Ceramic composite process applied to metal base material

Abstract

The invention discloses a ceramic composite process applied to a metal base material. The ceramic composite process comprises the following steps: 1) carrying out micro-arc oxidation treatment on the metal base material; and 2) carrying out post-treatment on the metal base material obtained in the step 1). According to the method, the metal base material is subjected to micro-arc oxidation treatment, micro-arc oxidation ceramic membranes with different colors can be obtained on the surface of the metal base material, the colors are uniform, the appearance is attractive, then the metal base material is subjected to post-treatment, protection can be formed on the micro-arc oxidation ceramic membranes, micro-pores of the micro-arc oxidation ceramic membranes are filled, and the micro-arc oxidation ceramic membranes are protected. Microcosmic membrane holes in the surface of the metal base material subjected to micro-arc oxidation treatment are sealed, so that the smudginess resistance, weather resistance and surface hardness of the metal base material are greatly improved, and the phenomenon that a membrane layer is pulverized or fractured after the metal base material is impacted is prevented; the problems that in an existing micro-arc oxidation process, due to the fact that micro-pores exist in the surface, the anti-smudginess performance is poor, due to the fact that film pores are opened and not closed, the weather resistance is poor, the surface hardness is insufficient, and a micro-arc oxidation film is high in hardness and prone to being brittle are solved.

Description

Technical Field

[0001] The invention belongs to the technical field of metal material surface treatment, and in particular relates to a ceramic composite process applied to a metal substrate. Background Art

[0002] Micro-arc oxidation (MAO), also known as plasma electrolytic oxidation (PEO), is developed from anodizing technology, and the film performance formed is better than that of anodizing. The micro-arc oxidation process mainly relies on the matching and adjustment of electrolyte and electrical parameters. Under the instantaneous high temperature and high pressure generated by arc discharge, an oxide film is grown in situ on the surface of valve metals such as aluminum, magnesium, titanium and their alloys. Its corrosion resistance and wear resistance are significantly better than those of traditional anodized films, so it has received widespread attention.

[0003] The current technology of using micro-arc oxidation process to treat metal substrates has the following defects:

[0004] First, there are microscopic pores in the micro-arc oxidation film on the surface of the metal substrate. The specific defects are as follows: 1) liquid easily remains after flowing through the surface of the metal substrate; 2) dirt and foreign matter cannot be thoroughly cleaned or removed after entering the microscopic pores;

[0005] Second, the pores of the micro-arc oxidation film on the surface of the metal substrate are open and not closed. The specific defects are as follows: 1) weather resistance, including salt spray test, cannot meet specific requirements; 2) the microscopic undulations on the surface of the film lead to insufficient surface hardness, which means that the friction resistance and other properties of the surface need to be further improved;

[0006] Third, the micro-arc oxidation film formed on the surface of the metal substrate has high hardness and is brittle. Specifically, the micro-arc oxidation film is easily powdered after being impacted and the micro-arc oxidation film is broken after the product is deformed.

[0007] Based on this, the present invention discloses a ceramic composite process applied to a metal substrate. Summary of the invention

[0008] In view of the shortcomings of the prior art, an object of the present invention is to provide a ceramic composite process for metal substrates.

[0009] In order to achieve the above object, the technical solution adopted by the present invention is:

[0010] A ceramic composite process for a metal substrate comprises the following steps:

[0011] 1) Micro-arc oxidation treatment of metal substrates;

[0012] 2) Post-treating the metal substrate obtained in step 1).

[0013] Furthermore, in step 1), the metal substrate is pretreated before being subjected to micro-arc oxidation treatment.

[0014] Further, the step of pre-treating the metal substrate includes:

[0015] s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate;

[0016] s2. Cleaning the metal substrate obtained in step s1.

[0017] Further, in step 1), the process conditions of micro-arc oxidation treatment are:

[0018] A pulse power supply is used with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55°C, and a time of 5-50min.

[0019] Furthermore, the pulse power supply is a positive and negative dual pulse power supply, the positive pulse voltage is 0-750V, the negative pulse voltage is 0-450V, the duty cycle is 5%-50%, and the frequency is 50-1250Hz.

[0020] Furthermore, in step 2), the step of post-treating the metal substrate obtained in step 1) comprises:

[0021] S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment;

[0022] S22, spraying, electrophoresis and / or ion implantation are performed on the metal substrate obtained in step s21.

[0023] Furthermore, the spraying includes nano-spraying.

[0024] Furthermore, the process conditions of the nano-spraying are:

[0025] The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

[0026] Furthermore, the process conditions of the ion implantation are:

[0027] Metal ion implantation was performed using a metal plasma implantation device with an acceleration voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10 -2 Pa-3×10 -2Pa, the injection time is 20-70 minutes. After the metal ion injection is completed, the metal substrate is placed in an oven and kept warm at 200-220°C for 25-60 minutes.

