A coating steam vertical air distribution device and its use method

Abstract

The present invention relates to the field of vacuum evaporation technology, and specifically to a coating steam vertical gas distribution device and a method of using the same, including a vacuum coating chamber and a gas distribution mechanism, the gas distribution mechanism is a vertical gas distribution mechanism, the upper part of a movable bracket is installed on both sides of the vertical gas distribution mechanism, a coating chamber sealing surface is provided on one side of the vacuum coating chamber connected to the vertical gas distribution mechanism, the vertical gas distribution mechanism is connected to the vacuum coating chamber through a gas distribution chamber flange to form a complete section of vacuum coating process equipment, the side of the vacuum coating chamber is provided with a coating chamber side connection flange, and multiple vacuum coating process equipment sections are connected through the coating chamber side connection flange to form various forms of equipment layout. The vertical gas distribution mechanism of the present invention realizes the change of the vertical upward steam flow form of the horizontal evaporator to the steam flow form that the horizontal evaporator can spray horizontally from side to side, solving the problem that the horizontal evaporator cannot spray sideways and distribute gas uniformly and can be adjusted up and down for the vertical substrate in the evaporation process.

Description

Technical Field

[0001] The present invention relates to the field of vacuum evaporation technology, and in particular to a vertical vapor distribution device for coating steam and a method for using the device. Background Art

[0002] Vacuum coating: A process in which materials are evaporated or sputtered physically or chemically under vacuum conditions and condensed on the surface of the coated part to form a thin film.

[0003] Steam particle flow: In a vacuum environment, solid materials sublime or evaporate into gas phase particle flow at a certain temperature, and fly to the surface of the substrate in the form of thermodynamic motion to solidify into a film.

[0004] Gas distribution: In the coating process, the flow field, flow velocity, temperature field, pressure, flow domain morphology and position of the gas phase steam particle flow are controlled to achieve a process effect of uniform or controllable gas distribution.

[0005] Due to the melting and liquefaction of the evaporated material in the vacuum evaporation process, the evaporator must be placed horizontally and the steam direction must be vertically upward. At the same time, the substrate must be placed horizontally and adjustable left and right and directly above the evaporation airflow.

[0006] The current vacuum evaporation process uses a horizontal placement of the evaporator and a vertical upward vapor flow, which cannot be used in process layouts where some substrates must be placed vertically. Summary of the invention

[0007] In view of the shortcomings of the existing background technology, the purpose of the present invention is to provide a coating steam vertical gas distribution device with a simple structure and easy use and a method of using the same. The setting of the vertical gas distribution mechanism of the present invention realizes the change of the vertical upward steam flow form of the horizontal evaporator to the steam flow form that the horizontal evaporator can spray horizontally from the side, solving the problem that the horizontal evaporator cannot spray sideways and adjust the uniform gas distribution for the vertical substrate in the evaporation process; the coating steam vertical gas distribution device has a simple structure, strong reliability, and low cost, and can achieve continuous production to save costs to a great extent and improve work efficiency.

[0008] To achieve the above, the technical solution of the present invention is: a vertical gas distribution device for coating steam, comprising a vacuum coating chamber and an gas distribution mechanism, the gas distribution mechanism is connected to the vacuum coating chamber, and is characterized in that: it also includes a movable bracket, the gas distribution mechanism is a vertical gas distribution mechanism, the upper part of the movable bracket is installed on both sides of the vertical gas distribution mechanism, a coating chamber sealing surface is provided on one side where the vacuum coating chamber is connected to the vertical gas distribution mechanism, the vertical gas distribution mechanism is connected to the vacuum coating chamber through the gas distribution chamber flange to form a complete section of vacuum coating process equipment, the side of the vacuum coating chamber is provided with a coating chamber side connecting flange, and a vacuum coating process equipment section composed of multiple vertical gas distribution mechanisms and the vacuum coating chamber is connected through the coating chamber side connecting flange to form various forms of design layouts.

[0009] The vertical gas distribution mechanism includes an element evaporator, an air control component, an air distribution box component and an air distribution chamber. The air distribution chamber is connected to the vacuum coating chamber, the movable bracket is symmetrically installed on both sides of the air distribution chamber, the air distribution box component is embedded in the air distribution chamber, one end of the air control component is connected to the air distribution box component, and the element evaporator is connected to the other end of the air control component.

[0010] Furthermore, the element evaporator includes a crucible, a crucible heater, an evaporator sealing flange, an evaporator temperature control sensor and a coating material. The crucible heater is coated on the outside of the crucible. The crucible is connected to the gas control chamber of the gas control assembly through the evaporator sealing flange. The evaporator temperature control sensor is installed on the crucible heater, and the coating material is placed in the crucible.

