38 results about "Repeat pattern" patented technology

The present invention may be embodied as a system (10) for monitoring a belt (90). The system (10) includes a sensor (20) configured to be mounted near a belt (90). The sensor (20) is configured to detect a profile of the belt (90). A processor is in electronic communication with the sensor (20). The processor is programmed to receive an electrical signal from the sensor (20); detect a repeating pattern in the electrical signal; and detect a deviation from the repeating pattern. In some embodiments, detecting a deviation from the repeating pattern further includes calculating a rolling average profile. The rolling average profile may, for example, an average of the most recent 5 – 100 cycles of the repeating pattern. In some embodiments, the deviation from the repeating pattern exceeds a predetermined deviation threshold for a duration of a cycle of the repeating pattern.

A three-dimensional support structure is provided and includes a single sheet of material that is folded into a repeating pattern of cells. Each of the cells is formed by first and second spaced-apart endwalls and first and second sloped sidewalls spanning between the endwalls. Each endwall comprises two plies of material while each sidewall com-prises a single ply of material. The first and second sidewalls are adjoined at-a folded edge, The cells are aligned such that the first endwall of one cell from the repeating pattern abuts the second endwail of an adjacent cell of the repeating pattern to form a four-ply wall of the material. A first liner may be attached to a first side of the folded material and a second I iper may be attached to a second side of the folded material.

Disclosed are example embodiments of methods, apparatuses and systems supporting beam diversity for multimedia broadcast multicast services. A method may comprise receiving information of one or more beams and abeam-specific repetition pattern for at least one of the one or more beams for transmission of a service from a network device, and receiving the service on the at least one of the one or more beams based on the beam-specific repetition pattern.

The present application relates to the field of image data processing, and more particularly to a kind of inkjet printing image data remote acquisition method and system, method includes: obtaining the RGB image of printing image, preset color difference threshold and merge similar RGB value, build palette and obtain index map;Based on initial window sliding scanning index map, based on the degree of completeness of pattern in initial window dynamic adjustment initial window size, as target window and output position, size information collection;Based on the color frequency of each pixel in each target window, local connectivity and color difference degree as weight calculation multi-dimensional space matrix feature of each target window, construct printing feature vector, based on hash function projection and capture similar pattern of printing feature vector of each target window, construct repeat pattern dictionary;Based on compression algorithm, palette and pattern dictionary are compressed in turn, and original printing pattern is reconstructed block by block in reverse when decoding, the scheme of the application improves the compression efficiency of printing pattern.

A process of improving quality of audio captured corresponding to an incident. An electronic computing device determines that an incident is likely to occur at a particular location within a field of view of a camera when the analysis of the video recordings indicate a repeated pattern of occurrences of the incident at the particular location within the field of view. When the device determines that audio quality of the audio of the video recordings captured corresponding to the particular location is below a predetermined audio quality threshold, the electronic computing device identifies a position or orientation relative to the particular location for placing an external microphone and improving the audio quality of the audio captured corresponding to the particular location. The electronic computing device then provides an electronic notification with a recommendation to place the external microphone at the identified position or orientation relative to the particular location.

The main repeating patterns in the recorded spatiotemporal data are identified, extracted, and / or refined by: converting the data into phase data; determining the global cycle length for each cycle with discrete time points; determining the start time in the original recording; calculating the optimal global phase order over 2π and the entire cycle length using the time points and start time; assigning singular values ​​to each spatial location; and generating a visual representation of the pattern. Variations of the method can be used to identify features of the pattern, such as spatial movement, focal position, drift, and stability.

A storage device, a non-volatile memory device, and a method of operating the non-volatile memory device are provided. The storage device includes a storage controller configured to send a command and program data including a pattern of one or more bits, a non-volatile memory device configured to receive the command and the program data, and a pattern monitoring circuit configured to monitor a pattern of the program data sent from the storage controller. The pattern monitoring circuit is configured to send an abnormal status check bit to the storage controller when the program data includes repeated patterns that are repeated a preset number of times or more, and the storage controller is configured to resend the program data to the non-volatile memory device in response to receiving the abnormal status check bit.