[0028] Compared with the prior art, the present invention has the following beneficial effects:

[0029] The present invention discloses a ceramic composite process applied to a metal substrate. By performing micro-arc oxidation treatment on the metal substrate, micro-arc oxidation ceramic films of different colors can be obtained on the surface of the metal substrate, with uniform color and beautiful appearance. The metal substrate is then post-treated to protect the micro-arc oxidation ceramic film, fill the microscopic pores of the micro-arc oxidation ceramic film, and seal the microscopic film pores on the surface of the metal substrate after the micro-arc oxidation treatment, thereby greatly improving the anti-fouling performance, weather resistance and surface hardness of the metal substrate, preventing the metal substrate from powdering or cracking after being impacted, and solving the problems of poor anti-fouling performance due to microscopic pores on the surface, poor weather resistance and insufficient surface hardness due to open and unsealed film pores, and high hardness and brittleness of the micro-arc oxidation film in the existing micro-arc oxidation process. DETAILED DESCRIPTION

[0030] The present invention is described in detail below so that the advantages and features of the present invention can be more easily understood by those skilled in the art, thereby making a clearer and more definite definition of the protection scope of the present invention.

[0031] A brief summary of one or more aspects is given below to provide a basic understanding of these aspects. This summary is not an exhaustive overview of all conceived aspects, and is neither intended to identify the key or critical elements of all aspects nor to define the scope of any or all aspects. Its only purpose is to give some concepts of one or more aspects in a simplified form as a prelude to a more detailed description that will be given later.

[0032] A ceramic composite process for a metal substrate comprises the following steps:

[0033] 1) Pre-treating the metal substrate and then performing micro-arc oxidation treatment on the metal substrate;

[0034] 2) Post-treating the metal substrate obtained in step 1).

[0035] In step 1), the step of pre-treating the metal substrate includes:

[0036] s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate;

[0037] s2. Cleaning the metal substrate obtained in step s1.

[0038] In some embodiments, in step 1), the process conditions of micro-arc oxidation treatment are:

[0039] A pulse power supply is used with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55°C, and a time of 5-50min.

[0040] In some embodiments, the pulse power supply is a single pulse power supply.

[0041] In some embodiments, the pulse power supply is preferably a positive and negative dual pulse power supply, with a positive pulse voltage of 0-750V, a negative pulse voltage of 0-450V, a duty cycle of 5%-50%, and a frequency of 50-1250Hz.

[0042] In some embodiments, in step 2), the step of post-treating the metal substrate obtained in step 1) comprises:

[0043] S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment;

[0044] S22, spray coating, electrophoresis and / or ion implantation are performed on the metal substrate obtained in step s21. The metal substrate obtained in step s21 may be spray coated only, or ion implantation or electrophoresis may be performed only, or ion implantation or electrophoresis may be performed first and then spray coating. The specific selection may be flexible according to actual needs.

[0045] In some embodiments, spray coating includes nanospray coating.

[0046] In some embodiments, the process conditions of nano-spraying are:

[0047] The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

[0048] In some embodiments, the process conditions of ion implantation are:

[0049] Metal ion implantation was performed using a metal plasma implantation device with an acceleration voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10 -2 Pa-3×10 -2 Pa, the injection time is 20-70 minutes. After the metal ion injection is completed, the metal substrate is placed in an oven and kept warm at 200-220°C for 25-60 minutes.

[0050] Example 1

[0051] A ceramic composite process for a metal substrate comprises the following steps:

[0052] 1) Pre-treating the metal substrate and then performing micro-arc oxidation treatment on the metal substrate;

[0053] 2) Post-treating the metal substrate obtained in step 1).

[0054] In step 1), the step of pre-treating the metal substrate includes:

[0055] s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate;

[0056] s2. Cleaning the metal substrate obtained in step s1.

[0057] In step 1), the process conditions of micro-arc oxidation treatment are:

[0058] A single pulse power supply was used with a frequency of 1200 Hz, a voltage of 750 V, an electrolyte temperature of 45 °C, and a time of 40 min.

[0059] In step 2), the step of post-treating the metal substrate obtained in step 1) comprises:

[0060] S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment;

[0061] S22, the metal substrate obtained in step s21 is treated with Al2O3 having a particle size of 20 nm. 2 O 3 Ultrafine powder is nano-sprayed, and the process conditions are:

[0062] The spray gun shaft speed is 300 mm / s, the conveyor belt speed is 10 mm / s, and the paint flow rate is 0.5 g / 30 s.

[0063] Example 2

[0064] A ceramic composite process for a metal substrate comprises the following steps:

[0065] 1) Pre-treating the metal substrate and then performing micro-arc oxidation treatment on the metal substrate;

[0066] 2) Post-treating the metal substrate obtained in step 1).

[0067] In step 1), the step of pre-treating the metal substrate includes:

[0068] s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate;

[0069] s2. Cleaning the metal substrate obtained in step s1.

[0070] In step 1), the process conditions of micro-arc oxidation treatment are:

[0071] A positive and negative dual pulse power supply is used with a frequency of 1200Hz, a voltage of 750V, an electrolyte temperature of 55°C, a time of 50min, a positive pulse voltage of 750V, a negative pulse voltage of 450V, and a duty cycle of 50%.

