Hole measurement pattern and hole measurement method
A graphics and measurement technology, used in semiconductor/solid-state device testing/measurement, electrical components, semiconductor/solid-state device manufacturing, etc. Success rate, the effect of improving the measurement situation
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0021] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.
[0022] figure 1 A hole metrology pattern according to an embodiment of the present invention is schematically shown. Such as figure 1 As shown, the hole measurement pattern according to the embodiment of the present invention includes: a first part A, a second part B and a third part C.
[0023] figure 2 A first portion A of a hole metrology pattern according to an embodiment of the invention is schematically shown. Such as figure 2 As shown, the first part A is a densely repeated pattern area, and the densely repeated pattern area contains at least three rows and three columns of highly repeated patterns A1.
[0024] image 3 A second portion B of the hole metrology pattern according to an embodiment of the invention is schematically sh...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com