Face recognition-based attendance processing method and device

A face recognition and processing method technology, applied in the field of attendance, can solve the problems of low intelligence and poor attendance processing ability, and achieve the effect of solving low intelligence and improving attendance processing ability

Inactive Publication Date: 2018-08-24
上德智能科技(武汉)有限公司
View PDF13 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The main purpose of this application is to provide a face recognition-based attendance processing method and device to solve the problem of low intelligence caused by poor attendance processing capabilities

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Face recognition-based attendance processing method and device
  • Face recognition-based attendance processing method and device
  • Face recognition-based attendance processing method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] In order to make those skilled in the art better understand the solutions of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only The embodiments are part of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the scope of protection of the present application.

[0032] It should be noted that the terms "first", "second", etc. in the description and claims of the present application and the above drawings are used to distinguish similar objects, and are not necessarily used to describe a specific sequence or sequence. It is to be understood that the data so used are interchangeable un...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a face recognition-based attendance processing method and a face recognition-based attendance processing method device. The face recognition-based attendance processing methodcomprises the following steps: acquiring a first user face image by a first terminal; identifying identity information corresponding to the first user face image; judging whether vehicle information in the identity information is the same as vehicle information preset by the first terminal; if the vehicle information in the identity information is the same as the vehicle information preset by thefirst terminal, determining and recording first attendance information of a first user. Through the face recognition-based attendance processing method and the face recognition-based attendance processing method device, the technical problem of low intelligence degree caused by poor attendance processing capacity is solved.

Description

technical field [0001] The present application relates to the field of attendance, in particular, to a method and device for processing attendance based on face recognition. Background technique [0002] With the acceleration of urbanization and the opening of the "two-child" policy, the rigid demand for school buses continues to grow. According to data from China Automobile News, the total school bus market in my country reached 28,000 in 2016, a year-on-year increase of 5%. However, due to the diverse operating modes of school buses, the small number of dedicated school buses and the imperfection of relevant policies, school bus safety accidents frequently occur. Currently, there are 230 million primary and secondary school students, 100 million kindergarten students in China, and nearly 90 million students who need vehicles to get to and from school. [0003] With the rapid development of the Internet of Things, higher requirements are placed on wireless communication te...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G07C1/10G06K9/00
CPCG07C1/10G06V40/172
Inventor 陈诚李辉陈立洲
Owner 上德智能科技(武汉)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap