Epitaxial equipment

Abstract

The utility model relates to the field of semiconductors, and discloses epitaxy equipment, which is characterized in that a dustproof part is arranged in a loading chamber, so that when slow crystals are placed on a bracket row, the upper part of the uppermost crystal can be shielded, the top surface of the uppermost crystal is prevented from being exposed and a large amount of dust is prevented from being scattered, and the dust amount of the uppermost crystal is effectively reduced. The crystal quality is improved. The dustproof part is arranged in the loading chamber, so that the upper part of the uppermost crystal can be shielded when the bracket is full of the crystals, and a large amount of dust is prevented from being scattered due to exposure of the top surface of the uppermost crystal, so that the dust amount of the uppermost crystal is effectively reduced, and the crystal quality is improved.

Description

Technical Field

[0001] The utility model relates to the field of semiconductors, in particular to an epitaxial device. Background Art

[0002] Semiconductor equipment plays an important supporting role in the entire semiconductor industry. Due to the complexity of semiconductor manufacturing processes, different equipment is required for each link. As one of the semiconductor equipment, epitaxial equipment affects the performance and reliability of transistors. Epitaxial equipment is a device used to produce semiconductor materials. Its working principle is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with good lattice structure integrity on a silicon single crystal substrate with a certain crystal orientation and a resistivity of the same crystal orientation as the substrate and a different thickness.

[0003] In the inner cavity of the epitaxial device, due to the complex environment in the loading room and a certain amount of airflow generated in the loading room when the epitaxial device is running, dust is easily generated in the loading room due to some structures themselves under the action of these airflows. In some loading rooms, multiple crystals are placed at the same time, and the crystals are spaced apart in the vertical direction. The gap between two adjacent crystals usually does not cause dust to enter. However, dust is scattered on the surface of the crystal directly above the top crystal because there is no other crystal to block it, resulting in particles on the crystal, affecting the crystal quality. Utility Model Content

[0004] In view of the above-mentioned deficiencies of the prior art, the technical problem to be solved by the present invention is: to provide an epitaxial device to solve the problem that dust is easily scattered on the top crystal in the loading chamber.

[0005] In order to solve the above technical problems, a technical solution adopted by the utility model is: to provide an epitaxial device including a furnace body with a loading chamber formed inside, the loading chamber is provided with brackets arranged on both sides of the loading chamber, and a plurality of placement grooves for crystals to penetrate therein are symmetrically opened on opposite sides of the two brackets for installing multiple crystals, and a crossbeam with two ends respectively connected to the tops of the two brackets is provided in the loading chamber, and a dustproof part is installed on the crossbeam, and the dustproof part covers directly above each placement groove and is close to the two top placement grooves in the vertical direction. After the crystal is placed in the two top placement grooves, the dustproof part can block the top of the crystal to greatly avoid the probability of dust scattering on the crystal surface and prevent the formation of crystal particles.

[0006] Furthermore, the crossbeam is in a strip-shaped structure, and the dust-proof portion includes a first baffle connected to the top surface of the crossbeam and two second baffles extending in opposite directions from both sides of the first baffle to form a shielding crystal. The first baffle is convenient for connection with the crossbeam, and the crossbeam can be used to shield part of the dust to a certain extent. The second baffle further blocks the crystal, reducing or even preventing dust from falling on the top crystal.

[0007] A positioning strip is convexly provided on the bottom surface of the first baffle plate and extends toward one side of the cross beam. The positioning strip extends along the length direction of the cross beam. A positioning groove is concavely provided on the cross beam at a position opposite to the positioning strip, through which the positioning strip passes, so as to limit the first baffle plate on the cross beam and realize quick positioning.

[0008] Furthermore, the second baffle is bent from the first baffle and extends downward along the side wall of the beam and then continues to bend to extend horizontally toward the side away from the beam, thereby shortening the distance between the second baffle and the top crystal, reducing the gap between the second baffle and the crystal, and improving the dustproof effect.

[0009] Furthermore, the first baffle and the second baffle are integrally formed and made of quartz, so that the baffles will not pollute the environment inside the loading chamber, have stability, and will not generate static electricity to avoid affecting the epitaxy of the crystal.

