Mask cleaning method, device and equipment, storage medium and product

Abstract

The invention discloses a mask cleaning method and device, equipment, a storage medium and a product, relates to the technical field of semiconductor manufacturing, and discloses a mask cleaning method which comprises the steps that a mask to be cleaned is soaked in cleaning liquid so as to clean the surface of the mask to be cleaned; and activating a preset variable electric field and a variable magnetic field so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask. The variable electric field and the variable magnetic field are applied when the mask plate is cleaned by the cleaning liquid, and the charged particles are controlled to be separated from the surface of the mask plate through the variable electric field and the variable magnetic field, so that the retention of the charged particles in the cleaning liquid on the mask plate is reduced; therefore, on the basis that the variable electromagnetic field is applied to the cleaning liquid, the number of charged particles remaining on the mask plate can be reduced, the possibility that mist defects appear on the surface of the mask plate is further reduced, and finally the cleaning effect of the mask plate is remarkably improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing technology, and in particular to mask cleaning methods, devices, equipment, storage media and products. Background Art

[0002] During the semiconductor manufacturing process, the mask will gradually develop fog defects under the irradiation of lasers of a specific wavelength. Fog defects are mainly caused by ammonium sulfate compounds, which manifest as organic or inorganic residues on the mask. The presence of fog defects has a serious impact on product quality and may cause a significant drop in product qualification rate. In addition, once the mask has fog defects, it needs to be returned to the factory for repair, especially for phase masks. Each cleaning will cause its phase angle to decrease. Once it is lower than the standard value, the mask needs to be scrapped.

[0003] The existing mask cleaning technology uses chemical solvents to clean organic matter, particles and other impurities on the mask surface. However, when using chemical solutions, charged particles will remain on the mask, resulting in a significant reduction in the cleaning effect of the mask.

[0004] Therefore, how to improve the cleaning effect of the mask is a problem that needs to be solved urgently.

[0005] The above contents are only used to assist in understanding the technical solution of the present application and do not constitute an admission that the above contents are prior art. Summary of the invention

[0006] The main purpose of the present application is to provide a mask cleaning method, device, equipment, storage medium and product, aiming to solve the technical problem of poor mask cleaning effect.

[0007] To achieve the above object, the present application proposes a mask cleaning method, the method comprising:

[0008] Immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0009] The preset variable electric field and variable magnetic field are activated to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0010] In one embodiment, the step of activating a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned to obtain a cleaned target mask includes:

[0011] When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated;

[0012] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned;

[0013] When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

[0014] In one embodiment, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned comprises:

[0015] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0016] When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0017] When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0018] In one embodiment, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned comprises:

[0019] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0020] When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0021] When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0022] In one embodiment, the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned includes:

[0023] Obtaining a contamination rating for the mask to be cleaned;

[0024] Immersing the mask to be cleaned in flowing cleaning liquid;

[0025] Based on the preset time duration corresponding to the contamination rating, the surface of the mask to be cleaned is cleaned.

[0026] In one embodiment, before the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned, the step includes:

[0027] Acquiring concentration information of the cleaning liquid and size information of the mask to be processed;

[0028] The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0029] In addition, to achieve the above-mentioned purpose, the present application also proposes a mask cleaning device, the mask cleaning device comprising:

[0030] A cleaning module, used for immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0031] The activation module is used to activate the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, so as to obtain a cleaned target mask.

[0032] In addition, to achieve the above objectives, the present application also proposes a mask cleaning device, which includes: a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the computer program is configured to implement the steps of the mask cleaning method described above.

[0033] In addition, to achieve the above objectives, the present application also proposes a storage medium, which is a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the mask cleaning method described above are implemented.

[0034] In addition, to achieve the above-mentioned purpose, the present application also provides a computer program product, which includes a computer program, and when the computer program is executed by a processor, the steps of the mask cleaning method described above are implemented.

