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416 results about "Repeat pattern" patented technology

Method and system for managing design corrections for optical and process effects based on feature tolerances

A method for modifying instances of a repeating pattern in an integrated circuit design to correct for perturbations during rendering is described. In the typical embodiment, these corrections are optical proximity corrections that correct for optical effects during the projection of the mask pattern onto the wafer and / or processing effects for example photoresist response and etching effects. The method comprises determining a correction for the repeating pattern based on a first set of tolerances for features of the repeating pattern. Then, the suitability of the corrections is evaluated for instances of the repeating pattern in the integrated circuit design based on a second set of tolerances, which is different from the first set of tolerances. This can be used to preserve much of the hierarchy of the layout data in the corrected, or lithography, data. This can be achieved during the OPC process, thus avoiding the post OPC compaction. It can further take advantage of the fact that, for a given physical layer of a chip for example, different portions of the representing design polygons typically have different requirements on pattern fidelity on the wafer while perturbations may vary as a function of field position. By applying knowledge of the feature tolerances, and allowing design corrections only when tolerances are not met, the data explosion that occurs when moving from layout to lithography data can be contained without sacrificing accuracy.
Owner:CADENCE DESIGN SYST INC

Method and apparatus for evaluating and calibrating a signaling system

A method and apparatus for evaluating and calibrating a signaling system is described. Evaluation is accomplished using the same circuits actually involved in normal operation of the signaling system. Capability for in-situ testing of a signaling system is provided, and information may be obtained from the actual perspective of a receive circuit in the system. A pattern of test information is generated in a transmit circuit of the system and is transmitted to a receive circuit. A similar pattern of information is generated in the receive circuit and used as a reference. The receive circuit compares the patterns. Any differences between the patterns are observable. Preferably, the patterns are repeating patterns that allow many iterations of testing to be performed. In one embodiment, a linear feedback shift register (LFSR) is implemented to produce patterns. Information obtained from testing may be used to assess the effects of various system parameters, including but not limited to output current, crosstalk cancellation coefficients, and self-equalization coefficients, and system parameters may be adjusted to optimize system performance. An embodiment of the invention may be practiced with various types of signaling systems, including those with single-ended signals and those with differential signals. An embodiment of the invention may be applied to systems communicating a single bit of information on a single conductor at a given time and to systems communicating multiple bits of information on a single conductor simultaneously.
Owner:RAMPART ASSET MANAGEMENT LLC

Color display system with improved apparent resolution

ActiveUS20070257944A1Improved apparent resolutionReduced image processing complexityCathode-ray tube indicatorsInput/output processes for data processingColor imageDisplay device
A full color display system comprised of: a) a display which is formed from a two-dimensional array of three or more differently colored light-emitting elements arranged in a repeating pattern forming a first number of full-color two-dimensional groups of light-emitting elements, each full-color group of light-emitting elements being formed by more than one luma-chroma sub-group of light-emitting elements, wherein the display has a peak white luminance and each luma-chroma sub-group comprising at least one distinct high-luminance light-emitting element having a peak output luminance value that is 40 percent or greater of the peak white luminance of the display device; and b) a processor for providing a signal to drive the display by receiving a three-or-more color input image signal, which specifies three-or-more color image values at each of a two-dimensional number of sampled addressable spatial locations within an image to be displayed; wherein the processor dynamically forms re-sampling functions for image spatial locations derived from the input image signal and corresponding to the spatial location of each luma-chroma sub-group in the display array based on an analysis of the spatial content of the three-or-more color input image signal and the display array repeating pattern, and applying the re-sampling functions to the three-or-more color input image signal to render a signal for driving each light-emitting element within each corresponding luma-chroma sub-group of light-emitting elements.
Owner:GLOBAL OLED TECH

Method of manufacture of particles with controlled dimensions

A process for the preparation of particles with controlled dimensions comprising the steps of: (i) providing a laminar substrate having a patterned surface comprising a micro-relief repeat pattern comprising one or more discrete cells, each cell consisting of a floor portion and walls having a height (HW); (ii) depositing organic or inorganic material onto the patterned surface and into the cells to provide a thickness (T) of the deposited material wherein T≦HW (iii) stripping the deposited organic or inorganic material from the surface of the substrate; and (iv) collecting the particles formed from said organic or inorganic material; and a composition obtainable from said process comprising a plurality of particles (P), wherein the number (n) of particles in said composition is at least 10, wherein said particles (P) are platelets exhibiting a planar geometry which is circular or which is made up of a number (x) of planar (y)-sided polygon(s), wherein x is from 1 to 20 and y is at least 3 wherein if x is greater than 1 then said planar (y)-sided polygons are fused along one or more sides thereof, wherein the width (WP) of the platelets (P) at their widest point is no more than about 250 pm and the thickness of the platelets (P) is in the range of 10 nm to 50 nm.
Owner:SZUSCIK MACHNICKI ANDREW HENRY

Artificial stone

ActiveUS20110067333A1Enhance natural appearanceLarge widthCovering/liningsNatural patternsRepeat patternEngineering
An artificial stone is disclosed for use in creating a covering for a supporting surface. The artificial stone includes a body for placement on the supporting surface, which is shaped for mating engagement with like stones with intermediate perimeter joints to produce a continuous surface covering. The stone has a facing surface on the body, which facing surface has a contour defining a surface area and is subdivided by at least one simulated joint into a major surface portion and at least one minor surface portion. The major surface portion is free of simulated joints and extends over at least about 60% of the total surface of the facing surface. The stone further includes at least one perimeter recess in the body for generating a gap between the stone and another like stone in mating engagement therewith, which gap is wider than adjacent the adjoining perimeter joint. Stones of this construction can easily be arranged in a regular, repeated pattern to generate a continuous covering for the supporting surface with the surface of the resulting covering having an irregular, natural appearance. The irregular top contours of the stones, the uneven division of the facing surface and the perimeter recesses and the resulting gaps between mating stones simulate the appearance of a natural stone surface covering for walkways, roadways, pavements or walls.
Owner:OLDCASTLE BUILDING PROD CANADA INC
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