[0010] Furthermore, the two ends of the crossbeam are detachably connected to the top ends of the two brackets; the two brackets each include a stand connected to the inner wall of the loading chamber and a plurality of support plates hinged on one side of the stand to the inner wall of the stand, the plurality of support plates are evenly spaced in the vertical direction, the gap between any two adjacent support plates can allow a crystal to pass therethrough, the other side of each support plate extends inwardly in the horizontal direction and can swing up and down, the top surface of each support plate and the stand are jointly enclosed to form the placement groove for placing multiple crystals in the loading chamber, and the support plate can be used to support the crystal and at the same time take out the crystal upward when it is needed, thereby simplifying the crystal disassembly process.

[0011] Furthermore, each support plate has a support foot extending along a direction perpendicular to the support plate toward a side away from the support plate on the bottom surface. When the support plate is rotated to horizontal, the support foot abuts against the inner wall of the stand so that the support plate can remain horizontal and be used to support the crystal.

[0012] Furthermore, a recessed groove is formed on the inner side wall of the stand and at a position corresponding to each support plate. The support plate is convexly provided on one side of the stand close to the stand, extends into the recessed groove and is hinged to the recessed groove. The recessed groove is open on one side of the support plate to have a space for the support plate to swing up and down within a certain range. The recessed groove facilitates the rotation of the support plate and can limit the swinging angle of the support plate.

[0013] Furthermore, the top of the recessed groove has an inclined surface that tilts outward from top to bottom. When the top surface of the support plate abuts against the inclined surface to tilt the support plate upward, a channel for the crystal to pass through is formed between the two relative support plates in an inclined state on the two brackets, so that the support plates just abut against the inclined surface when the crystal passes between the support plates, so that the support plates are reset under the action of gravity after the crystal passes.

[0014] Furthermore, a bulge is formed on the end of the supporting foot away from the supporting plate, and a groove is recessed on the top surface of each supporting plate for the supporting foot of an adjacent supporting plate above it to pass through and clamp the bulge. During the crystal removal process, the supporting foot on the supporting plate above it is squeezed into the groove by the squeezing of the crystal, thereby keeping the supporting plate in a tilted state to facilitate the installation of the next crystal.

[0015] An epitaxial device of the utility model has at least the following beneficial effects: by arranging a dustproof part in the loading chamber, it can shield the top of the top crystal when the bracket is full of crystals, avoiding the top surface of the top crystal from being exposed and scattering a large amount of dust, thereby effectively reducing the amount of dust in the top crystal and improving the crystal quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings:

[0017] Figure 1 It is a structural schematic diagram of the epitaxial device of the utility model;

[0018] Figure 2 It is a front cross-sectional view of the epitaxial device of the utility model;

[0019] Figure 3 for Figure 2 An enlarged view of section A is shown;

[0020] Figure 4 It is a partial cross-sectional view of each support plate of the utility model in a state of leaning against an inclined surface;

[0021] Figure 5 It is a side view of the crossbeam and the dustproof part of the utility model;

[0022] Figure 6 This is the particle distribution diagram before and after the top crystal is installed with the protective part.

[0023] The meanings of the symbols in the accompanying drawings are:

[0024] Furnace body-1; loading chamber-11; top cover-12; cylinder cover-13; observation window-14; bracket-2; placement groove-21; stand-22; recessed groove-221; positioning column-222; support plate-23; support foot-231; convex bump-232; card slot-233; channel-234; crossbeam-3; positioning hole-31; dustproof part-4; first baffle-41; second baffle-42; positioning strip-43. DETAILED DESCRIPTION

[0025] The utility model will be further described below in conjunction with the accompanying drawings.

[0026] like Figures 1 to 5 As shown, an epitaxial device of the utility model includes a furnace body 1 with a loading chamber 11 formed inside, brackets 2 arranged on both sides of the loading chamber 11, a crossbeam 3 arranged in the loading chamber 11 and connected to the tops of the two brackets 2 at both ends, and a dustproof part 4 installed on the crossbeam 3. The loading chamber 11 is a reaction chamber inside the furnace body 1. The bracket 2 is used to support and install multiple crystals. The crossbeam 3 increases the stability between the two brackets 2 to a certain extent. The dustproof part 4 is used to cover and shield the top surface of the crystal at the top position of the bracket 2 to reduce the dust scattered during the reaction in the loading chamber 11 from scattering to the crystal surface and forming particles on the surface of the growing crystal, thereby effectively improving the quality of the top crystal. It should be noted that the epitaxial device also includes a heating system, a temperature control system and an exhaust system not shown in the figure. The heating system adopts induction heating or resistance heating, the temperature control system adopts feedback control, and the exhaust system can adjust the atmosphere. By using a thyristor device to control the current, the heating power is controlled, thereby controlling the temperature of the loading chamber 11. The heating system, the temperature control system and the exhaust system are all existing technologies, so they are not described in detail.