[0035] One or more technical solutions proposed in this application have at least the following technical effects:

[0036] Compared with the related art, in which chemical solvents are used to clean organic matter, particles and other impurities on the surface of the mask, but the use of chemical solutions will retain charged particles on the mask, the present application soaks the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; activates a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned, and obtains a cleaned target mask. It can be understood that the present application adopts the application of a variable electric field and a variable magnetic field when cleaning the mask with a cleaning liquid. When charged particles appear in the cleaning liquid, the charged particles are controlled to detach from the surface of the mask by the variable electric field and the variable magnetic field, so as to reduce the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects on the surface of the mask during subsequent use. Therefore, based on the application of a variable electromagnetic field to the cleaning liquid, the retention of charged particles on the mask can be reduced, thereby reducing the possibility of fog defects on the surface of the mask, and finally completing a significant improvement in the cleaning effect of the mask. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present application and, together with the description, serve to explain the principles of the present application.

[0038] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0039] Figure 1 A schematic diagram of a process flow provided for an embodiment of a mask cleaning method of the present application;

[0040] Figure 2 A schematic diagram of a simplified device of an embodiment of the mask cleaning method of the present application;

[0041] Figure 3 A schematic diagram of the movement of charged particles in the mask cleaning method according to an embodiment of the present application;

[0042] Figure 4 This is a schematic diagram of the module structure of the mask cleaning device according to an embodiment of the present application;

[0043] Figure 5 Schematic diagram of the equipment structure of the hardware operating environment involved in the mask cleaning method in the embodiment of the present application.

[0044] Description of Figure Numbers:

[0045] 1. Chemical liquid nozzle; 2. Variable magnetic field; 3. Variable electric field;

[0046] 4. Mask support structure; 5. Mask; 6. Cleaning liquid;

[0047] 7. Positively charged particles; 8. Negatively charged particles.

[0048] The purpose, features and advantages of this application will be further described in conjunction with the embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0049] It should be understood that the specific embodiments described herein are only used to explain the technical solutions of the present application and are not used to limit the present application.

[0050] In order to better understand the technical solution of the present application, a detailed description will be given below in conjunction with the accompanying drawings and specific implementation methods.

[0051] The main solution of the embodiment of the present application is: immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0052] The preset variable electric field and variable magnetic field are activated to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0053] In this embodiment, the present application uses a mask cleaning device as the execution body. For the convenience of description, it is specifically described below as "device".

[0054] According to the prior art, when the mask is irradiated with a laser of a specific wavelength, fog defects will gradually appear. Fog defects are mainly caused by ammonium sulfate compounds, which manifest as organic or inorganic residues on the mask. The existence of fog defects has a serious impact on product quality and may cause a significant drop in product qualification rate. In addition, once the mask has fog defects, it needs to be returned to the factory for repair, especially for phase masks. Each cleaning will cause its phase angle to decrease. Once it is lower than the standard value, the mask needs to be scrapped. The existing mask cleaning technology uses chemical solvents to clean organic matter, particles and other impurities on the surface of the mask. However, when using chemical solutions, charged particles will remain on the mask, resulting in a significant reduction in the cleaning effect of the mask.

[0055] The present application provides a solution, which adopts the method of applying a variable electric field and a variable magnetic field when cleaning the mask with a cleaning liquid. When charged particles appear in the cleaning liquid, the charged particles are controlled to detach from the surface of the mask by the variable electric field and the variable magnetic field, thereby reducing the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects on the surface of the mask during subsequent use. Therefore, applying a variable electromagnetic field to the cleaning liquid can reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects on the surface of the mask, and finally significantly improving the cleaning effect of the mask.

[0056] This embodiment uses electric and magnetic fields to assist the cleaning liquid, which can efficiently process the charged particles generated after the reaction, thereby improving the cleaning effect. This method is particularly suitable for the field of precision cleaning, and has the advantages of good cleaning effect, short cleaning time, and little damage to the mask.

[0057] Based on this, the present application embodiment provides a mask cleaning method, referring to Figure 1 , Figure 1 This is a schematic diagram of the process of the first embodiment of the mask cleaning method of the present application.

