Fixing and damping mechanism for reflector polishing

Abstract

The embodiment of the invention provides a fixing and damping mechanism for reflector polishing, and relates to the technical field of lens machining and fixing mechanisms. The fixing and damping mechanism for reflector polishing comprises a lifting adjusting part, an external supporting part and an internal supporting part. The external supporting part comprises a beam plate, a supporting plate, a pedestal, a lower seat plate and an upper seat plate, the lifting adjusting part lifts the beam plate for lifting adjustment, the supporting plate is connected with the beam plate and the pedestal, the lower seat plate is detachably connected with the upper seat plate, a second spring is arranged above the pedestal to elastically support the lower seat plate, and a scrap collecting groove is formed in the upper surface of the lower seat plate. And a scrap outlet communicated with the scrap collecting groove is formed in one side of the scrap collecting groove. And vibration generated during polishing operation is buffered by second springs at the four corners of the bottom of the lower base plate and can also be buffered by an elastic ring base and an elastic supporting ring at the bottom of the ball, the influence of polishing vibration on a lens is effectively reduced, and a good protection effect on the polished reflector is achieved.

Description

Technical Field

[0001] The present application relates to the technical field of lens processing and fixing mechanisms, and in particular to a reflector polishing and fixing shock absorbing mechanism. Background Art

[0002] Glass reflectors are widely used in the field of optics. When using polishing equipment to polish the surface of a lens, the polishing head in the polishing equipment contacts the surface of the lens, which not only polishes the surface of the lens, but also causes the lens to vibrate during the polishing process. Because the structure of glass reflective lenses is hard and brittle, the internal crystal structure of the lens is easily damaged when the reflector is vibrated during polishing, and the lens's ability to resist shock and pressure is reduced in the later stage. In severe cases, the polished reflective lens can even be shattered and damaged. Summary of the invention

[0003] The present application aims to solve at least one of the technical problems existing in the prior art. To this end, the present application proposes a fixed vibration reduction mechanism for polishing a reflector to solve the problem that the internal crystal structure of the reflector is easily damaged when the reflector is vibrated during polishing, and the reflector lens is likely to be broken and damaged during processing.

[0004] A reflector polishing fixed damping mechanism according to an embodiment of the present application includes: a lifting and lowering adjustment part, an external supporting part and an internal supporting part.

[0005] The external support part includes a beam plate, a supporting plate, a pedestal, a lower seat plate and an upper seat plate, the lifting and lowering adjustment part lifts the beam plate for lifting and lowering adjustment, the supporting plate connects the beam plate and the pedestal, the lower seat plate is detachably connected to the upper seat plate, and the lower seat plate is elastically supported by a second spring above the pedestal, a debris collection groove is provided on the upper surface of the lower seat plate, a debris outlet connected to the debris collection groove is provided on one side of the debris collection groove, and the debris collection groove is gradually inclined downward toward the debris outlet, and a positioning block and an elastic positioning member for positioning a reflector are respectively provided in the upper trough of the upper seat plate; The internal supporting part includes a sphere, an elastic ring seat with an open top, and a ring pressure plate. The sphere is fixed at the bottom of the lower seat plate and moves through the top of the pedestal. The elastic ring seat is arranged above the support plate, and the inclined arc surface on the inner side of the elastic ring seat elastically supports the sphere. An elastic supporting ring is arranged on one side of the inclined surface at the top of the elastic ring seat to cooperate with the inclined arc surface of the elastic ring seat to support the sphere. The ring pressure plate is arranged on the bottom side of the cavity layer inside the elastic ring seat, and the ring pressure plate is connected to the support plate and presses and fixes the elastic ring seat.

[0006] In some embodiments of the present application, the lifting and lowering adjustment part includes a motor, a mounting seat, a threaded rod, a support seat and a bracket. The motor is installed at the bottom of the mounting seat, and the bottom end of the threaded rod is connected to the output shaft end of the motor. The bracket is arranged on one side of the mounting seat, and the threaded rod is rotatably arranged with the mounting seat and the bracket respectively, and the threaded rod rotates through the support seat.

[0007] In some embodiments of the present application, the support seat and the bracket are slidably matched, and the beam plate and the support seat are fixedly installed.