[0027] like Figure 1 and Figure 2 As shown, the furnace body 1 is a cylindrical structure with a hollow interior, the top of the furnace body 1 is open and sealed with a top cover 12, and a cylinder cover 13 is sealed on the top cover 12, and the cylinder cover 13 has an observation port made of a transparent material to facilitate observation of the situation in the loading chamber 11. At least one observation window 14 is also provided on the side wall of the furnace body 1 for convenient observation of the situation in the loading chamber 11.

[0028] like Figure 2As shown, the bracket 2 is provided in two and is respectively provided on two opposite sides of the loading chamber 11. The two brackets 2 are provided in the vertical direction, and one side of the two brackets 2 is provided facing each other to be relatively distributed. A plurality of placement grooves 21 for crystals to be inserted therein are symmetrically provided on the opposite side of the two brackets 2 to be distributed in a mirror image. The placement grooves 21 on the two brackets 2 are evenly spaced in the vertical direction so that the crystals can be neatly placed in the loading chamber 11. The minimum horizontal spacing between any two placement grooves 21 of the same height on the two brackets 2 is less than the diameter of the crystal, and the maximum horizontal spacing between any two placement grooves 21 of the same height on the two brackets 2 is greater than the diameter of the crystal, so that the crystal can extend into the two opposite placement grooves 21 through the opposite sides, and the bottom wall of the placement groove 21 supports the crystal so that the middle of the crystal is suspended. It should be noted that the spacing between two adjacent placement grooves 21 in the vertical direction should prevent dust from being easily dispersed therein, and the specific setting is determined according to the actual crystal thickness and the airflow conditions in the loading chamber 11.

[0029] In the content defined in this embodiment, both brackets 2 include a stand 22 arranged in the loading chamber 11 along the vertical direction and a plurality of support plates 23 connected to the stand 22 on one side. The two stands 22 are arranged on opposite sides of the loading chamber 11 to be relatively distributed. The two stands 22 have inner side walls facing each other, that is, the side faces of the two stands 22 facing each other. Each support plate 23 is connected to the inner side wall of the stand 22 and is mirror-distributed to be relatively arranged. Each support plate 23 is evenly spaced in the vertical direction, and each support plate 23 is arranged in the horizontal direction so that the top and bottom surfaces of the support plate 23 are both horizontal planes. The gap or spacing between any two adjacent support plates 23 is greater than the thickness of the crystal so that the crystal can penetrate into the gap. The support plate 23 located below between any two adjacent support plates 23 is used to support the crystal, and the support plate 23 located above is used to limit the support plate 23 and to support the next crystal upward. Among them, the minimum distance between any two supporting plates 23 on the two vertical frames 22 in the horizontal direction (i.e., the distance between the sides of the two supporting plates 23 facing each other) is smaller than the diameter of the crystal, and the maximum distance between any two supporting plates 23 on the two vertical frames 22 in the horizontal direction (i.e., the distance between the sides of the two supporting plates 23 away from each other) is larger than the diameter of the crystal. The top surface of each supporting plate 23 and the inner side wall of the vertical frame 22 are jointly formed to form a placement groove 21, so that multiple crystals can be placed in the loading chamber 11. When in use, the crystal can be inserted into the placement groove 21 from the side of each supporting plate 23, that is, when the two vertical frames 22 are respectively arranged on the left and right sides of the loading chamber 11, the crystal is inserted into the placement groove 21 from the front and back sides of each supporting plate 23 to complete the placement of the crystal.