[0011] Furthermore, the air control assembly includes an air control chamber heater, a distribution valve, an air control chamber sealing flange, an air control room temperature control sensor and an air control chamber. An air control chamber heater for heating is provided on the outside of the air control chamber, a plurality of distribution valves are provided on one side of the air control chamber, and a plurality of air control chamber sealing flanges are provided on the other side of the air control chamber. The air control chamber is connected to the air distribution box of the air distribution box assembly through the air control chamber sealing flange, and the air control room temperature control sensor is installed on the air control chamber.

[0012] Furthermore, the air distribution box assembly includes multiple air distribution boxes, air distribution box temperature control sensors, air distribution box heaters, valve nozzles and air distribution manifolds. The air distribution boxes are arranged in the air distribution chamber, and each air distribution box is respectively provided with a valve nozzle. An air distribution box heater and an air distribution box temperature control sensor are installed on the side of the air distribution box extending out of the air distribution chamber. An air distribution manifold is provided in the air distribution box, one end of the air distribution manifold is connected to the air control chamber through the valve nozzle, and a nozzle is provided at the other end of the air distribution manifold.

[0013] Furthermore, the air distribution chamber is a shell structure, the open end of the air distribution chamber is connected to the air distribution chamber flange and the vacuum coating chamber, a long strip through groove is provided on the bottom plate of the air distribution chamber, and the air distribution box is arranged in the air distribution chamber through the long strip through groove.

[0014] Further, the air distribution manifold includes a first-layer manifold, a second-layer manifold, a third-layer manifold and a fourth-layer manifold, the first-layer manifold is provided with a second-layer manifold at both ends, the second-layer manifold is provided with a third-layer manifold at both ends, the third-layer manifold is provided with a fourth-layer manifold at both ends, and the first-layer manifold, the second-layer manifold, the third-layer manifold and the fourth-layer manifold are all U-shaped pipes. The air distribution manifold can be expanded to more layers or reduced to fewer layers as needed.

[0015] Furthermore, the vacuum coating chamber includes a coating chamber, a thin film substrate, a substrate heater and a coating chamber bracket. The coating chamber is sealed and connected to the gas distribution chamber through a coating chamber sealing surface. The coating chamber is installed on the coating chamber bracket. The substrate heater is arranged in the coating chamber. Both sides of the coating chamber are provided with long through holes for the thin film substrate to pass through.

[0016] The present invention also provides a method for using a vertical steam distribution device for coating, which is characterized in that: based on the above-mentioned vertical steam distribution device for coating, the method of use is as follows: the vertical air distribution mechanism is an independent subsystem, and when working, the movable bracket is pushed to connect and tighten the air distribution chamber flange of the vertical air distribution mechanism to the coating chamber sealing surface of the vacuum coating chamber, so that the vertical air distribution mechanism and the vacuum coating chamber form a complete section of vacuum coating process equipment; the vertical air distribution mechanism and the vacuum coating chamber form a complete section of vacuum coating process equipment, which can be connected through the coating chamber side connecting flange of the vacuum coating chamber, so that the equipment sections form a linear, arc-shaped, or saddle-shaped equipment layout in the form of an array.

[0017] Furthermore, the method of use also includes:

[0018] S1. Equipment operation preparation: First, connect and seal all components of the equipment and evacuate to the vacuum required by the process. Then, preheat the crucible, gas control chamber, gas distribution box and film substrate of the evaporator to 300-400℃;

[0019] S2. Using an element evaporator, the evaporation material is heated, melted, and vaporized in the evaporator under vacuum to generate a high-temperature vapor molecular flow, and temperature control feedback is obtained through a temperature sensor; specifically, a powdered or granular solid coating material is contained in a crucible in the evaporator, and a crucible heater heats the crucible to the vacuum saturated vapor pressure temperature of the film material. Under this vacuum degree / temperature, the solid film material melts and evaporates to generate an element molecular vapor particle flow;

[0020] S3. The gas control component heats and vaporizes the steam particle flow from the evaporator for the second time, and controls the opening of the distribution valve to adjust the steam flow at each outlet of the gas control chamber, and obtains temperature control feedback through the temperature sensor; specifically, the steam particle flow reaches the gas control chamber through the connecting pipe, is heated and pressurized for the second time by the gas control chamber heater, and then the valve core opening is controlled by each distribution valve to distribute the steam flow flowing into each valve nozzle;

[0021] S4. The gas distribution box assembly heats and vaporizes the steam particle flow from the gas control chamber for the third time, and sprays the high-temperature steam molecular flow onto the substrate surface through the gas distribution homogenization manifold and nozzle, and obtains temperature control feedback through the temperature sensor;

[0022] S5. The gas distribution chamber is movable so as to be connected to the vacuum coating chamber, and is used to provide the installation foundation and gas distribution vacuum environment of various components. It can also be used to install sputtering targets of other materials during process preparation. Specifically, the flow rate of the secondary heated and pressurized steam particle flow is proportionally controlled by the distribution valve, enters the vertically installed gas distribution box through the valve nozzle, and is heated and pressurized three times by the gas distribution box heater. The three-time heated and pressurized steam particle flow reaches the uniformly distributed nozzles on the front end of the gas distribution box through the gas distribution manifold and is ejected;

[0023] S6. The vacuum coating chamber provides installation conditions and vacuum environment for equipment and devices, and provides transmission operation conditions for upright, continuously moving substrates or flexible windable film substrates; specifically, three times heated and pressurized steam particles flow through the nozzle and are sprayed onto the surface of the vertical and slowly moving film substrate, and solidify into a film on the surface of the film substrate according to the film forming process or reaction process.

[0024] The advantages of adopting the technical solution of the present invention are:

[0025] 1. The arrangement of the vertical gas distribution mechanism of the present invention realizes the change of the vertical upward steam flow form of the horizontal evaporator into a steam flow form in which the horizontal evaporator can spray horizontally from the side, thus solving the problem that the horizontal evaporator cannot spray sideways and distribute gas uniformly and adjustable up and down for the vertical substrate in the evaporation process; the vertical gas distribution device for coating steam has a simple structure, strong reliability, and low cost, and can realize continuous production, greatly saving costs and improving work efficiency.

[0026] 2. The coating steam vertical gas distribution device of the present invention utilizes the composite control of steam thermal power and vacuum gradient to achieve good process performance, and the control method is as follows: a. Thermal motion generated by high-temperature steam particles generated in the crucible; b. The temperature of the steam airflow gradually increases as it flows through the tube cavity; c. The vacuum degree of the crucible, gas control chamber, gas distribution manifold, and coating cavity gradually increases. All three modes are conducive to maintaining the temperature and controlling the flow direction of the steam particle flow, and are conducive to the final formation of a residue-free injection of the high-temperature steam particle flow. The unique structural form of the coating steam vertical gas distribution device of the present invention, combined with its unique composite control technology, fully realizes the function of uniform gas distribution for vertical substrates in the evaporation process. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings in the following description are only for the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0028] Figure 1 It is a schematic diagram of the overall three-dimensional structure of the vertical steam distribution device for coating according to the present invention;

[0029] Figure 2 It is a schematic diagram of the components of the vertical steam distribution device for coating of the present invention;

[0030] Figure 3 It is a schematic diagram of the explosion of the vertical steam distribution device for coating according to the present invention;

[0031] Figure 4 The internal structure of the vertical steam distribution device for coating of the present invention is shown in FIG. Figure 1 ;

[0032] Figure 5 The internal structure of the vertical steam distribution device for coating of the present invention is shown in FIG. Figure 2 .

[0033] The marks in the above figure are:

[0034] 1. Element evaporator; 11. Crucible heater; 12. Evaporator sealing flange; 13. Evaporator temperature control sensor; 14. Crucible; 15. Coating material; 16. Steam particle flow; 17. Secondary heating and pressurized steam particle flow; 18. Tertiary heating and pressurized steam particle flow;

[0035] 2. Gas control components; 22. Gas control chamber heater; 23. Distribution valve; 24. Gas control chamber sealing flange; 25. Gas control room temperature control sensor; 26. Gas control chamber;

[0036] 3. Air distribution box assembly; 31. Air distribution box; 32. Air distribution box temperature control sensor; 33. Air distribution box heater; 34. Valve nozzle; 35. Air distribution manifold; 351. First-layer manifold; 352. Second-layer manifold; 353. Third-layer manifold; 354. Fourth-layer manifold; 36. Nozzle;

[0037] 4. Air distribution chamber; 41. Long strip through groove;

[0038] 5. Vacuum coating chamber; 51. Coating chamber; 52. Thin film substrate; 53. Substrate heater; 54. Coating chamber bracket;

[0039] 6. Vertical air distribution mechanism; 7. Sealing surface of coating chamber; 8. Flange of air distribution chamber; 9. Movable bracket; 10. Side connecting flange of coating chamber. DETAILED DESCRIPTION

[0040] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments.

