Pattern editing and pattern generating method for electronic pattern machine

A pattern machine and pattern technology, applied in embroidery machines, embroidery machine mechanisms, floral stitch sewing machines, etc., can solve the problems of simple and single pattern generation, complicated pattern editing, etc., and achieve rich pattern patterns, pattern editing is simple and convenient, good economic effect

Inactive Publication Date: 2012-08-15
CHANGSHU RES INSTITUE OF NANJING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to provide a pattern editing and pattern generation method for an electronic pattern machine, aiming to solve the problems of simple and single patterns for pattern generation and cumbersome pattern editing

Method used

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  • Pattern editing and pattern generating method for electronic pattern machine
  • Pattern editing and pattern generating method for electronic pattern machine
  • Pattern editing and pattern generating method for electronic pattern machine

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Embodiment Construction

[0014] In order to make the purpose, technology and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and examples.

[0015] see figure 1 , is a flow chart of the pattern creation method of the pattern editing and pattern creation method of the electronic pattern machine of the present invention. The pattern generation method includes: the user can select different stitch distances when the electronic pattern machine is making a pattern, and the stitch distance is the distance between two adjacent stitch points, which is one of the most important parameters in sewing equipment. The optional stitch distance range of the electronic pattern machine used in the invention is 0.1-12.7mm, and the pattern formed by pattern making will be based on the stitch distance selected by the user. After the user has given a certain number of stitch points, these stitch points are called ...

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Abstract

The invention provides a pattern editing and pattern generating method for an electronic pattern machine. A pattern design is an important performance index of an electronic pattern machine control system. The pattern editing and pattern generating method disclosed by the invention provides a generation method of various pattern designs. The generation method comprises spatial migration, straight line, circle, circular arc, curve and polygon; on the basis, the generation method for pattern designs such as homodromous multiple sewing, converse multiple sewing, assistant sewing, front and back backstitch and overlapping sewing is realized, and the generation method for the complex pattern designs comprising various patterns is realized. The pattern generating method is integrated into pattern edition, and the pattern is automatically generated in the pattern edition. The pattern editing and pattern generating method has the technical effect that the abundant pattern design is applied, and the pattern can be simply and conveniently edited. A friendly editing interface is provided to support the dynamic edition and secondary edition of the pattern. The pattern editing and pattern generating method has the advantages of high operation efficiency and good pattern generating effect.

Description

technical field [0001] The invention relates to the technical field of light industrial machinery, in particular to a pattern editing and pattern generation method for an electronic pattern machine. Background technique [0002] At present, the patterns used by electronic pattern machines are mainly generated by professional pattern-making personnel through pattern-making software. Traditional patterns in the form of simple linear combinations are inconvenient and time-consuming, and can no longer meet the needs of producers. Pattern editing is also cumbersome and impossible. It is convenient and fast to realize complex pattern design. Contents of the invention [0003] The purpose of the present invention is to provide a pattern editing and pattern generation method for an electronic pattern machine, aiming at solving the problems of simple and single patterns for pattern generation and cumbersome pattern editing. [0004] The technical solution of the present invention ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D05B9/00D05B19/10D05C7/00
Inventor 孙瑜
Owner CHANGSHU RES INSTITUE OF NANJING UNIV OF SCI & TECH
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