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CaF2-free low power flat field apochromatic metallographic microobjective

An apochromatic, microscope objective lens technology, applied in microscopes, optics, instruments, etc., can solve the problems of difficulty in obtaining large-sized materials, few special optical materials, unstable physical and chemical properties, etc., and achieve a simple structure and high cost performance. Effect

Inactive Publication Date: 2011-04-20
GUILIN UNIV OF ELECTRONIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In recent years, some people use special glass (such as TF 3 ) to replace or partially replace CaF 2 The design and manufacture of plan apochromatic objective lenses shows superiority in reducing costs and improving manufacturability, but there are few special optical materials, they are brittle, their physical and chemical properties are unstable, and large-sized materials are more difficult to obtain

Method used

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  • CaF2-free low power flat field apochromatic metallographic microobjective
  • CaF2-free low power flat field apochromatic metallographic microobjective
  • CaF2-free low power flat field apochromatic metallographic microobjective

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Embodiment Construction

[0021] refer to figure 1 , the present invention has no CaF 2 The low magnification plan apochromatic metallographic microscope objective lens consists of the first positive lens 1, the second negative lens 2, and the third positive lens 3, the first positive lens 1, the second negative lens 2, and the third The positive lens 3 is coaxial, and the sequence from left to right is the first positive lens 1 → the second negative lens 2 → the third positive lens 3 → object plane 4, and the object plane 4 passes through the third positive lens 3 → the first Two pieces of negative lens 2→the first piece of positive lens 1, imaging at infinity.

[0022] Lenses are CaF free 2 common optical glass material.

[0023] The present invention is free of CaF 2 Low magnification plan apochromatic metallographic microscope objective:

[0024] Working distance W.D>30mm;

[0025] Magnification β=4×-6.3×;

[0026] Numerical aperture ≥ 0.1; aperture angle > 2°;

[0027] Focal length f'=38-6...

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Abstract

The invention provides a CaF2-free low power flat field apochromatic metallographic microobjective, comprising lenses. The microobjective is characterized by comprising three lenses, namely a first plus lens, a second minus lens and a third plus lens, and the three lenses are coaxial. The first plus lens, the second minus lens, the third plus lens and an object plane are arranged in sequence from left to right, and the imaging is formed at infinity in opposite direction. The CaF2-free low power metallographic microobjective has the advantages of achieving the effect of flat field apochromatism, and having long operating distance, high cost performance and simple structure.

Description

technical field [0001] The invention relates to a microscope objective lens, in particular to a CaF-free 2 Low magnification plan apochromatic metallographic microscope objective. Background technique [0002] Microscopic objective lens is an important component of metallographic microscope, and its imaging quality directly affects the performance of metallographic microscope. The plan apochromatic microscope objective is the microscope objective with the best image quality and the highest grade. In order to correct axial chromatic aberration and secondary spectrum at the same time in the objective lens, the conventional method is to introduce optical crystals, such as calcium fluoride CaF 2 etc. as manufacturing materials. In recent years, some people use special glass (such as TF 3 ) to replace or partially replace CaF 2 The design and manufacture of plan apochromatic objective lenses shows superiority in reducing costs and improving manufacturability, but there are f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B21/02G02B1/00
Inventor 萧泽新曹杰李鹏肖冉
Owner GUILIN UNIV OF ELECTRONIC TECH
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