A mask design method, apparatus, and storage medium are disclosed. The mask design method includes: obtaining a mask design to be subdivided, the mask design including: an adjacent array pattern group and an epitaxial pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; subdividing the array pattern group to obtain a repeating pattern set and a subdivision scheme for the repeating pattern set; obtaining a subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set; and subdividing the mask design to be subdivided based on the subdivision scheme for the repeating pattern set and the subdivision scheme for the epitaxial pattern group to obtain multiple sub-mask designs. Obtaining the subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set obtained by subdividing the array pattern group can effectively improve the periodicity in the subdivision scheme of the array pattern group, and can create a periodic environment where the patterns at the edge positions of the array pattern group are the same as or similar to the patterns at the center positions, which is beneficial for expanding the process window and improving exposure quality.

Systems and methods for modifying an infinite repeat pattern of a digital image are disclosed. An infinite repeat pattern of a digital source image is obtained, and a modification area is selected that includes a plurality of duplicates of portions of the digital source image. Within the modification area, the borders between the duplicates, the joints between multiple borders, and the points where the borders meet the perimeter of the modification area are determined. The joints are centered along a central axis of the modification area. An additional selection area within the modification area is made based on the earlier-determined borders, joints, and points on the perimeter of the modification area. The additional selection area is modified using an artificial intelligence (AI) model to create an infinite repeat pattern without clearly visible borders and / or boundaries between the duplicates of the digital source image, and without other undesirable features.

Preparing for live music performances such as curating and sequencing list of tracks and remixing them with musical loops can be challenging. The present disclosure predicts a first set of features relevant to an event. One or more music tracks are generated using at least a subset of the predicted first set of features. The one or more music tracks are split into one or more individual arrangement tracks. One or more segments are generated by identifying one or more repetitive patterns for each of the one or more individual arrangement tracks. A second set of features are extracted from each of the one or more segments. One or more loops are generated based on at least a subset of extracted second set of features. The one or more loops are provided for one or more loop sequencers for usage in the event.

Disclosed in the present application are a method and apparatus for detecting wafer defects which relates to the field of semiconductor. The method provided by the present application comprises: determining a repeating pattern unit and a non-repeating pattern unit in a Scanning Electron Microscope (SEM) image based on a SEM image to be detected and pattern units in a design layout; measuring the pattern units in the design layout, the repeating pattern unit, and the non-repeating pattern unit to determine difference information; and determining whether the repeating pattern unit and the non-repeating pattern unit have defects based on the difference information.

Techniques for high-resolution dimming include a light fixture having a plurality of light sources arranged in a plurality of groups, wherein each group comprises one or more light sources. The plurality of groups are controlled so that each of the groups is repeatedly switched on and off according to a repeating pattern, the repeating pattern including at least three different combinations of which of the plurality of groups is switched on and which of the plurality of groups is switched off. Each of the at least three different combinations is repeated at least once every 1 / 10 s.

A test and measurement instrument has an input to receive a signal under test having a repeating pattern. one or more analog-to-digital converters (ADC) to sample the signal under test at a sample rate over many repeating patterns to digitize the signal, one or more processors configured to execute code to cause the one or more processors to: recover a clock from the sampled signal under test, use the clock to generate an original pattern waveform, interpolate and resample from the original pattern waveform to generate an evenly time-spaced pattern waveform, apply an equalizer to the evenly time-spaced pattern waveform to produce an equalized pattern waveform, interpolate and resample from the equalized pattern waveform to produce a new waveform having equalized samples at sample times of the sampled signal under test, recover an updated clock from the new waveform, and use the updated clock to produce an updated waveform.