[0030] In this embodiment, since there may be a small distance between the support plate 23 and the inner wall of the loading chamber 11, it may be difficult to install the crystal. For this reason, one side of each support plate 23 is hinged on the inner wall of the stand 22 so that each support plate 23 is horizontally opposed to each other so as to extend inward on the other side, and the extended side of each support plate 23 can swing up and down. When it is necessary to remove or install the crystal, the corresponding support plates 23 on the two stands 22 are tilted upward until the crystal can pass upward in the vertical direction. In this way, the crystal can be installed or removed more easily, reducing the difficulty of crystal disassembly. In this embodiment, in order to prevent the support plates 23 from tilting downward relative to the horizontal state and possibly squeezing the crystals located therebelow, a support foot 231 is formed on the bottom surface of each support plate 23 and extends in a direction perpendicular to the support plate 23 toward a side away from the support plate 23. In this embodiment, some surfaces of the support plate 23 facing downward in the horizontal state are defined as top surfaces, and the side surface facing upward is defined as the top surface. The support foot 231 is formed to extend downward relative to the bottom surface of the support plate 23, and the support foot 231 is located on a side of the support plate 23 close to the stand 22 and abuts against the inner wall side of the stand 22 when the support plate 23 is in a horizontal state. The side surface of the support foot 231 facing the inner wall of the stand 22 is a vertical plane forming an abutment surface. When in use, when the crystal is supported on any two opposite support plates 23, the weight of the crystal causes the support plates 23 to rotate to a horizontal state. At this time, the abutment surface of the support foot 231 rests on the inner wall of the stand 22, so that the support plate 23 can support the crystal. When the support plate 23 needs to be rotated, pressure is applied upward to the side of the support plate 23 away from the stand 22, and the support plate 23 can swing upward to facilitate loading and unloading of the crystal.

[0031] In order to limit the swing angle of the support plate 23 and prevent the support plate 23 from swinging upward at an excessively large angle, which would make it difficult to reset the support plate 23 under the action of gravity, a recessed groove 221 is formed on the inner wall of the stand 22 and at a position corresponding to each support plate 23. The recessed groove 221 is recessed in the horizontal direction toward the side away from the support plate 23. The side of the recessed groove 221 away from the support plate 23 is an arc-shaped surface. The top and bottom of the arc-shaped surface are both curved and extend to the notch of the recessed groove 221. The support plate 23 is close to the support plate 23. A connecting block is formed on one side of the stand 22 and extends toward the recessed groove 221. A through hole is horizontally provided on the connecting block perpendicular to the direction of separation of the two stands 22. A rotating rod is rotatably provided in the through hole. Both ends of the rotating rod are connected to the recessed groove 221 so that the support plate 23 is hinged to the recessed groove 221. The recessed groove 221 is open near the side of the support plate 23 to have a space for the support plate 23 to swing up and down within a certain range. When the top surface of the support plate 23 abuts against the top of the recessed groove 221, it can no longer continue to swing upward. In order to make the top surface of the support plate 23 keep tilted and easy to reset when abutting against the top of the recessed groove 221, there is an inclined surface at the top of the recessed groove 221 that is inclined from top to bottom and from inside to outside. The angle between the inclined surface and the horizontal plane is greater than 60 degrees and less than 90 degrees. When the top surface of the support plate 23 abuts against the inclined surface, the inner side of the support plate 23 tilts upward. At the same time, when any two opposing support plates 23 on the two brackets 2 are in an inclined state, the spacing between the two sides of the two support plates 23 away from the stand 22 is equal to the diameter of the crystal, so that a channel 234 for the crystal to pass through is formed between the two opposing support plates 23 in an inclined state. When it is necessary to install the crystal, after the corresponding two support plates 23 are rotated upward to form the channel 234, the crystal can be directly passed through the channel 234 in the vertical direction to be placed in the corresponding placement slot 21, and the installation of the crystal is completed; when removing the crystal, the crystal is directly moved upward, and the two sides of the crystal will squeeze the support plates 23 on both sides to make the support plates 23 tilt upward until the crystal passes.

