Thermoelectrochemical oxidation method based on magnetic field regulation and control

Abstract

A thermoelectric chemical oxidation method based on magnetic field regulation and control comprises the steps that a first cylindrical electrode and a second cylindrical electrode are placed in two plating pools with electrolyte respectively, and a conductor wire rod penetrates through the electrolyte along the axes of the two cylindrical electrodes under traction of a winding device; a plurality of solenoids are arranged on the periphery of a plating tank, and the current in each solenoid is periodically and sequentially adjusted at different moments in the thermoelectric chemical oxidation process, so that a rotating magnetic field is generated on the periphery of the plating tank. According to the method, the movement of the plasma in the thermoelectric chemical oxidation process is regulated and controlled through the external magnetic field, the gathering of the plasma in the thermoelectric chemical oxidation process is reduced, the intensity of the plasma is reduced, and non-uniform ablation is avoided.

Description

[0001] This application is a divisional application of the original application. The filing date of the original application is January 28, 2022, the application number is 2022101111966, and the name of the invention is Thermoelectrochemical oxidation device based on magnetic field regulation. Technical Field

[0002] The invention relates to the technical field of surface treatment, and in particular to a thermoelectrochemical oxidation method based on magnetic field regulation. Background Art

[0003] Thermoelectrochemical oxidation is also known as microplasma oxidation, plasma thermoelectrochemical oxidation, plasma enhanced electrochemical surface ceramicization, etc. Its working voltage is relatively high. However, during the thermoelectrochemical oxidation of materials, excessive plasma aggregation will lead to uneven ablation on the surface of the material, affecting the quality of surface treatment. Summary of the invention

[0004] The object of the present invention is to provide a thermoelectrochemical oxidation method based on magnetic field regulation, which regulates the movement of plasma in the thermoelectrochemical oxidation process by auxiliary magnetic field, reduces the aggregation of plasma in the micro-arc oxidation process, reduces the intensity of plasma, avoids uneven ablation, and thus realizes the optimization of the thermoelectrochemical oxidation process.

[0005] To achieve the above-mentioned purpose, the technical solution of the present invention is as follows:

[0006] A thermoelectrochemical oxidation method based on magnetic field regulation includes a plating pool with an electrolyte in which a workpiece to be processed is located. The workpiece to be processed and the electrolyte are respectively connected to a thermoelectrochemical oxidation power source, and a component for generating a magnetic field is also provided next to the plating pool.

[0007] Furthermore, the axial direction of the component generating the magnetic field is perpendicular or parallel to the surface of the workpiece to be processed where the thermo-electrochemical oxidation occurs.

[0008] Furthermore, the number of the components for generating a magnetic field is n, where n≥2 and n is an even number, and the components for generating a magnetic field are symmetrically distributed on both sides of the surface of the workpiece to be processed where thermoelectrochemical oxidation occurs.

[0009] Furthermore, the workpiece to be processed is a conductor wire, and both ends of the conductor wire are respectively wound on a unwinding device and a winding device. The plating pool includes a plating pool 1 and a plating pool 2. Cylindrical electrodes 1 and 2 are respectively placed in the two plating pools. The conductor wire passes through the electrolyte along the axis of the cylindrical electrode under the traction of the winding device. The n=4, and the four components that generate the magnetic field are symmetrically distributed along the conductor wire outside the plating pool in groups of two.

[0010] Furthermore, the conductor wire is a flat aluminum wire or aluminum foil.

[0011] Furthermore, the component generating the magnetic field is a permanent magnet or a solenoid, and the solenoid is connected to a DC power supply.

[0012] Furthermore, the circuit connecting the solenoid coil and the DC power supply also has a current regulating device.

[0013] Furthermore, the number of the components generating the magnetic field is not less than 3, and the components generating the magnetic field are distributed around the plating pool. The components generating the magnetic field are solenoids, and the current in each solenoid is periodically adjusted in turn at different times during the thermoelectrochemical oxidation process to generate a dynamic rotating magnetic field around the plating pool.

[0014] Furthermore, the components generating the magnetic field are distributed on the same circular ring at equal intervals around the plating pool, and the workpiece to be processed is located at the center of the circular ring.

[0015] Furthermore, the workpiece to be processed is a cuboid, and the number of the components generating a magnetic field is 4. The 4 components generating a magnetic field are symmetrically distributed around the cuboid workpiece, and the currents in the 4 solenoids are periodically adjusted in sequence during the thermoelectrochemical oxidation process.

[0016] Compared with the prior art, the beneficial technical effects of the present invention are:

[0017] The present invention provides a thermoelectrochemical oxidation method based on magnetic field regulation, which regulates the movement of plasma in the thermoelectrochemical oxidation process by an external magnetic field, reduces the aggregation of plasma in the thermoelectrochemical oxidation process, reduces the intensity of plasma, avoids uneven ablation, and thus optimizes the thermoelectrochemical oxidation process.

[0018] By applying a longitudinal magnetic field perpendicular to the surface of the plated workpiece and utilizing a longitudinal magnetic field parallel to the plasma axis, the morphology of the plasma during the thermoelectrochemical oxidation process is regulated, the aggregation of the plasma is suppressed, and the intensity of the plasma is reduced; the current threshold for forming anode spots is increased so that the plasma can remain in a diffuse state at high currents, greatly reducing the ablation of the material.

