Multi-cavity cluster type coating equipment for perovskite solar cell

Abstract

The utility model belongs to the technical field of coating, and relates to multi-cavity cluster type coating equipment for perovskite solar cells, which comprises a plurality of cavities, each cavity comprises a transmission cavity positioned in the middle, a feeding and discharging cavity and a plurality of deposition cavities, the feeding and discharging cavity and the deposition cavities are arranged around the transmission cavity, and adjacent cavities are separated by gate valves. The transmission cavity is internally provided with a rotary manipulator which is used for clamping a substrate and is in butt joint with each chamber, the deposition chambers comprise two PVD (Physical Vapor Deposition) chambers, two multi-source evaporation chambers and an ALD (Atomic Layer Deposition) chamber, and vacuumizing mechanisms are independently arranged in the transmission cavity and each deposition chamber. According to the equipment, various plating layers of the perovskite solar cell can be deposited by utilizing the PVD cavity, the multi-source evaporation cavity and the ALD cavity, so that the preparation requirements of a single cell and a laminated perovskite cell are met at the same time; and the cluster type design is adopted, all functional layers are uniformly allocated, the equipment intelligence degree is high, the equipment cost is saved, and the influence of environmental water and oxygen on the performance of the device is completely avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of film coating, and in particular to a multi-cavity cluster type film coating device for a perovskite solar cell. Background Art

[0002] In recent years, the industrialization process of perovskite batteries has been in full swing. During this process, the equipment for preparing perovskite battery components has also developed rapidly, and the performance of the equipment has become one of the main factors affecting the cost, efficiency and stability of the components. Compared with the pure perovskite battery route, crystalline silicon-perovskite stacked batteries are expected to be industrialized first. For many companies with accumulated silicon technology, crystalline silicon superimposed perovskite is a route that can not only utilize the original production lines and technology accumulation, but also reduce costs and increase efficiency. At present, the production equipment of perovskite stacked battery components is mainly coating equipment, because it has the highest value and occupies the vast majority of equipment investment.

[0003] Perovskite tandem battery coating equipment is mainly divided into three types of equipment: PVD (physical vapor deposition), RPD (reactive plasma deposition), and ALD (atomic layer deposition), and PVD technology is divided into evaporation, sputtering, and ion plating. Perovskite tandem batteries include multiple groups of different film layers. For perovskite tandem batteries prepared by the full vacuum method, the mainstream of the composite layer uses ALD to prepare tin dioxide; for the hole transport layer and top electrode of the battery, the mainstream uses sputtering PVD or evaporation PVD; for the electron transport layer, the mainstream uses sputtering PVD or evaporation PVD, and RPD or ALD equipment is used to make the barrier layer. Therefore, in order to meet the overall process of the tandem battery, at least 4-6 different coating equipment are required.

[0004] In response to the demand for an expanded industrial area, the size of the corresponding coating equipment will be proportionally enlarged, resulting in a larger footprint. Different coating equipment corresponds to different operating systems. The cumbersome back-and-forth operation makes it difficult to effectively connect the production lines in series, resulting in a waste of manpower and maintenance costs, and low production capacity. At the same time, the various film layers of the stacked battery perovskite are more sensitive to water and oxygen in the environment, and during preparation, they inevitably need to be transferred between various devices, resulting in the film layer being exposed to environmental water and oxygen for a long time, resulting in a decrease in the quality of the coating, which in turn affects the overall device performance.

[0005] Chinese patent CN109904327B discloses a cluster vacuum deposition system for preparing perovskite solar cells, which includes a central chamber and a plurality of deposition chambers arranged around the central chamber. The types of deposition chambers include resistive thermal evaporation deposition chambers, organic / inorganic source evaporation deposition chambers, electron beam evaporation deposition chambers, and magnetron sputtering deposition chambers, which can be used to manufacture perovskite solar cells having a substrate, a transparent conductive film layer, a barrier layer, a perovskite absorption layer, a hole transport layer, and a metal back electrode layer. However, this system can only be used for the preparation of single-cell perovskite batteries. From the perspective of market expectations and industry prospects, perovskite stacks will have broader development prospects than single-cell batteries. Therefore, corresponding equipment is urgently needed to be compatible with the preparation of single-cell and stacked perovskite batteries.