[0058] In this embodiment, the mask cleaning method includes steps S10 to S20:

[0059] Step S10, immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0060] It should be noted that the mask to be cleaned refers to a mask that needs to be cleaned. Masks are usually used in photolithography processes in the fields of semiconductor manufacturing, flat panel displays, etc., and play a role in shielding and pattern transfer. During use, the surface of the mask may be contaminated with various pollutants and needs to be cleaned regularly to ensure its performance. The cleaning liquid is a liquid specifically used for cleaning masks, including but not limited to deionized water, organic solvents, surfactants and other ingredients, which are used to dissolve and remove pollutants on the surface of the mask.

[0061] Exemplarily, the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned includes:

[0062] Obtaining a contamination rating for the mask to be cleaned;

[0063] Immersing the mask to be cleaned in flowing cleaning liquid;

[0064] Based on the preset time duration corresponding to the contamination rating, the surface of the mask to be cleaned is cleaned.

[0065] It should be noted that the mask to be cleaned refers to a mask that needs to be cleaned. The mask is usually used in the photolithography process in the fields of semiconductor manufacturing, flat panel display, etc., and plays the role of shielding and pattern transfer. During use, the surface of the mask may be contaminated with various pollutants and needs to be cleaned regularly to ensure its performance. The pollution rating: This is a quantitative assessment of the degree of contamination on the surface of the mask, which is usually rated based on factors such as the type, quantity, and distribution of pollutants. Different pollution ratings may correspond to different cleaning strategies and parameters to ensure effective cleaning effects. The cleaning liquid is a liquid specifically used for cleaning masks, including but not limited to deionized water, organic solvents, surfactants and other ingredients, which are used to dissolve and remove pollutants on the surface of the mask. The preset duration is a cleaning time pre-set according to the pollution rating of the mask. Different pollution ratings may correspond to different cleaning times to ensure effective removal of pollutants without excessive cleaning.

[0066] It is understood that flowing cleaning liquid can better carry away contaminants and maintain the cleanliness and effectiveness of the cleaning liquid.

[0067] Exemplarily, before the step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned, the step includes:

[0068] Acquiring concentration information of the cleaning liquid and size information of the mask to be processed;

[0069] The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0070] It should be noted that the concentration information of the cleaning liquid refers to the concentration of the active ingredients in the cleaning liquid, which may include the concentration of the cleaning agent, the proportion of the solvent, etc. The concentration information is very important for determining the cleaning effect and selecting appropriate cleaning conditions. The size information of the mask to be processed refers to the size of the mask to be cleaned, including length, width, thickness, etc. The size information helps to determine the amount of cleaning liquid and the cleaning time required during the cleaning process. The power calculation model is a pre-set mathematical model for calculating the working power of the variable electric field and the variable magnetic field according to the concentration of the cleaning liquid and the size of the mask. The model takes into account the influence of the electric field and the magnetic field on the cleaning effect, as well as the power required for masks of different sizes and cleaning liquids of different concentrations. The working power to be adjusted of the variable electric field and the variable magnetic field refers to the working power of the electric field and the magnetic field suitable for the current cleaning conditions obtained according to the power calculation model. By adjusting the power of the electric field and the magnetic field, the cleaning effect and efficiency can be optimized.

[0071] It can be understood that by adjusting the power of the electric field and the magnetic field according to the concentration of the cleaning liquid and the size of the mask, the movement of the charged particles can be more effectively controlled, thereby improving the cleaning effect.

[0072] Step S20, activating a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

[0073] It should be noted that the variable electric field is an electric field whose intensity and / or direction can be changed. During the cleaning process, the moving direction and speed of the charged particles can be affected by changing the electric field.

[0074] In addition, it should be noted that the variable magnetic field is a magnetic field that can change the strength and / or direction of the magnetic field, and the movement of charged particles can be affected by changing the magnetic field. The charged particles are particles with electric charge, and during the cleaning process, the charged particles will react in the cleaning liquid. Through the action of the electric field and the magnetic field, these charged particles can be separated from the surface of the mask. The target mask refers to a mask that reaches the expected cleanliness after cleaning. After cleaning, the contaminants on the surface of the mask are removed, and its original performance and cleanliness are restored.

