Cleaning process for heat recovery system equipment

Abstract

The invention belongs to the technical field of liquid crystal panel equipment cleaning, and provides a cleaning process of heat recovery system equipment. The method comprises the following steps: (1) dismounting a heat exchange tube: dismounting the heat exchange tube of heat recovery system equipment; (2) heating and baking: heating and baking the heat exchange tube at 180-520 DEG C for 2 hours; (3) photoresist is removed, specifically, the heat exchange tube obtained after the step (2) is completed is soaked in photoresist removing liquid at the temperature ranging from-8 DEG C to-12 DEG C for 8-12 min; the photoresist removing solution comprises an organic solvent, amide, organic acid and alcohol amine; and (4) washing and drying: washing with purified water and then drying. According to the cleaning process, the problems that in the prior art, the cleaning process for heat recovery system equipment is complex and the liquid medicine loss is large are solved, the cleaning time is short, corrosion to the heat exchange tube is small, cleaning is thorough, and the effect of completely removing photoresist can be achieved.

Description

Technical Field

[0001] The invention belongs to the technical field of cleaning liquid crystal panel equipment, and in particular relates to a cleaning process for heat recovery system equipment. Background Art

[0002] The heat recovery system (TRU) equipment is mainly used to provide heat recovery in the production of LCD panels, so that the exhaust gas of the equipment can be converted into usable hot gas through its ventilation treatment, thereby achieving the effect of energy saving and emission reduction. The gas in the vacuum chamber contains substances such as photoresist. After a period of use, the photoresist will adhere to the heat exchange pipe of the TRU, affecting the heat exchange effect, and needs to be cleaned regularly.

[0003] Due to the special structure of the heat exchange tubes on the TRU, the heat exchange tubes are made of copper tubes with stainless steel sheets welded on them. Ordinary alkaline cleaning requires a long time of soaking, a large amount of alkaline solution is required, and a high-pressure water gun is needed to flush the heat exchange tubes to remove the residual film on the surface. The cleaning process is complicated and the cleaning time is too long.

[0004] At present, there is an urgent need for a new process to clean the heat exchanger in order to improve the cleaning efficiency of the product. Summary of the invention

[0005] In view of the above-mentioned deficiencies in the prior art, the purpose of the present invention is to provide a cleaning process for heat recovery system equipment; the cleaning process solves the problems of complex cleaning process and large loss of chemical solution for TRU equipment in the prior art, takes less time to clean, has less erosion to the heat exchange tubes, and cleans thoroughly, thereby achieving the effect of completely removing the photoresist.

[0006] In order to achieve the above object, the solution adopted by the present invention is:

[0007] A cleaning process for heat recovery system equipment comprises: (1) heat exchange tube disassembly: disassembling the heat exchange tube of the heat recovery system equipment; (2) heating and baking: heating and baking the heat exchange tube at 180-520°C for 2 hours; (3) removing photoresist: soaking the heat exchange tube after completing step (2) in a degumming liquid at -8 to -12°C for 8-12 minutes; the degumming liquid comprises an organic solvent, amide, organic acid and alcohol amine; (4) rinsing and drying: rinsing with pure water and then drying.

[0008] Furthermore, in a preferred embodiment of the present invention, step (2) includes: heating and baking the heat exchange tube at 180-220°C for 10 minutes, then heating and baking at 280-320°C for 20 minutes, then heating and baking at 380-420°C for 40 minutes, and then heating and baking at 480-520°C for 50 minutes.

[0009] Furthermore, in a preferred embodiment of the present invention, the degumming solution comprises, by weight, 15-18 parts of amide, 12-16 parts of alcohol amine, 72-75 parts of organic solvent and 3-5 parts of organic acid.

[0010] Furthermore, in a preferred embodiment of the present invention, the amide includes at least one of butenamide, oxalyl diamide, and acetamide.

[0011] Furthermore, in a preferred embodiment of the present invention, the organic solvent includes at least one of ethylene glycol and ethylene glycol butyl ether.

[0012] Furthermore, in a preferred embodiment of the present invention, the organic acid includes at least one of lactic acid, citric acid and tartaric acid.

[0013] Furthermore, in a preferred embodiment of the present invention, the alcoholamine includes at least one of isopropanolamine, triethanolamine and monoethanolamine.

[0014] The beneficial effects of a cleaning process for heat recovery system equipment provided by the present invention are:

[0015] The cleaning process of the heat recovery system equipment provided by the present invention comprises: (1) disassembling the heat exchange tube; (2) heating and baking; (3) removing the photoresist; and (4) rinsing and drying.

[0016] In the present application, the heat exchange tube is heated and baked at high temperature and then immediately immersed in a low-temperature degumming solution. The sudden change in temperature helps the photoresist to quickly fall off the heat exchange tube in the degumming solution, greatly reducing the degumming time.

[0017] In the present application, a gradient temperature increase method is used to heat and bake the heat exchange tube, which is beneficial for the photoresist attached to the heat exchange tube to break layer by layer from the outside to the inside, while saving energy consumption to a certain extent, and is more conducive to the subsequent rapid dissolution of the photoresist in the degumming liquid, thereby completely peeling off the heat exchange tube.

