Chip holder for thermistor vacuum sputtering

Abstract

The utility model discloses a chip rack for thermistor vacuum sputtering, which comprises an outer frame and groove strips, the outer frame is a square frame, a plurality of parallel groove strips are arranged in the square frame, a loading support plate is arranged between adjacent groove strips, and a guide rail groove convenient for installation and fixation is arranged at the top of the outer frame. An opening used for loading the supporting plate to push the upper plate from the opening side is formed in the position, corresponding to the position between every two adjacent groove strips, of the outer side of the outer frame, spring screws are embedded into the single sides, corresponding to the groove positions, of the groove strips, and after the supporting plate is pushed to be arranged, the spring screws abut against the top and the bottom of the supporting plate to fix and load the supporting plate. The production efficiency is greatly improved, the supporting plate is fixed through the spring screws, the stability of the supporting plate and a product is guaranteed, the size of the internal structure of the rack is the same as the size of a tool in the subsequent process, the continuity between the processes is guaranteed, and the production efficiency is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of thermistors, and in particular relates to a sheet frame for vacuum sputtering of thermistors. Background Art

[0002] Ceramic PTC thermistors generally require traditional chemical plating for metal coating, which not only causes great pollution to the environment, but also causes great harm to the human body, and the quality of the coating is not high. With the miniaturization of electronic devices and the full implementation of RoHS standards, almost all major international ceramic companies are changing their metallization technology to sputtering metallization, which not only reduces production costs, but also greatly improves the quality of metallization and realizes green metallization, which is also in line with the green environmental protection concept advocated now.

[0003] Vacuum sputtering coating uses advanced magnetron sputtering technology to replace screen printing, spraying, and chemical nickel plating to perform green metallization on ceramic devices. The gradient film system electrode of "transition layer + conductive layer + welding layer" is used as the electrode layer to enhance the bonding force of the film layer, reduce the ohmic contact resistance, and improve the withstand voltage and resistance to high-temperature corrosion of lead-free solder, thereby greatly reducing the thickness of the electrode layer and greatly reducing the production cost of metallization.

[0004] The inventors found in actual use that these prior arts have at least the following technical problems:

[0005] The traditional vacuum sputtering wafer rack has low loading and unloading efficiency, which affects the overall efficiency of product production. The traditional vacuum sputtering wafer rack inserts the sputtering tray from the front, and the loading efficiency is low, which makes it difficult to implement the construction of an automated production line.

[0006] The internal tooling structure dimensions of the traditional vacuum sputtering wafer rack do not match the tooling dimensions of the subsequent process, which increases the number of steps in the process flow and affects the production efficiency of the subsequent process.

[0007] The internal width of the groove for mounting the pallet on a traditional vacuum sputtering wafer rack is greater than the thickness of the pallet, making it impossible to fix the pallet. The pallet needs to be fixed with screws before the wafer rack can be loaded and unloaded, which affects the production efficiency of the previous process. Utility Model Content

[0008] In order to overcome the above-mentioned deficiencies, the inventor of the utility model has continuously reformed and innovated through long-term exploration and attempts, multiple experiments and efforts, and proposed a film rack for vacuum sputtering of thermistors. The side-push plate loading method is adopted to greatly improve the production efficiency, and the support plate is fixed with spring screws to ensure the stability of the support plate and the product. The internal structure size of the film rack is the same as the size of the tooling of the subsequent process, which ensures the continuity between processes and improves production efficiency.

[0009] To achieve the above purpose, the technical solution adopted by the utility model is: to provide a thermistor vacuum sputtering sheet rack. It includes an outer frame and groove bars. The outer frame is a square frame. A plurality of parallel groove bars are arranged in the square frame. A loading pallet is installed between adjacent groove bars. A guide groove is arranged on the top of the outer frame for easy installation and fixing. An opening for the loading pallet to push the upper plate from the opening side is arranged at the position corresponding to the adjacent groove bars on the outer side of the outer frame. A spring screw is embedded in one side of the corresponding groove position of the groove bar. After the upper pallet is pushed, the spring screw presses against the top and bottom of the pallet to fix the loading pallet.

[0010] According to the thermistor vacuum sputtering sheet rack described in the utility model, its further preferred technical solution is: the groove strips include top groove strips, bottom groove strips, and bidirectional groove strips, and top groove strips and bottom groove strips facing the inside of the frame are arranged at the top and bottom thereof, and more than one bidirectional groove strip is arranged between the top groove strip and the bottom groove strip.

[0011] According to the sheet rack for vacuum sputtering of thermistors described in the utility model, its further preferred technical solution is: the loading pallet is rectangular, and vertical pallet grooves are formed between the top groove strip and the adjacent two-way groove strips, and between the two-way groove strips and the adjacent two-way groove strips. The height of the vertical pallet grooves is the same as the length of the loading pallet, and the two short sides of the loading pallet are clamped; a horizontal pallet groove is formed between the bottom groove strip and the adjacent two-way groove strips, and the height of the horizontal pallet groove is the same as the width of the loading pallet, and the two long sides of the loading pallet are clamped.

