and S4, the plasma generator is turned off, the vacuum degree of the cleaning chamber is recovered to normal atmospheric pressure, and cleaning is completed. High-energy plasmas are projected to the surface of a cleaned object, grease, dirt and other substances on the surface are corroded, and therefore the purpose of cleaning is achieved.

Description

Technical Field

[0001] The invention belongs to the technical field of vacuum arc chamber cleaning, and in particular relates to a vacuum arc chamber cleaning method and a vacuum plasma cleaning machine. Background Art

[0002] The vacuum interrupter, also known as the vacuum switch tube, is the core component of the medium and high voltage power switch, mainly composed of an airtight insulating shell, a conductive circuit, a shielding system, contacts, parts and other parts. The excellent insulation of the vacuum in the tube enables the medium and high voltage circuit to quickly extinguish the arc and suppress the current after the power is cut off, avoiding accidents and unexpected events. It is mainly used in power transmission and distribution control systems, as well as in power distribution systems such as metallurgy, mining, petroleum, chemical industry, railways, broadcasting, communications, and industrial high-frequency heating. It has the characteristics of energy saving, material saving, fire prevention, explosion prevention, small size, long life, low maintenance cost, reliable operation and no pollution.

[0003] Acid cleaning is currently widely used for cleaning vacuum interrupters. The characteristics of acid cleaning are that there are many process steps, the process is relatively complicated, and it takes a long time. In addition, the chemical agents after cleaning will cause technical problems such as difficulty in recycling and environmental pollution.

[0004] The Chinese patent publication number is CN106493108A, and the name is a patent application for an acid-free cleaning process for a vacuum interrupter. The steps include: flushing the parts of the vacuum interrupter with high-pressure water; cleaning the parts of the vacuum interrupter while grinding and polishing them; after water washing and dehydration, vacuum high-temperature purification of the parts of the vacuum interrupter. This process does not rely on acid for cleaning, avoiding the defects of difficult recovery of chemical agents after cleaning and environmental pollution, and the process is simple, and post-processing is convenient and easy to industrialize. This patent application uses high-pressure water for cleaning, which has poor cleaning effect and is prone to residue. Summary of the invention

[0005] In order to overcome the problems existing in the above-mentioned prior art, the purpose of the present invention is to provide a vacuum interrupter cleaning method and a vacuum plasma cleaning machine, which uses a radio frequency power supply to generate high-energy disordered plasma under a certain pressure, and bombards the surface of the product to be cleaned by plasma to achieve the cleaning purpose, so as to clean the parts and the interrupter of the vacuum interrupter. The parts and the interrupter of the vacuum interrupter are cleaned, the surface state of the parts and the interrupter of the interrupter is improved, and the dependence on the pickling process is reduced.

[0006] To achieve the above object, the technical solution adopted by the present invention is: In a first aspect, the present invention provides a vacuum interrupter cleaning method, comprising the following steps: S1: placing several parts of the vacuum interrupter or the entire vacuum interrupter as objects to be cleaned into a cleaning chamber of a vacuum plasma cleaning machine; S2: evacuating the cleaning chamber of the vacuum plasma cleaning machine; S3: starting the plasma generator of the vacuum plasma cleaning machine for cleaning; S4: Turn off the plasma generator, restore the vacuum degree of the cleaning chamber to normal atmospheric pressure, and complete the cleaning.

[0007] Optionally, the power of the vacuum plasma cleaning machine is 100W-500W; the vacuum degree of the cleaning chamber is controlled at 20Pa-50Pa; and the duration of the plasma generator is 10-30s.

[0008] Optionally, the objects to be cleaned include parts of a vacuum arc chamber with a center hole and the number is greater than one. When the parts of the vacuum arc chamber with a center hole are placed in the cleaning chamber of a vacuum plasma cleaning machine, an axis is used to pass through the center hole and is suspended in the cleaning chamber of the vacuum plasma cleaning machine, and the spacing is greater than 0.1 mm.