[0075] Exemplarily, the step of activating a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned to obtain a cleaned target mask includes:

[0076] When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated;

[0077] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned;

[0078] When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

[0079] It should be noted that the variable electric field is an electric field that can change the strength and / or direction of the electric field. During the cleaning process, the movement direction and speed of the charged particles can be affected by changing the electric field. The variable magnetic field is a magnetic field that can change the strength and / or direction of the magnetic field, and the movement of the charged particles can be affected by changing the magnetic field. The charged particles are particles with electric charge, and during the cleaning process, the cleaning liquid will react to generate charged particles. Through the action of the electric field and the magnetic field, these charged particles can be detached from the mask surface.

[0080] In addition, it should be noted that the liquid cleaning start signal is a control signal used to indicate the start of the cleaning process. When this signal is received, the system will start to activate and adjust the electric field and magnetic field. The change frequency refers to the frequency of change of the electric field and magnetic field, that is, the number of times the electric field and magnetic field change per unit time. Adjusting the change frequency can affect the motion law of charged particles, thereby optimizing the cleaning effect. The liquid cleaning end signal is a control signal used to indicate the end of the cleaning process. When this signal is received, the device will stop activating and adjusting the electric field and magnetic field to complete the cleaning process.

[0081] It is understood that in electricity and magnetism, the negative pole and the south pole represent the direction of charge and magnetic flux, respectively. Placing the negative pole and the south pole on the same side generates a combined force in a specific direction, making it easier for charged particles to detach from the mask surface.

[0082] Exemplarily, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned includes:

[0083] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0084] When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0085] When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0086] It should be noted that the frequency of change of the variable electric field and the variable magnetic field refers to the frequency of change of the electric field and the magnetic field, that is, the number of changes of the electric field and the magnetic field per unit time. Adjusting the frequency of change can affect the motion law of the charged particles, thereby optimizing the cleaning effect. The first horizontal magnetic pole and electrode refer to the first magnetic pole and electrode arranged in the horizontal direction, representing the directions of the magnetic field and the electric field, respectively. In this section of material, the first horizontal magnetic pole is the S pole and the electrode is the negative pole, generating a resultant force in a specific direction, making it easier for positively charged particles to detach from the mask surface. The second horizontal magnetic pole and electrode refer to the second magnetic pole and electrode arranged in the horizontal direction, representing the directions of the magnetic field and the electric field, respectively. The second horizontal magnetic pole is the N pole and the electrode is the positive pole, generating a resultant force in a specific direction, making it easier for negatively charged particles to detach from the mask surface. Positively charged particles and negatively charged particles refer to particles with positive and negative charges. During the cleaning process, charged particles will react in the cleaning liquid. Through the action of the electric field and the magnetic field, these charged particles can be detached from the mask surface.

[0087] Exemplarily, the step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned includes:

[0088] Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0089] When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned;

[0090] When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

[0091] It should be noted that the frequency of change of the variable electric field and the variable magnetic field refers to the frequency of change of the electric field and the magnetic field, that is, the number of changes of the electric field and the magnetic field per unit time. Adjusting the frequency of change can affect the motion law of charged particles, thereby optimizing the cleaning effect. The first vertical magnetic pole and electrode refer to the first magnetic pole and electrode arranged in the vertical direction, representing the directions of the magnetic field and the electric field, respectively. In this section of material, the first vertical magnetic pole is the S pole and the electrode is the negative pole, which may be to generate a resultant force in a specific direction, so that positively charged particles are more likely to detach from the mask surface. The second vertical magnetic pole and electrode refer to the second magnetic pole and electrode arranged in the vertical direction, representing the directions of the magnetic field and the electric field, respectively. In this section of material, the second vertical magnetic pole is the N pole and the electrode is the positive pole, which may be to generate a resultant force in a specific direction, so that negatively charged particles are more likely to detach from the mask surface. Positively charged particles and negatively charged particles refer to particles with positive and negative charges. During the cleaning process, charged particles will react in the cleaning liquid. Through the action of electric and magnetic fields, these charged particles can be detached from the surface of the mask.

