Imprinting device and imprinting method

a technology of imprinting device and imprinting method, which is applied in the direction of electric/magnetic/electromagnetic heating, instruments, photomechanical equipment, etc., can solve the problems of pattern transfer failure, and achieve the effect of improving throughput and precise pattern transfer

Inactive Publication Date: 2012-09-06
SCIVAX CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This solution enables uniform pressure application and rapid temperature control, improving pattern transfer precision and throughput by directly pressing a flexible film with a gas and using electromagnetic waves or heated gases for heating and cooling, thus overcoming the limitations of conventional technologies.

Problems solved by technology

If the mold and the molding object are not parallel to each other, pressure applied thereto becomes nonuniform, so that stress may be applied locally and the molding object may be deformed or damaged, resulting in transfer failure of the pattern.

Method used

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  • Imprinting device and imprinting method
  • Imprinting device and imprinting method
  • Imprinting device and imprinting method

Examples

Experimental program
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Effect test

first embodiment

[0038]As shown in FIG. 1, a first imprinting device 1 of the present invention is an imprinting device for transferring a pattern on a mold 100 to a film-like molding object 200, and mainly comprises a stage 11 for holding the mold 100, a pressurizing-chamber casing 13 which configure a pressurizing chamber 12 together with the molding object 200, sealing means 14 which airtightly seals a space between the pressurizing-chamber casing 13 and the molding object 200, opening / closing means 15 which opens / closes the space between the pressurizing-room chamber 13 and the molding object 200, pressurizing means 16 for adjusting an atmospheric pressure inside the pressurizing chamber 12, and heating means 17 which heats the molding object 200. Moreover, it is preferable that the imprinting device should further have degassing means 18 which expels any gas from a space between the mold 100 and the molding object 200.

[0039]The stage 11 is not limited to any particular one as far as it can hold...

second embodiment

[0068]As shown in FIG. 4, a second imprinting device 2 of the present invention is an imprinting device for transferring a pattern on a film mold 100 to a molding object 200, and mainly comprises a stage 11 which holds the molding object 200, a pressurizing-chamber casing 13 which configures a pressurizing chamber 12 together with the mold 100, sealing means 14 which airtightly seals a space between the pressurizing-chamber casing 13 and the mold 100, degassing means 18 which eliminates any gas present between the mold 100 and the molding object 200, opening / closing means 15 which opens / closes the space between the pressurizing-chamber casing 13 and the mold 100, heating means 17 which heats the molding object 200, and pressurizing means 16 which adjusts atmospheric pressure in the pressurizing chamber 12.

[0069]That is, the second imprinting device 2 of the present invention corresponds to the first imprinting device 1 of the present invention using the film mold 100 and swaps respe...

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Abstract

The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object, and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.

Description

TECHNICAL FIELD[0001]The present invention relates to an imprinting device and an imprinting method with high throughput.BACKGROUND ART[0002]Recently, thermal nanoimprinting technologies are getting attention as technologies of forming an ultra-fine pattern in a micro order or in a nano order. According to such technologies, a molding object like a substrate or a film formed of a resin with thermal plasticity is heated to a temperature equal to the glass transition temperature of the resin or higher, and a fine pattern is pressed against the molding object, thereby transferring the pattern.[0003]According to such nanoimprinting technologies, parallelism between the mold and the molding object and flatness are important factors. If the mold and the molding object are not parallel to each other, pressure applied thereto becomes nonuniform, so that stress may be applied locally and the molding object may be deformed or damaged, resulting in transfer failure of the pattern.[0004]In orde...

Claims

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Application Information

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Patent Type & AuthorityApplications(United States)
IPC IPC(8): B29C59/02B29C35/08B81C99/00
CPCB29C33/42B29C59/022B29C2035/0822G03F7/0002B82Y10/00B82Y40/00B29C2059/023B81C1/00H01L21/027
InventorTAKAYA, YOSHIAKIHASHIMA, YUJIHAYASHIDA, YOSHIHISAKAWAGUCHI, HIROSUKETANAKA, SATORUKANAI, AKIHIKOUEHARA, KAZUAKI
OwnerSCIVAX CORP