[0009] Optionally, the objects to be cleaned include parts of a vacuum interrupter without a center hole and the number of parts is greater than one, a mesh tray is placed in the cleaning chamber, and the parts of the vacuum interrupter without a center hole are placed in the mesh tray.

[0010] Optionally, after step S4, the cleaned parts are assembled within 2 hours.

[0011] Optionally, in step S3, a float flowmeter is used to monitor the output flow of the plasma generator.

[0012] Optionally, in step S2, a three-phase motor vacuum pump is used to evacuate the air.

[0013] Optionally, the cleaning chamber of the vacuum plasma cleaning machine is made of SUS304 stainless steel, and the wall thickness of the cleaning chamber of the vacuum plasma cleaning machine is not less than 10 mm.

[0014] Optionally, the parts of the vacuum interrupter to be cleaned are any of stainless steel and porcelain shells such as the moving cover plate, static cover plate, bellows, shielding cover, shielding tube, guide sleeve fixing ring, moving and static conductive rods, and sealing ring of the vacuum interrupter.

[0015] In a second aspect, the present invention provides a vacuum plasma cleaning machine, which is used to perform the vacuum arc chamber cleaning method.

[0016] Compared with the prior art, the present invention has the following beneficial effects: A vacuum interrupter cleaning method of the present invention uses vacuum plasma to clean the vacuum interrupter, which can save a lot of water, electricity and chemicals, save energy and reduce pollution to the environment. The parts are in the cleaning room of the vacuum cleaning machine, and a plasma generator is used as a radio frequency power source under a certain pressure to generate high-energy disordered plasma through ignition, and the surface of the cleaned product is bombarded by the plasma to achieve the cleaning purpose. The generated plasma only decomposes the adsorbed gas molecules on the surface of the parts; the positively charged ions in the plasma impact the negatively charged materials on the surface, and the resulting sputtering will remove the particulate matter attached to the surface. The free radicals in the plasma undergo a chemical chain reaction with the surface of the object, generating new free radicals or further decomposing, and finally decomposing into volatile small molecules, and there will be no problem of over-cleaning. The present invention overcomes the acid cleaning process, the large-scale use of resources and the environmental pollution caused. The means adopted are to change the acid cleaning to plasma cleaning.

[0017] Furthermore, the vacuum arc chamber cleaning method of the present invention does not rely on acid for cleaning. It uses the small mass and fast moving speed of electrons in the plasma to reach the surface of the material first and make it negatively charged, and at the same time produce an impact on the surface of the material, prompting the decomposition of gas molecules adsorbed on the surface; the positively charged ions in the plasma impact the material with negative charge on the surface, and the resulting sputtering will remove the particulate matter attached to the surface. The free radicals in the plasma undergo a chemical chain reaction with the surface of the object, generating new free radicals or further decomposing, and may eventually decompose into volatile small molecules; ultraviolet rays have strong light energy and penetrating power, and can penetrate the surface of the material to a depth of several microns to produce an effect, breaking and decomposing the molecular bonds of the surface-attached substances. The process requirements for surface treatment of parts are met, the process is simple, the post-treatment is convenient and easy to industrialize, and it will not cause pollution to the environment. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings described herein are for explanation purposes only and are not intended to limit the scope of the present invention in any way. In addition, the shapes and proportional dimensions of the components in the drawings are only for illustration purposes to help understand the present invention, and are not intended to specifically limit the shapes and proportional dimensions of the components of the present invention. In the drawings: Figure 1 The figure is a flow chart of the cleaning method of the present invention. DETAILED DESCRIPTION

[0019] In order to enable those skilled in the art to better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0020] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0021] In the description of the embodiments of the present invention, it should be noted that if the terms "upper", "lower", "horizontal", "inner", etc. appear, the orientation or position relationship indicated is based on the orientation or position relationship shown in the accompanying drawings, or is the orientation or position relationship in which the product of the invention is usually placed when used. It is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0022] When an element is referred to as being "disposed on" another element, it may be directly on the other element or there may also be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may also be a central element. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and are not intended to be the only embodiments. If the term "horizontal" appears, it does not mean that the component is required to be absolutely horizontal, but it can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", which does not mean that the structure must be completely horizontal, but it can be slightly tilted.

