Inductively coupled plasma emission spectrum sampling device

Abstract

An inductively coupled plasma emission spectrum sampling device relates to the technical field of instrument analysis and mainly comprises a thermal evaporator, an atomizing chamber, a conveying pipeline and an ICP torch pipe which are sequentially connected, the atomizing chamber is respectively connected with the thermal evaporator and an external air source, and a penetrating channel communicated with an atomizing cavity in the atomizing chamber is arranged in the thermal evaporator in a penetrating manner. The sample clamp and the heating pipe can be coaxially moved to be fixed in the penetrating channel, the heating pipe can be heated by a heating coil in the penetrating channel, and a sample feeding air channel is arranged on the sample clamp and connected with a sample air pipe arranged on the thermal evaporator; external carrier gas can blow a sample in the heating pipe into the atomization cavity along the sample feeding gas channel and the sample gas pipe; according to the invention, the atomizing chamber with large volume is reserved for ensuring uniform dispersion of the sample in the carrier gas, condensation and deposition of the atomized or evaporated sample on the inner wall of the sampling device can be effectively avoided, and meanwhile, the dispersion effect of the sample is not influenced, so that the sampling quality is improved.

Description

Technical Field

[0001] The invention relates to the technical field of instrument analysis, and in particular to an inductively coupled plasma emission spectrum sampling device. Background Art

[0002] Inductively coupled plasma spectroscopy (ICP-OES) is a common analytical method in elemental analysis tests. It has the characteristics of low detection limit, high sensitivity, good precision, and can perform multi-element determination at the same time. It has a large dynamic linear width range, which makes it widely used in related analytical science fields.

[0003] Among them, the sampling process of introducing samples into the inductively coupled plasma is one of the key factors to ensure the quality of the test results, and it is also the weak link in the entire analysis process. At present, the conventional sampling method is the solution atomization method, which mainly uses an atomizer to atomize a dilute solution containing the element to be tested into an aerosol, and the aerosol sample is carried to the torch by a carrier gas to generate plasma for analysis. In this method, the dispersion quality of the aerosol sample is greatly affected by the atomization effect of the atomizer, and there are problems such as large sample consumption, low atomization efficiency, and easy clogging, which greatly limits the application of this method.

[0004] In order to solve the many shortcomings of solution atomization, the industry has developed a thermal injection method based on solution atomization, which mainly includes thermal spray injection and thermal evaporation injection. The basic principle is to heat the sample or sample solution through a heat source. After the sample solution is heated, it is converted into a thermal spray aerosol composed of solvent particles and sample particles. After the sample is heated alone, it can be broken down into smaller particles or directly converted into a dry aerosol composed of particle vapor. It can be seen that compared with conventional solution atomization injection, thermal injection can effectively reduce the amount of sample consumed, significantly reducing the possibility of equipment clogging. At the same time, the movement speed of the sample particles is accelerated after being heated, and the atomization efficiency can also be significantly improved.

[0005] It is worth noting that the hot injection method has higher requirements for thermal evaporation and aerosol transmission systems. The heated atomized or evaporated samples are prone to condensation or deposition when they contact the lower temperature parts of the device such as the container wall, resulting in a decrease in the sample vapor density, thereby affecting the accuracy of the subsequent analysis results. In this regard, the conventional solution is to reduce the internal volume of the injection device as much as possible, that is, to use a smaller evaporator and a shorter transmission tube, so that the evaporated atomized sample is introduced into the torch tube for subsequent analysis before condensation and deposition. However, when the internal volume of the injection device is relatively small, on the one hand, the inner wall of the equipment channel is more likely to contact the atomized or evaporated sample, and the possibility of condensation and deposition is also increased accordingly. At the same time, since the channel allowing the fluid to pass through is reduced, once the deposit appears, it will be more likely to be blocked, and more costs will be required for maintenance; on the other hand, the volume of the injection part is small, which will cause the atomized and evaporated sample to be introduced into the subsequent analysis equipment before it is fully dispersed in the carrier gas flow to be uniform, and it is easier to produce carbon deposits in high-temperature parts such as the torch tube, affecting the normal operation of the analysis equipment. Summary of the invention

[0006] In view of this, the present invention aims to provide an inductively coupled plasma emission spectrometry sampling device, which can reduce the condensation and deposition of atomized or evaporated samples as much as possible while ensuring the inner wall volume of the sampling device, thereby ensuring the sampling effect of the thermal sampling method.