[0018] In the present application, the degumming liquid adopts a combination of organic solvent, amide, organic acid and alcohol amine. Among them, the amide can increase the contact area between the organic solvent and the photoresist, improve the wettability of the two, and play the role of a surfactant; the organic acid will produce hydrogen ions in the degumming liquid, and the alcohol amine will produce hydroxide in the degumming liquid. The two neutralize each other, which can further increase the concentration of organic acid radical ions in the degumming liquid. The organic acid radical ions can form a complex with the copper tube (heat exchange tube), and the complex can be adsorbed on the surface of the copper tube to form a non-water-soluble protective film to protect the copper tube from corrosion; in addition, the use of organic acid can also increase the solubility of the photoresist in the degumming liquid, increase the dissolution rate, and play a role in solubilization; the alkalinity of alcohol amine is relatively low and the corrosiveness is relatively small, and it can also prevent the dissolved photoresist molecules from agglomerating, improve the dispersibility of the photoresist molecules in the organic solvent, thereby improving the solubility of the degumming liquid to the photoresist. The degumming liquid provided in the present application can greatly improve the stripping and dissolving ability of the degumming liquid system on photoresist through the mutual matching of the above components, and has little erosion on the heat exchange tube, and can play a role in completely removing the photoresist. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical scheme and advantages of the embodiments of the present invention clearer, the technical scheme in the embodiments of the present invention will be described clearly and completely below. If the specific conditions are not specified in the embodiments, they are carried out according to conventional conditions or conditions recommended by the manufacturer. If the manufacturer of the reagents or instruments used is not specified, they are all conventional products that can be purchased commercially.

[0020] The features and performance of the present invention are further described in detail below in conjunction with the embodiments.

[0021] Example 1

[0022] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0023] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0024] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0025] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0026] (4) Rinse and dry: Rinse with pure water and then dry.

[0027] Example 2

[0028] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0029] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0030] (2) Heating and baking: The heat exchange tubes were heated and baked at 180°C for 10 min, then heated and baked at 320°C for 20 min, then heated and baked at 380°C for 40 min, and then heated and baked at 520°C for 50 min;

[0031] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0032] (4) Rinse and dry: Rinse with pure water and then dry.

[0033] Example 3

[0034] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0035] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0036] (2) Heating and baking: The heat exchange tubes were heated and baked at 220°C for 10 min, then heated and baked at 280°C for 20 min, then heated and baked at 420°C for 40 min, and then heated and baked at 480°C for 50 min;

[0037] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0038] (4) Rinse and dry: Rinse with pure water and then dry.

[0039] Example 4

[0040] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0041] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0042] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0043] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -8°C for 8 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0044] (4) Rinse and dry: Rinse with pure water and then dry.

[0045] Example 5

[0046] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0047] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0048] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0049] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -12°C for 12 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0050] (4) Rinse and dry: Rinse with pure water and then dry.

[0051] Example 6

[0052] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0053] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0054] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0055] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 15 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 16 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 72 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 5 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0056] (4) Rinse and dry: Rinse with pure water and then dry.

[0057] Example 7

[0058] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0059] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0060] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0061] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 18 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 12 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 75 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 3 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0062] (4) Rinse and dry: Rinse with pure water and then dry.

[0063] Example 8

[0064] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0065] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0066] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0067] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 15 parts of amide (buteneamide: oxalyl diamide = 1:1), 16 parts of alcohol amine (triethanolamine: monoethanolamine = 1:1), 72 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 5 parts of organic acid (citric acid: tartaric acid = 1:1) by weight;

[0068] (4) Rinse and dry: Rinse with pure water and then dry.

[0069] Example 9

[0070] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0071] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0072] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0073] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 15 parts by weight of amide (oxalyl diamide), 16 parts by weight of alcohol amine (isopropanolamine), 72 parts by weight of organic solvent (ethylene glycol) and 5 parts by weight of organic acid (tartaric acid);

[0074] (4) Rinse and dry: Rinse with pure water and then dry.

[0075] Comparative Example 1

[0076] This comparative example provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0077] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0078] (2) Heating and baking: Heat the heat exchange tube at 500°C for 2 hours;

[0079] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0080] (4) Rinse and dry: Rinse with pure water and then dry.

[0081] Comparative Example 2

[0082] This comparative example provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0083] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0084] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0085] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in ethylene glycol at -10°C for 10 minutes;

[0086] (4) Rinse and dry: Rinse with pure water and then dry.

[0087] Comparative Example 3

[0088] This comparative example provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0089] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0090] (2) Heating and baking: The heat exchange tubes were heated and baked at 160°C for 10 min, then heated and baked at 340°C for 20 min, then heated and baked at 360°C for 40 min, and then heated and baked at 540°C for 50 min;

[0091] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0092] (4) Rinse and dry: Rinse with pure water and then dry.

[0093] Comparative Example 4

[0094] This comparative example provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0095] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0096] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0097] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -5°C for 15 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 14 parts of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 4 parts of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1) by weight;

[0098] (4) Rinse and dry: Rinse with pure water and then dry.

