Baseplate producing, processing and polishing device
By setting up barrier strips and limit blocks on the conveyor belt of the substrate polishing device, distinguishing areas and increasing friction, the problems of different contact degrees and time caused by inconsistent substrate positions are solved, and the consistency of the finished product after deburring of the substrate is achieved.
Patent Information
- Application Number
- CN202420927154.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-29
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2034-04-29
AI Technical Summary
It is difficult to ensure consistency of the substrate on the conveyor belt of the polishing device, resulting in different contact degrees and time between the substrate and the polishing roller, which affects the consistency of product production.
By setting up barrier strips and limit blocks on the conveyor belt, distinguishing the central area and edge areas, and using anti-slip marks and exhaust holes to increase friction, ensuring that the position of the substrate is consistent, and the limit block locates the base position to ensure that the position of the substrate is referenced to ensure that the position of the substrate is ensured. The degree and time of each contact are consistent.
The consistency of the finished product after substrate deburring is achieved, the relative error between finished products is reduced, and the consistency of product production is improved.
Smart Images

Figure CN222155124U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of PCB substrate processing, in particular to a substrate production, processing and polishing device. Background Art
[0002] The substrate production and processing polishing device is often used to polish and remove burrs on the edge of the cut substrate. The commonly used substrate production and processing polishing device on the market is generally composed of three parts: a conveying mechanism, a polishing mechanism, and a machine body. The cut substrate is transported by the conveying mechanism, and the substrate moves and contacts with the polishing mechanism to grind and polish the edge of the substrate to achieve deburring of the substrate.
[0003] The polishing mechanism is generally composed of multiple groups of polishing rollers under the turntable. When the polishing rollers rotate, a circular track is formed. It is difficult to ensure that the position of the substrate on the conveying mechanism is consistent every time. Therefore, the degree and contact time of the substrate and the polishing rollers are different, which affects the consistency of product production. Utility Model Content
[0004] In view of the shortcomings of the prior art, the utility model provides a substrate production and processing polishing device, which is used to solve the problem that it is difficult to ensure that the position of the substrate on the conveyor belt of the polishing device is consistent every time, resulting in different degrees and contact times between the substrate and the polishing roller, thus affecting the consistency of product production.
[0005] In order to solve the above technical problems, the utility model provides the following technical solutions:
[0006] A substrate production and processing polishing device comprises a machine body and a polishing mechanism driven by a motor in the machine body, wherein a conveyor belt is horizontally arranged on the machine body along the conveying direction, and baffles which are adapted to the shape and size of the conveyor belt and are horizontally fixedly installed on the machine body are arranged at the loading end and the unloading end of the conveyor belt, and a limit block is movably installed on the baffle, and the limit block is adsorbed and connected to the baffle through a magnetic block fixedly installed on the lower surface.
[0007] Preferably, the conveyor belt is a rubber belt.
[0008] Preferably, the conveyor belt consists of a central area and edge areas on both sides of the central area.
[0009] Preferably, the conveyor belt is provided with anti-slip grooves.
[0010] Preferably, exhaust holes are evenly arranged on the conveyor belt.
[0011] Compared with the prior art, the utility model has the following beneficial effects:
[0012] The utility model provides a conveyor belt, a baffle and a limit block, and distinguishes and marks the center area and the two side areas on the conveyor belt through the limit block, and uses the limit block to limit the placement of the substrate. The rotation track of the polishing roller on the polishing mechanism is annular. When the substrate is transported on the conveyor belt, there are differences in the contact degree and time between the substrate and the polishing mechanism at different positions. The limit block distinguishes the areas on the conveyor belt, ensures the consistency of the placement of the substrate, thereby achieving the consistency of the finished products after deburring, reduces the relative error between the finished substrate products, and solves the problem that it is difficult to ensure that the position of the substrate on the conveyor belt of the polishing device is consistent every time, resulting in different contact degrees and time between the substrate and the polishing roller, thereby affecting the consistency of product production. BRIEF DESCRIPTION OF THE DRAWINGS
[0013] Figure 1 It is a schematic diagram of the three-dimensional structure of the utility model;
[0014] Figure 2 This is a schematic diagram of the internal structure of the utility model;
[0015] Figure 3 This is a schematic diagram of the bottom structure of the limit block of the utility model;
[0016] Figure 4 It is a schematic diagram of the planar structure of the conveyor belt of the utility model when viewed from above.