[0072] In step 2), the step of post-treating the metal substrate obtained in step 1) comprises:

[0073] S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment;

[0074] S22, first use ion implantation to implant ions into the metal substrate obtained in step s21, and then use Al2O3 with a particle size of 20 nm to implant ions into the metal substrate. 2 O 3 Ultrafine powder for nano spraying.

[0075] The process conditions of nano spraying are:

[0076] The spray gun shaft speed is 300 mm / s, the conveyor belt speed is 10 mm / s, and the paint flow rate is 0.5 g / 30 s.

[0077] The process conditions of ion implantation are:

[0078] Metal ion implantation was performed using a metal plasma implantation device with an acceleration voltage of 50 kV, an implantation energy of 65 keV, and a vacuum degree of 2×10 -2 Pa, the injection time is 50 minutes. After the metal ion injection is completed, the metal substrate is placed in an oven and kept at 220°C for 50 minutes.

[0079] The rest is the same as in Example 1.

[0080] Example 3

[0081] A ceramic composite process for a metal substrate comprises the following steps:

[0082] 1) Pre-treating the metal substrate and then performing micro-arc oxidation treatment on the metal substrate;

[0083] 2) Post-treating the metal substrate obtained in step 1).

[0084] In step 1), the step of pre-treating the metal substrate includes:

[0085] s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate;

[0086] s2. Cleaning the metal substrate obtained in step s1.

[0087] In step 1), the process conditions of micro-arc oxidation treatment are:

[0088] A positive and negative dual pulse power supply was used with a frequency of 1250 Hz, a voltage of 750 V, an electrolyte temperature of 55°C, a time of 50 min, a positive pulse voltage of 650 V, a negative pulse voltage of 400 V, and a duty cycle of 10%.

[0089] In step 2), the step of post-treating the metal substrate obtained in step 1) comprises:

[0090] S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment;

[0091] S22, performing ion implantation on the metal substrate obtained in step s21 using ion implantation technology.

[0092] The process conditions of ion implantation are:

[0093] Metal ion implantation was performed using a metal plasma implantation device with an acceleration voltage of 40 kV, an implantation energy of 45 keV, and a vacuum degree of 1×10 -2 Pa, the injection time is 70 minutes. After the metal ion injection is completed, the metal substrate is placed in an oven and kept at 200°C for 60 minutes.

[0094] The rest is the same as in Example 1.

[0095] Parts or structures not specifically described in the present invention may adopt existing technologies or existing products and will not be described in detail here.

[0096] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made using the contents of the present invention specification, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A ceramic composite process for a metal substrate, characterized in that: The steps include: 1) Micro-arc oxidation treatment of metal substrates; 2) Post-treating the metal substrate obtained in step 1).

2. A ceramic composite process for metal substrates according to claim 1, characterized in that: In step 1), the metal substrate is pretreated before being subjected to micro-arc oxidation treatment.

3. A ceramic composite process for metal substrates according to claim 2, characterized in that: The steps for pre-treating the metal substrate include: s1. Grind and polish the metal substrate to improve the surface flatness of the metal substrate; s2. Cleaning the metal substrate obtained in step s1.

4. A ceramic composite process for metal substrates according to claim 1, characterized in that: In step 1), the process conditions of micro-arc oxidation treatment are: A pulse power supply is used with a frequency of 50-1250Hz, a voltage of 300-750V, an electrolyte temperature of 10-55°C, and a time of 5-50min.

5. A ceramic composite process for metal substrates according to claim 4, characterized in that: The pulse power supply is a positive and negative dual pulse power supply, the positive pulse voltage is 0-750V, the negative pulse voltage is 0-450V, the duty cycle is 5%-50%, and the frequency is 50-1250Hz.

6. A ceramic composite process for metal substrates according to claim 1, characterized in that: In step 2), the step of post-treating the metal substrate obtained in step 1) comprises: S21, performing plasma cleaning on the metal substrate obtained in step 1), thereby removing dirt and foreign matter that may be present in the microscopic membrane pores after micro-arc oxidation treatment; S22, spraying, electrophoresis and / or ion implantation are performed on the metal substrate obtained in step s21.

7. A ceramic composite process for metal substrates according to claim 6, characterized in that: The spraying includes nano spraying.

8. A ceramic composite process for metal substrates according to claim 7, characterized in that: The process conditions of the nano spraying are: The spray gun shaft speed is 300-1500mm / s, the conveyor belt speed is 1-50mm / s, and the paint flow rate is 0.1-10g / 30s.

9. A ceramic composite process for metal substrates according to claim 6, characterized in that: The process conditions of the ion implantation are: Metal ion implantation was performed using a metal plasma implantation device with an acceleration voltage of 25-60 kV, an implantation energy of 40-70 keV, and a vacuum degree of 1×10 -2 Pa-3×10 -2 Pa, the injection time is 20-70 minutes. After the metal ion injection is completed, the metal substrate is placed in an oven and kept warm at 200-220°C for 25-60 minutes.