[0012] According to the thermistor vacuum sputtering sheet rack described in the utility model, its further preferred technical solution is: the number of loading pallets clamped in each layer between the top groove strip and the adjacent bidirectional groove strip, and between the bidirectional groove strip and the adjacent bidirectional groove strip is 7; the number of loading pallets clamped between the bottom groove strip and the adjacent bidirectional groove strip is 5.

[0013] According to the thermistor vacuum sputtering sheet rack described in the utility model, a further preferred technical solution is: the outer frame is set as a double-layer structure of two supporting steel bars on the opening side, and the gap between the two steel bars is the same as the thickness of the loading pallet.

[0014] According to the thermistor vacuum sputtering sheet rack described in the utility model, a further preferred technical solution is: a guide rail of a vacuum sputtering device is installed in the guide rail groove for positioning.

[0015] According to the thermistor vacuum sputtering sheet rack described in the utility model, a further preferred technical solution is: the outer frame is arranged on a support base, and the bottom of the support base is located on the roller of the sputtering equipment.

[0016] According to the thermistor vacuum sputtering sheet rack of the utility model, a further preferred technical solution is that the spring screws are arranged corresponding to the four corners of the loading support plate.

[0017] According to the thermistor vacuum sputtering sheet rack of the utility model, a further preferred technical solution is that the positions of the spring screws on the groove strips are correspondingly arranged.

[0018] According to the thermistor vacuum sputtering sheet rack of the utility model, a further preferred technical solution is: the groove strip is thickened on one side where the spring screw is installed to increase the strength.

[0019] Compared with the prior art, the technical solution of the utility model has the following advantages / benefits:

[0020] 1. The sheet rack involved in the utility model adopts a side push-type plate loading method, which greatly improves production efficiency.

[0021] 2. The sheet rack groove of the utility model adopts spring screws to fix the support plate to ensure the stability of the support plate and the product.

[0022] 3. The internal structural dimensions of the sheet rack involved in the utility model are the same as the dimensions of the post-process tooling, which ensures the continuity between processes and improves production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solution of the implementation mode of the utility model, the drawings required for use in the implementation mode will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.

[0024] Figure 1 The utility model is a structural schematic diagram of a thermistor vacuum sputtering sheet frame.

[0025] Figure 2 The utility model is a side structural schematic diagram of a thermistor vacuum sputtering sheet frame.

[0026] Figure 3 The utility model is a schematic diagram of the top groove strip structure of a thermistor vacuum sputtering sheet frame.

[0027] Figure 4 The utility model is a side view of a top groove strip of a thermistor vacuum sputtering sheet rack.

[0028] The markings in the figure are: 1. outer frame 2. groove bar 201. top groove bar 202. bottom groove bar 203. bidirectional groove bar 3. guide rail groove 4. support base 5. spring screw 6. support steel bar 7. loading pallet 8. opening. DETAILED DESCRIPTION

[0029] In order to make the purpose, technical scheme and advantages of the utility model clearer, the technical scheme in the embodiment of the utility model is clearly and completely described below. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model. Therefore, the detailed description of the embodiment of the utility model provided below is not intended to limit the scope of the utility model claimed for protection, but only represents the selected embodiment of the utility model.

[0030] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and thus, once an item is defined in one drawing, it may not be further defined or explained in the subsequent drawings.

[0031] Example:

[0032] like Figure 1-Figure 4 As shown, a thermistor vacuum sputtering sheet rack comprises an outer frame 1 and groove bars 2. The outer frame 1 is a square frame in which a plurality of parallel groove bars 2 are arranged. A loading pallet 7 is installed between adjacent groove bars 2. A guide rail groove 3 for easy installation and fixation is arranged on the top of the outer frame 1. An opening 8 for pushing the loading pallet 7 onto the upper plate from the opening side is arranged on the outer side of the outer frame 1 corresponding to the portion between the adjacent groove bars 2. A spring screw 5 is embedded on one side of the corresponding groove portion of the groove bar 2. After the upper pallet is pushed onto the upper plate, the spring screw 5 is pressed against the top and bottom of the pallet to fix the loading pallet 7. The installation is performed using the spring screw 5, which has strong stability and will not cause difficulty in twisting. After the spring screw 5 is loosened, it will not fall off due to vibration and can be retained in the hole for next use. The loading pallet 7 is fixed at the four corners, which has high stability and will not shake.

[0033] The groove strip 2 includes a top groove strip 201, a bottom groove strip 202, and a bidirectional groove strip 203. The top groove strip 201 and the bottom groove strip 202 facing the inside of the frame are arranged at the top and bottom, and one or more bidirectional groove strips 203 are arranged between the top groove strip 201 and the bottom groove strip 202. Its structure is to use the grooves of the two groove strips to be relatively arranged to limit the two ends of the loading pallet 7. The form of the groove strip 2 can adjust the depth and width of the groove according to needs.

