Vapor deposition device

Abstract

The invention provides an evaporation device which comprises a substrate to be evaporated, a mask, a plurality of magnetic adsorption units and a magnetic isolation structure, the magnetic adsorption units are arranged on the side, away from the mask, of the substrate to be evaporated at intervals, and the magnetic adsorption units are used for adsorbing the mask to the substrate; the magnetic isolation structure and the magnetic adsorption units are located on the same side of the to-be-evaporated substrate and used for isolating any two adjacent magnetic adsorption units. According to the evaporation device, any two adjacent magnetic adsorption units are isolated through the magnetic isolation structures, so that mutual interference of magnetic fields between the magnetic adsorption units is avoided, the distribution uniformity of the magnetic fields is improved, the magnetic adsorption force of the magnetic adsorption units on each area of the mask is more uniform, and the evaporation efficiency is improved. Therefore, in the process that the mask plate is used for carrying out evaporation on the to-be-evaporated substrate, the mask plate is attached to the to-be-evaporated substrate more uniformly and tightly, the phenomenon that the mask plate is wrinkled is reduced, poor evaporation such as color mixing is reduced, and the evaporation effect is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to an evaporation device. Background Art

[0002] Organic Light Emitting Display (OLED) and flat-panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, desktop computers, etc. due to their advantages such as high image quality, power saving, thin body and wide application range, becoming the mainstream in display devices.

[0003] In the manufacturing process of organic light-emitting diode (OLED) display panels, it is necessary to form a desired pattern on a substrate using a mask by evaporation. However, in existing evaporation devices, the mask and the substrate are prone to uneven bonding, which affects the evaporation effect. Summary of the invention

[0004] In view of this, the purpose of the present application is to provide a vapor deposition device, which improves the problem of uneven mask lamination by isolating the magnetic field between magnetic adsorption units.

[0005] Based on the above objectives, the present application provides a vapor deposition device, which includes:

[0006] A substrate to be evaporated;

[0007] A mask plate is arranged on one side of the substrate to be evaporated;

[0008] A plurality of magnetic adsorption units are arranged at intervals on a side of the substrate to be evaporated away from the mask, and the magnetic adsorption units are used to adsorb the mask to the substrate;

[0009] A magnetic isolation structure, wherein the magnetic isolation structure and the magnetic adsorption unit are located on the same side of the substrate to be evaporated, and is used to isolate any two adjacent magnetic adsorption units.

[0010] In one embodiment, the magnetic isolation structure includes a first isolation plate and a second isolation plate, the first isolation plate and the second isolation plate intersect to form a plurality of isolation spaces, and the magnetic adsorption unit is located in the isolation space;

[0011] In one embodiment, the thickness of the first isolation plate and the second isolation plate is 0.5-1.5 mm;

[0012] In one embodiment, the first separator plate and the second separator plate both include non-magnetic metal separators;

[0013] In one embodiment, the plurality of magnetic adsorption units are arranged in a matrix, and the first isolation plate and the second isolation plate are perpendicular to each other.

[0014] In one embodiment, the plurality of magnetic adsorption units are configured such that the magnetic field strength gradually decreases or increases from the center position to the edge position of the substrate to be evaporated.

[0015] In one embodiment, the magnetic adsorption unit includes an electromagnet; and the evaporation device further includes:

[0016] A controller, electrically connected to the magnetic adsorption unit, and used to control the magnetic field strength of each magnetic adsorption unit;

[0017] In one embodiment, the evaporation device further includes a magnetic field detector, which is used to detect the magnetic field strength of each magnetic adsorption unit and feed back to the controller.

[0018] In one embodiment, the mask includes:

[0019] Mask version body;

[0020] The support bar is used to support the mask body, and the support bar includes a telescopic portion, and the telescopic portion includes a magnetostrictive material, which is used to shrink along the length direction of the support bar under the action of a magnetic field.

[0021] In one embodiment, the magnetostrictive material comprises a giant magnetostrictive material;

[0022] In one embodiment, the magnetostrictive material includes an alloy based on TbFe2 or DyFe2.