[0006] Therefore, it is necessary to improve the existing coating equipment to solve the above problems. Utility Model Content

[0007] The main purpose of the utility model is to provide a multi-cavity cluster coating device for perovskite solar cells, which can manufacture both single-section perovskite solar cells and stacked perovskite solar cells.

[0008] The utility model achieves the above-mentioned purpose through the following technical scheme: a multi-chamber cluster coating device for perovskite solar cells, comprising a plurality of chambers, wherein the chambers include a transmission chamber located in the middle and a loading and unloading chamber and a plurality of deposition chambers arranged around the transmission chamber, and adjacent chambers are separated by plug valves, and a rotating manipulator for clamping a substrate and docking with each chamber is provided in the transmission chamber, and the deposition chamber includes two PVD chambers, two multi-source evaporation chambers and one ALD chamber, and a vacuum pumping mechanism is independently provided in the transmission chamber and each deposition chamber.

[0009] Specifically, the PVD chamber includes a process chamber and an annealing chamber separated by a chamber wall, a conveying mechanism is provided at the same height at the lower parts of the process chamber and the annealing chamber, a target material is provided above the conveying mechanism in the process chamber, a hot plate is provided above and / or below the conveying mechanism in the annealing chamber, the process chamber is adjacent to the transfer chamber and separated by a gate valve, and the process chamber and the annealing chamber are separated by another gate valve located on the chamber wall.

[0010] Furthermore, the width of each chamber and the width of each gate valve are not less than 1 m.

[0011] Specifically, the multi-source evaporation chamber includes a co-evaporation chamber for preparing the perovskite layer and a single evaporation chamber for preparing the anti-reflection layer and the electron transport layer.

[0012] Specifically, the ALD chamber is a low vacuum SALD process chamber, and the ALD chamber is connected to a tin source and a water source.

[0013] The beneficial effects of the technical solution of the utility model are:

[0014] 1. This equipment can use PVD chamber, multi-source evaporation chamber and ALD chamber to deposit various coatings of perovskite solar cells, thereby meeting the preparation needs of single-cell and stacked perovskite cells at the same time;

[0015] 2. Cluster design, unified allocation of each functional layer, high degree of equipment intelligence, saving equipment cost, and completely avoiding the impact of environmental water and oxygen on device performance;

[0016] 3. The ALD chamber adopts a low vacuum type, and the vacuum of the transmission chamber is easy to match, which is conducive to speeding up the production cycle. At the same time, the C60 / SnO2 process is used to prepare the electron transport layer of the stacked battery. The rhythm of evaporation and ALD is easier to match, and the rhythm is faster. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a layout diagram of a multi-cavity cluster coating device for perovskite solar cells according to an embodiment;

[0018] Figure 2 It is a schematic diagram of the structure of the PVD chamber;

[0019] Figure 3 A diagram of the stacking structure of a single-cell perovskite solar cell;

[0020] Figure 4 A diagram of the stacking structure of a perovskite tandem solar cell.

[0021] The numbers in the figure represent:

[0022] 1- multi-chamber cluster coating equipment, 11- transmission chamber, 111- rotary manipulator, 12- loading and unloading chamber, 13- PVD chamber, 131- chamber wall, 132- process chamber, 1321- target material, 133- annealing chamber, 1331- hot plate, 134- conveying mechanism, 14a- co-evaporation chamber, 14b- single evaporation chamber, 15- ALD chamber, 16- gate valve;

[0023] 2a-perovskite single-cell solar cell, 2b-perovskite stacked solar cell 2b, 21a-TCO transparent conductive glass, 21b-silicon cell substrate, 22-composite tunneling layer, 23-hole transport layer, 24-perovskite layer, 25-anti-reflection layer, 26-electron transport layer, 27-electrode. DETAILED DESCRIPTION

[0024] The utility model is further described in detail below in conjunction with specific embodiments.