The invention relates to the field of chip design, in particular to a redundant graph filling method and device, equipment and a storage medium. Performing graph retrieval on the to-be-processed chip layout, and determining repeated graphs in the to-be-processed chip layout; determining representative graphs corresponding to the repeated graphs; performing redundant pattern filling on the representative pattern to obtain a filled pattern; filling all the repeated patterns by using the filling pattern; removing the repeated pattern from the to-be-processed chip layout to obtain a residual layout; performing redundant graph filling on the residual layout to obtain a residual filling layout; and combining the residual filling layout with the removed filled repeated graph to obtain a finished product filling layout. According to the method, only redundant pattern filling needs to be carried out on the representative pattern corresponding to the repeated pattern, then only the filling pattern needs to be copied into the repeated pattern, meanwhile, process deviation is avoided, and the device performance is greatly improved.

The present disclosure discloses a method for indicating required RACH occasions using a low-overhead signaling mechanism that minimizes number of bits required for indication. The method comprises selecting (702) a PRACH Configuration Index that provides RACH occasions in a first type of slots within a RACH frame and generating (706) a bitmap in which slots having wanted RACH occasions are represented by a first value and slots having unwanted RACH occasions are represented by a second value. The method comprises identifying (708) whether the bitmap exhibits a repetition pattern and upon identifying the repetition pattern, generating (710) a compressed bitmap corresponding to a portion of the bitmap that defines the repetition pattern, appending a repeat indicator with the compressed bitmap, and transmitting (712) the compressed bitmap along with the repeat indicator to UEs (106) for performing random access during the wanted RACH occasions indicated in the compressed bitmap.

A method for time synchronisation in a satellite based quantum key distribution system, by at a transmitter, emitting a first series of laser pulses (LP) encoded to form a quantum beam, emitting a second series of LP having a predetermined repeating pattern; at a receiver, receiving the first and second series of LP and determining reception times of pulses of the first and second series of LP; comparing the second series of LP to the predetermined pattern and determining the point at which the received second series of LP is most correlated to the predetermined pattern; determining a relationship fitting reception times of a plurality of the received pulses to emission times of corresponding ones of the second series of LP; and using the determined relationship to convert between reception times of the first series of LP and emission times of corresponding ones of the first series of LP.

The notch detection device includes: a mounting surface for a plate-shaped object with a notch, a sensor, and a processing unit. The sensor is configured to rotate relative to the outer periphery of the object mounted on the mounting surface about a predetermined rotation axis. During this rotation, it repeatedly measures the distance from the rotation axis to the outer periphery, acquiring a series of distance data along the circumferential direction. The outer periphery of the object, excluding the notch portion, extends in a manner forming a predetermined repeating pattern along the circumferential direction. The processing unit divides the series of distance data acquired by the sensor into multiple groups corresponding to the repeating pattern along the circumferential direction, and detects the position of the notch by comparing the divided distance data between groups.

The present disclosure may be embodied as a system for monitoring a belt. The system includes a sensor configured to be mounted near a belt. The sensor is configured to detect a profile of the belt. A processor is in electronic communication with the sensor. The processor is programmed to receive an electrical signal from the sensor; detect a repeating pattern in the electrical signal; and detect a deviation from the repeating pattern. In some embodiments, detecting a deviation from the repeating pattern further includes calculating a rolling average profile. The rolling average profile may, for example, an average of the most recent 5-100 cycles of the repeating pattern. In some embodiments, the deviation from the repeating pattern exceeds a predetermined deviation threshold for a duration of a cycle of the repeating pattern.

A method of manufacturing a semiconductor device includes the steps of: forming a lower structure including a first repeating pattern; and forming an upper structure, the step of forming a second repeating pattern to correspond to each of the first repeating patterns on the lower structure, and the step of forming the second repeating pattern includes: preparing a design layout for the second repeating pattern; forming a first corrected layout including the corrected second repeating pattern by performing optical proximity correction (OPC) on the design layout; forming a second corrected layout by performing position correction on the first corrected layout to move the position of the corrected second repeating pattern to correspond to the changed position of the first repeating pattern according to the physical deformation of the lower structure; using the second corrected layout to manufacture a mask; and using the mask to pattern a photoresist layer.