[0007] In order to solve at least one of the above technical problems, the technical solution provided by the present invention is: An inductively coupled plasma emission spectrometry sampling device comprises a thermal evaporator, an atomization chamber, a delivery pipeline, and an ICP torch, wherein the thermal evaporator, the atomization chamber, the delivery pipeline, and the ICP torch are connected in sequence, wherein the atomization cavity inside the atomization chamber is cylindrical, a continuous reduction is provided on one side of the atomization cavity, a side of the atomization chamber away from the continuous reduction is connected to the thermal evaporator, and a main gas pipe connecting an external gas source and the atomization cavity is also provided on the surface of the atomization chamber; The thermal evaporator is provided with a through channel coaxial with the atomization chamber, connecting the side in contact with the atomization chamber and the side away from the atomization chamber, and the inside of the through channel can accommodate the sample clamp to move coaxially to fix, wherein the sample clamp is a columnar structure, and the side close to the atomization chamber is detachably coaxially connected to the heating tube, and the side away from the atomization chamber is connected to a handle; At least part of the through channel is a metal frame and a heating coil which are sequentially arranged inside and outside, wherein the metal frame is a frame structure, and its internal frame can be in contact with and cooperate with the outer surface of the heating tube when the sample clamp is fixed; The sample clamp is provided with a sample delivery air channel that can connect the inside and outside of the heating tube. The conveying air flow direction of the sample delivery air channel in the heating tube coincides with the axis of the heating tube and points to the continuous reduction point. A sample air pipe that can be connected to an external air source is also provided inside the thermal evaporator. When the sample clamp is moved to a fixed position, the sample delivery air channel and the sample air pipe can be connected.

[0008] One embodiment of the present invention is that a plurality of side tubes connecting an external air source and an atomizing cavity are obliquely arranged on the surface of the atomizing chamber, so that the direction of the airflow ejected from the side tubes can go around the inner wall of the atomizing cavity along the thread line toward the continuous reduction in diameter, and the side tubes are distributed around the circumference of the atomizing chamber in a circular ring structure, and a plurality of groups of the circular ring structures are distributed between the main air pipe and the continuous reduction in diameter.

[0009] Furthermore, a gas distributor is provided outside the thermal evaporator, the gas distributor is connected to an external gas source through an air inlet pipe, and the sample gas pipe, the main gas pipe and the side pipe are all connected to the gas distributor.

[0010] Furthermore, the side tubes are all connected to a connecting sandwich tube outside the atomization chamber, wherein the connecting sandwich tube is a circular tube arranged around the outside of the atomization chamber, a sandwich is arranged in the wall of the circular tube and is connected to the side tube, and the sandwich of the connecting sandwich tube is connected to the gas distributor through a side air pipe.

[0011] Furthermore, a gas heater is provided on the air intake pipe.

[0012] An implementation manner of the present invention is that at least a portion of the sample clamp on one side close to the atomization chamber is a reduced diameter portion, and the heating tube is connected to the reduced diameter portion.

[0013] Furthermore, at least a part of the through channel on a side away from the atomization chamber is a sample injection rack, and the sample injection rack is an internally hollow frame structure, wherein the hollow part matches the maximum width of the sample clamp.

[0014] In one embodiment of the present invention, at least a portion of the through channel on a side close to the atomization chamber is a continuously reduced diameter portion.