[0023] It should be noted that similar reference numerals and letters represent similar items in the following figures, so once an item is defined in one figure, it does not need to be further defined and explained in the subsequent figures. In the description of the present invention, it is understood that the terms "include" and "comprise" indicate the presence of the described features, wholes, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and / or their collections.

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art of the technical field of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. As used in the specification of the present invention and the appended claims, the singular forms of "a", "an" and "the" are intended to include plural forms unless the context clearly indicates otherwise.

[0025] The present invention is described in detail below with reference to the accompanying drawings.

[0026] like Figure 1 As shown, a vacuum interrupter cleaning method of the present invention comprises the following steps: S1: Place the parts of the vacuum interrupter into the cleaning chamber of the vacuum plasma cleaning machine; S2: evacuating the cleaning chamber of the vacuum plasma cleaning machine; S3: starting the plasma generator of the vacuum plasma cleaning machine for cleaning; S4: Turn off the plasma generator, restore the vacuum degree of the cleaning chamber to normal atmospheric pressure, and complete the cleaning.

[0027] Among them, the vacuum degree of the cleaning chamber is controlled at 20Pa-50Pa; the duration of the plasma generator is 10-30s, and the power of the vacuum plasma cleaning machine is 100W-500W.

[0028] The cleaning effect will be different if the plasma generator setting parameters are different; the present invention controls the vacuum degree at 20Pa-50Pa, which is beneficial for cleaning the parts of the arc extinguishing chamber and maintaining the cleanliness of the parts after cleaning; the vacuum degree control can be appropriately relaxed for cleaning the arc extinguishing chamber before the soft package. The plasma cleaning effect is poor for cleaning the severe oxide layer on the surface of the parts.

[0029] Plasma is a state of matter. Matter usually exists in three states: solid, liquid, and gas. However, in some special cases, there is a fourth state, such as matter in the ionosphere in the earth's atmosphere. The following substances exist in the plasma state: electrons in high-speed motion; neutral atoms, molecules, and atomic groups (free radicals) in an activated state; ionized atoms and molecules; unreacted molecules and atoms, etc., but the matter generally remains electrically neutral. In a vacuum chamber, a high-energy disordered plasma is generated by igniting a radio frequency power supply under a certain pressure, and the surface of the product to be cleaned is bombarded by the plasma to achieve the cleaning purpose.

[0030] The mechanism of plasma cleaning mainly relies on the activation of active particles in plasma to achieve the purpose of removing stains on the surface of objects. In terms of reaction mechanism, plasma cleaning usually includes the following processes: inorganic gas is excited into plasma state; gas phase substances are adsorbed on the solid surface; adsorbed groups react with solid surface molecules to generate product molecules; product molecules are decomposed to form gas phase; reaction residues are detached from the surface.

[0031] The plasma cleaning machine uses gas as the cleaning medium. When working, the plasma in the cleaning chamber gently flushes the surface of the object to be cleaned. Organic pollutants can be effectively cleaned away in a short time. At the same time, the pollutants are pumped away by the vacuum pump, and the cleaning degree reaches the molecular level.

[0032] For the vacuum interrupter, it is made of a variety of materials vacuum brazed and welded, including insulating materials (ceramics, glass), metal materials (stainless steel, oxygen-free copper, electric iron, etc. The biggest feature of plasma cleaning technology is that it can be used regardless of the type of substrate to be treated. It can treat metals, semiconductors, oxides and most polymer materials, such as polypropylene, polyester, polyimide, polyvinyl chloride, epoxy, and even polytetrafluoroethylene, and can achieve overall and local cleaning as well as complex structures.

[0033] The object to be cleaned is dry after plasma cleaning and can be sent to the next process without further drying. The processing efficiency of the entire process line can be improved; plasma cleaning allows users to stay away from harmful solvents that harm the human body, and also avoids the problem of easily damaging the object to be cleaned in wet cleaning; the method of the present invention can avoid the use of harmful solvents such as trichloroethane, ODS, so that no harmful pollutants will be generated after cleaning, so this cleaning method is an environmentally friendly green cleaning method.