[0008] In some embodiments of the present application, the elastic positioning member includes a fixed frame, a movable block, a first guide rod and a first spring, the fixed frame is fixed to the outer side of the upper seat plate, the movable block is located inside the upper seat plate, one end of the first guide rod is connected to the movable block, and the other end of the first guide rod is movable through the fixed frame and the upper seat plate, and the first spring is sleeved on the outside of the first guide rod located between the upper seat plate and the fixed frame.

[0009] In some embodiments of the present application, a second guide rod is provided on the outer side of the movable block, and the second guide rod movably passes through the upper seat plate.

[0010] In some embodiments of the present application, a placement hole is provided on the top of the base, and the bottom end of the second spring is provided inside the placement hole.

[0011] In some embodiments of the present application, a through hole is provided on the lower seat plate, and the top end of the second spring is provided inside the through hole.

[0012] The fixed shock-absorbing mechanism for polishing the reflector also includes a debris and dust auxiliary collection part, which includes a collection box, an air inlet hose, a fan, a box cover and a chip collection cover. The chip collection cover is arranged on the outside above the upper seat plate, the fan is installed at the bottom of two beams, and the box cover is fixed to the bottom of the fan. The vent on the box cover is aligned with the fan, and a mesh plate is arranged inside the vent. The top end of the air inlet hose is connected to the debris outlet on one side of the lower seat plate, and the bottom end of the air inlet hose passes through the box cover and is connected to the inside of the collection box.

[0013] In some embodiments of the present application, the debris and dust auxiliary collection portion further includes a buckle, and the buckle connects the collection box and the box cover.

[0014] In some embodiments of the present application, an air inlet is provided at the top of the box cover, and the bottom end of the air inlet hose is connected to the air inlet.

[0015] The beneficial effects of the present application are as follows: the present application obtains a fixed shock-absorbing mechanism for polishing a reflector through the above design. When the polishing head of the polishing equipment contacts and polishes the upper surface of the lens, the polishing head of the polishing equipment will be pressed on the upper surface of the lens, and the second spring can elastically support the positioned lens, and the synchronous elastic support ring and the elastic ring seat can also elastically support the lens through the sphere, so that the rigid contact and extrusion between the upper surface of the lens and the polishing head are avoided, and the lens has a good protective effect during polishing. The vibration generated during the polishing operation will be buffered by the second springs at the four corners of the bottom of the lower seat plate, and can also be buffered by the elastic ring seat and the elastic support ring at the bottom of the sphere, effectively reducing the impact of the polishing vibration on the lens, and having a good protective effect on the polished reflector.

[0016] Additional aspects and advantages of the present application will be given in part in the description below, and in part will become apparent from the description below, or will be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0018] Figure 1 is a schematic diagram of the structure of a fixed damping mechanism for polishing a reflector according to an embodiment of the present application; Figure 2 is a schematic diagram of the structure of the lifting and lowering adjustment part according to an embodiment of the present application; Figure 3 is a schematic structural diagram of an external support part and an internal support part according to an embodiment of the present application; Figure 4 is a schematic diagram of the structure of an elastic positioning member according to an embodiment of the present application; Figure 5 is a schematic structural diagram of a pedestal, a lower seat plate, a second spring and an internal support portion according to an embodiment of the present application; Figure 6 is a schematic diagram of a pedestal structure according to an embodiment of the present application; Figure 7 is a schematic diagram of the structure of the lower seat plate according to an embodiment of the present application; Figure 8 is a schematic diagram of the structure of the internal support part according to an embodiment of the present application; Fig. 9 is a schematic diagram of the cross-sectional structure of the elastic ring seat, the elastic support ring and the ring pressure plate according to an embodiment of the present application; Fig.10 is a schematic diagram of the structure of a debris dust auxiliary collection part and a dust barrier part according to an embodiment of the present application; Fig.11 is a schematic diagram of the box cover and mesh plate structure according to an embodiment of the present application; Fig.12 It is a schematic diagram of the exhaust hood structure according to an embodiment of the present application.

