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A kind of array substrate and its preparation method, display device

An array substrate and array technology, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve the problems of reducing the display effect of the display device, affecting the black matrix shading effect on the drain, etc., to ensure the effect of the display effect.

Active Publication Date: 2016-10-05
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The inventors found that after the black matrix is ​​integrated on the array substrate, since the black matrix is ​​usually located between the drain and the pixel electrode of the thin film transistor, in order to realize the electrical connection between the drain and the pixel electrode, it needs to be formed after the black matrix is ​​formed. hole, the via hole will affect the shading effect of the black matrix on the drain, reducing the display effect of the display device

Method used

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  • A kind of array substrate and its preparation method, display device
  • A kind of array substrate and its preparation method, display device
  • A kind of array substrate and its preparation method, display device

Examples

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Embodiment 1

[0041] An embodiment of the present invention provides an array substrate, the array substrate includes:

[0042] It includes a plurality of pixel units arranged in an array on the base substrate 1, such as figure 1 As shown, the pixel unit includes a thin film transistor 2 and a pixel electrode 3, wherein a first black matrix 4 is arranged between the drain 21 of the thin film transistor 2 and the pixel electrode 3, and the first black matrix 4 A via hole 5 is formed, and the drain electrode 21 is connected to the pixel electrode 3 through the via hole 5, and the array substrate further includes:

[0043] The second black matrix 6 is arranged corresponding to the drain 21 and covers the via holes of the first black matrix 4 .

[0044] like figure 1 As shown, since the first black matrix 4 is used to fully shield the gate lines, data lines, and thin film transistors 2 and other structures that need to be shielded from light, the first black matrix 4 usually covers the thin f...

Embodiment 2

[0059] An embodiment of the present invention provides a method for preparing an array substrate, such as image 3 Shown, this preparation method comprises:

[0060] Step S101, forming a drain of a thin film transistor, a first black matrix, and a pixel electrode, wherein the first black matrix is ​​located between the drain and the pixel electrode, and the first black matrix is ​​formed with a via hole, The drain and the pixel electrode are connected through the via hole.

[0061] Step S102 , forming a second black matrix, the second black matrix is ​​arranged corresponding to the drain, and covers the via holes of the first black matrix.

[0062] Wherein, preferably, the size of the second black matrix 6 is larger than the size of the drain 21 .

[0063] Among them, specifically, according to figure 1 or figure 2 As shown in the structure of the array substrate, it can be seen that step S101 may include the following steps:

[0064] Step S1011, forming the drain of the...

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Abstract

The embodiment of the invention discloses an array substrate, a manufacturing method of the array substrate and a display device and relates to the technical field of display. The display effect of the display device can be ensured. The array substrate comprises a plurality of pixel units which are arranged in an array mode. Each pixel unit comprises a thin film transistor and a pixel electrode, wherein a first black matrix is arranged between the drain electrode of the thin film transistor and the pixel electrode, the first black matrix is provided with a via hole, and the drain electrode and the pixel electrode are connected through the via hole. The array substrate comprises second black matrixes. The second black matrixes correspond to the drain electrodes and shield the via holes of the first black matrixes.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display device. Background technique [0002] In recent years, people have higher and higher requirements on light transmittance, resolution, and power consumption of display devices, and display devices are developing towards high transmittance, high resolution, and low power consumption. Among them, the higher the resolution, the smaller the size of each pixel unit. When the side length of the pixel unit changes from tens of microns to more than ten microns, obviously, the size of the pixel unit has been greatly reduced. At this time , if the width of the black matrix dividing the pixel units remains unchanged, the black matrix will become obvious relative to the pixel units, which will affect the display effect of the display device. [0003] Therefore, BOA (Black matrix on Array) technology came into being. Si...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77G02F1/1335G02F1/1339
Inventor 刘冬妮吕敬
Owner BOE TECH GRP CO LTD