[0034] The plasma generated by the present invention using high frequency in the radio wave range is different from direct light such as laser. The plasma has low directionality, which allows it to penetrate into the tiny holes and recesses of an object to complete the cleaning task, so there is no need to consider the shape of the object being cleaned too much. Moreover, the cleaning effect on these difficult-to-clean parts is similar to or even better than that of Freon cleaning.

[0035] The present invention uses plasma to clean the parts of the vacuum interrupter, which can greatly improve the cleaning efficiency. The entire cleaning process is fast and has high productivity.

[0036] The vacuum conditions required for plasma cleaning are easy to achieve, and the cleaning process does not require the use of expensive organic solvents, which makes the overall cost lower than traditional wet cleaning processes.

[0037] In addition, plasma cleaning avoids the need for transport, storage, and discharge of cleaning fluids, so it is easy to keep the production site clean and sanitary. Plasma cleaning can be used regardless of the object being treated. It can treat a variety of materials, whether metals, semiconductors, oxides, or polymer materials (such as polypropylene, polyvinyl chloride, polytetrafluoroethylene, polyimide, polyester, epoxy resin, and other polymers). Therefore, it is particularly suitable for materials that are not resistant to heat and solvents. It can also selectively clean the entire, partial, or complex structure of the material.

[0038] The method of the present invention can improve the surface properties of the material itself while completing the cleaning and decontamination, such as improving the surface wetting properties and improving the adhesion of the film.

[0039] The present invention utilizes the small mass and fast moving speed of electrons in plasma, which can reach the surface of the material first and make it negatively charged, and at the same time produce an impact on the surface of the material, prompting the decomposition of gas molecules adsorbed on the surface; the positively charged ions in the plasma impact the material with negative charge on the surface, and the resulting sputtering will remove the particulate matter attached to the surface. The free radicals in the plasma react chemically with the surface of the object, generating new free radicals or further decomposing, and may finally decompose into volatile small molecules; ultraviolet rays have strong light energy and penetrating power, and can penetrate the surface of the material to a depth of several microns to produce an effect, breaking and decomposing the molecular bonds of the surface-attached substances. The process requirements for surface treatment of parts are met, the process is simple, the post-processing is convenient and easy to industrialize, and it will not cause pollution to the environment.

[0040] After using the plasma cleaning process, each part saves 0.8 yuan, saves energy, and the energy consumption is only 27% of the traditional pickling process, and reduces pollution to the environment.

[0041]

[0042] Example 1 In this embodiment, a vacuum interrupter cleaning method is provided, and the parts of the vacuum interrupter to be cleaned are any of stainless steel and porcelain shells such as the moving cover plate, static cover plate, bellows, shielding cover, shielding cylinder, guide sleeve fixing ring, moving and static conductive rods, sealing ring, etc. of the vacuum interrupter, or the vacuum interrupter as a whole. It is used for cleaning the vacuum interrupter before soft packing or before sealing the soft pack interrupter.

[0043] The vacuum interrupter cleaning method of this embodiment comprises the following steps: Place the parts of the vacuum interrupter into the cleaning chamber of the vacuum plasma cleaning machine, and then close the door of the cleaning chamber.

[0044] Start the vacuum pump and control the vacuum degree of the vacuum plasma cleaning machine at 50pa.

[0045] Maintain a stable vacuum.

[0046] Start the plasma generator of the cleaning machine and expose the parts of the vacuum interrupter to the plasma environment for 10 seconds according to the state of the parts. The plasma power supply outputs plasma and the flow meter is used to control the flow to achieve plasma cleaning of the parts.

[0047] Wait for cleaning to be completed and then switch off the plasma generator.

[0048] Turn off the vacuum pump and control the vacuum degree of the cleaning chamber at normal atmospheric pressure.

[0049] Open the door of the cleaning chamber and take out the parts of the vacuum interrupter.