[0041] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the present invention should be understood by people with ordinary skills in the field to which the present invention belongs. The "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0042] like Figures 1 to 5 As shown, a coating steam vertical air distribution device includes a vacuum coating chamber 5 and an air distribution mechanism, the air distribution mechanism is connected to the vacuum coating chamber 5, and is characterized in that it also includes a movable bracket 9, the air distribution mechanism is a vertical air distribution mechanism 6, the bottom of the movable bracket 9 is provided with a movable wheel, the movable bracket 9 is an L-shaped bracket, the upper part of the movable bracket 9 is installed on both sides of the vertical air distribution mechanism 6, the vacuum coating chamber 5 is connected to the vertical air distribution mechanism 6 on a side provided with a coating chamber sealing surface 7, the vertical air distribution mechanism 6 is connected to the vacuum coating chamber 5 through the air distribution chamber flange 8 to form a complete section of vacuum coating process equipment, the side of the vacuum coating chamber 5 is provided with a coating chamber side connection flange 10, and the vacuum coating process equipment section formed by multiple vertical air distribution mechanisms 6 and the vacuum coating chamber 5 is connected through the coating chamber side connection flange 10 to form a variety of equipment layouts. That is, the vacuum coating process equipment section formed by the vertical air distribution mechanism 6 and the vacuum coating chamber 5 is formed in an array form to form a linear, arc, saddle and other equipment layouts. The arrangement of the vertical gas distribution mechanism of the present invention realizes the change of the vertical upward steam flow form of the horizontal evaporator into a steam flow form in which the horizontal evaporator can spray horizontally from the side, thereby solving the problem that the horizontal evaporator cannot perform lateral spraying and vertically adjustable uniform gas distribution for the vertical substrate in the evaporation process; the vertical gas distribution device for coating steam has a simple structure, strong reliability, and low cost, and can realize continuous production, greatly save costs, and improve work efficiency.

[0043] The vertical gas distribution mechanism 6 includes an element evaporator 1, an air control component 2, an air distribution box component 3 and an air distribution chamber 4. The air distribution chamber 4 is connected to the vacuum coating chamber 5. The movable bracket 9 is symmetrically installed on both sides of the air distribution chamber 4. The air distribution box component 3 is embedded in the air distribution chamber 4. One end of the air control component 2 is connected to the air distribution box component 3, and the element evaporator 1 is connected to the other end of the air control component 2.

[0044] The element evaporator 1 includes a crucible 14, a crucible heater 11, an evaporator sealing flange 12, an evaporator temperature control sensor 13 and a coating material 15. The crucible heater 11 is coated on the outside of the crucible 14. The crucible 14 is connected to the gas control chamber 26 of the gas control component 2 through the evaporator sealing flange 12. The evaporator temperature control sensor 13 is installed on the crucible heater 11, and the coating material 15 is placed in the crucible 14. The element evaporator heats, melts, and vaporizes the evaporation material in the evaporator under vacuum to generate a high-temperature steam molecular flow, and obtains temperature control feedback through the temperature sensor.

[0045] The gas control assembly 2 includes a gas control chamber heater 22, a distribution valve 23, a gas control chamber sealing flange 24, a gas control room temperature control sensor 25 and a gas control chamber 26. The gas control chamber heater 22 for heating is provided on the outside of the gas control chamber 26. A plurality of distribution valves 23 are provided on one side of the gas control chamber 26. A plurality of gas control chamber sealing flanges 24 are provided on the other side of the gas control chamber 26. The gas control chamber 26 is connected to the gas distribution box 31 of the gas distribution box assembly 3 through the gas control chamber sealing flange 24. The gas control room temperature control sensor 25 is installed on the gas control chamber 26. The gas control assembly heats and vaporizes the steam particle flow from the evaporator for the second time, controls the opening of the distribution valve to adjust the steam flow at each outlet of the gas control chamber, and obtains temperature control feedback through the temperature sensor.

[0046] The air distribution box assembly 3 includes a plurality of air distribution boxes 31, an air distribution box temperature control sensor 32, an air distribution box heater 33, a valve nozzle 34 and an air distribution manifold 35. The air distribution box 31 is arranged in the air distribution chamber 4. A valve nozzle 34 is arranged on each air distribution box 31. The air distribution box heater 33 and the air distribution box temperature control sensor 32 are installed on the side of the air distribution box 31 extending out of the air distribution chamber 4. The air distribution manifold 35 is arranged in the air distribution box 31. One end of the air distribution manifold 35 is connected to the air control chamber 26 through the valve nozzle 34, and the other end of the air distribution manifold 35 is provided with a nozzle 36. The air distribution box assembly heats and vaporizes the steam particle flow from the evaporator for the second time, controls the opening of the distribution valve to adjust the steam flow at each outlet of the air control chamber, and obtains temperature control feedback through the temperature sensor;

[0047] The gas distribution chamber 4 is a shell structure, and the open end of the gas distribution chamber 4 is connected to the gas distribution chamber flange 8 and the vacuum coating chamber 5. A long strip through slot 41 is provided on the bottom plate of the gas distribution chamber 4, and the gas distribution box 31 is arranged in the gas distribution chamber 4 through the long strip through slot 41. The gas distribution manifold 35 includes a first-layer manifold 351, a second-layer manifold 352, a third-layer manifold 353 and a fourth-layer manifold 354. The two ends of the first-layer manifold 351 are provided with a second-layer manifold 352, the two ends of the second-layer manifold 352 are provided with a third-layer manifold 353, and the two ends of the third-layer manifold 353 are provided with a fourth-layer manifold 354. The first-layer manifold 351, the second-layer manifold 352, the third-layer manifold 353 and the fourth-layer manifold 354 are all U-shaped pipes. The gas distribution chamber assembly can be moved to connect to the vacuum coating chamber, provide the installation foundation of each component and the gas distribution vacuum environment, and can also be used to install sputtering targets of other materials during process preparation;