[0023] In one embodiment, the telescopic portion is configured to contract under the action of the magnetic field of the magnetic adsorption unit;

[0024] In one embodiment, an orthographic projection of the telescopic portion on the mask at least partially overlaps with an orthographic projection of the plurality of magnetic adsorption units on the mask.

[0025] In one embodiment, the telescopic portion is located in the middle of the support bar in the length direction.

[0026] In one embodiment, the support bar includes at least two telescopic parts arranged at intervals along the length direction.

[0027] In one embodiment, the telescopic portion includes an arc-shaped structure, and the opening direction of the arc-shaped structure is located in the length direction of the telescopic portion.

[0028] In one embodiment, the support bar includes at least one pair of arc-shaped structures with openings in opposite directions.

[0029] Compared with the prior art, the evaporation device provided in the present application uses a plurality of magnetic adsorption units to adsorb and fix the mask plate on the substrate to be evaporated, and uses a magnetic isolation structure to isolate any two adjacent magnetic adsorption units to avoid mutual interference of the magnetic fields between the magnetic adsorption units and improve the uniformity of the magnetic field distribution. When the mask plate is adsorbed by the corresponding magnetic adsorption unit, the various areas of the mask plate are more evenly subjected to the magnetic adsorption force of the magnetic adsorption unit. Therefore, in the process of using the mask plate to evaporate the substrate to be evaporated, the mask plate is more evenly and tightly attached to the substrate to be evaporated, which is beneficial to reduce the phenomenon of wrinkles on the mask plate and reduce poor evaporation such as color mixing, thereby improving the evaporation effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the present application or related technologies, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, the drawings described below are only embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0031] Figure 1 is a schematic diagram of a related evaporation device;

[0032] Figure 2 A schematic diagram of a use state of a vapor deposition device provided in one embodiment of the present application;

[0033] Figure 3 A schematic top view of a vapor deposition device provided in one embodiment of the present application;

[0034] Figure 4 A cross-sectional schematic diagram of a vapor deposition device provided in one embodiment of the present application;

[0035] Figure 5 A cross-sectional schematic diagram of a vapor deposition device provided in another embodiment of the present application;

[0036] Figure 6 A schematic diagram of a mask of an evaporation device provided in one embodiment of the present application;

[0037] Figure 7 A schematic diagram of a support bar of a vapor deposition device provided in one embodiment of the present application;

[0038] Figure 8A schematic diagram of a support bar of a vapor deposition device provided in another embodiment of the present application;

[0039] Fig. 9 A schematic diagram of a support bar of an evaporation device provided in another embodiment of the present application.

[0040] Marking Description:

[0041] 100, evaporation device; 10, mask; 20, substrate to be evaporated; 30, evaporation source; 40, magnetic adsorption unit; 50, magnetic isolation structure; 51, first isolation plate; 52, second isolation plate; 110, mask body; 120, support bar; 121, telescopic part. DETAILED DESCRIPTION

[0042] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in combination with specific embodiments and with reference to the accompanying drawings.

[0043] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the present application should be the usual meanings understood by people with ordinary skills in the field to which the present application belongs. The "first", "second" and similar words used in the embodiments of the present application do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0044] OLED display has the advantages of being thin and light, low power consumption, high contrast, high color gamut, and flexible display, and is the development trend of the next generation of displays. OLED display includes passive organic electroluminescent diode (Passive matrix OLED; PMOLED) display and active matrix organic light emitting diode panel (Active Matrix / Organic Light Emitting Diode; AMOLED) display. AMOLED display can be realized through a glass substrate of low temperature polysilicon technology (Low Temperature Poly-silicon; LTPS) and FMM (Fine Metal Mask, also known as fine metal mask). In the preparation process, an evaporation process is required. The evaporation process is specifically to evaporate the OLED material onto the glass substrate according to a predetermined procedure by vacuum evaporation, and use the pattern on the mask to form red, green and blue devices.