[0025] Example:

[0026] like Figure 1and Figure 2 As shown, the multi-chamber cluster coating equipment 1 for perovskite solar cells of the utility model comprises a plurality of chambers, wherein the chambers comprise a transmission chamber 11 in the middle, a loading and unloading chamber 12 and a plurality of deposition chambers arranged around the transmission chamber 11, and adjacent chambers are separated by gate valves 16. A rotating manipulator 111 for clamping a substrate 21 and docking with each chamber is provided in the transmission chamber 11, and the deposition chamber comprises two PVD chambers, two multi-source evaporation chambers and one ALD chamber 15, and a vacuum pumping mechanism (not shown) is independently provided in the transmission chamber and each deposition chamber.

[0027] The loading and unloading chamber 12 can deliver the substrate 21 and the coated perovskite solar cell 2 through a multi-layer basket. The rotary manipulator 111 picks up the substrate 21 and places it in front of the deposition chamber in the order of coating. Each deposition chamber can complete different coating processes, so different types of materials can be deposited. The barrier layer 22 (ALD process), the hole transport layer 23 (PDV process), the perovskite layer 24 (evaporation process), the anti-reflection layer 25 (evaporation process), the electron transport layer 26 (evaporation process) and the electrode 27 (evaporation process) will be evaporated on the substrate 21 in turn. This equipment has a cluster design, each functional layer is uniformly allocated, the equipment has a high degree of intelligence, saves equipment cost, and completely avoids the influence of environmental water and oxygen on device performance.

[0028] like Figure 2 As shown, the PVD chamber 13 includes a process chamber 132 and an annealing chamber 133 separated by a chamber wall 131, a conveying mechanism 134 is provided at the same height at the lower part of the process chamber 132 and the annealing chamber 133, a target 1321 located above the conveying mechanism 134 is provided in the process chamber 132, a hot plate 1331 is provided above the conveying mechanism 134 in the annealing chamber 133, the process chamber 132 is adjacent to the transfer chamber 11 and separated by a gate valve 16, and the process chamber 132 and the annealing chamber 133 are separated by another gate valve 16 located on the chamber wall 131.

[0029] The two PVD chambers 13 in the device are used to deposit the hole transport layer 23 and the electrode 27 respectively. The material of the hole transport layer 23 is NiO x (nickel oxide), with a thickness of 20-40 nm. The material of the electrode 27 is ITO (indium tin oxide), with a thickness of 100-200 nm. Therefore, the target materials 1321 of the two PVD chambers 13 are NiO x Target material and ITO target material, each target material 1321 is independently provided with an RF power supply. After the battery plate is deposited in the process chamber 132, the gate valve 16 on the chamber wall 131 is opened, and the conveying mechanism 134 translates it into the annealing chamber 133, the gate valve 16 is closed, and the hot plate 1331 is used for heating and annealing. Finally, the battery plate is sent back to the transmission chamber 11. The hot plate 1331 can also be arranged below or on the upper and lower sides of the conveying mechanism 134.

[0030] The width of each chamber and the width of each gate valve 16 are not less than 1 m.

[0031] In this way, the device can be used in the manufacturing process of large-size perovskite solar cells with a panel surface of one meter square.

[0032] like Figure 1 As shown, the multi-source evaporation chamber includes a co-evaporation chamber 14 a for preparing the perovskite layer 24 and a single evaporation chamber 14 b for preparing the anti-reflection layer 25 and the electron transport layer 26 .

[0033] The material of the perovskite layer 24 is FA and Cs binary hybrid perovskite, with a thickness of 400-600nm. The perovskite layer 24 needs to be formed by co-evaporation reaction of multiple raw materials, and multiple raw materials evaporate at the same time, so it is advisable to deposit it separately in a co-evaporation chamber 14a. The material of the anti-reflection layer 25 is LiF (lithium fluoride), with a thickness of 1-6nm. The materials of the electron transport layer 26 are C60 (carbon 60) and BCP (2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline), the thickness of C60 is 20-40nm, and the thickness of BCP is 5-10nm. A total of three raw materials are used from the anti-reflection layer 25 to the electron transport layer 26, but the three are layered and evaporated, and only one raw material is used each time, so it is advisable to place it separately in a single evaporation chamber 14b to complete the deposition, where BCP can be replaced by preparing SnO2 through ALD.

[0034] The ALD chamber 15 is a low vacuum SALD process chamber, and the ALD chamber 15 is connected to a tin source and a water source.