[0048] The vacuum coating chamber 5 includes a coating chamber 51, a film substrate 52, a substrate heater 53 and a coating chamber bracket 54. The coating chamber 51 is sealed and connected to the air distribution chamber 4 through the coating chamber sealing surface 7. The coating chamber 51 is installed on the coating chamber bracket 54. The substrate heater 53 is arranged in the coating chamber 51. Both sides of the coating chamber 51 are provided with long through holes for the film substrate 52 to pass through. The vacuum coating chamber assembly provides installation conditions and vacuum environment for equipment and devices, and provides transmission and operation conditions for upright, continuously moving substrates or flexible rollable film substrates (flexible rollable film substrates have a thickness of about several nm to hundreds of nm, a width of generally hundreds of mm to thousands of mm, and a length of generally hundreds of m to thousands of m).

[0049] Based on the above-mentioned vertical gas distribution device for coating steam, the present invention also provides a method for using the vertical gas distribution device for coating steam, and the method for using is as follows: the vertical gas distribution mechanism 6 is an independent subsystem, and when working, the movable bracket 9 is pushed to connect and tighten the gas distribution chamber flange 8 of the vertical gas distribution mechanism 6 and the coating chamber sealing surface 7 of the vacuum coating chamber 5, so that the vertical gas distribution mechanism 6 and the vacuum coating chamber form a complete section of vacuum coating process equipment; the vertical gas distribution mechanism 6 and the vacuum coating chamber form a complete section of vacuum coating process equipment, which can be connected through the coating chamber side connecting flange 10 of the vacuum coating chamber, so that the equipment sections form a linear, arc-shaped, and saddle-shaped equipment layout in the form of an array.

[0050] The method of use also includes:

[0051] S1. Equipment operation preparation: First, connect and seal all components of the equipment and evacuate to the process background vacuum degree. The vacuum degree in all chambers and pipelines is 5e -5 pa / 5e -4Pa; secondly, the crucible 14, gas control chamber 26, gas distribution box 31, film substrate 52 and other steam flow field related structures of the evaporator are preheated accordingly, and the preheating temperature of each structure is set from low to high according to the sequence of the flow field in which it is located, for example, 300-400°C;

[0052] S2. Using an element evaporator, the evaporation material is heated, melted, and vaporized in the evaporator under vacuum to generate a high-temperature steam molecular flow, and temperature control feedback is obtained through a temperature sensor;

[0053] Specifically, the evaporation control of the element evaporator part is as follows:

[0054] 1) The crucible 14 in the evaporator is filled with a powdered or granular solid coating material 15, and the crucible heater 11 heats the crucible 14 to the vacuum melting temperature t1 corresponding to the film material, for example 3e -4 Pa / 270℃;

[0055] 2) The crucible heater continues to heat the crucible to the vacuum saturated vapor pressure temperature t2 corresponding to the film material, for example 3e -4 Pa / 300℃;

[0056] 3) Under this vacuum / temperature condition, the solid film material melts and evaporates, generating a flow of film material elemental molecular vapor particles 16;

[0057] 4) The evaporator temperature control system is provided with temperature feedback by the evaporator temperature control sensor 13, and performs PID calculation to adjust the heater current / voltage to accurately control the heating temperature of the element evaporator (such as ±0.1℃), and realize accurate control of the flow rate of the steam particle flow 16;

[0058] S3. The gas control component heats and vaporizes the steam particle flow from the evaporator for the second time, controls the opening of the distribution valve to adjust the steam flow rate at each outlet of the gas control chamber, and obtains temperature control feedback through the temperature sensor;

[0059] Specifically, the evaporation control of the gas control component is as follows:

[0060] 1) The steam particle flow 16 reaches the gas control chamber 26 through the connecting pipe;

[0061] 2) The gas control chamber heater 22 performs secondary heating and pressurization on the gas control chamber 26 to t2+g2, further heating the steam particle flow (g2=secondary heating ratio coefficient, determined according to different material properties, for example: for a certain evaporation material g2=11%t2), forming a secondary heated and pressurized steam particle flow 17;

[0062] 3) Each distribution valve controls the sliding opening of the valve core to distribute and control the flow rate of the secondary heated and pressurized steam particles flowing into each valve nozzle 34;

