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High-purity anhydrous hydrofluoric acid sampling equipment and sampling method thereof

A technology of anhydrous hydrofluoric acid and sampling equipment, applied in sampling, sampling device, measuring device and other directions, can solve the problems of untreated waste gas, easily polluted samples, insufficient safety consideration, etc., to prevent pollution of samples and improve cleanliness. The effect of environment and temperature guarantee

Pending Publication Date: 2019-11-08
冠礼控制科技(上海)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, at present, most high-purity anhydrous hydrofluoric acid equipment is transplanted with industrial-grade hydrofluoric acid sampling methods, and most of them adopt open sampling, without considering the cleanliness of the space, and not controlling the environment of the sampling space, because pollutants are harmful to industrial-grade hydrofluoric acid. For hydrofluoric acid, there are no strict requirements for high-purity hydrofluoric acid
In addition, the existing

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  • High-purity anhydrous hydrofluoric acid sampling equipment and sampling method thereof
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  • High-purity anhydrous hydrofluoric acid sampling equipment and sampling method thereof

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Embodiment Construction

[0024] Below in conjunction with accompanying drawing, the present invention will be further described as follows:

[0025] As shown in the accompanying drawings, the present invention provides a high-purity anhydrous hydrofluoric acid sampling device, including a high-efficiency filter 1, a housing 2, a fixed bracket 4, an exhaust pipe 5, a liquid inlet joint 6, a sampling valve 7, Liquid inlet pipe 8, laminar flow plate 9, air extraction box 10, ice water box 12, sampling bottle 17, housing 2 is a hollow sealed housing, and a fixed bracket 4 is provided below the housing 2 and is supported by the fixed bracket 4. There is an air inlet on the top of the body 2, and a high-efficiency filter 1 is arranged at the air inlet. A laminar flow plate 9 is arranged at the inner bottom of the housing 2. The laminar flow plate 9 has a uniform porous structure, and an exhaust box 10 is arranged on the inner wall of the housing 2. , the air outlet of the laminar flow plate 9 is connected w...

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Abstract

The invention relates to high-purity anhydrous hydrofluoric acid sampling equipment. The equipment comprises a casing, the casing is supported by a fixing bracket, an air inlet in the top of the casing is provided with a high-efficiency filter, the inner bottom of the casing is provided with a laminar flow plate, and the laminar flow plate is of a uniform porous structure; the inner side wall of the casing is provided with an air suction box, an air outlet of the laminar flow plate is connected with an air inlet of the air suction box, an air suction pipe is connected to an air outlet of the air suction box, and air entering the high-efficiency filter is subjected to turbulence by the laminar flow plate and forms an air circulation loop through the air suction box and the air suction pipe;the casing is internally provided with an ice water box, a sampling bottle is placed in the ice water box, a sampling port of the sampling bottle is sequentially connected with a sampling valve and aliquid inlet joint through a liquid inlet pipeline, the sampling valve is arranged outside the casing, and high-purity anhydrous hydrofluoric acid enters the sampling bottle through the liquid inletjoint, the sampling valve and the liquid inlet pipeline; the high-purity anhydrous hydrofluoric acid sampling equipment greatly improves the cleanliness of a sampling environment, can prevent samplesfrom being contaminated in the sampling operation and reduces the damage of exhaust gas to personnel to the greatest degree.

Description

[technical field] [0001] The invention relates to the technical field of chemical equipment, in particular to a high-purity anhydrous hydrofluoric acid sampling equipment and a sampling method thereof. [Background technique] [0002] Manufacturing processes in industries such as chips and LCD panels are increasingly demanding refinement and high performance. High-purity hydrofluoric acid needs to be used in the production of the above industries. The current production process of high-purity hydrofluoric acid is to chemically pretreat anhydrous hydrofluoric acid, enter the rectification tower through rectification operation, and obtain anhydrous hydrofluoric acid after cooling. , absorb with ultrapure water in the absorption tower, and use methods such as controlling the spray density and gas-liquid ratio to further purify the high-purity hydrofluoric acid, then go through the ultrafiltration process below 0.2μm, and finally in a closed and clean environment (CLASS 100) Fil...

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Application Information

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IPC IPC(8): G01N1/14
CPCG01N1/14G01N2001/1418
Inventor 胡厚福薛贝贝简建至郭家宏
Owner 冠礼控制科技(上海)有限公司