Coating equipment shell with gas distribution structure

Abstract

The utility model discloses a coating equipment shell with a gas distribution structure, which comprises a shell, a graphite boat is arranged in the shell, a plurality of groups of silicon wafers are arranged on the graphite boat, gaps are formed among the plurality of groups of silicon wafers, a gas distribution component is further arranged in the shell, and the gas distribution component is arranged in the shell. And the gas distribution assembly is positioned above the plurality of groups of silicon wafers and is used for spraying gas to the gaps. Compared with the prior art, the gas distribution assembly disclosed by the utility model can distribute ammonia gas into each gap, so that the action of the gas and the surface of a silicon wafer is more sufficient and uniform, the coating process is further optimized, and the overall yield of batteries is improved; therefore, dust raw materials used for film coating cannot be continuously deposited on the graphite boat at the bottom of the gap, a large amount of dust is prevented from being attached to the graphite boat after the graphite boat is used for a period of time, and pollution caused by the fact that the dust attached to the surface of a silicon wafer is easily attached to the surface of the silicon wafer when the silicon wafer is loaded on the graphite boat subsequently is prevented.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer coating, in particular to a coating equipment shell with a gas distribution structure. Background Art

[0002] The quality of the passivation layer prepared by the coating process plays a decisive role in the efficiency and performance of the battery. The passivation layer can reduce the reflectivity of the crystalline silicon surface, improve the light utilization rate and the passivation defects. During coating, PECVD equipment (Plasma Enhanced Chemical Vapor Deposition) is mainly used to prepare the passivation film. Its technical principle is that under the action of high-frequency alternating power, the reaction gas is ionized into plasma, and through complex primary and secondary reactions, it is finally deposited, adsorbed or diffused on the substrate silicon wafer. By adjusting the flow ratio of different reaction gases, the thickness of the film layer can be controlled, so that it can show better anti-reflection and passivation effects.

[0003] Before the passivation layer is deposited on the surface of crystalline silicon, the cleanliness of the silicon wafer surface directly affects the appearance quality of the crystalline silicon cell surface. The coating equipment includes a shell and a graphite boat. The shell is generally designed as a tube structure. The graphite boat is installed in the tube body. Multiple silicon wafers are installed on the graphite boat. After the graphite boat has been used for a period of time, a large amount of dust will adhere to the position between the silicon wafers. When the silicon wafers are subsequently loaded, the dust is easy to adhere to the surface of the silicon wafer to cause pollution, which can easily cause appearance problems after the silicon wafer is coated. Moreover, the coating equipment mostly takes in air through the nozzle of the tube body. The incoming gas will be blocked by the graphite boat. The uneven distribution of gas in the tube can easily cause irregular white spots on the surface of the silicon wafer, or lead to appearance problems such as uneven film thickness. Utility Model Content

[0004] The main purpose of the utility model is to provide a coating equipment shell with a gas distribution structure. The gas distribution component can distribute ammonia to each gap, so that the gas and the surface of the silicon wafer can interact more fully and evenly, thereby optimizing the coating process and improving the overall yield rate of the battery. In addition, since the gas flows in the gap, the dust raw materials used for coating cannot be continuously deposited on the graphite boat at the bottom of the gap, thereby avoiding a large amount of dust from being attached to the graphite boat after being used for a period of time, and preventing the dust from being attached to the surface of the silicon wafer when the silicon wafer is subsequently loaded on the graphite boat, causing pollution.

[0005] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0006] A coating equipment shell with a gas distribution structure includes a shell, a graphite boat is arranged in the shell, a plurality of groups of silicon wafers are arranged on the graphite boat and gaps are formed between the plurality of groups of silicon wafers, and a gas distribution component is also arranged in the shell, the gas distribution component is located above the plurality of groups of silicon wafers and is used to spray gas into the gaps.

[0007] Furthermore, the gas distribution component includes a gas distribution chamber fixed to the inner wall of the shell, and the gas distribution chamber has multiple groups of blowing ports matching the gap positions on the side pointing to the silicon wafer. The gas distribution chamber is also connected to an air inlet pipe, and the air inlet end of the air inlet pipe passes through the shell.

[0008] Furthermore, the side surface where the gas distribution chamber is fixed to the shell is an arc-shaped surface.

[0009] Furthermore, a sealing end cover is provided at one end of the shell, a discharge box is fixed on the end surface of the sealing end cover located on the inner side of the shell, and a plurality of discharge ports are provided on one side of the discharge box.

[0010] Furthermore, the plurality of groups of discharge ports correspond to the plurality of groups of gap positions.

[0011] Furthermore, a feed pipe is connected to the other end of the discharge box, and a feed port of the feed pipe passes through the sealing end cover.

[0012] Furthermore, positioning seats for carrying the graphite boat are fixed on both sides of the bottom of the shell.

[0013] Furthermore, a positioning plate is fixed to the end of the positioning seat away from the direction in which the graphite boat enters the shell.

[0014] Compared with the prior art, the utility model has the following beneficial effects:

[0015] The gas distribution assembly of the utility model can distribute ammonia to each gap, so that the gas interacts with the surface of the silicon wafer more fully and evenly, thereby optimizing the coating process and improving the overall yield rate of the battery. In addition, since the gas flows in the gap, the dust raw materials used for coating cannot be continuously deposited on the graphite boat at the bottom of the gap, thereby avoiding a large amount of dust from being attached to the graphite boat after being used for a period of time, and preventing the dust from being easily attached to the surface of the silicon wafer and causing pollution when the silicon wafer is subsequently loaded on the graphite boat.

[0016] The discharge box of the utility model conveys the dust material to a plurality of gaps through the discharge port, so that the dust material can be evenly distributed in the shell body and fully contact with the silicon wafer.

[0017] The positioning plate of the utility model can position the graphite boat after it enters the shell 1, so that it is located at a designated position in the shell, thereby ensuring that the air outlet is aligned with the gap. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic overall cross-sectional view of a coating equipment shell with a gas distribution structure according to the utility model.

[0019] Figure 2 It is a side view schematic diagram of a coating equipment shell with a gas distribution structure according to the utility model.

[0020] Figure 3 The utility model is a schematic diagram of the connection between the shell and the sealing end cover of a coating equipment shell with a gas distribution structure.

[0021] Figure 4 It is a schematic diagram of the connection structure between the sealing end cover and the discharge box of a coating equipment shell with a gas distribution structure according to the utility model.

[0022] In the figure: 1. Shell; 2. Sealing end cover; 3. Feed pipe; 4. Discharge box; 5. Gas distribution chamber; 6. Inlet pipe; 7. Positioning seat; 8. Graphite boat; 9. Silicon wafer; 10. Air blowing port; 11. Gap; 12. Discharge port; 13. Positioning plate. DETAILED DESCRIPTION

[0023] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further described below in conjunction with specific implementation methods.

[0024] like Figure 1-4 As shown, a coating equipment shell with a gas distribution structure includes a shell 1, a graphite boat 8 is arranged in the shell 1, a plurality of groups of silicon wafers 9 are arranged on the graphite boat 8 and gaps 11 are formed between the plurality of groups of silicon wafers 9, and a gas distribution component is also arranged in the shell 1, the gas distribution component is located above the plurality of groups of silicon wafers 9 and is used for spraying gas into the gap 11.

[0025] In this embodiment, the gas distribution assembly includes a gas distribution chamber 5 fixed to the inner wall of the housing 1. The gas distribution chamber 5 is provided with a plurality of blowing ports 10 that match the positions of the gaps 11 on the side of the silicon wafer 9. The gas distribution chamber 5 is also connected to an air inlet pipe 6. The air inlet end of the air inlet pipe 6 passes through the housing 1 and the penetration position is sealed by a sealing ring. This is a prior art and will not be described in detail here.

[0026] like Figure 1 and Figure 2As shown, the graphite boat 8 loaded with silicon wafers 9 moves into the shell 1, the shell 1 is connected to the furnace pipe on the production line, and the air inlet pipe 6 is connected to the ammonia gas supply equipment. Therefore, the ammonia enters the gas distribution chamber 5 through the air inlet pipe 6. Since the multiple groups of blowing ports 10 are respectively aimed at the gaps 11 formed by the multiple groups of silicon wafers 9, the ammonia will flow in the multiple gaps 11, thereby distributing the ammonia to each gap 11 more evenly, so that the gas acts on the surface of the silicon wafer 9 more fully and evenly, thereby optimizing the coating process and improving the overall yield of the battery. In addition, since the gas flows in the gaps 11, the dust raw materials used for coating cannot be continuously deposited on the graphite boat 8 at the bottom of the gaps 11, thereby avoiding the graphite boat 8 from being attached with a large amount of dust after being used for a period of time, causing the dust to easily adhere to the surface of the silicon wafer 9 and cause pollution.

[0027] Among them, Figure 2 As shown, the side surface where the gas distribution chamber 5 is fixed to the shell 1 is an arc surface, and the arc surface is in full contact with the inner side of the shell 1 to improve the connection stability between the gas distribution chamber 5 and the shell 1.

[0028] like Figure 3 and Figure 4 As shown, a sealing end cover 2 is provided at one end of the shell 1, and the sealing end cover 2 can be opened, and can seal one side opening of the shell 1 when closed. This is the prior art and will not be elaborated here. The sealing end cover 2 is located on the end face of the inner side of the shell 1 and a discharge box 4 is fixed thereon. A plurality of discharge ports 12 are provided on one side of the discharge box 4, and the positions of the plurality of discharge ports 12 correspond to the plurality of gaps 11. A feed pipe 3 is connected to the other end of the discharge box 4, and a feed port of the feed pipe 3 passes through the sealing end cover 2. The dust material is transported to the discharge box 4 through the feed pipe 3 by a pumping device, and the discharge box 4 transports the dust material to the plurality of gaps 11 through the discharge port 12, so that the dust material can be evenly distributed in the shell 1, so as to fully contact with the silicon wafer 9.