[0063] 4) The gas control room temperature control system is provided with temperature feedback by the gas control room temperature control sensor 25, and performs PID calculation to adjust the heater current / voltage, so as to accurately control the heating temperature of the gas control chamber (such as ±0.1°C), and realize the accurate control of the flow rate of the secondary heating and pressurized steam particle flow 17;

[0064] S4. The gas distribution box assembly heats and vaporizes the steam particle flow from the gas control chamber for the third time, and sprays the high-temperature steam molecular flow onto the substrate surface through the gas distribution homogenization manifold and nozzle, and obtains temperature control feedback through the temperature sensor;

[0065] S5. The gas distribution chamber can be moved to connect to the vacuum coating chamber, which is used to provide the installation basis and gas distribution vacuum environment for various components. It can also be used to install sputtering targets of other materials during process preparation.

[0066] The specific controls are as follows:

[0067] 1) The particles of the secondary heated and pressurized steam flow 17 pass through the valve nozzle 34 and the connecting pipe and enter the gas distribution manifold 35 in the vertically arranged gas distribution box 31;

[0068] 2) The gas distribution box heater 33 heats the gas distribution box three times to t2+g3 (g3=three-time heating ratio coefficient, determined according to the vapor pressure characteristics of different evaporation materials, for example: for a certain evaporation material, g3=19%t2), forming a three-time heated and pressurized steam particle flow 18;

[0069] 3) The three-time heated and pressurized steam particles flow through the gas distribution manifold to the uniformly distributed nozzles on the front surface of the gas distribution box and are ejected;

[0070] 4) The temperature control system of the air distribution box provides temperature feedback from the temperature control sensor of the air distribution box, performs PID calculation to adjust the heater current / voltage, and accurately controls the heating temperature of the air distribution box (such as ±0.1℃), realizing the residual-free injection of the three-time heated and pressurized steam particle flow;

[0071] S6 vacuum coating chamber 5 provides installation conditions for equipment and devices, vacuum environment, and provides transmission operating conditions for the upright, continuously moving substrate or flexible rollable film substrate;

[0072] The specific controls are as follows:

[0073] 1) The tertiary heated and pressurized steam particle flow 18 is uniformly sprayed onto the surface of the vertically placed and slowly moving thin film substrate 52 through each vertically arranged nozzle 36;

[0074] 2) The vapor particle flow reaches the substrate surface and solidifies into a film according to the film forming process or reaction process;

[0075] 3) The substrate can be heated, cooled or set to normal temperature according to the substrate material, evaporation material and film forming process.

[0076] In the prior art, due to the melting and liquefaction of the evaporated material in the general evaporation process, the evaporator must be placed horizontally and the steam direction is also vertically upward, so the substrate must be placed horizontally directly above the evaporator. The coating steam vertical gas distribution device of the present invention realizes the conversion of the vertical upward steam of the horizontal evaporator into a vertical lateral horizontal injection form, solving the problem of uniform gas distribution for the vertical substrate by the horizontal evaporator in the evaporation process.

[0077] The coating steam vertical gas distribution device of the present invention utilizes the composite control of steam thermal power and vacuum gradient to achieve good process performance, and the control method is as follows: a. Thermal motion generated by high-temperature steam particles generated in the crucible; b. The temperature of the steam airflow gradually increases as it flows through the tube cavity; c. The vacuum degree of the crucible, gas control chamber, gas distribution manifold, and coating cavity gradually increases. All three modes are conducive to maintaining the temperature and controlling the flow direction of the steam particle flow, and are conducive to the final formation of a residue-free injection of the high-temperature steam particle flow.

[0078] The unique structural form of the coating steam vertical gas distribution device of the present invention, combined with its unique composite control technology, completely realizes the function of uniform gas distribution for the vertical substrate in the evaporation process.

[0079] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present invention is limited to these examples. Under the concept of the present invention, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity.