[0092] The present embodiment provides a mask cleaning method, which applies a variable electric field and a variable magnetic field when cleaning the mask with a cleaning liquid. When charged particles appear in the cleaning liquid, the charged particles are controlled to detach from the mask surface by the variable electric field and the variable magnetic field, thereby reducing the retention of charged particles in the cleaning liquid on the mask, thereby reducing the possibility of fog defects on the mask surface during subsequent use. Therefore, applying a variable electromagnetic field to the cleaning liquid can reduce the retention of charged particles on the mask, thereby reducing the possibility of fog defects on the mask surface, and ultimately significantly improving the cleaning effect of the mask.

[0093] In a feasible implementation, a suitable cleaning liquid is selected and brought into contact with the mask to be cleaned, ensuring that the cleaning liquid can fully cover the mask surface and start the chemical reaction process. During the reaction between the cleaning liquid and the mask, the charged particles generated by the reaction are monitored in real time. This can be achieved by conductivity detection or other suitable methods. According to the properties of the monitored charged particles (positive charge or negative charge), the parameters of the variable electric field and the variable magnetic field are adjusted. By adjusting the direction and position of the electrodes and the magnetic poles, it is ensured that the charged particles can effectively move and detach from the mask surface under the combined action of the electric field and the magnetic field. When the presence of charged particles is detected, the preset variable electric field and variable magnetic field are activated. Ensure that the frequency of change of the electric field and the magnetic field matches the response frequency of the charged particles to maximize the cleaning effect. During the cleaning process, according to the number and distribution of the charged particles, the parameters of the electric field and the magnetic field are adjusted in real time to ensure the efficiency and accuracy of the cleaning process. When it is detected that the cleaning reaction is close to completion and the number of charged particles is significantly reduced, the electric field and the magnetic field are gradually reduced and finally turned off. At this point, the contaminants on the mask surface have been effectively removed.

[0094] For example, in order to help understand the implementation process of the mask cleaning method obtained by combining this embodiment with the above embodiments, please refer to Figure 2 , Figure 2 A simplified schematic diagram of a mask cleaning method is provided, specifically:

[0095] First, the contamination rating of the mask to be cleaned is obtained by optical inspection or other methods. The contamination rating can be divided according to the type, quantity and distribution of contaminants so that the cleaning parameters can be adjusted in subsequent steps.

[0096] Immerse the mask to be cleaned in the flowing cleaning liquid to ensure that all parts of the mask are fully contacted by the cleaning liquid. The cleaning liquid can be deionized water, chemical solvent or other suitable cleaning agent.

[0097] The frequency of the variable electric field and the variable magnetic field is adjusted according to the contamination rating of the mask and the characteristics of the cleaning liquid. The frequency of the change should be selected so that the charged particles can effectively detach from the mask surface under the action of the electric field and the magnetic field.

[0098] Make sure the negative pole of the variable electric field is in the same direction as the S pole of the variable magnetic field. This can be achieved by adjusting the position of the electrodes and magnetic poles. Figure 3 When the first horizontal magnetic pole is the S pole and the second horizontal magnetic pole is the N pole, the first horizontal electrode should be the negative pole and the second horizontal electrode should be the positive pole. Charged particles are generated in the cleaning liquid by reaction. Through the action of electric field and magnetic field, these charged particles can be separated from the surface of the mask.

[0099] When a liquid cleaning start signal is received, the preset variable electric field and variable magnetic field are activated. The activation of the electric field and magnetic field causes the charged particles in the cleaning liquid to be acted upon by force, thereby separating from the mask surface.

[0100] When the liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off. At this time, the charged particles on the surface of the mask have been effectively removed, and a cleaned target mask is obtained.

[0101] It should be noted that the above examples are only used to understand the present application and do not constitute a limitation on the mask cleaning method of the present application. More simple transformations based on this technical concept are all within the protection scope of the present application.