[0029] Among them, Figure 1 and Figure 2 As shown, positioning seats 7 for carrying the graphite boat 8 are fixed on both sides of the bottom of the shell 1, and positioning plates 13 are fixed to the ends of the positioning seats 7 away from the direction in which the graphite boat 8 enters the shell 1. When the manipulator sends the graphite boat 8 into the shell 1, the bottom end of the graphite boat 8 will contact the positioning seats 7, and the positioning plates 13 will position the graphite boat 8 after entering the shell 1, so that it is located at a specified position in the shell 1, thereby ensuring that the blowing port 10 is aligned with the gap 11.

[0030] Working principle: first, the shell 1 is connected to the furnace tube on the production line, and then the sealing end cover 2 is opened, and the graphite boat 8 is sent into the shell 1 by a manipulator, and the graphite boat 8 is made to contact the positioning plate 13, so as to ensure that the blowing port 10 is aligned with the gap 11, and then the sealing end cover 2 is closed. Next, the air inlet pipe 6 is connected to the ammonia gas supply equipment, and the feed pipe 3 is connected to the dust material pumping pipeline. When the coating operation is carried out, the ammonia enters the gas distribution chamber 5 through the air inlet pipe 6. Since the multiple groups of blowing ports 10 are respectively aligned with the gaps 11 formed by the multiple groups of silicon wafers 9, the ammonia will flow in the multiple gaps 11, so that the ammonia is more evenly distributed to each group. In the gap 11, the gas interacts with the surface of the silicon wafer 9 more fully and evenly, and the dust material is transported to the discharge box 4 through the feed pipe 3 by the pumping equipment. The discharge box 4 transports the dust material to multiple gaps 11 through the discharge port 12, and cooperates with the uniform flow of ammonia to make the dust material evenly distributed in the shell 1, so as to fully contact with the silicon wafer 9 to cooperate with the coating equipment to perform coating operations. In this process, the furnace tube is acted upon by the negative pressure pump to suck away the excess ammonia memory dust inside the shell 1, so as to prevent the dust from being deposited on the graphite boat 8, thereby preventing excessive dust from adhering to the surface of the silicon wafer 9 when the subsequent graphite boat 8 is loaded with silicon wafers 9.

[0031] The above shows and describes the basic principle and main features of the utility model and the advantages of the utility model. Those skilled in the art should understand that the utility model is not limited by the above embodiments. The above embodiments and descriptions are only for explaining the principle of the utility model. Without departing from the spirit and scope of the utility model, the utility model may have various changes and improvements, which fall within the scope of the utility model to be protected. The scope of protection claimed by the utility model is defined by the attached claims and their equivalents.

Claims

1. A coating equipment housing with a gas distribution structure, comprising a housing (1), characterized in that: A graphite boat (8) is arranged in the shell (1), and a plurality of groups of silicon wafers (9) are arranged on the graphite boat (8), and gaps (11) are formed between the plurality of groups of silicon wafers (9). A gas distribution component is also arranged in the shell (1), and the gas distribution component is located above the plurality of groups of silicon wafers (9) and is used to spray gas into the gaps (11).

2. The coating equipment housing with a gas distribution structure according to claim 1, characterized in that: The gas distribution component comprises a gas distribution chamber (5) fixed to the inner wall of the shell (1), and the gas distribution chamber (5) is provided with a plurality of groups of blowing ports (10) matching the positions of the gaps (11) on the side facing the silicon wafer (9), and the gas distribution chamber (5) is also connected to an air inlet pipe (6), and the air inlet end of the air inlet pipe (6) passes through the shell (1).

3. The coating equipment housing with a gas distribution structure according to claim 2, characterized in that: The side surface on which the gas distribution chamber (5) is fixed to the shell (1) is an arc-shaped surface.

4. The coating equipment housing with a gas distribution structure according to claim 1, characterized in that: A sealing end cover (2) is provided at one end of the shell (1), a discharge box (4) is fixed on the end surface of the sealing end cover (2) located inside the shell (1), and a plurality of discharge ports (12) are provided on one side of the discharge box (4).

5. The coating equipment housing with a gas distribution structure according to claim 4, characterized in that: The positions of the multiple groups of discharge ports (12) correspond to the positions of the multiple groups of gaps (11).

6. A coating equipment housing with a gas distribution structure according to claim 4 or 5, characterized in that: The other end of the discharge box (4) is connected to a feed pipe (3), and the feed opening of the feed pipe (3) passes through the sealing end cover (2).

7. The coating equipment housing with a gas distribution structure according to claim 1, characterized in that: Positioning seats (7) for supporting a graphite boat (8) are fixed on both sides of the inner bottom of the shell (1).

8. The coating equipment housing with a gas distribution structure according to claim 7, characterized in that: A positioning plate (13) is fixed to the end of the positioning seat (7) away from the graphite boat (8) and in the direction of entering the housing (1).

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