[0015] The technical effects of the present invention are: The present invention retains a spray chamber with a relatively large volume to ensure uniform dispersion of the sample in the carrier gas, and can generate a hot carrier gas curtain with a certain temperature on the inner wall of the spray chamber. Compared with the conventional hot injection method, it can effectively avoid condensation and deposition of the atomized or evaporated sample on the inner wall of the injection device, and will not affect the dispersion effect of the sample, thereby improving the injection quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0017] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 Schematic diagram of the trajectory of the airflow ejected from the side pipe in the atomizing cavity in the present invention; Figure 3 Schematic diagram of the distribution of the side tubes on the vertical cross section of the atomization chamber in the present invention; Figure 4 Schematic diagram of the distribution of the side tubes on the horizontal cross section of the atomization chamber in the present invention; In the figure, 1-thermal evaporator, 2-atomization chamber, 3-injection rack, 4-sample clamp, 5-handle, 6-heating tube, 7-sample delivery airway, 8-metal rack, 9-heating coil, 10-inlet pipe, 11-gas heater, 12-gas distributor, 13-sample air pipe, 14-main air pipe, 15-side pipe, 16-connecting interlayer pipe, 17-side air pipe, 18-through channel, 19-atomization cavity, 20-continuous reduction, 21-delivery pipeline, 22-ICP torch, a1-horizontal plane projection of side tube flow, a2-axis direction of atomization air flow, a3-horizontal axial angle, b1-vertical plane projection of side tube flow, b2-vertical plane tangent of side tube contact point, b3-projection tangent angle, c-side tube air flow trajectory. DETAILED DESCRIPTION

[0018] The present invention will be further described in detail below in conjunction with the embodiments and drawings.

[0019] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Therefore, the following detailed description of the embodiments of the present invention provided in the drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention.

[0020] See also Figure 1, an inductively coupled plasma emission spectrometry sampling device, comprising a thermal evaporator 1, an atomization chamber 2, a delivery pipeline 21, and an ICP torch 22, wherein the thermal evaporator 1, the atomization chamber 2, the delivery pipeline 21, and the ICP torch 22 are connected in sequence, and this connection method is a basic setting method of the ICP sampling device, wherein the atomization cavity 19 inside the atomization chamber 2 is cylindrical, and a continuous reduction 20 is provided on one side of the atomization cavity 19 to form a funnel structure, and its tip is connected to the pipeline of the subsequent ICP torch, and the side of the atomization chamber 2 away from the continuous reduction 20 is connected to the thermal evaporator 1, and a main gas pipe 14 connecting an external gas source and the atomization cavity 19 is also provided on the surface of the atomization chamber 2, and the main gas pipe 14 is used to provide a large flow carrier gas flow as the main gas flow, and the thermal atomization or thermal evaporation of the sample is carried out in the thermal evaporator 1, and after the atomized sample is introduced into the atomization cavity 19, it is carried to the continuous reduction 20 by the main carrier gas flow provided by the main gas pipe 14 and enters the subsequent delivery pipeline 21.

[0021] A through channel 18 coaxial with the atomization chamber 19 is provided in the thermal evaporator 1 to connect the side in contact with the atomization chamber 19 and the side away from the atomization chamber 2. The through channel 18 can accommodate the sample clamp 4 to move coaxially to be fixed, wherein the sample clamp 4 is a columnar structure, and the side close to the atomization chamber 19 is detachably coaxially connected to the heating tube 6, and the side away from the atomization chamber 19 is connected to the handle 5. The sample clamp 4 is used to fix the heating tube 6. When setting, one side of the heating tube 6 is used as the front end, and the handle 5 is held to push the sample clamp 4 and the heating tube 6 into the through channel 18 in the direction toward the atomization chamber 19. Obviously, in order to ensure the sealing effect of the through channel 18 at the heating tube 6 during the injection operation, the sample clamp 4 should be able to just fill the cross-section of the through channel 18. In the present embodiment, at least a portion of the sample clamp 4 on the side close to the atomization chamber 19 is a reduced diameter, and the heating tube 6 is connected to the reduced diameter. The reduced diameter facilitates the fixation of the sample clamp 4. The through-channel 18 only needs to refer to the conventional design and provide a reduced diameter structure that cooperates with the reduced diameter of the sample clamp 4 to fix the sample clamp 4 pushed there, while the heating tube 6 always remains at the front end in the moving direction of the sample clamp 4. In addition, at least a portion of the through-channel 18 on the side away from the atomization chamber 19 is a sample injection rack 3. The sample injection rack 3 is an internally hollow frame structure, wherein the hollow portion cooperates with the maximum width of the sample clamp 4. The sample injection rack 3 is mainly used to support the sample clamp 4. Its structure may adopt a circular tube or a rectangular frame, and its interior cooperates with the sample clamp 4 to achieve support for the sample clamp 4. In some embodiments, at least a portion of the through-channel 18 on the side close to the atomization chamber 19 is a continuous reduced diameter, forming a structure such as Figure 1 The funnel-shaped structure shown is conducive to the sample airflow entering the atomization chamber 19.

[0022] At least part of the through-channel 18 is a metal frame 8 and a heating coil 9 which are sequentially sleeved inside and outside, wherein the metal frame 8 is a frame structure, and its internal frame can contact and cooperate with the outer surface of the heating tube 6 when the sample holder 4 is fixed. After the sample holder 4 and the heating tube 6 are pushed into the through-channel 18 and fixed, the heat generated by the heating coil 9 is transferred to the heating tube 6 through the metal frame 8, raising its temperature, thereby evaporating the sample inside the heating tube 6, wherein the metal frame 8 can be made of a metal material with good thermal conductivity, and its shape can be set to a tubular frame structure that can fit exactly with the outside of the heating tube 6, so as to achieve support and heat conduction for the heating tube 6. Referring to the prior art, the heating tube 6 can be a graphite tube or a heat-resistant quartz tube, and a concave surface is set inside it for accommodating a solution or a solid sample, and one side of the tube body is fixed on the sample holder 4, and the other side points to the atomization chamber 19.

[0023] The sample holder 4 is provided with a sample delivery air channel 7 which can connect the inside and outside of the heating tube 6. The conveying air flow direction of the sample delivery air channel 7 in the heating tube 6 coincides with the axis of the heating tube 6 and points to the continuous reduction point 20. The thermal evaporator 1 is also provided with a sample air pipe 13 which can be connected to an external air source. When the sample holder 4 is moved to be fixed, the sample delivery air channel 7 can be connected to the sample air pipe 13. When the sample holder 4 and the heating tube 6 are pushed into the through channel 18 until they are fixed, the carrier air flow of the external air source can be filled into the heating tube 6 from the side of the sample holder 4 through the sample air pipe 13 and the sample delivery air channel 7, thereby carrying the heated atomized or evaporated product in the heating tube 6 into the atomization cavity 19.