[0102] The present application also provides a mask cleaning device, please refer to Figure 4 , the mask cleaning device comprises:

[0103] The cleaning module 10 is used to immerse the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned;

[0104] The activation module 20 is used to activate the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, so as to obtain a cleaned target mask.

[0105] And / or, the activation module 20 includes:

[0106] A first activation module, configured to activate a preset variable electric field and a variable magnetic field when receiving a liquid cleaning start signal;

[0107] A first adjustment module is used to adjust the change frequency of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned;

[0108] The first closing module is used to close the variable electric field and the variable magnetic field when receiving a liquid cleaning end signal to obtain a cleaned target mask.

[0109] And / or, the first adjustment module includes:

[0110] A second adjustment module is used to adjust the change frequency of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0111] A first control module, configured to control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole;

[0112] The second control module is used to control the negatively charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole.

[0113] And / or, the first adjustment module includes:

[0114] A third adjustment module is used to adjust the change frequency of the variable electric field and the variable magnetic field, and control the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction;

[0115] A third control module is used for controlling the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole;

[0116] The fourth control module is used to control the negatively charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned by the variable electric field and the variable magnetic field when the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole.

[0117] And / or, the cleaning module 10 includes:

[0118] A first acquisition module is used to obtain a contamination rating of the mask to be cleaned;

[0119] A first immersion module, used for immersing the mask to be cleaned in flowing cleaning liquid;

[0120] The first cleaning module is used to clean the surface of the mask to be cleaned based on a preset time duration corresponding to the contamination rating.

[0121] And / or, the mask cleaning device comprises:

[0122] A second acquisition module, used to acquire the concentration information of the cleaning liquid and the size information of the mask to be processed;

[0123] The first calculation module is used to input the concentration information and the size information into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

[0124] The mask cleaning device provided by the present application adopts the mask cleaning method in the above embodiment, which can solve the technical problem of poor mask cleaning effect. Compared with the prior art, the beneficial effects of the mask cleaning device provided by the present application are the same as the beneficial effects of the mask cleaning method provided by the above embodiment, and other technical features of the mask cleaning device are the same as the features disclosed in the above embodiment method, which will not be repeated here.

[0125] The present application provides a mask cleaning device, which includes: at least one processor; and a memory that is communicatively connected to the at least one processor; wherein the memory stores instructions that can be executed by the at least one processor, and the instructions are executed by the at least one processor so that the at least one processor can execute the mask cleaning method in the above-mentioned embodiment one.

[0126] Reference below Figure 5 , which shows a schematic diagram of the structure of a mask cleaning device suitable for implementing the embodiment of the present application. The mask cleaning device in the embodiment of the present application may include but is not limited to mobile terminals such as mobile phones, tablet computers, laptop computers, digital broadcast receivers, PDAs (Personal Digital Assistants), PMPs (Portable Media Players), vehicle terminals (such as vehicle navigation terminals), etc., and fixed terminals such as digital TVs, desktop computers, etc. Figure 5 The mask cleaning device shown is merely an example and should not bring any limitation to the functions and scope of use of the embodiments of the present application.

[0127] like Figure 5As shown, the mask cleaning device may include a processing device 1001 (e.g., a central processing unit, a graphics processor, etc.), which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM: Read Only Memory) 1002 or a program loaded from a storage device 1003 to a random access memory (RAM: Random Access Memory) 1004. In RAM1004, various programs and data required for the operation of the mask cleaning device are also stored. The processing device 1001, ROM1002, and RAM1004 are connected to each other through a bus 1005. An input / output (I / O) interface 1006 is also connected to the bus. Generally, the following systems can be connected to the I / O interface 1006: an input device 1007 including, for example, a touch screen, a touch pad, a keyboard, a mouse, an image sensor, a microphone, an accelerometer, a gyroscope, etc.; an output device 1008 including, for example, a liquid crystal display (LCD: Liquid Crystal Display), a speaker, a vibrator, etc.; a storage device 1003 including, for example, a magnetic tape, a hard disk, etc.; and a communication device 1009. The communication device 1009 can allow the mask cleaning device to communicate with other devices wirelessly or by wire to exchange data. Although the figure shows a mask cleaning device with various systems, it should be understood that it is not required to implement or have all the systems shown. More or fewer systems can be implemented or have alternatively.

