The invention discloses a high-durability FeFET based on a ferroelectric
semiconductor channel and an anti-ferroelectric
gate dielectric and a preparation method of the high-durability FeFET. A back gate
electrode layer, an anti-ferroelectric
gate dielectric layer, a ferroelectric
semiconductor channel layer, a top gate high-k
gate dielectric layer and a top gate
electrode layer are sequentially stacked in a FeFET structure, and the anti-ferroelectric gate
dielectric layer serves as a back gate
dielectric layer; the top gate high-k gate
dielectric layer serves as a top gate
dielectric layer, the thickness of the back gate
dielectric layer is larger than that of the top gate
dielectric layer, and an asymmetric double-gate structure is formed. According to the invention, the
hafnium oxide-based anti-ferroelectric thin film is used for replacing a ferroelectric thin film as a gate medium of the FeFET, so that the operation
voltage is effectively reduced; no
interface layer is arranged between the ferroelectric
semiconductor channel and the anti-ferroelectric gate dielectric, so that durability failure caused by charge
trapping and defect generation associated with the traditional FeFET and the
interface layer is inhibited; the out-of-plane
spontaneous polarization continuous, precise and adjustable characteristic of a ferroelectric semiconductor channel and the gate storage mode and the channel storage mode which are switched mutually based on the asymmetric double-gate structure of the FeFET are hopeful to enable the FeFET to show higher durability.