[0024] In this embodiment, the surface of the atomizing chamber 2 is inclinedly provided with a plurality of side tubes 15 connecting the external air source and the atomizing cavity 19, so that the airflow direction ejected from the side tubes 15 can go around the inner wall of the atomizing cavity 19 along the thread line to the continuous reduction point 20, see Figure 2 The direction of the airflow ejected from the single side tube 15 is shown as the side tube airflow trajectory c in the figure. It can be seen that in order to produce the airflow effect shown in the figure, the inclined side tube 15 should meet the vertical section of the atomizing cavity 19. Figure 3The content shown, that is, the smaller angle between the vertical plane projection b1 of the side tube flow direction and the tangent b2 of the vertical plane of the side tube contact point - the projection tangent angle b3 is not 90°. The vertical plane projection b1 of the side tube flow direction is the projection of the jet direction of the side tube 15 on the vertical section of the atomizing chamber 19, and the vertical plane tangent b2 of the side tube contact point is the tangent of the contact point between the side tube 15 and the atomizing chamber 19 on the vertical section of the atomizing chamber 19. If the projection tangent angle b3 is 90°, the carrier gas flow direction of the side tube 15 will directly point to the central axis of the atomizing chamber 19, which is different from the conventional surround There is no difference in the air intake setting, and the carrier gas flow of the side tube 15 set on the opposite side will cancel each other out, so it cannot achieve the effect of making the air flow move along the thread line on the inner wall. Therefore, the projected tangent angle b3 needs to be set to an acute angle, preferably an acute angle less than 45°, so that the carrier gas flow direction can point to the inner wall of the atomization chamber 19. Since the inner wall of the atomization chamber 19 is a circular surface, the actual speed direction of the carrier gas flow will always be maintained on the tangent line of the contact point due to the influence of the circular surface. Therefore, the movement direction of the carrier gas flow is a circular motion on the vertical section of the atomization chamber 19. At the same time, the distribution of the side tube 15 on the horizontal cross section of the atomizing chamber 19 should satisfy Figure 4 The content shown, Figure 4 It can be regarded as observing the atomizing chamber 19 from a top-down perspective, wherein the smaller angle between the horizontal plane projection a1 of the side tube flow direction and the axial direction a2 of the atomizing airflow on the horizontal plane - the horizontal axial angle a3 should be an acute angle, the horizontal plane projection a1 of the side tube flow direction is the projection of the jet direction of the side tube 15 on the horizontal section of the atomizing chamber 19, and the axial direction a2 of the atomizing airflow can be regarded as the flow direction of the airflow ejected from the heating tube 6. When the horizontal axial angle a3 is an acute angle, the jet direction of the side tube 15 can generate a motion component in the direction of the axial direction a2 of the atomizing airflow. Combined with the above-mentioned setting mode of the side tube 15 generating a circular motion airflow on the vertical section of the atomizing chamber 19, the following is adopted: Figure 3 and Figure 4 When the side tube 15 is arranged at the angle shown in FIG. Figure 2 The thread-like airflow directed toward the continuous reduction 20 is shown.

[0025] On this basis, the side tubes 15 are distributed in a circular ring structure around the atomizing chamber 2 in an interval manner, and multiple groups of the circular ring structures are distributed between the main air pipe 14 and the continuous reduction 20. The airflows of the multiple groups of side tubes 15 will be combined along the inner wall of the atomizing cavity 19 to form a vortex-shaped air curtain, separating the inner wall of the atomizing cavity 19 from the middle part of the atomizing cavity. Obviously, in order to make the carrier gas flows ejected from each side tube 15 converge into a vortex-shaped air curtain instead of canceling each other out, the side tubes 15 located on the same circular ring structure should be as follows: Figure 3 As shown, the carrier gas flows of all the side tubes 15 have the same circular motion direction on the vertical cross section of the atomization chamber 19, so that the carrier gas flows doing circular motion converge instead of canceling each other out.

[0026] The side tubes 15 are all connected to the connecting interlayer tube 16 outside the atomization chamber 2, wherein the connecting interlayer tube 16 is a circular tube arranged around the outside of the atomization chamber 2, and a interlayer is arranged in the wall of the circular tube to communicate with the side tube 15, and the interlayer of the connecting interlayer tube 16 is connected to the gas distributor 12 through the side air pipe 17. The carrier gas flow is filled into the connecting interlayer tube 16 by the side air pipe 17, so that all the side tubes 15 can inject gas into the inside of the atomization cavity 19 at the same time.