[0019] icon: 10-lifting adjustment part; 110-motor; 120-mounting seat; 130-threaded rod; 140-support seat; 150-bracket; 20-external support part; 210-beam plate; 220-support plate; 230-base; 231-limiting opening; 232-placing hole; 240-lower seat plate; 241-debris collection groove; 242-debris outlet; 243-through hole; 250-upper seat plate; 260-positioning block; 270-elastic positioning member; 271-fixed frame; 272-movable block; 273-first guide rod; 274-first spring; 275-first Two guide rods; 280-second spring; 30-inner support part; 310-sphere; 320-elastic ring seat; 330-elastic support ring; 340-ring pressure plate; 40-debris and dust auxiliary collection part; 410-collection box; 420-air inlet hose; 430-fan; 440-box cover; 450-mesh plate; 460-clasp; 470-air inlet; 480-chip collection cover; 50-dust barrier part; 520-exhaust cover; 521-air inlet; 530-air outlet hose; 540-first partition; 550-second partition; 551-air outlet. DETAILED DESCRIPTION

[0020] The technical solutions in the embodiments of the present application will be described below in conjunction with the drawings in the embodiments of the present application.

[0021] A fixing and damping mechanism for polishing a reflector according to an embodiment of the present application will be described below with reference to the accompanying drawings.

[0022] See also Figure 1-Figure 12 According to an embodiment of the present application, a reflector polishing fixed damping mechanism includes: a lifting and lowering adjustment part 10, an external supporting part 20 and an internal supporting part 30.

[0023] The lifting and adjusting part 10 is used to support the external supporting part 20 and the internal supporting part 30 for lifting and adjusting operations. The external supporting part 20 and the internal supporting part 30 can fix the lens to be polished, and then the lifting and adjusting part 10 can move the positioned lens up to the bottom of the polishing and grinding head. When the lens is being polished, the cooperation of the internal supporting part 30 and the external supporting part 20 provides a good shock-absorbing effect for the lens, that is, effectively reducing the damage to the glass lens caused by vibration during the polishing process.

[0024] See also Figure 1 , Figure 3 , Figure 5-Figure 9 The external support part 20 includes a beam plate 210, a support plate 220, a pedestal 230, a lower seat plate 240 and an upper seat plate 250. The lifting and adjusting part 10 lifts the beam plate 210 for lifting and adjusting, and the support plate 220 is connected to the beam plate 210 and the pedestal 230 respectively by bolts. The lower seat plate 240 and the upper seat plate 250 are detachably connected by bolts, and the lower seat plate 240 is elastically supported by a second spring 280 arranged above the pedestal 230. Four groups of second springs 280 are used, and the four groups of second springs 280 support the four corners below the lower seat plate 240 respectively. A debris collection groove 241 is arranged on the upper surface of the lower seat plate 240, and a debris outlet 242 connected to the debris collection groove 241 is arranged on one side of the debris collection groove 241, and the debris collection groove 241 is gradually inclined downward toward the debris outlet 242. The upper plate 250 has a positioning block 260 and an elastic positioning member 270 for positioning the reflector. The internal support part 30 includes a sphere 310, an elastic ring seat 320 with an open top, and a ring pressure plate 340. The top of the sphere 310 is a planar structure. The sphere 310 is fixed to the bottom of the lower plate 240 and movably penetrates the top of the pedestal 230. The top of the pedestal 230 is provided with a limited opening 231, and the bottom of the sphere 310 is movably installed through the limited opening 231. The elastic ring seat 320 is arranged above the support plate 220, and the inclined arc surface inside the elastic ring seat 320 elastically supports the sphere 310. An elastic support ring 330 is arranged on one side of the top inclined surface of the elastic ring seat 320 to cooperate with the inclined arc surface of the elastic ring seat 320 to support the sphere 310. The elastic ring seat 320 and the elastic support ring 330 can be made of rubber, plastic or silicone with good elasticity. The ring pressure plate 340 is disposed on the bottom side of the cavity layer of the elastic ring seat 320 , and the ring pressure plate 340 is connected to the supporting plate 220 and presses and fixes the elastic ring seat 320 .

[0025] The working principle of the fixed shock-absorbing mechanism for polishing the reflector is as follows: the lens to be processed is placed in the loading trough inside the upper seat plate 250, and the lens is positioned by the cooperation of the positioning block 260 in the loading trough and the elastic positioning member 270. The lifting and lowering adjustment part 10 is adjusted to drive the external support part 20 and the internal support part 30 to move upward, that is, to drive the positioned lens to move upward to the bottom of the polishing and grinding head of the polishing equipment. When the polishing and grinding head of the polishing equipment contacts and polishes the lens on the upper surface of the lens, the polishing and grinding head of the polishing equipment will press and hold the upper surface of the lens, and the second spring 280 can elastically support the positioned lens, and the synchronous elastic support ring 330 and the elastic ring seat 320 can also play an elastic support role on the lens through the sphere 310, so that the upper surface of the lens and the polishing and grinding head are prevented from rigid contact and extrusion, which has a good protective effect on the lens during polishing. The vibration generated during the polishing operation will be buffered by the second springs 280 at the four corners of the bottom of the lower seat plate 240, and can also be buffered by the elastic ring seat 320 and the elastic support ring 330 at the bottom of the sphere 310, effectively reducing the impact of the polishing vibration on the lens and having a good protective effect on the polished reflector.