[0099] Comparative Example 5

[0100] This comparative example provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0101] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0102] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0103] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 12 parts by weight of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1), 19 parts by weight of alcohol amine (isopropanolamine: triethanolamine: monoethanolamine = 1:1:1), 69 parts by weight of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) and 8 parts by weight of organic acid (lactic acid: citric acid: tartaric acid = 1:1:1);

[0104] (4) Rinse and dry: Rinse with pure water and then dry.

[0105] Comparative Example 6s

[0106] This embodiment provides a cleaning process for heat recovery system equipment, comprising the following steps:

[0107] (1) Heat exchange tube disassembly: disassemble the heat exchange tubes of the heat recovery system equipment;

[0108] (2) Heating and baking: The heat exchange tube is heated and baked at 200°C for 10 min, then heated and baked at 300°C for 20 min, then heated and baked at 400°C for 40 min, and then heated and baked at 500°C for 50 min;

[0109] (3) Removing the photoresist: Soak the heat exchange tube after step (2) in a degumming solution at -10°C for 10 minutes; the degumming solution includes 16 parts of amide (buteneamide: oxalyl diamide: acetamide = 1:1:1) and 74 parts of organic solvent (ethylene glycol: ethylene glycol butyl ether = 1:1) by weight;

[0110] (4) Rinse and dry: Rinse with pure water and then dry.

[0111] Experimental Example 1

[0112] (1) Photoresist stripping effect on heat exchange tubes

[0113] Evaluation criteria: A: Complete removal of photoresist; B: Trace amounts of photoresist remaining on the copper surface; C: Less than 1 / 3 of the photoresist remaining; D: More than 1 / 3 of the photoresist remaining.

[0114] (2) Corrosion to the surface of heat exchange tubes (copper tubes)

[0115] Evaluation criteria: A: no corrosion occurs on the surface of the heat exchange tube; B: corrosion occurs on the surface of the heat exchange tube; C: the heat exchange tube is corroded and depressions occur on the surface.

[0116] The evaluation results are shown in Table 1:

[0117] Table 1

[0118] Group No. (1) Photoresist stripping effect on heat exchange tubes (2) Corrosion to the surface of heat exchange tubes (copper tubes) Example 1 A A Example 2 A A Example 3 A A Example 4 A A Example 5 A A Example 6 A A Example 7 A A Example 8 A A Example 9 A A Comparative Example 1 B A Example 2 C C Example 3 B A Example 4 B B Example 5 C B Example 6 C C

[0119] It can be seen from the data in Table 1 that the cleaning process of the heat recovery system equipment provided by the present application has an excellent effect of removing photoresist and will not corrode the heat exchange tube. The present application adopts a gradient heating method to heat and bake, the conditions for removing the photoresist, and the composition and ratio of the photoresist have an impact on the final removal of the photoresist and whether the heat exchange tube is corroded. The cleaning process of the heat recovery system equipment under the above-mentioned specific technical conditions provided by the present application can solve the problems of complex cleaning process and large loss of liquid medicine for TRU equipment in the prior art, and the cleaning time is short, the corrosion of the heat exchange tube is small, and the cleaning is thorough, which can achieve the effect of completely removing the photoresist. .

[0120] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A cleaning process for heat recovery system equipment, characterized in that: include: (1) Disassembly of heat exchange tubes: disassembly of the heat exchange tubes of the heat recovery system equipment; (2) Heating and baking: heating and baking the heat exchange tube at 180-520° C. for 2 h; (3) Removing the photoresist: soaking the heat exchange tube after step (2) in a degumming solution at -8 to -12°C for 8 to 12 minutes; the degumming solution comprises an organic solvent, amide, organic acid and alcohol amine; (4) Rinse and dry: Rinse with pure water and then dry.

2. The cleaning process of the heat recovery system equipment according to claim 1 is characterized in that: Step (2) comprises: heating and baking the heat exchange tube at 180-220°C for 10 minutes, then heating and baking at 280-320°C for 20 minutes, then heating and baking at 380-420°C for 40 minutes, and then heating and baking at 480-520°C for 50 minutes.

3. The cleaning process of the heat recovery system equipment according to claim 1 is characterized in that: In parts by weight, the degumming solution comprises 15-18 parts of the amide, 12-16 parts of the alcohol amine, 72-75 parts of the organic solvent and 3-5 parts of the organic acid.

4. The cleaning process of the heat recovery system equipment according to claim 3 is characterized in that: The amide includes at least one of butenamide, oxalyl diamide and acetamide.

5. The cleaning process of the heat recovery system equipment according to claim 1 is characterized in that: The organic solvent includes at least one of ethylene glycol and ethylene glycol butyl ether.

6. The cleaning process of the heat recovery system equipment according to claim 1, characterized in that: The organic acid includes at least one of lactic acid, citric acid and tartaric acid.

7. The cleaning process of the heat recovery system equipment according to claim 3 is characterized in that: The alcoholamine includes at least one of isopropanolamine, triethanolamine and monoethanolamine.