[0027] In addition, a gas distributor 12 is provided outside the thermal evaporator 1. The gas distributor 12 is connected to an external gas source through an air inlet pipe 10, and the sample gas pipe 13, the main gas pipe 14, and the side pipe 15 are all connected to the gas distributor 12. The gas distributor 12 can control the injection sequence and flow rate of the carrier gas flow in each part of the sample gas pipe 13, the main gas pipe 14, and the side pipe 15.

[0028] In some embodiments, a gas heater 11 is provided on the air inlet pipe 10 connected to the external air source, which can preheat the carrier gas flow, further keep the atomized and evaporated samples at a higher temperature, and reduce the possibility of condensation or deposition due to low temperature.

[0029] In summary, the use of the present invention is as follows: During the injection operation, if thermal atomization injection is performed, the sample solution is injected into the heating tube 6, and if thermal evaporation injection is performed, the solid sample is loaded into the heating tube 6, and the sample holder 4 loaded with the sample is sent along the injection rack 3 to the through channel 18, so that the heating tube 6 is in contact with and fixed to the metal rack 8; After that, the heating coil 9 is controlled to heat the heating tube 6 to increase the temperature, so that the sample is heated and atomized or evaporated. At this time, the gas distributor 12 divides the gas of the carrier gas source into multiple parts, and the gas of the carrier gas source is heated in the gas heater 11 to be a hot carrier gas with a certain temperature, wherein a part of the hot carrier gas enters the heating tube 6 along the sample gas pipe 13 and the sample delivery gas channel 7, and blows the sample mist or steam filled in the heating tube 6 into the atomization cavity 19 through the through channel 18, ensuring that the sample steam can completely enter the atomization cavity 19. Most of the hot carrier gas enters the atomization cavity 19 from the main gas pipe 14 and moves toward the continuous reduction 20, and another part of the hot carrier gas moves along the multiple groups of side tubes 15, and moves along the inner wall surface of the atomization cavity 19 in a threaded manner according to the jet direction of the aforementioned side tubes 15 toward the continuous reduction 20. The various devices in the above process can be coordinated and controlled by the central control system commonly used in the prior art, ensuring that the sample aerosol can smoothly reach the ICP torch 22 along the delivery pipeline 21 for analysis and testing.

[0030] In this process, the air intake carrier gas flow of the multiple groups of side tubes 15 can be combined into an air flow vortex that is close to the inner wall of the atomization chamber 19 and points to the continuous reduction point 20, while the sample-carrying carrier gas flow blown into the atomization chamber 19 by the heating tube 6 moves along the central axis of the atomization chamber 19 toward the continuous reduction point 20, thereby avoiding the contact between the sample aerosol and the inner wall of the atomization chamber 2. At the same time, since the carrier gas has a certain temperature, the probability of condensation or deposition of the sample aerosol inside the atomization chamber 2 is effectively reduced, thereby ensuring the vapor density of the sample. In addition, the atomization chamber 19 provides sufficient space for the sample aerosol to be fully dispersed in the carrier gas flow. Multi-airflow sampling can avoid the sample aerosol from contacting the inner wall of the atomization chamber 2 as much as possible, while allowing the sample aerosol to be fully dispersed due to the disturbance of the airflow, thereby reducing the errors and local carbon deposition that may occur due to excessive local sample concentration in the subsequent analysis process, thereby improving the sampling quality.

[0031] In the description of the present invention, it should be pointed out that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside" and "outside" etc. indicating directions or positional relationships are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and should not be understood as a limitation on the present invention.