[0026] The elastic support of the elastic ring seat 320, the elastic support ring 330 and the sphere 310, in combination with the support of the second springs 280 at the four corners, also has a good angle fine-tuning protection function. When the polishing head vibrates during the polishing operation, that is, whether the polishing head contacts the lens vertically or contacts the lens at an inclined angle with a slight tilt, the positioned lens can tilt and move with the support of the second spring 280, the elastic ring seat 320, the elastic support ring 330 and the sphere 310 to ensure that the polishing position of the polishing head is always in contact with the upper surface of the lens, that is, it can prevent vibration while also ensuring the efficiency and quality of polishing.

[0027] The top of the elastic ring seat 320 is open, which is convenient for disassembling and assembling the ring pressure plate 340 inside it. The ring pressure plate 340 is fixedly connected to the support plate 220 by screws, that is, the elastic ring seat 320 is stably fixed above the support plate 220. The arc surface inside the elastic ring seat 320 is used to stably hold the ball 310, and the outer edge of the elastic support ring 330 is in contact with the inner side wall of the elastic ring seat 320. The elastic support ring 330 cooperates with the inner arc surface of the elastic ring seat 320 to support the ball 310 at the same time. The outer ring of the elastic ring seat 320 can also be used for the elastic support ring 330, so that the elastic ring seat 320 and the elastic support ring 330 have better wrapping and supporting capabilities.

[0028] The debris dust generated during the polishing process falls into the debris collection groove 241 on the lower seat plate 240 through the feeding groove on the upper seat plate 250. The truncated table in the middle of the lower seat plate 240 is used to support the positioned lens. The debris collection groove 241 around the truncated table is used to store debris, and the collected debris can fall out from the debris outlet 242 on one side along the debris collection groove 241.

[0029] For specific settings, see Figure 2 The lifting and lowering adjustment part 10 includes a motor 110, a mounting seat 120, a threaded rod 130, a support seat 140 and a bracket 150. The motor 110 is mounted at the bottom of the mounting seat 120, and the bottom end of the threaded rod 130 is connected to the output shaft end of the motor 110. The bracket 150 is arranged on one side of the mounting seat 120, and the threaded rod 130 is rotatably arranged with the mounting seat 120 and the bracket 150 respectively, and the threaded rod 130 rotates and penetrates the support seat 140. The beam plate 210 and the support seat 140 are fixedly installed by bolts. The motor 110 drives the threaded rod 130 to rotate, and the rotating threaded rod 130 will drive the support seat 140 to move and adjust in the vertical direction, that is, drive the beam plate 210 on one side of the support seat 140 to move and adjust in the vertical direction. Two limiting rollers are arranged on one side of the support seat 140 to clamp and contact with the bracket 150 to improve the stability of the support seat 140 when it moves in the vertical direction.

[0030] For details, please refer to Figure 4 The elastic positioning member 270 includes a fixed frame 271, a movable block 272, a first guide rod 273 and a first spring 274. The fixed frame 271 is fixed to the outer side of the upper seat plate 250 by bolts, the movable block 272 is located inside the upper seat plate 250, one end of the first guide rod 273 is connected to the movable block 272, and the other end of the first guide rod 273 is movable through the fixed frame 271 and the upper seat plate 250. The first spring 274 is sleeved on the outside of the first guide rod 273 located between the upper seat plate 250 and the fixed frame 271. Among them, the positioning block 260 and the elastic positioning member 270 can be made of a relatively hard rubber material. When loading the lens, the outer ring of the lens is pressed against the inner arc surface of the movable block 272 in the elastic positioning member 270. At this time, the movable block 272 moves backward, and the first spring 274 is compressed. At this time, the lens can be placed on the round table above the lower seat plate 240, and the movable block 272 is pushed to move under the elastic force of the first spring 274, and the lens is clamped and positioned with the positioning block 260. Two positioning blocks 260 are used, and the two positioning blocks 260 are fixedly arranged on the inner wall of the upper seat plate 250, and the two positioning blocks 260 and the movable block 272 are arranged in a ring array.