[0019] The Lorentz force is exerted on the plasma through a transverse magnetic field perpendicular to the plasma axis, which promotes arc movement and cooling, thereby shortening the plasma burning time and avoiding uneven ablation. Increasing the transverse magnetic field can also shorten the time required for the plasma to start moving, thereby promoting plasma movement. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is a schematic structural diagram of a thermoelectrochemical oxidation method based on magnetic field regulation in Example 1 of the present invention;

[0021] Figure 2Schematic diagram of the principle of regulating the plasma morphology by a magnetic field in Example 1 of the present invention, wherein the left figure is without applying a magnetic field, and the right figure is with applying a magnetic field;

[0022] Figure 3 is a schematic structural diagram of a thermoelectrochemical oxidation method based on magnetic field regulation in Example 2 of the present invention;

[0023] Figure 4 It is a schematic structural diagram of a thermoelectrochemical oxidation device controlled by a rotating magnetic field in Example 4 of the present invention. DETAILED DESCRIPTION

[0024] The technical solution of the present invention will be clearly and completely described below in conjunction with the accompanying drawings and specific embodiments.

[0025] Example 1

[0026] like Figure 1 As shown, a thermoelectrochemical oxidation method based on magnetic field regulation includes a plating pool 1 2 and a plating pool 2 3, wherein the plating pools have an electrolyte, and cylindrical electrodes 1 4 and 2 5 are placed in the two plating pools, respectively, and a flat aluminum wire 1 passes through the plating pool 1 2, the plating pool 2 3 and the electrodes 1 4 and 2 5 therein (this thermoelectrochemical oxidation device is a prior art, and its specific structure and working principle can be found in Chinese invention patent CN2021116747753). In addition, a solenoid coil 6 is also included as an external component for generating a magnetic field. Four solenoid coils 6 are symmetrically distributed along the flat aluminum wire 1 outside the plating pool in groups of two.

[0027] The device of the present invention utilizes a longitudinal magnetic field parallel to the plasma axis to control the plasma morphology. The longitudinal magnetic field can suppress the aggregation of plasma, increase the current threshold for forming anode spots, and enable the plasma to remain in a diffuse state at high currents, greatly reducing the ablation of materials. In terms of the regulation of plasma by the longitudinal magnetic field, the basic function of the longitudinal magnetic field is to cause electrons to rotate around the magnetic lines of force of the longitudinal magnetic field, thereby limiting the radial contraction or diffusion of electrons. Since the movement of electrons is limited, the electrostatic force in the plasma will also limit the movement of ions to reduce the radial loss of plasma. Figure 2 As shown, during the thermoelectrochemical oxidation, a ceramic film layer 101 is formed on the flat aluminum wire 1. When no magnetic field is applied ( Figure 2 Left), the plasma 102 is highly concentrated, resulting in high temperature and high intensity of the plasma 102, which easily causes uneven ablation; when a magnetic field is applied ( Figure 2 Right), the longitudinal magnetic field can suppress the aggregation of plasma 102, increase the current threshold for forming anode spots, and enable plasma 102 to remain in a diffuse state at high currents, which can greatly reduce the ablation of materials.

[0028] Example 2

[0029] like Figure 3 As shown, the difference between this embodiment and embodiment 1 is that only one plating pool and electrode are used, the flat aluminum wire 1 and the cylindrical electrode 4 are respectively connected to the thermoelectrochemical oxidation power supply, and a pair of spiral coils 6 are symmetrically distributed on both sides of the flat aluminum wire 1. The circuit connecting the spiral coils to the DC power supply also has a current regulating device, which adjusts the current size according to different process parameters in the thermoelectrochemical oxidation process to achieve regulation of the magnetic field strength.

[0030] Example 3

[0031] A thermoelectrochemical oxidation device regulated by a rotating magnetic field. Compared with Example 1, in this embodiment, there are multiple components that generate a magnetic field, and the components that generate a magnetic field are distributed at equal intervals around the plating pool. Preferably, the components that generate a magnetic field are distributed on the same circular ring around the plating pool, and the workpiece to be processed is located at the center of the circular ring. The component that generates the magnetic field is a solenoid. At different times during the thermoelectrochemical oxidation process, the current in each solenoid is periodically adjusted in turn to generate a rotating magnetic field around the plating pool, which promotes arc movement and cooling, thereby shortening the plasma combustion time, so as to regulate the movement of plasma during the thermoelectrochemical oxidation process, reduce the aggregation of plasma during the thermoelectrochemical oxidation process, avoid uneven ablation, and optimize the thermoelectrochemical oxidation process. Increasing the transverse magnetic field can also shorten the time required for the plasma to start moving, thereby promoting the movement of the plasma.

[0032] Example 4

[0033] like Figure 4 As shown, a thermoelectrochemical oxidation device based on rotating magnetic field regulation includes a plating pool 9, an electrode 8 and a rectangular workpiece to be processed 7, and four solenoids 6 are evenly distributed around the plating pool 9. During the thermoelectrochemical oxidation process, the current in the four solenoids 6 is periodically adjusted in turn to generate a dynamically changing spiral magnetic field around the plating pool 9.

Claims

1. A thermoelectrochemical oxidation method based on magnetic field regulation, characterized in that: The method comprises: placing a cylindrical electrode 1 and an electrode 2 in two plating tanks with electrolyte respectively, and allowing the conductor wire to pass through the electrolyte along the axis of the two cylindrical electrodes under the traction of a winding device; More than three solenoids are arranged around the plating pool, and the current in each solenoid is periodically adjusted in sequence at different times during the thermoelectrochemical oxidation process to generate a rotating magnetic field around the plating pool.

2. The thermoelectrochemical oxidation method based on magnetic field regulation according to claim 1, characterized in that: The solenoids are distributed on the same circular ring at equal intervals around the plating pool, and the conductor wire is located at the center of the circular ring.

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