[0032] Since it is necessary to rotate the two support plates 23 at the same time and keep them tilted to allow the crystal to pass when installing the crystal, this is difficult to operate. In order to avoid this problem, a convex 232 is formed on the end of the support foot 231 away from the support plate 23. The convex 232 can be spherical or rugby-shaped. The width of the convex 232 is greater than the width of the end of the support foot 231 away from the support plate 23 and the surface is smooth. A groove 233 is concavely provided on the top surface of each support plate 23 for the support foot 231 of a support plate 23 adjacent to any support plate 23 above to pass through. The inner wall contour of the groove 233 is consistent with the outer contour of the end of the support foot 231 away from the support plate 23 and the convex 232 to match, and when each support plate 23 is in a tilted state, the support foot 231 of any support plate 23 is directly opposite to the groove 233 of the support plate 23 adjacent to it below. When the crystal needs to be taken out, the crystal is moved upward so that the crystal presses the support plate 23, and the support plate 23 swings upward under the pressure of the crystal. During the upward swinging of the support plate 23, the slot 233 gradually approaches the support foot 231 of the support plate 23 above it. When the support foot 231 abuts against the notch of the slot 233, the top surface of the support plate 23 at this time is still against the inclined surface, and the crystal can continue to move upward to press the support plate 23. At this time, the support plate 23 is tilted to a certain angle, which can also guide the crystal so that the crystal presses the two opposite support plates 23. Until the support plate 23 abuts against the inclined surface and is in an inclined state, the convex bump 232 is squeezed and extends into the slot 233, and the slot 233 clamps the main convex bump 232 to keep the support plate 23 in an inclined state. When the next crystal is removed or the next round of crystals are installed, the channel 234 is retained to facilitate the installation or removal of the crystal. After any two relatively inclined crystals are installed, the support plate 23 can be reset by pulling the support plate 23 downward to disengage the convex bump 232 from the slot 233. It is less difficult to pull the support plate 23 downward, which is convenient for operation. It should be noted that the inclined state of the support plate 23 described in this embodiment refers to the state when the support plate 23 abuts against the inclined surface.

[0033] like Figure 2 , Figure 3 and Figure 5As shown, the crossbeam 3 is in a strip-shaped structure, and the two ends of the crossbeam 3 are respectively connected to the top of the two vertical frames 22. In order to facilitate the installation and removal of the crystal by cooperating with the support plate 23, the crossbeam 3 is detachably connected to the top of the two vertical frames 22. In the content defined in this embodiment, there are horizontal support surfaces on the top of the two vertical frames 22, and the two support surfaces are arranged at the same height. Positioning columns 222 are arranged on both support surfaces in the vertical direction, and the top of each positioning column 222 is in a truncated cone shape with a narrow top and a wide bottom. Positioning holes 31 for the positioning columns 222 to be movably inserted therein are opened at the two ends of the crossbeam 3 and at the positions corresponding to each positioning column 222 in the vertical direction, and the crossbeam 3 is sleeved on each positioning column 222 through each positioning hole 31, and the positioning column 222 limits the freedom of the crossbeam 3 in the horizontal direction. A limit block is provided on one of the stands 22, the bottom of which is rotatably connected to the top of the stand 22. The limit block includes a vertical block extending upward from the stand 22 in the vertical direction and a horizontal block formed by bending the stand and continuing to extend in the horizontal direction to form an L shape. The distance between the bottom surface of the horizontal block and the top surface of the stand 22 is equal to the thickness of the beam 3. After the limit block is rotated toward one side of the beam 3, the limit block gradually rotates toward the top surface of the beam 3 until the cross block abuts against the beam 3, thereby limiting the freedom of the beam 3 in the vertical direction. When the crystal needs to be installed or removed, the beam 3 can be moved upward after turning away from the limit block.

[0034] like Figure 2 , Figure 3 , Figure 5 and Figure 6 As shown, the dustproof part 4 covers directly above each placement slot 21 in the vertical direction and is arranged close to the top two placement slots 21 to cover the top surface of the topmost crystal. The dustproof part 4 includes a first baffle 41 connected to the top surface of the beam 3 and two second baffles 42 extending in opposite directions from both sides of the first baffle 41 to form a shielding crystal. Since the overall shape of the crystal is circular, the overall shape of the dustproof part 4 is a circular sheet structure and its diameter is larger than the diameter of the crystal. The first baffle 41 is the middle part of the dustproof part 4 and covers the top surface of the beam 3. A plurality of threaded holes can be opened on the beam 3 and the first baffle 41 to achieve connection through screws; as shown in FIG. Figure 6 It can be seen from the distribution diagram of particles on the crystal before and after the installation of the dustproof part 4 that the particles on the crystal are significantly reduced after the installation of the dustproof part 4. The first baffle 41 is located on the top surface of the beam 3, and a positioning strip 43 is convexly provided on the bottom surface of the first baffle 41 in the vertical direction toward one side of the beam 3. The length direction of the positioning strip 43 extends along the length direction of the beam 3. A positioning groove for the positioning strip 43 to pass through is formed at the position of the beam 3 directly opposite to the positioning strip 43. During installation, the positioning strip 43 is aligned with the positioning groove to quickly find the direction of the dustproof part 4 and align it with the beam 3. At the same time, after the positioning strip 43 is passed through the positioning groove, the contact area between the first baffle 41 and the beam 3 is increased to improve the connection stability.

