Substrate-processing device, substrate-processing method, and computer-readable recording medium on which substrate-processing program has been recorded

A technology for a substrate processing apparatus and a substrate processing method, which is applied to chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc. , The effect of suppressing the generation of water marks and particles
CN106463377AActive Publication Date: 2017-02-22TOKYO ELECTRON LTD
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Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
TOKYO ELECTRON LTD
Publication Date
2017-02-22

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Abstract

A substrate-processing device is provided with: a substrate rotation unit (11) for causing a substrate (3) to turn while the substrate (3) is held; a processing liquid feeding unit (13) for feeding a processing liquid to the substrate; and a substitution liquid feeding unit for feeding a substitution liquid, which is substituted for the processing liquid fed from the processing liquid feeding unit, to the substrate. When the substitution liquid feeding unit (14) is feeding the substitution liquid to the substrate, the processing liquid feeding unit (13) feeds the processing liquid to a position further on the outer periphery side of the substrate than the position at which the substitution liquid fed from the substitution liquid feed unit is fed onto the substrate, and a liquid film of the processing liquid is formed. The entirety of the surface of the substrate can be kept covered by a liquid film without increasing the amount of the substitution liquid consumed.
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Description

technical field

[0001] The present invention relates to a substrate processing apparatus for replacing processing liquid on a substrate with a replacement liquid, a substrate processing method, and a computer-readable recording medium in which a substrate processing program is recorded. Background technique

[0002] Conventionally, when manufacturing semiconductor components, flat panel displays, etc., various liquid processes such as cleaning and etching have been performed on substrates such as semiconductor wafers and liquid crystal substrates using substrate processing equipment.

[0003] For example, in a substrate processing apparatus that cleans a substrate, a chemical solution for cleaning is supplied to a rotating substrate, and the surface of the substrate is cleaned with the chemical solution. Thereafter, a rinse liquid is supplied to the central portion of the substrate, and the surface of the substrate is rinsed with the rinse liquid. In this rinsing process, a...

Claims

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