[0050] Among them, the power of the vacuum plasma cleaning machine is 100W. The wall thickness of the cleaning chamber of the vacuum plasma cleaning machine is not less than 10mm. The cavity material of the cleaning chamber of the vacuum plasma cleaning machine is sus304 stainless steel.

[0051] In this embodiment, when the vacuum interrupter parts with a center hole are placed in the cleaning chamber of the vacuum plasma cleaning machine, they are hung on the shaft with a spacing greater than 0.1 mm. Parts without a center hole are placed on a mesh tray.

[0052] Example 2 A vacuum arc chamber cleaning method of this embodiment cleans the parts of the vacuum arc chamber, which are any one or more combinations of stainless steel and porcelain shells such as the moving cover plate, static cover plate, bellows, shielding cover, shielding tube, guide sleeve fixing ring, moving and static conductive rods, and sealing ring of the vacuum arc chamber, and the number of each part is one or more.

[0053] The vacuum interrupter cleaning method of this embodiment comprises the following steps: Place the parts of the vacuum interrupter into the cleaning chamber of the vacuum plasma cleaning machine, and then close the door of the cleaning chamber.

[0054] Start the vacuum pump and control the vacuum degree of the vacuum plasma cleaning machine at 30pa.

[0055] Maintain a stable vacuum.

[0056] Start the plasma generator of the cleaning machine and expose the parts of the vacuum interrupter to the plasma environment for 20 seconds according to the state of the parts. The plasma power supply outputs plasma and the flow meter is used to control the flow to achieve plasma cleaning of the parts.

[0057] Wait for cleaning to be completed and then switch off the plasma generator.

[0058] Turn off the vacuum pump and control the vacuum degree of the cleaning chamber at normal atmospheric pressure.

[0059] Open the door of the cleaning chamber and take out the parts of the vacuum interrupter.

[0060] Among them, the power of the vacuum plasma cleaning machine is 300W.

[0061] Example 3 A vacuum arc chamber cleaning method of this embodiment cleans the parts of the vacuum arc chamber, which are any combination of stainless steel and porcelain shells such as the moving cover plate, static cover plate, bellows, shielding cover, shielding tube, guide sleeve fixing ring, moving and static conductive rods, and sealing ring of the vacuum arc chamber, and the number of each part is greater than one.

[0062] The vacuum interrupter cleaning method of this embodiment comprises the following steps: Place the parts of the vacuum interrupter into the cleaning chamber of the vacuum plasma cleaning machine, and then close the door of the cleaning chamber.

[0063] Start the vacuum pump and control the vacuum degree of the vacuum plasma cleaning machine at 50pa.

[0064] Maintain a stable vacuum.

[0065] Start the plasma generator of the cleaning machine and expose the parts of the vacuum interrupter to the plasma environment for 30 seconds according to the state of the parts. The plasma power supply outputs plasma and the flow meter is used to control the flow to achieve plasma cleaning of the parts.

[0066] Wait for cleaning to be completed and then switch off the plasma generator.

[0067] Turn off the vacuum pump and control the vacuum degree of the cleaning chamber at normal atmospheric pressure.

[0068] Open the door of the cleaning chamber and take out the parts of the vacuum interrupter.

[0069] Among them, the power of the vacuum plasma cleaning machine is 500W.

[0070] In this embodiment, a float flowmeter is used to control the flow rate, and the flow rate range is 0-200 ml / min.

[0071] In this embodiment, the vacuum pump is of model BSV30, with a voltage of three-phase 380V and a pumping speed of 8L / s.

[0072] Among them, the vacuum plasma cleaning machine is equipped with two outflow paths, one is controlled by air-breaking gas and the other is controlled by compressed air.

[0073] In this embodiment, the cleaning chamber inside the plasma cleaning machine has multiple layers, and the parts of various vacuum arc extinguishing chambers are placed in layers in the cleaning chamber of the plasma cleaning machine, and the multiple parts are separated by partitions to prevent the parts from being damaged by collision.