[0034] The loading pallet 7 is rectangular, and there are vertical pallet grooves between the top groove strip 201 and the adjacent two-way groove strip 203, and between the two-way groove strip 203 and the adjacent two-way groove strip 203. The height of the vertical pallet groove is the same as the length of the loading pallet 7, clamping the two short sides of the loading pallet 7; a horizontal pallet groove is formed between the bottom groove strip 202 and the adjacent two-way groove strip 203, and the height of the horizontal pallet groove is the same as the width of the loading pallet 7, clamping the two long sides of the loading pallet 7. Of course, this is only because the size of the rack is limited by the equipment. In actual use, the loading pallet 7 rack can be installed horizontally or vertically.

[0035] The number of loading pallets 7 clamped in each layer between the top groove strip 201 and the adjacent two-way groove strip 203, and between the two-way groove strip 203 and the adjacent two-way groove strip 203 is 7; the number of loading pallets 7 clamped between the bottom groove strip 202 and the adjacent two-way groove strip 203 is 5. This is a setting that is more in line with the specifications of the film rack and can be adjusted in actual use. However, it is not advisable to set too many installation positions in one row, which will result in too long side installation length and low installation efficiency.

[0036] The outer frame 1 is configured as a double-layer structure with two supporting steel bars 6 on the opening side, and the gap between the two steel bars is the same as the thickness of the loading pallet 7. The double-layer structure can meet the requirements of side-opening push-type feeding, and the structural strength is also higher.

[0037] The guide rail of the vacuum sputtering equipment is installed in the guide rail groove 3 for positioning, that is, the upper guide rail groove 3 is used for positioning the film rack and the sliding groove of the film rack. The outer frame 1 is arranged on the support base 4, and the bottom of the support base 4 is located on the roller of the sputtering equipment, realizing the upper end guiding and the lower end bearing. Of course, the outer frame 1 can also be installed in the form of a ceiling rail, and only the guide rail groove 3 needs to be adaptively changed.

[0038] The spring screw 5 is set corresponding to the position on the groove strip 2, and the spring screw 5 is set corresponding to the four corners of the loading tray 7, which can achieve more stable fixation. At the same time, it can be fixed only by setting it in the groove position, and the one side of the spring screw 5 installed in the groove strip 2 is thickened to increase strength and prevent slippage and deformation.

[0039] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0040] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0041] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0042] The above are only preferred embodiments of the present invention. It should be noted that the above preferred embodiments should not be regarded as limiting the present invention. The protection scope of the present invention should be based on the scope defined by the claims. For ordinary technicians in this technical field, several improvements and modifications can be made without departing from the spirit and scope of the present invention, and these improvements and modifications should also be regarded as the protection scope of the present invention.

Claims

1. A thermistor vacuum sputtering sheet holder, characterized in that: It includes an outer frame and groove bars. The outer frame is a square frame. A plurality of parallel groove bars are arranged in the square frame. A loading pallet is installed between adjacent groove bars. A guide rail groove is arranged on the top of the outer frame for easy installation and fixation. An opening for the loading pallet to push the upper plate from the opening side is arranged at the position corresponding to the adjacent groove bars on the outside of the outer frame. A spring screw is embedded on one side of the corresponding groove position of the groove bar. After the upper pallet is pushed, the spring screw presses against the top and bottom of the pallet to fix the loading pallet.

2. A thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The groove strips include top groove strips, bottom groove strips, and bidirectional groove strips. Top groove strips and bottom groove strips facing the inside of the frame are arranged at the top and bottom, and more than one bidirectional groove strip is arranged between the top groove strips and the bottom groove strips.

3. A thermistor vacuum sputtering wafer holder according to claim 2, characterized in that: The loading pallet is rectangular, and there are vertical pallet grooves between the top groove bar and the adjacent two-way groove bar, and between the two-way groove bar and the adjacent two-way groove bar. The height of the vertical pallet groove is the same as the length of the loading pallet, clamping the two short sides of the loading pallet; a horizontal pallet groove is formed between the bottom groove bar and the adjacent two-way groove bar, and the height of the horizontal pallet groove is the same as the width of the loading pallet, clamping the two long sides of the loading pallet.

4. A thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The number of loading pallets clamped between the top groove strip and the adjacent bidirectional groove strip, and between the bidirectional groove strip and the adjacent bidirectional groove strip in each layer is 7; the number of loading pallets clamped between the bottom groove strip and the adjacent bidirectional groove strip is 5.

5. The thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The outer frame is arranged at the opening side as a double-layer structure of two supporting steel bars, and the gap between the two steel bars is the same as the thickness of the loading pallet.

6. The thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The guide rail of the vacuum sputtering equipment is installed in the guide rail groove for positioning.

7. The thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The outer frame is arranged on a supporting base, and the bottom of the supporting base is located on the roller of the sputtering device.

8. The thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The spring screws are arranged corresponding to the four corners of the loading support plate.

9. The thermistor vacuum sputtering wafer holder according to claim 7, characterized in that: The positions of the spring screws on the groove strips are arranged correspondingly.

10. The thermistor vacuum sputtering wafer holder according to claim 1, characterized in that: The groove strip is thickened on one side where the spring screw is installed to increase the strength.

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