2results about How to "Avoid affecting the process" patented technology

The utility model discloses a kind of refining machine oil agent circulation systems for fiber production involve fiber production technical field, including refiner, oil agent circulation tank and membrane filtration device, the bottom of the refiner is provided with liquid collecting tank, and the circulating liquid of liquid collecting tank is connected with oil agent circulation tank, and oil agent circulation tank is connected with membrane filtration device and oiling device respectively, and the circulating liquid of oil agent outlet of membrane filtration device is connected with oil agent circulation tank, the refining machine oil agent circulation system for fiber production is also provided with external processor, liquid level transmitter is arranged in the oil agent circulation tank, and oil agent circulation pump is arranged in the liquid outlet of oil agent circulation tank, and solenoid valve I is arranged in the inlet of membrane filtration device;By optimizing oil agent process, improve fiber oiling rate uniformity, make fiber physical property more stable, product strength and elongation rate variation coefficient reduce, significantly improve product quality.Product quality improvement helps company to develop high-end market, improve product added value, enhance market competitiveness.

The application discloses a preparation method of a semiconductor device, which comprises the following steps: providing a substrate; forming a stack layer on the surface of the substrate, wherein the stack layer comprises a first type region and a second type region, and the first type region and the second type region are arranged adjacently; forming a mask layer on the surface of the first type region; forming a shielding layer on the sidewall of the mask layer, wherein the shielding layer shields part of the surface of the second type region; etching the second type region by taking the mask layer and the shielding layer as masks, the second type region shielded by the shielding layer is formed with a lateral erosion, and the width of the shielding layer is greater than the maximum width of the lateral erosion of the second type region; removing the shielding layer to expose the part of the second type region shielded by the shielding layer; and removing the exposed part of the second type region to make the sidewall of the first type region vertical and flush, so that the preparation method of the semiconductor device can reduce the over-etching influence on the adjacent sidewalls in the etching process, and improve the product performance and yield.