[0074] In this embodiment, the internal cleaning chamber of the vacuum plasma cleaning machine is provided with a suitable tray structure according to the different shapes and parts of the arc extinguishing chamber to prevent bumps and inadequate cleaning.

[0075] Example 4 A vacuum plasma cleaning machine is used to execute the vacuum interrupter cleaning method.

[0076] In this embodiment, the vacuum plasma cleaning machine has a single door. In the cleaning chamber inside the vacuum plasma cleaning machine, the inner wall opposite to the inner wall of the single door and the two side inner walls connected to the inner wall are provided with electrode plates. The three electrode plates are arranged vertically and are perpendicular to each other.

[0077] In this embodiment, in the cleaning chamber of the vacuum plasma cleaning machine, the length of the area where the product is placed is not less than 200 mm, the width is not less than 400 mm, and the height is not less than 400 mm.

[0078] Unless otherwise specified, the device elements involved in the above embodiments are all conventional device elements, and the structural settings, working modes or control modes involved are all conventional settings, working modes or control modes in the art unless otherwise specified.

[0079] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention rather than to limit it. Other modifications or equivalent substitutions made to the technical solution of the present invention by ordinary technicians in the field should be included in the scope of the claims of the present invention as long as they do not depart from the spirit and scope of the technical solution of the present invention.

Claims

1. A vacuum interrupter cleaning method, characterized in that: The following steps are involved: S1: placing several parts of the vacuum interrupter or the entire vacuum interrupter as objects to be cleaned into a cleaning chamber of a vacuum plasma cleaning machine; S2: evacuating the cleaning chamber of the vacuum plasma cleaning machine; S3: starting the plasma generator of the vacuum plasma cleaning machine for cleaning; S4: Turn off the plasma generator, restore the vacuum degree of the cleaning chamber to normal atmospheric pressure, and complete the cleaning.

2. A vacuum interrupter cleaning method according to claim 1, characterized in that: The power of the vacuum plasma cleaning machine is 100W-500W; the vacuum degree of the cleaning chamber is controlled at 20Pa-50Pa; the duration of the plasma generator is 10-30s.

3. A vacuum interrupter cleaning method according to claim 1, characterized in that: The objects to be cleaned include parts of a vacuum arc extinguishing chamber with a center hole and the number is greater than one. When the parts of the vacuum arc extinguishing chamber with a center hole are placed in the cleaning chamber of a vacuum plasma cleaning machine, an axis is used to pass through the center hole and be suspended in the cleaning chamber of the vacuum plasma cleaning machine, and the spacing is greater than 0.1 mm.

4. A vacuum interrupter cleaning method according to claim 1, characterized in that: The objects to be cleaned include parts of a vacuum interrupter without a center hole and the number of parts is greater than one. A mesh tray is placed in the cleaning chamber, and the parts of the vacuum interrupter without a center hole are placed in the mesh tray.

5. A vacuum interrupter cleaning method according to claim 1, characterized in that: After step S4, the cleaned parts are assembled within 2 hours.

6. A vacuum interrupter cleaning method according to claim 1, characterized in that: In step S3, a float flowmeter is used to monitor the output flow of the plasma generator.

7. A vacuum interrupter cleaning method according to claim 1, characterized in that: In step S2, a three-phase motor vacuum pump is used to evacuate the air.

8. A vacuum interrupter cleaning method according to claim 1, characterized in that: The cleaning chamber of the vacuum plasma cleaning machine is made of sus304 stainless steel, and the wall thickness of the cleaning chamber of the vacuum plasma cleaning machine is not less than 10mm.

9. A vacuum interrupter cleaning method according to claim 1, characterized in that: The parts of the vacuum interrupter to be cleaned are any of stainless steel and porcelain shells such as the moving cover plate, static cover plate, bellows, shielding cover, shielding tube, guide sleeve fixing ring, moving and static conductive rods, sealing ring, etc. of the vacuum interrupter.

10. A vacuum plasma cleaning machine, characterized in that: The vacuum plasma cleaning machine is used to perform the vacuum interrupter cleaning method according to any one of claims 1 to 9.

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