[0080] Therefore, any omission, modification, equivalent substitution, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A method for using a vertical vapor distribution device for coating, the vertical vapor distribution device for coating comprising a vacuum coating chamber (5) and a distribution mechanism, the distribution mechanism being connected to the vacuum coating chamber (5), characterized in that: It also includes a movable bracket (9), wherein the air distribution mechanism is a vertical air distribution mechanism (6), the upper part of the movable bracket (9) is installed on both sides of the vertical air distribution mechanism (6), a coating chamber sealing surface (7) is provided on a side of the vacuum coating chamber (5) connected to the vertical air distribution mechanism (6), the vertical air distribution mechanism (6) is connected to the vacuum coating chamber (5) via an air distribution chamber flange (8) to form a complete section of vacuum coating process equipment, the side of the vacuum coating chamber (5) is provided with a coating chamber side connection flange (10), the vertical air distribution mechanism (6) is an independent subsystem, and when working, by pushing the movable bracket (9), the vacuum coating process equipment section formed by the plurality of vertical air distribution mechanisms (6) and the vacuum coating chamber (5) is connected via the coating chamber side connection flange ( 10) docking to form various equipment layouts; the vertical gas distribution mechanism (6) includes an element evaporator (1), a gas control assembly (2), a gas distribution box assembly (3) and a gas distribution chamber (4); the element evaporator (1) includes a crucible (14), a crucible heater (11), an evaporator sealing flange (12), an evaporator temperature control sensor (13) and a coating material (15); the gas control assembly (2) includes a gas control chamber heater (22), a distribution valve (23), a gas control chamber sealing flange (24), a gas control room temperature control sensor (25) and a gas control chamber (26); the gas distribution box assembly (3) includes a plurality of gas distribution boxes (31), a gas distribution box temperature control sensor (32), a gas distribution box heater (33), a valve nozzle (34) and a gas distribution manifold (35); The method of use comprises: a. thermal movement of high-temperature steam particles generated in the crucible; b. gradually increasing the temperature of the steam flow through the tube cavity; c. gradually increasing the vacuum degree of the crucible, the gas control chamber, the gas distribution manifold, and the coating cavity; The specific control steps are as follows: S1. Equipment operation preparation: First, all components of the equipment are connected and sealed and evacuated to the vacuum degree required by the process. Then, the crucible (14), gas control chamber (26), gas distribution box (31), and film substrate (52) of the evaporator are preheated to 300-400°C; S2. Using an element evaporator, the evaporation material is heated, melted, and vaporized in the evaporator under vacuum to generate a high-temperature vapor molecular flow, and temperature control feedback is obtained through a temperature sensor; specifically, a powdered or granular solid coating material (15) is placed in a crucible (14) in the evaporator, and a crucible heater (11) heats the crucible (14) to the vacuum saturated vapor pressure temperature of the film material. At this vacuum degree / temperature, the solid film material melts and evaporates to generate an element molecular vapor particle flow (16); Specifically, the evaporation control of the element evaporator part is as follows: 1) A powdery or granular solid coating material (15) is placed in a crucible (14) in an evaporator, and a crucible heater (11) heats the crucible (14) to a vacuum melting temperature t1 corresponding to the coating material; 2) The crucible heater continues to heat the crucible to the vacuum saturated vapor pressure temperature t2 corresponding to the film material; S3. The gas control component heats and vaporizes the steam particle flow from the evaporator for a second time, controls the opening of the distribution valve to adjust the steam flow rate at each outlet of the gas control chamber, and obtains temperature control feedback through the temperature sensor; specifically, the steam particle flow (16) reaches the gas control chamber (26) through the connecting pipe, is heated and pressurized for a second time by the gas control chamber heater (22), and then the valve core opening of each distribution valve is controlled to distribute the steam flow rate flowing into each valve nozzle (34); Specifically, the evaporation control of the gas control component is as follows: 1) The steam particle flow (16) reaches the gas control chamber (26) through the connecting pipe; 2) The gas control chamber heater (22) performs secondary heating and pressurization on the gas control chamber (26) to t2+g2, further heating the steam particle flow, g2 is the secondary heating proportional coefficient, g2 is proportional to t2, and forms a secondary heated and pressurized steam particle flow (17); S4. The gas distribution box assembly heats and vaporizes the steam particle flow from the gas control chamber for the third time, and sprays the high-temperature steam molecular flow onto the substrate surface through the gas distribution homogenization manifold and nozzle, and obtains temperature control feedback through the temperature sensor; The specific controls are as follows: 1) The secondary heated and pressurized steam particle flow (17) passes through the valve nozzle (34) and the connecting pipe and enters the gas distribution manifold (35) in the vertically arranged gas distribution box (31); 2) The air distribution box heater (33) heats the air distribution box three times to t2+g3, where g3 is the three-time heating proportional coefficient and g3 is proportional to t2, thereby forming a three-time heated and pressurized steam particle flow (18).

2. The method for using the vertical vapor distribution device for coating according to claim 1, characterized in that: The gas distribution chamber (4) is connected to the vacuum coating chamber (5), the movable bracket (9) is symmetrically installed on both sides of the gas distribution chamber (4), the gas distribution box assembly (3) is embedded in the gas distribution chamber (4), one end of the gas control assembly (2) is connected to the gas distribution box assembly (3), and the element evaporator (1) is connected to the other end of the gas control assembly (2).

3. The method for using the vertical vapor distribution device for coating according to claim 2, characterized in that: The crucible heater (11) is coated on the outside of the crucible (14); the crucible (14) is connected to the gas control chamber (26) of the gas control component (2) via an evaporator sealing flange (12); an evaporator temperature control sensor (13) is mounted on the crucible heater (11); and a coating material (15) is placed in the crucible (14).