[0128] In particular, according to the embodiments disclosed in the present application, the process described above with reference to the flowchart can be implemented as a computer software program. For example, the embodiments disclosed in the present application include a computer program product, which includes a computer program carried on a computer-readable medium, and the computer program includes a program code for executing the method shown in the flowchart. In such an embodiment, the computer program can be downloaded and installed from a network through a communication device, or installed from a storage device 1003, or installed from a ROM 1002. When the computer program is executed by the processing device 1001, the above-mentioned functions defined in the method of the embodiment disclosed in the present application are executed.

[0129] The mask cleaning device provided by the present application adopts the mask cleaning method in the above embodiment, which can solve the technical problem of poor mask cleaning effect. Compared with the prior art, the beneficial effects of the mask cleaning device provided by the present application are the same as the beneficial effects of the mask cleaning method provided by the above embodiment, and the other technical features of the mask cleaning device are the same as the features disclosed in the method of the previous embodiment, which will not be repeated here.

[0130] It should be understood that the various parts disclosed in this application can be implemented by hardware, software, firmware or a combination thereof. In the description of the above embodiments, specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0131] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

[0132] The present application provides a computer-readable storage medium having computer-readable program instructions (ie, computer programs) stored thereon, and the computer-readable program instructions are used to execute the mask cleaning method in the above-mentioned embodiment.

[0133] The computer-readable storage medium provided in the present application may be, for example, a USB flash drive, but is not limited to electrical, magnetic, optical, electromagnetic, infrared, or semiconductor systems, systems or devices, or any combination of the above. More specific examples of computer-readable storage media may include, but are not limited to: an electrical connection with one or more wires, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above. In this embodiment, the computer-readable storage medium may be any tangible medium containing or storing a program that can be used by or in combination with an instruction execution system, system or device. The program code contained on the computer-readable storage medium may be transmitted using any appropriate medium, including but not limited to: wires, optical cables, RF (Radio Frequency), etc., or any suitable combination of the above.

[0134] The computer-readable storage medium may be included in the mask cleaning device; or may exist independently without being assembled into the mask cleaning device.

[0135] The computer-readable storage medium carries one or more programs. When the one or more programs are executed by the mask cleaning device, the mask cleaning device: immerses the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; activates a preset variable electric field and a variable magnetic field to control the charged particles in the cleaning liquid to detach from the surface of the mask to be cleaned, thereby obtaining a target mask that has been cleaned.

[0136] Computer program code for performing the operations of the present application may be written in one or more programming languages ​​or a combination thereof, including object-oriented programming languages ​​such as Java, Smalltalk, C++, and conventional procedural programming languages ​​such as "C" or similar programming languages. The program code may be executed entirely on the user's computer, partially on the user's computer, as a separate software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In the case of a remote computer, the remote computer may be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computer (e.g., via the Internet using an Internet service provider).

[0137] The flow chart and block diagram in the accompanying drawings illustrate the possible architecture, function and operation of the system, method and computer program product according to various embodiments of the present application. In this regard, each square box in the flow chart or block diagram can represent a module, a program segment or a part of a code, and the module, the program segment or a part of the code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementations, the functions marked in the square box can also occur in a sequence different from that marked in the accompanying drawings. For example, two square boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each square box in the block diagram and / or flow chart, and the combination of the square boxes in the block diagram and / or flow chart can be implemented with a dedicated hardware-based system that performs a specified function or operation, or can be implemented with a combination of dedicated hardware and computer instructions.

[0138] The modules involved in the embodiments described in this application may be implemented by software or hardware, wherein the name of the module does not constitute a limitation on the unit itself in some cases.

[0139] The readable storage medium provided in the present application is a computer-readable storage medium, which stores computer-readable program instructions (i.e., computer programs) for executing the above-mentioned mask cleaning method, and can solve the technical problem of poor mask cleaning effect. Compared with the prior art, the beneficial effects of the computer-readable storage medium provided in the present application are the same as the beneficial effects of the mask cleaning method provided in the above-mentioned embodiment, and will not be described in detail here.

