Luminescent film, and preparation method and application thereof

A luminescent thin film and thin film preparation technology, which is applied in the direction of luminescent materials, chemical instruments and methods, vacuum evaporation coating, etc., can solve the problems of expensive equipment, low luminous intensity of luminescent film, complicated process, etc., and achieve stable luminous performance and improved Luminous intensity and luminous efficiency, the effect of simple process

Inactive Publication Date: 2014-06-25
OCEANS KING LIGHTING SCI&TECH CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition to their unique advantages, these methods have limitations such as complex processes, expensive equipment, and low luminous intensity of the prepared luminescent films.

Method used

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  • Luminescent film, and preparation method and application thereof
  • Luminescent film, and preparation method and application thereof
  • Luminescent film, and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044] Preparation of ceramic sputtering targets: BaO, MgO, SiO with a purity of 99.99% 2 , Fe 2 o 3 and CeO 2 The powders are uniformly mixed to obtain a mixture, and the total mass of the mixture is 100g, wherein the mass percentage of BaO is 24.7%, the mass percentage of MgO is 6.4%, and the SiO 2 The mass percentage content is 61.9%, Fe 2 o 3 The mass percentage content is 2%, CeO 2 The mass percentage content is 5%; after uniform mixing, it is sintered at 1200°C to form a Φ50×2mm ceramic target;

[0045] Substrate acquisition: Clean the sapphire substrate successively with acetone and absolute ethanol, then corrode it with concentrated phosphoric acid, rinse it with deionized water, dry it with high-purity nitrogen gas, and put it into a vacuum chamber;

[0046] Preparation of luminescent film: first place the ceramic sputtering target and the substrate in the vacuum chamber, and make the distance between the ceramic sputtering target and the substrate 70mm, and the...

Embodiment 2

[0049] Preparation of ceramic sputtering targets: BaO, MgO, SiO with a purity of 99.99% 2 , Fe 2 o 3 and CeO 2 The powders are uniformly mixed to obtain a mixture, and the total mass of the mixture is 100g, wherein the mass percentage of BaO is 20%, the mass percentage of MgO is 10%, and the SiO 2 The mass percentage content is 68.7%, Fe 2 o 3 The mass percentage content is 0.3%, CeO 2 The mass percentage content is 1%; after uniform mixing, it is sintered into a Φ50×2mm ceramic target at 1200°C;

[0050] Substrate acquisition: Clean the sapphire substrate successively with acetone and absolute ethanol, then corrode it with concentrated phosphoric acid, rinse it with deionized water, dry it with high-purity nitrogen gas, and put it into a vacuum chamber;

[0051] Preparation of luminescent film: first place the ceramic sputtering target and the substrate in the vacuum chamber, and make the distance between the ceramic sputtering target and the substrate 70mm, and then us...

Embodiment 3

[0053] Preparation of ceramic sputtering targets: BaO, MgO, SiO with a purity of 99.99% 2 , Fe 2 o 3 and CeO 2 The powders are uniformly mixed to obtain a mixture, and the total mass of the mixture is 100g, wherein the mass percentage of BaO is 30%, the mass percentage of MgO is 10%, and the SiO 2 The mass percentage content is 67%, Fe 2 o 3 The mass percentage content is 1%, CeO 2 The mass percentage content is 2%; after uniform mixing, it is sintered at 1200°C to form a Φ50×2mm ceramic target;

[0054] Substrate acquisition: Clean the sapphire substrate successively with acetone and absolute ethanol, then corrode it with concentrated phosphoric acid, rinse it with deionized water, dry it with high-purity nitrogen gas, and put it into a vacuum chamber;

[0055] Preparation of luminescent film: first place the ceramic sputtering target and the substrate in the vacuum chamber, and make the distance between the ceramic sputtering target and the substrate 50mm, and then use...

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Abstract

The invention provides a luminescent film, and a preparation method and an application thereof. The molecular formula of the luminescent film is Ba3MgSi2O8 : Fe<3+>, Ce<4+>, wherein the molar percentage of Fe<3+> is 0.004%-0.069%; and the molar percentage of Ce<4+> is 0.006%-0.047%. The luminescent film employs Ba3MgSi2O8 as a matrix and dopes Fe<3+> and Ce<4+> in the Ba3MgSi2O8 matrix, wherein both Fe<3+> and Ce<4+> act as active elements and constitute luminescent centers of the luminescent film, thereby improving the luminescent intensity and luminescent efficiency of the luminescent film. The preparation method of the luminescent film adopts a sintering method to prepare sputtering target materials; and the luminescent film is prepared via a magnetron sputtering mode, and thus the structural stability performance of the luminescent film is enhanced, thereby enabling the luminescent property of the luminescent film to be stable.

Description

technical field [0001] The invention belongs to the field of luminescent physical materials and display technology, and in particular relates to a luminescent thin film and its preparation method and application. Background technique [0002] Thin film electroluminescent display (TFELD) has attracted widespread attention and developed rapidly due to its advantages such as active light emission, full solid state, impact resistance, fast response, large viewing angle, wide application temperature, and simple process. Compared with the traditional display screen made of luminescent powder, the luminescent film shows strong advantages in terms of contrast, heat conduction, uniformity, adhesion to the substrate, and outgassing rate. Therefore, it is of great significance to prepare luminescent films with good performance. [0003] Existing preparation methods of luminescent thin films include laser-induced deposition and the like. In addition to their unique advantages, these m...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): C09K11/79H01L33/00C23C14/08C23C14/34
Inventor周明杰王平陈吉星钟铁涛
OwnerOCEANS KING LIGHTING SCI&TECH CO LTD