9 results about "Repeat pattern" patented technology

A three-dimensional support structure is provided and includes a single sheet of material that is folded into a repeating pattern of cells. Each of the cells is formed by first and second spaced-apart endwalls and first and second sloped sidewalls spanning between the endwalls. Each endwall comprises two plies of material while each sidewall com-prises a single ply of material. The first and second sidewalls are adjoined at-a folded edge, The cells are aligned such that the first endwall of one cell from the repeating pattern abuts the second endwail of an adjacent cell of the repeating pattern to form a four-ply wall of the material. A first liner may be attached to a first side of the folded material and a second I iper may be attached to a second side of the folded material.

The main repeating patterns in the recorded spatiotemporal data are identified, extracted, and / or refined by: converting the data into phase data; determining the global cycle length for each cycle with discrete time points; determining the start time in the original recording; calculating the optimal global phase order over 2π and the entire cycle length using the time points and start time; assigning singular values ​​to each spatial location; and generating a visual representation of the pattern. Variations of the method can be used to identify features of the pattern, such as spatial movement, focal position, drift, and stability.

A mask design method, apparatus, and storage medium are disclosed. The mask design method includes: obtaining a mask design to be subdivided, the mask design including: an adjacent array pattern group and an epitaxial pattern group, wherein the patterns in the array pattern group are arranged in a periodic array; subdividing the array pattern group to obtain a repeating pattern set and a subdivision scheme for the repeating pattern set; obtaining a subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set; and subdividing the mask design to be subdivided based on the subdivision scheme for the repeating pattern set and the subdivision scheme for the epitaxial pattern group to obtain multiple sub-mask designs. Obtaining the subdivision scheme for the epitaxial pattern group based on the repeating pattern set and the subdivision scheme for the repeating pattern set obtained by subdividing the array pattern group can effectively improve the periodicity in the subdivision scheme of the array pattern group, and can create a periodic environment where the patterns at the edge positions of the array pattern group are the same as or similar to the patterns at the center positions, which is beneficial for expanding the process window and improving exposure quality.

Preparing for live music performances such as curating and sequencing list of tracks and remixing them with musical loops can be challenging. The present disclosure predicts a first set of features relevant to an event. One or more music tracks are generated using at least a subset of the predicted first set of features. The one or more music tracks are split into one or more individual arrangement tracks. One or more segments are generated by identifying one or more repetitive patterns for each of the one or more individual arrangement tracks. A second set of features are extracted from each of the one or more segments. One or more loops are generated based on at least a subset of extracted second set of features. The one or more loops are provided for one or more loop sequencers for usage in the event.

Disclosed in the present application are a method and apparatus for detecting wafer defects which relates to the field of semiconductor. The method provided by the present application comprises: determining a repeating pattern unit and a non-repeating pattern unit in a Scanning Electron Microscope (SEM) image based on a SEM image to be detected and pattern units in a design layout; measuring the pattern units in the design layout, the repeating pattern unit, and the non-repeating pattern unit to determine difference information; and determining whether the repeating pattern unit and the non-repeating pattern unit have defects based on the difference information.

The notch detection device includes: a mounting surface for a plate-shaped object with a notch, a sensor, and a processing unit. The sensor is configured to rotate relative to the outer periphery of the object mounted on the mounting surface about a predetermined rotation axis. During this rotation, it repeatedly measures the distance from the rotation axis to the outer periphery, acquiring a series of distance data along the circumferential direction. The outer periphery of the object, excluding the notch portion, extends in a manner forming a predetermined repeating pattern along the circumferential direction. The processing unit divides the series of distance data acquired by the sensor into multiple groups corresponding to the repeating pattern along the circumferential direction, and detects the position of the notch by comparing the divided distance data between groups.

Exemplary aspects disclosed herein include detecting a repeating pattern in an instruction pipeline of a processor to reduce repeated fetches. The processor includes a pattern recording circuit configured to receive information in a data stream (e.g., instructions or consumed data) in the instruction pipeline. The pattern recording circuit includes a first-in-first-out (FIFO) table circuit containing an input record column and a plurality of additional adjacent record columns. As new data appears in the data stream, the data recording circuit is configured to sequentially record next incoming data from the data stream into a next input entry of the input record column and then move previously recorded data to adjacent entries of the adjacent record columns. A distance between the input record column and an additional record column having matching data is a distance between repeated occurrences of data in the data stream.

According to one aspect of the present disclosure, a pick-and-place apparatus is provided for picking an electronic component from a first carrier and placing the electronic component on a second carrier. The apparatus comprises a pickup unit provided with a diffraction grating having repeating pattern units in a first direction. An nth-order light beam is generated by irradiating the diffraction grating with collimated light. The change in the length of the pickup unit in the first direction at the position of the diffraction grating can be determined based on the sensed nth-order light beam.

The application provides a VLIW architecture compilation optimization method, device, equipment, medium and product, the method comprises: generating a VLIW instruction package sequence, and repeating the VLIW instruction package sequence at least three times to identify a repeated pattern;Based on the predetermined operation constraint and instruction constraint, the CP-SAT scheduler is used to preliminarily schedule the VLIW instruction package sequence, obtain a preliminary scheduling result, freeze part of the preliminary scheduling result, and perform secondary scheduling for the register number constraint to obtain an optimized scheduling result;From the optimized scheduling result, the smallest repeating unit, the leading code and the trailing code are identified, and auxiliary control instructions are added to the key execution nodes of the smallest repeating unit to form an optimized loop mode;Combining multiple optimized loop modes and tensor control logic, a tensor operation instruction sequence is generated. Thus, the instruction packaging problem in GEMM calculation under the light feather architecture is effectively solved, and the efficiency of GEMM calculation is effectively improved.