[0140] The present application also provides a computer program product, including a computer program, which implements the steps of the above-mentioned mask cleaning method when executed by a processor.

[0141] The computer program product provided in this application can solve the technical problem of poor mask cleaning effect. Compared with the prior art, the beneficial effects of the computer program product provided in this application are the same as the beneficial effects of the mask cleaning method provided in the above embodiment, which will not be repeated here.

[0142] The above descriptions are only some embodiments of the present application, and are not intended to limit the patent scope of the present application. All equivalent structural changes made using the contents of the present application specification and drawings under the technical concept of the present application, or direct / indirect applications in other related technical fields are included in the patent protection scope of the present application.

Claims

1. A mask cleaning method, characterized in that: The method includes: Immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; The preset variable electric field and variable magnetic field are activated to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, thereby obtaining a cleaned target mask.

2. The method according to claim 1, characterized in that The step of activating the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned to obtain a cleaned target mask includes: When a liquid cleaning start signal is received, a preset variable electric field and variable magnetic field are activated; Adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned; When a liquid cleaning end signal is received, the variable electric field and the variable magnetic field are turned off to obtain a cleaned target mask.

3. The method according to claim 2, characterized in that The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned comprises: Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction; When the first horizontal magnetic pole is an S pole, the second horizontal magnetic pole is an N pole, the first horizontal electrode is a negative pole, and the second horizontal electrode is a positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; When the first horizontal magnetic field is the N pole, the second horizontal magnetic field is the S pole, the first horizontal electrode is the positive pole, and the second horizontal electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

4. The method according to claim 2, characterized in that The step of adjusting the changing frequencies of the variable electric field and the variable magnetic field, controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to be on the same side, so as to control the charged particles in the cleaning liquid to be separated from the surface of the mask to be cleaned comprises: Adjusting the changing frequencies of the variable electric field and the variable magnetic field, and controlling the negative pole of the variable electric field and the S pole of the variable magnetic field to maintain the same direction; When the first vertical magnetic pole is the S pole, the second vertical magnetic pole is the N pole, the first vertical electrode is the negative pole, and the second vertical electrode is the positive pole, the variable electric field and the variable magnetic field control the positively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned; When the first vertical magnetic field is the N pole, the second vertical magnetic field is the S pole, the first vertical electrode is the positive pole, and the second vertical electrode is the negative pole, the variable electric field and the variable magnetic field control the negatively charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned.

5. The method according to claim 1, characterized in that The step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned comprises: Obtaining a contamination rating for the mask to be cleaned; Immersing the mask to be cleaned in flowing cleaning liquid; Based on the preset time duration corresponding to the contamination rating, the surface of the mask to be cleaned is cleaned.

6. The method according to claim 1, characterized in that The step of immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned comprises: Acquiring concentration information of the cleaning liquid and size information of the mask to be processed; The concentration information and the size information are input into a preset power calculation model to obtain the working power to be adjusted of the variable electric field and the variable magnetic field.

7. A mask cleaning device, characterized in that: The device comprises: A cleaning module, used for immersing the mask to be cleaned in a cleaning liquid to clean the surface of the mask to be cleaned; The activation module is used to activate the preset variable electric field and variable magnetic field to control the charged particles in the cleaning liquid to separate from the surface of the mask to be cleaned, so as to obtain a cleaned target mask.

8. A mask cleaning device, characterized in that: The device comprises: a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the computer program is configured to implement the steps of the mask cleaning method according to any one of claims 1 to 6.

9. A storage medium, characterized in that: The storage medium is a computer-readable storage medium, and a computer program is stored on the storage medium. When the computer program is executed by a processor, the steps of the mask cleaning method according to any one of claims 1 to 6 are implemented.

10. A computer program product, characterized in that The computer program product comprises a computer program, and when the computer program is executed by a processor, the steps of the mask cleaning method according to any one of claims 1 to 6 are implemented.

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