The invention provides a compiling optimization method and device of a VLIW framework, equipment, a medium and a product, and the method comprises the steps: generating a VLIW instruction packet sequence, and repeatedly executing the VLIW instruction packet sequence for at least three times to recognize a repeated Pattern; based on preset operation constraints and instruction constraints, a CP-SAT scheduler is used for conducting preliminary scheduling on the VLIW instruction packet sequence, a preliminary scheduling result is obtained, part of the preliminary scheduling result is frozen, secondary scheduling is conducted according to the number constraints of registers, and an optimized scheduling result is obtained; identifying a minimum repetitive unit, a preamble code and a trailing code from the optimized scheduling result, and adding an auxiliary control instruction to a key execution node of the minimum repetitive unit to form an optimized circulation mode; and combining a plurality of optimized loop modes and tensor control logics to generate a tensor operation instruction sequence. Therefore, the instruction packaging problem during GEMM calculation under the light plume architecture is effectively solved, and the GEMM calculation efficiency is effectively improved.

Generating patterns for architectural product manufacture. Defining a repeating pattern that is used for a layout design and displaying a visualization that represents the repeating pattern. Defining a design area of architecture and displaying a second visualization that represents the design area of architecture. The repeating pattern is then applied to the design area of architecture to complete the layout design of the design area. The second visualization that represents the design area of architecture includes the applied repeating pattern. Thereafter, information related to one or more components that are required to implement the layout design of the design area is generated.

A method for mapping a physical hybrid automatic repeat request indicator channel (PHICH) is described. The method for mapping a PHICH includes determining an index of a resource element group transmitting a repetitive pattern of the PHICH, according to a ratio of the number of available resource element groups in a symbol in which the PHICH is transmitted and the number of available resource element groups in a first or second OFDM symbol, and mapping the PHICH to the symbol according to the determined index. In transmitting the PHICH, since efficient mapping is performed considering available resource elements varying with OFDM symbols, repetition of the PHICH does not generate interference between neighbor cell IDs and performance is improved.

Exemplary aspects disclosed herein include detecting a repeating pattern in an instruction pipeline of a processor to reduce repeated fetches. The processor includes a pattern recording circuit configured to receive information in a data stream (e.g., instructions or consumed data) in the instruction pipeline. The pattern recording circuit includes a first-in-first-out (FIFO) table circuit containing an input record column and a plurality of additional adjacent record columns. As new data appears in the data stream, the data recording circuit is configured to sequentially record next incoming data from the data stream into a next input entry of the input record column and then move previously recorded data to adjacent entries of the adjacent record columns. A distance between the input record column and an additional record column having matching data is a distance between repeated occurrences of data in the data stream.

A method of session-based DASH operation can include sending a media presentation description (MPD) during a media access session. The MPD references a session-based description (SBD) and indicates a keyword name. The SBD includes a first repetition pattern element that includes a first sequence of timed keyword values for the keyword name. The first repetition pattern element indicates that the first sequence of timed keyword values for the keyword name repeats along a timeline or an order line. A request for a segment of the sequence of segments can be received from a DASH client, the request including the keyword name and a first keyword value for the keyword name. In response to the received request for the segment of the sequence of segments, the requested segment of the sequence of segments is sent to the DASH client.

The positioning system (9) comprises a device (10) and a plurality of fixed bases (12), which comprise a counter cyclically browsing n pointer positions.The device comprises an emitter configured to emit a request comprising at least one point pattern whose values read with the pointer modulate a carrier.Each receiving base emits a response:a) repeating the pattern received by the base from the device; and / orb) representative of a first temporal pattern offset, measured by the base, between the pattern received and an identical pattern stored in the memory of the base.The device comprises:a means for measuring a second temporal pattern offset between the values of pattern points received in each response and the values stored in the memory of the device;a means for determining the distance between the device and each base as a function of:a) the total pattern offset between the pattern emitted by the device and the repeated pattern received by the device from the base; and / orb) the second pattern offset and the first pattern offset measured by the base.