[0031] Furthermore, a second guide rod 275 is disposed outside the movable block 272, and the second guide rod 275 movably penetrates the upper seat plate 250. The second guide rod 275 is disposed to enhance the stability of the movable block 272 when it moves.

[0032] For specific settings, see Figure 6 and Figure 7 The top of the pedestal 230 is provided with a placement hole 232, and the bottom end of the second spring 280 is arranged inside the placement hole 232. The lower seat plate 240 is provided with a through hole 243, and the top end of the second spring 280 is arranged inside the through hole 243. The placement hole 232 and the through hole 243 are both used to install the limiting second spring 280, so that the second spring 280 between the lower seat plate 240 and the pedestal 230 can support the lower seat plate 240 more stably.

[0033] In the above-mentioned reflector polishing and fixing shock-absorbing mechanism, an upper seat plate 250 and a lower seat plate 240 are used to cooperate to support the lens. During the polishing and grinding process of the lens, dust generated is easy to fly and fall on the equipment components, which makes subsequent cleaning inconvenient.

[0034] See also Fig.10 and Fig.11 The fixed damping mechanism for polishing the reflector also includes a debris dust auxiliary collection part 40, which includes a collection box 410, an air inlet hose 420, a fan 430, a box cover 440 and a chip collection cover 480. The chip collection cover 480 is arranged outside the upper seat plate 250, the fan 430 is installed at the bottom of the two beam plates 210, and the box cover 440 is fixed to the bottom of the fan 430 by bolts. The vent on the box cover 440 is aligned with the fan 430, and a mesh plate 450 is arranged inside the vent. The top of the air inlet hose 420 is connected to the debris outlet 242 on one side of the lower seat plate 240, and the bottom of the air inlet hose 420 passes through the box cover 440 and is connected to the inside of the collection box 410. An air inlet 470 is arranged on the top of the box cover 440, and the bottom of the air inlet hose 420 is connected to the air inlet 470.

[0035] When the polishing head of the polishing equipment is polishing the upper surface of the lens, the dust generated during the polishing will fall into the range of the chip collecting cover 480 outside the upper seat plate 250, and at this time, the fan 430 is in operation, and the air inside the box cover 440 is extracted. That is, when the fan 430 is in operation, the inside of the collection box 410 is in a negative pressure state, and the air inside the chip collecting cover 480 will enter the air inlet hose 420 through the debris collection groove 241 and the debris outlet 242 at the top of the lower seat plate 240, and the air inside the air inlet hose 420 will enter the inside of the collection box 410. The flowing air will drive the dust generated during polishing and grinding to enter the inside of the collection box 410 through the debris collection groove 241, the debris outlet 242 and the air inlet hose 420 at the top of the lower seat plate 240. Excessive air in the collection box 410 will be discharged outward through the mesh plate 450 on the top of the box cover 440 and the fan 430, while dust will fall into the collection box 410 and be collected. This design allows the waste chips generated by polishing to be discharged into the collection box 410 through the chip collection cover 480 and the debris collection groove 241 of the annular structure on the top of the box cover 440 to complete collection, thereby reducing polishing dust from falling into the equipment and the table, and reducing the burden of subsequent staff cleaning the equipment and the table.

[0036] Among them, the debris collection groove 241 adopts an inclined setting and annular structure, which can ensure that the table in the middle of the lower seat plate 240 supports the workpiece while reducing the space occupied by the entire assembly. The design of the inclined debris collection groove 241 makes it easier for the dust carried by the circulating air to slide to the debris outlet 242 and enter the air inlet hose 420, reducing the possibility of dust falling and adhering to the inner wall of the debris collection groove 241.

[0037] Furthermore, the debris and dust auxiliary collection part 40 also includes a buckle 460, and the buckle 460 connects the collection box 410 and the box cover 440. The design of connecting the collection box 410 and the box cover 440 with the buckle 460 can realize the quick disassembly and assembly of the collection box 410 at the bottom of the box cover 440, and pour out and clean the dust collected in the collection box 410. The collection box 410 and the box cover 440 are sealed with a sealing ring to prevent the dust inside the collection box 410 from falling out from the gap between the collection box 410 and the box cover 440, and at the same time ensure the sealing performance between the collection box 410 and the box cover 440, and ensure that the inside of the collection box 410 is in a good negative pressure state under the action of the fan 430, so that the collection box 410 has a good dust collection effect.