4. The method for using the vertical vapor distribution device for coating according to claim 3, characterized in that: An air control chamber heater (22) for heating is provided on the outside of the air control chamber (26); a plurality of distribution valves (23) are provided on one side of the air control chamber (26); a plurality of air control chamber sealing flanges (24) are provided on the other side of the air control chamber (26); the air control chamber (26) is connected to an air distribution box (31) of an air distribution box assembly (3) via the air control chamber sealing flange (24); and an air control room temperature control sensor (25) is mounted on the air control chamber (26).

5. The method for using the vertical vapor distribution device for coating according to claim 3, characterized in that: The air distribution boxes (31) are arranged in the air distribution chamber (4), and each air distribution box (31) is provided with a valve nozzle (34). An air distribution box heater (33) and an air distribution box temperature control sensor (32) are installed on one side of the air distribution box (31) extending out of the air distribution chamber (4). An air distribution manifold (35) is arranged in the air distribution box (31), one end of the air distribution manifold (35) is connected to the air control chamber (26) through the valve nozzle (34), and a nozzle (36) is arranged at the other end of the air distribution manifold (35).

6. The method for using the vertical vapor distribution device for coating according to claim 5, characterized in that: The gas distribution chamber (4) is a shell structure, the open end of the gas distribution chamber (4) is connected to the gas distribution chamber flange (8) and the vacuum coating chamber (5), a long strip through slot (41) is provided on the bottom plate of the gas distribution chamber (4), and the gas distribution box (31) passes through the long strip through slot (41) and is arranged in the gas distribution chamber (4).

7. The method for using the vertical vapor distribution device for coating according to claim 5, characterized in that: The air distribution manifold (35) comprises a first-layer manifold (351), a second-layer manifold (352), a third-layer manifold (353) and a fourth-layer manifold (354); the first-layer manifold (351) is provided with a second-layer manifold (352) at both ends; the second-layer manifold (352) is provided with a third-layer manifold (353) at both ends; the third-layer manifold (353) is provided with a fourth-layer manifold (354) at both ends; the first-layer manifold (351), the second-layer manifold (352), the third-layer manifold (353) and the fourth-layer manifold (354) are all U-shaped pipes.

8. The method for using the vertical vapor distribution device for coating according to claim 6, characterized in that: The vacuum coating chamber (5) comprises a coating chamber (51), a thin film substrate (52), a substrate heater (53) and a coating chamber bracket (54); the coating chamber (51) is sealed and connected to the gas distribution chamber (4) via a coating chamber sealing surface (7); the coating chamber (51) is mounted on the coating chamber bracket (54); the substrate heater (53) is arranged in the coating chamber (51); and long through holes for the thin film substrate (52) to pass through are provided on both sides of the coating chamber (51).

9. The method for using the vertical vapor distribution device for coating according to claim 1, characterized in that: The method of use is as follows: the vertical air distribution mechanism (6) is an independent subsystem. When working, the movable bracket (9) is pushed to connect and tighten the air distribution chamber flange (8) of the vertical air distribution mechanism (6) and the coating chamber sealing surface (7) of the vacuum coating chamber (5), so that the vertical air distribution mechanism (6) and the vacuum coating chamber form a complete section of vacuum coating process equipment; the vertical air distribution mechanism (6) and the vacuum coating chamber form a complete section of vacuum coating process equipment, which can be connected through the coating chamber side connection flange (10) of the vacuum coating chamber, so that the equipment sections form a linear, arc-shaped, or saddle-shaped equipment layout in the form of an array.

10. The method for using the vertical vapor distribution device for coating according to claim 1, characterized in that: The method of use also includes: S5. The gas distribution chamber is movable so as to be connected to the vacuum coating chamber, and is used to provide a foundation for the installation of various components and a gas distribution vacuum environment. It can also be used to install sputtering targets of other materials during process preparation. Specifically, the flow rate of the secondary heated and pressurized steam particle flow (17) is proportionally controlled by the distribution valve (23), enters the vertically installed gas distribution box (31) through the valve nozzle (34), is heated and pressurized three times by the gas distribution box heater (33), and the three-time heated and pressurized steam particle flow (18) reaches the nozzles (36) evenly distributed on the front end surface of the gas distribution box through the gas distribution manifold (35) and is ejected; S6. The vacuum coating chamber (5) provides installation conditions and a vacuum environment for equipment and devices, and provides transmission and operation conditions for an upright, continuously moving substrate or a flexible rollable film substrate; specifically, the three-time heated and pressurized steam particle flow (18) is sprayed through the nozzle (36) onto the surface of the vertical and slowly moving film substrate (52), and solidifies into a film on the surface of the film substrate (52) according to a film forming process or a reaction process.

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