[0035] In this embodiment, due to the setting of the crossbeam 3, the top crystal and the dustproof part 4 are separated by the crossbeam 3, and the distance between the dustproof part 4 and the top crystal is widened. For this reason, the second baffle 42 is bent from the first baffle 41 and extends downward along the side wall of the crossbeam 3, and then continues to bend to extend in the horizontal direction toward the side away from the crossbeam 3, so that the first baffle 41 and the two second baffles 42 are similar to an "Ω" shape, and the two second baffles 42 are lower in height than the first baffle 41, so as to be closer to the crystal, shortening the distance between the top crystal and the second baffle 42. In this embodiment, the first baffle 41 and the second baffle 42 are integrally formed and made of quartz. The quartz material will not pollute the internal environment of the loading chamber 11, and has high stability, will not generate static electricity, and will not create dust after the crystal is installed and the outer edge is closed.

Claims

1. An epitaxial device, comprising a furnace body with a loading chamber formed therein, wherein the loading chamber is provided with brackets disposed on both sides of the loading chamber, and a plurality of placement grooves for crystals to be inserted therein are symmetrically provided on opposite sides of the two brackets, characterized in that: A crossbeam with two ends respectively connected to the tops of the two brackets is arranged in the loading chamber, and a dustproof part is installed on the crossbeam. The dustproof part covers directly above each placement slot in the vertical direction and is close to the two top placement slots.

2. An epitaxial device according to claim 1, characterized in that: The crossbeam is in a strip-shaped structure, and the dustproof portion includes a first baffle connected to the top surface of the crossbeam and two second baffles extending in opposite directions from both sides of the first baffle to shield the crystal.

3. An epitaxial device according to claim 2, characterized in that: A positioning strip is convexly provided on the bottom surface of the first baffle plate toward one side of the cross beam, and the positioning strip extends along the length direction of the cross beam. A positioning groove is concavely provided on the cross beam at a position opposite to the positioning strip, and the positioning strip passes through the groove.

4. An epitaxial device as claimed in claim 3, characterized in that: The second baffle is bent from the first baffle and extends downward along the side wall of the beam, and then continues to bend to extend in a horizontal direction toward a side away from the beam.

5. An epitaxial device as claimed in claim 4, characterized in that: The first baffle and the second baffle are integrally formed and made of quartz.

6. An epitaxial device according to claim 1, characterized in that: The two ends of the crossbeam are detachably connected to the top ends of the two brackets; the two brackets each include a stand connected to the inner wall of the loading chamber and a plurality of support plates hinged on one side of the stand to the inner wall of the stand, the plurality of support plates are evenly spaced along the vertical direction, the gap between any two adjacent support plates can allow a crystal to pass therethrough, the other side of each support plate extends inwardly along the horizontal direction and can swing up and down, and the placement groove is formed between the top surface of each support plate and the stand.

7. An epitaxial device according to claim 6, characterized in that: A support foot is formed on the bottom surface of each support plate and extends in a direction perpendicular to the support plate toward a side away from the support plate. When the support plate rotates to a horizontal position, the support foot abuts against the inner side wall of the stand.

8. An epitaxial device according to claim 7, characterized in that: A recessed groove is formed on the inner side wall of the stand and at a position corresponding to each support plate. The support plate is convexly provided on one side of the stand close to the stand, extends into the recessed groove and is hinged to the recessed groove. The recessed groove is open on one side of the support plate to have a space for the support plate to swing up and down within a certain range.

9. An epitaxial device according to claim 8, characterized in that: The top of the recessed groove has an inclined surface that tilts outward from top to bottom. When the top surface of the support plate abuts against the inclined surface to tilt the support plate upward, a channel for the crystal to pass through is formed between the two relatively inclined support plates on the two brackets.

10. An epitaxial device according to claim 9, characterized in that: A convex bump is formed on one end of the support foot away from the support plate, and a groove is concavely provided on the top surface of each support plate for the support foot of an adjacent support plate above it to pass through and clamp the convex bump.

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