[0035] ALD chamber 15 is of low vacuum type, and the vacuum of transmission chamber 11 is easy to match, which is conducive to speeding up the production cycle. At the same time, the C60 / SnO2 process is used to prepare the electron transport layer of the stacked battery. The evaporation and ALD cycles are easier to match and the cycle is faster. ALD chamber 15 is used to prepare a composite layer of SnO2 (tin oxide) with a thickness of 10-30nm. In the ALD process, tin reacts with water to obtain tin oxide, and the by-product hydrogen is absorbed.

[0036] like Figure 3 As shown, in the preparation of a single-cell perovskite solar cell 2a, a TCO transparent conductive glass 21a is first placed in the upper and lower material chamber 12, and the TCO transparent conductive glass 21a is transferred to the PVD process chamber 13a through the transfer chamber 11 to prepare a NiOx hole transport layer 23, and then to the co-evaporation chamber 14a for co-evaporation of perovskite materials to obtain a perovskite layer 24, and then annealed in the annealing chamber 13b, and then transferred to the single evaporation chamber 14b to sequentially evaporate a LiF anti-reflection layer 25, C60 and a BCP electron transport layer 26, and finally transferred to the process chamber 13a to prepare an ITO electrode 27, and the finished product returns to the upper and lower material chamber 12 and is removed, wherein the BCP can be replaced by preparing SnO2 through ALD.

[0037] like Figure 4 As shown, in the preparation of the perovskite stacked solar cell 2b, the silicon cell substrate 21b is first placed in the loading and unloading chamber 12, and the silicon cell substrate 21b is transferred to the ALD chamber 15 through the transfer chamber 11 to prepare the SnO2 composite tunneling layer 22, and then transferred to the PVD process chamber 13a to prepare the NiO x The hole transport layer 23 is then transferred to the co-evaporation chamber 14a for co-evaporation of the perovskite material to obtain the perovskite layer 24, and then annealed in the annealing chamber 13b, and then transferred to the single evaporation chamber 14b to sequentially evaporate the LiF anti-reflection layer 25, C60 and BCP electron transport layer 26, and finally transferred to the process chamber 13a to prepare the ITO electrode 27, and the finished product returns to the loading and unloading chamber 12 and is removed.

[0038] The device can utilize the PVD chamber, the multi-source evaporation chamber and the ALD chamber 15 to deposit various coating layers of the perovskite solar cell, thereby meeting the preparation requirements of both single-cell and stacked perovskite cells.

[0039] The above are only some embodiments of the present invention. For those skilled in the art, several modifications and improvements can be made without departing from the inventive concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. A multi-chamber cluster coating device for perovskite solar cells, comprising a plurality of chambers, wherein the chambers include a transmission chamber in the middle, a loading and unloading chamber and a plurality of deposition chambers arranged around the transmission chamber, and adjacent chambers are separated by a gate valve. A rotary manipulator is provided in the transmission chamber to clamp the substrate and dock with each chamber, characterized in that: The deposition chamber comprises two PVD chambers, two multi-source evaporation chambers and one ALD chamber, and a vacuum pumping mechanism is independently arranged in the transmission chamber and each deposition chamber.

2. The multi-cavity cluster coating device for perovskite solar cells according to claim 1, characterized in that: The PVD chamber includes a process chamber and an annealing chamber separated by a chamber wall, a conveying mechanism is provided at the same height at the lower parts of the process chamber and the annealing chamber, a target material is provided in the process chamber and is located above the conveying mechanism, a hot plate is provided in the annealing chamber and is located above and / or below the conveying mechanism, the process chamber is adjacent to the transmission chamber and is separated by a gate valve, and the process chamber and the annealing chamber are separated by another gate valve located on the chamber wall.

3. The multi-cavity cluster coating device for perovskite solar cells according to claim 1 or 2, characterized in that: The width of each chamber and each gate valve shall not be less than 1m.

4. The multi-cavity cluster coating device for perovskite solar cells according to claim 1, characterized in that: The multi-source evaporation chamber comprises a co-evaporation chamber for preparing a perovskite layer and a single evaporation chamber for preparing an anti-reflection layer and an electron transport layer.

5. The multi-cavity cluster coating device for perovskite solar cells according to claim 1, characterized in that: The ALD chamber is a low vacuum SALD process chamber, and the ALD chamber is connected to a tin source and a water source.

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