[0038] The above-mentioned fixed shock-absorbing mechanism for mirror polishing can collect the dust generated during polishing. Since the operator stands in front of the equipment, that is, in front of the chip collecting cover 480 of the fixed shock-absorbing mechanism, if the polishing dust splashes out from the chip collecting cover 480, the dust generated by polishing will easily fall on the operator in front.

[0039] See also Fig.10 and Fig.12 The reflector polishing fixed damping mechanism also includes a dust blocking part 50, which includes an exhaust hood 520 with an open top, an air outlet hose 530, a first partition 540 and a second partition 550. The first partition 540 and the second partition 550 are respectively located on both sides above the fan 430, and the first partition 540, the second partition 550, the beam plate 210, and the support plate 220 form an air outlet cavity. The side of the second partition 550 is provided with an air outlet 551 connected to the air outlet cavity, the exhaust hood 520 is arranged at the front side of the chip collecting hood 480, and the outer side of the exhaust hood 520 is provided with an air inlet 521, the top end of the air outlet hose 530 is connected to the air inlet 521, and the bottom end of the air outlet hose 530 is connected to the air outlet 551.

[0040] The fixed damping mechanism for polishing the reflector uses the air discharged by the fan 430 in the debris and dust auxiliary collection part 40 during dust collection, that is, the air discharged by the fan 430 falls into the air outlet cavity formed by the first partition 540, the second partition 550, the beam plate 210, and the support plate 220. The over-pressure air in the air outlet cavity will enter the inside of the air outlet hose 530 through the air outlet 551 on the side of the second partition 550, and the air outlet hose 530 will guide the over-pressure air to the inside of the exhaust hood 520, and finally the air discharged by the fan 430 will be discharged from the open part above the exhaust hood 520. The air discharged from the top of the exhaust hood 520 forms a row of columns to block the dust scattered and splashed from the debris collection hood 480, so as to prevent the dust from falling on the operator, and the over-pressure air discharged by the fan 430 can provide a certain protection for the operator.

[0041] The design scheme can also use four groups of exhaust hoods 520 to be respectively arranged around the chip collecting hood 480. The fan 430 uses a high speed to generate a large wind pressure that can enter the four exhaust hoods 520. The air column discharged from the exhaust hood 520 is surrounded by the chip collecting hood 480. At this time, the air inside the chip collecting hood 480 moves downward to drive the dust to the debris collection groove 241 inside the lower seat plate 240, and the upward air column generated by the exhaust hood 520 outside the chip collecting hood 480 can prevent the polishing dust from splashing outward. At the same time, the air discharged from the exhaust hood 520 will drive most of the dust to be sucked into the chip collecting hood 480, further improving the dust collection effect.

[0042] Furthermore, the exhaust hood 520 is an equilateral trapezoidal structure that is wide at the top and narrow at the bottom. This structural arrangement can prevent the air entering the exhaust hood 520 from the air outlet hose 530 from generating turbulence, that is, the air entering the exhaust hood 520 can be better discharged upward from the opening at the top of the exhaust hood 520.

[0043] It should be noted that the specific model specifications of the motor 110 and the fan 430 need to be selected and determined according to the actual specifications of the device, and the specific selection calculation method adopts the existing technology in the field, so it will not be described in detail. The power supply and principle of the motor 110 and the fan 430 are clear to those skilled in the art and will not be described in detail here.

[0044] The above description is only an embodiment of the present application and is not intended to limit the scope of protection of the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application should be included in the scope of protection of the present application. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings.