[0032] The above is only a preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the embodiments of the present invention should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. An inductively coupled plasma emission spectroscopy sampling device, characterized in that: The invention comprises a thermal evaporator (1), an atomization chamber (2), a delivery pipeline (21), and an ICP torch (22), wherein the thermal evaporator (1), the atomization chamber (2), the delivery pipeline (21), and the ICP torch (22) are connected in sequence, wherein the atomization cavity (19) inside the atomization chamber (2) is cylindrical, a continuous reduction portion (20) is provided on one side of the atomization cavity (19), a side of the atomization chamber (2) away from the continuous reduction portion (20) is connected to the thermal evaporator (1), and a main gas pipe (14) connecting an external gas source and the atomization cavity (19) is also provided on the surface of the atomization chamber (2); The thermal evaporator (1) is provided with a through channel (18) coaxial with the atomizing chamber (19) and connected with a side in contact with the atomizing chamber (19) and a side away from the atomizing chamber (2), and the through channel (18) can accommodate a sample holder (4) to move coaxially to be fixed, wherein the sample holder (4) is a columnar structure, and a heating tube (6) is detachably coaxially connected to the side close to the atomizing chamber (19), and a handle (5) is connected to the side away from the atomizing chamber (19); At least a portion of the through channel (18) is a metal frame (8) and a heating coil (9) which are sequentially sleeved inside and outside, wherein the metal frame (8) is a frame structure, and its internal frame can be in contact with and cooperate with the outer surface of the heating tube (6) when the sample holder (4) is fixed; The sample holder (4) is provided with a sample delivery air passage (7) capable of communicating with the inside and outside of the heating tube (6); the conveying airflow direction of the sample delivery air passage (7) in the heating tube (6) coincides with the axis of the heating tube (6) and points to the continuous reduction point (20); a sample air pipe (13) capable of connecting to an external air source is also provided inside the thermal evaporator (1); when the sample holder (4) is moved to be fixed, the sample delivery air passage (7) and the sample air pipe (13) can be communicated.

2. The inductively coupled plasma optical emission spectroscopy sampling device according to claim 1, characterized in that: The surface of the atomizing chamber (2) is obliquely provided with a plurality of side tubes (15) connected to an external air source and the atomizing cavity (19), so that the direction of the airflow ejected from the side tubes (15) can go around the inner wall of the atomizing cavity (19) along the thread line toward the continuous reduction point (20), and the side tubes (15) are distributed in a circular ring structure at intervals in the circumferential direction around the atomizing chamber (2), and the plurality of groups of the circular ring structures are distributed at intervals between the main air pipe (14) and the continuous reduction point (20).

3. The inductively coupled plasma optical emission spectroscopy sampling device according to claim 2, characterized in that: A gas distributor (12) is arranged outside the thermal evaporator (1), the gas distributor (12) is connected to an external gas source via an air inlet pipe (10), and a sample gas pipe (13), a main gas pipe (14), and a side pipe (15) are all connected to the gas distributor (12).

4. The inductively coupled plasma emission spectroscopy sampling device according to claim 3, characterized in that: The side tubes (15) are all connected to a connecting sandwich tube (16) outside the atomization chamber (2), wherein the connecting sandwich tube (16) is a circular tube arranged around the outside of the atomization chamber (2), a sandwich layer is arranged in the wall of the circular tube and is connected to the side tube (15), and the sandwich layer of the connecting sandwich tube (16) is connected to the gas distributor (12) via a side gas pipe (17).

5. The inductively coupled plasma emission spectroscopy sampling device according to claim 3, characterized in that: A gas heater (11) is provided on the air inlet pipe (10).

6. The inductively coupled plasma optical emission spectrometry sampling device according to claim 1, characterized in that: At least a portion of the sample holder (4) on a side close to the atomization chamber (19) is a reduced diameter portion, and the heating tube (6) is connected to the reduced diameter portion.

7. The inductively coupled plasma optical emission spectrometry sampling device according to claim 6, characterized in that: At least a portion of the through channel (18) on the side away from the atomization chamber (19) is a sample injection rack (3), and the sample injection rack (3) is an internally hollow frame structure, wherein the hollow portion matches the maximum width of the sample holder (4).

8. The inductively coupled plasma optical emission spectrometry sampling device according to claim 1, characterized in that: At least part of the through channel (18) on the side close to the atomization chamber (19) is a continuously reduced diameter portion.

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