[0017] In the figure: 1, machine body; 2, polishing mechanism; 3, conveyor belt; 301, central area; 302, edge area; 303, anti-slip pattern; 304, exhaust hole; 4, baffle; 5, limit block; 501, magnetic block. DETAILED DESCRIPTION
[0018] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0019] like Figure 1-4 As shown, the utility model provides a technical solution: a substrate production and processing polishing device, comprising a body 1 and a polishing mechanism 2 driven by a motor in the body 1, a conveyor belt 3 is horizontally arranged on the body 1 along the conveying direction, the conveyor belt 3 is a rubber belt, and the conveyor belt 3 has a certain deformation ability, so that the polishing mechanism 2 has a buffer space when performing deburring treatment on the substrate, so as to avoid excessive polishing and grinding caused by excessive pressure on the substrate;
[0020] The conveyor belt 3 is composed of a central area 301 and edge areas 302 on both sides of the central area 301. According to different needs, the substrate is placed in the central area 301 or the edge area 302. When the polishing mechanism 2 rotates for polishing, the polishing area of the polishing roller of the polishing mechanism 2 is annular. The polishing area corresponding to the central area 301 is along the radial direction of the ring, and the area corresponding to the edge area 302 is on both sides of the radial direction. When the conveying speed of the conveyor belt 3 is the same, the substrate is polished by the polishing mechanism 2 at different times.
[0021] The conveyor belt 3 is provided with anti-slip grooves 303 to strengthen the friction between the substrate and the conveyor belt 3. The conveyor belt 3 is evenly provided with exhaust holes 304 to exhaust the air between the substrate and the conveyor belt 3 and strengthen the friction between the substrate and the conveyor belt 3.
[0022] The feeding end and the unloading end of the conveyor belt 3 are both provided with baffle bars 4 which are adapted to the shape and size and are horizontally fixedly installed on the machine body 1. A limit block 5 is movably installed on the baffle bar 4, and the limit block 5 is adsorbed and connected to the baffle bar 4 through a magnetic block 501 fixedly installed on the lower surface.
[0023] Working principle: According to the requirements of substrate polishing time and polishing area, substrates requiring short deburring time are placed in the edge area 302, and substrates requiring long deburring time are placed in the center area 301. The limit blocks 5 are installed at different positions on the baffle 4, and the position where the substrate is placed is positioned as a reference through the limit blocks 5. The friction between the conveyor belt 3 and the substrate is increased through the anti-slip grooves 303 and the exhaust holes 304. The conveyor belt 3 transports the substrate to the bottom of the polishing mechanism 2, and the burrs on the substrate are in contact with the polishing roller on the polishing mechanism 2 to achieve grinding and polishing to remove the burrs, thereby completing the deburring process.
[0024] It should be noted that, in this article, the terms "comprises", "includes" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or apparatus that includes a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or apparatus.
[0025] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. A substrate production and processing polishing device, comprising a body (1) and a polishing mechanism (2) driven by a motor in the body (1), characterized in that: A conveyor belt (3) is horizontally arranged on the machine body (1) along the conveying direction; a baffle (4) which is adapted to the shape and size of the conveyor belt (3) and is horizontally fixedly installed on the machine body (1) is arranged at the feeding end and the unloading end of the conveyor belt (3); a limit block (5) is movably installed on the baffle bar (4); and the limit block (5) is adsorbed and connected to the baffle bar (4) via a magnetic block (501) fixedly installed on the lower surface.
2. A substrate production and processing polishing device according to claim 1, characterized in that: The conveyor belt (3) is a rubber belt.
3. A substrate production and processing polishing device according to claim 1, characterized in that: The conveyor belt (3) consists of a central area (301) and edge areas (302) on both sides of the central area (301).
4. A substrate production and processing polishing device according to claim 1, characterized in that: The conveyor belt (3) is provided with anti-slip grooves (303).
5. The substrate production and processing polishing device according to claim 1, characterized in that: The conveyor belt (3) is evenly provided with exhaust holes (304).