[0045] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any technician familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A fixed damping mechanism for polishing a reflector, characterized in that: include: The lifting and adjusting part (10) and the external supporting part (20) are characterized in that the external supporting part (20) comprises a beam plate (210), a supporting plate (220), a pedestal (230), a lower seat plate (240) and an upper seat plate (250); the lifting and adjusting part (10) lifts the beam plate (210) for lifting and adjusting; the supporting plate (220) connects the beam plate (210) and the pedestal (230); the lower seat plate (240) is detachably connected to the upper seat plate (250); and a support plate (220) is arranged above the pedestal (230) to prevent the lower seat plate (240) from being detachably connected to the upper seat plate (250). The second spring (280) elastically supports the lower seat plate (240); a debris collection groove (241) is provided on the upper surface of the lower seat plate (240); a debris outlet (242) connected to the debris collection groove (241) is provided on one side of the debris collection groove (241); and the debris collection groove (241) is gradually inclined downward toward the debris outlet (242); and a positioning block (260) and an elastic positioning member (270) for positioning a reflector are respectively provided in the loading groove of the upper seat plate (250); An internal support portion (30), the internal support portion (30) comprising a sphere (310), an elastic ring seat (320) with an open top, and a ring pressure plate (340), the sphere (310) being fixed to the bottom of the lower seat plate (240) and movably passing through the top of the pedestal (230), the elastic ring seat (320) being arranged above the support plate (220), and the inclined arc surface inside the elastic ring seat (320) elastically supports the sphere (310), an elastic support ring (330) being arranged on one side of the top inclined surface of the elastic ring seat (320) to cooperate with the inclined arc surface of the elastic ring seat (320) to support the sphere (310), the ring pressure plate (340) being arranged on the bottom side of the cavity layer inside the elastic ring seat (320), and the ring pressure plate (340) being connected to the support plate (220) and pressing and fixing the elastic ring seat (320).

2. A reflector polishing fixed damping mechanism according to claim 1, characterized in that: The lifting and lowering adjustment part (10) comprises a motor (110), a mounting seat (120), a threaded rod (130), a support seat (140) and a bracket (150); the motor (110) is mounted on the bottom of the mounting seat (120), and the bottom end of the threaded rod (130) is connected to the output shaft end of the motor (110); the bracket (150) is arranged on one side of the mounting seat (120), and the threaded rod (130) is rotatably arranged with the mounting seat (120) and the bracket (150), respectively, and the threaded rod (130) rotatably passes through the support seat (140).

3. A reflector polishing fixed damping mechanism according to claim 2, characterized in that: The support seat (140) and the bracket (150) are slidably matched, and the beam plate (210) and the support seat (140) are fixedly installed.

4. A reflector polishing fixed damping mechanism according to claim 1, characterized in that: The elastic positioning member (270) comprises a fixed frame (271), a movable block (272), a first guide rod (273) and a first spring (274); the fixed frame (271) is fixed to the outside of the upper seat plate (250); the movable block (272) is located inside the upper seat plate (250); one end of the first guide rod (273) is connected to the movable block (272); the other end of the first guide rod (273) is movable through the fixed frame (271) and the upper seat plate (250); and the first spring (274) is sleeved on the outside of the first guide rod (273) located between the upper seat plate (250) and the fixed frame (271).

5. A reflector polishing fixed damping mechanism according to claim 4, characterized in that: A second guide rod (275) is arranged outside the movable block (272), and the second guide rod (275) movably penetrates the upper seat plate (250).

6. A reflector polishing fixing and damping mechanism according to claim 1, characterized in that: The top of the pedestal (230) is provided with a placement hole (232), and the bottom end of the second spring (280) is arranged inside the placement hole (232).

7. A reflector polishing fixing and damping mechanism according to claim 6, characterized in that: A through hole (243) is provided on the lower seat plate (240), and the top end of the second spring (280) is arranged inside the through hole (243).

8. The reflector polishing fixing and damping mechanism according to claim 1, characterized in that: The invention also comprises a debris and dust auxiliary collection part (40), wherein the debris and dust auxiliary collection part (40) comprises a collection box (410), an air inlet hose (420), a fan (430), a box cover (440) and a debris collection cover (480), wherein the debris collection cover (480) is arranged outside the upper seat plate (250), the fan (430) is installed at the bottom of the two beam plates (210), and the box cover (440) is fixed to the bottom of the fan (430), the ventilation opening on the box cover (440) is aligned with the fan (430), and a mesh plate (450) is arranged inside the ventilation opening, the top end of the air inlet hose (420) is connected to the debris outlet (242) on one side of the lower seat plate (240), and the bottom end of the air inlet hose (420) passes through the box cover (440) and is connected to the inside of the collection box (410).

9. A reflector polishing fixing and damping mechanism according to claim 8, characterized in that: The debris and dust auxiliary collection portion (40) further comprises a buckle (460), and the buckle (460) connects the collection box (410) and the box cover (440).

10. The reflector polishing fixing and damping mechanism according to claim 8, characterized in that: An air inlet (470) is provided at the top of the box cover (440), and the bottom end of the air inlet hose (420) is connected to the air inlet (470).

Images