[0045] Reference Figure 1 As shown, a related evaporation device 100 includes a substrate 20 to be evaporated, a mask 10 and an evaporation source 30. Evaporation is generally performed under vacuum conditions, where the material is evaporated by heating the evaporation source 30, and then condensed on the substrate 20 to be evaporated to form a thin film. During the evaporation process, a mask 10 is required to control the shape and position of the thin film. The mask 10 is a metal sheet with a specific pattern, which is placed between the substrate 20 to be evaporated and the evaporation source 30. The mask 10 has an opening, and only the opening corresponding to the mask 10 can form a thin film.

[0046] After long-term research, the inventors found that in the related technology, multiple magnetic adsorption units are used to adsorb the mask 10. Since the magnetic fields between the magnetic adsorption units interfere with each other, the magnetic field interference may change the direction of the magnetic lines of force, causing the direction of the magnetic force to shift, and may also cause the magnetic force to become unstable; the magnetic field interference between the magnetic adsorption units will cause the magnetic force on each area of ​​the mask 10 to be uneven, causing the mask 10 to be unevenly adhered when it is adsorbed to the substrate 20 to be evaporated, thereby affecting the evaporation effect.

[0047] Based on this, the present application provides a solution for an evaporation device to solve the above technical problems, as detailed in the following embodiments.

[0048] Reference Figure 2 , Figure 3 , Figure 4As shown, an embodiment of the present application discloses an evaporation device 100, which includes a substrate 20 to be evaporated, a mask 10, and a plurality of magnetic adsorption units 40, wherein the mask 10 is disposed on one side of the substrate 20 to be evaporated, and the plurality of magnetic adsorption units 40 are arranged at intervals on the side of the substrate 20 to be evaporated away from the mask 10, wherein the magnetic adsorption unit 40 is used to adsorb the mask 10 to the substrate 20 to be evaporated. The evaporation device 100 also includes a magnetic isolation structure 50, which is located on the same side of the substrate 20 to be evaporated as the magnetic adsorption unit 40, and is used to isolate any two adjacent magnetic adsorption units 40.

[0049] The evaporation device 100 provided in the embodiment of the present application uses a plurality of magnetic adsorption units 40 to adsorb and fix the mask plate 10 on the substrate to be evaporated 20, and uses a magnetic isolation structure 50 to isolate any two adjacent magnetic adsorption units 40 to avoid mutual interference of the magnetic fields between the magnetic adsorption units 40 and improve the uniformity of the magnetic field distribution. When the mask plate 10 is adsorbed by the corresponding magnetic adsorption unit 40, the various regions of the mask plate 10 are more evenly subjected to the magnetic adsorption force of the magnetic adsorption unit 40. In the process of using the mask plate 10 to evaporate the substrate 20 to be evaporated, the mask plate 10 is more evenly and tightly attached to the substrate to be evaporated 20, which is beneficial to reduce the phenomenon of wrinkles on the mask plate 10 and reduce poor evaporation such as color mixing, thereby improving the evaporation effect.

[0050] Specifically, the substrate 20 to be evaporated is arranged on the side of the mask 10 away from the evaporation source 30. In addition, a magnetic adsorption unit 40 and a magnetic isolation structure 50 are provided on the side of the substrate 20 to be evaporated away from the mask 10, wherein the magnetic isolation structure 50 has a magnetic shielding effect. The magnetic isolation structure 50 exists between any two adjacent magnetic adsorption units 40. When the magnetic adsorption units 40 are arranged in a single row or a single column, the magnetic isolation structure 50 includes a plurality of magnetic isolation plates arranged side by side or in parallel and spaced relation. When the magnetic adsorption units 40 are arranged in a rectangular array or a circular array, the magnetic isolation structure 50 includes isolation plates connected in a mesh. The mask 10 can be a fine metal mask, and the mask 10 includes a metal material that can be adsorbed by a magnet, and can include any one or more materials doped with magnetic powder, iron, cobalt, nickel, iron oxide, and ferroferric oxide, as long as the mask 10 and the magnetic adsorption unit 40 can be magnetically attracted to each other. The substrate 20 to be evaporated can be a glass substrate.

[0051] Exemplarily, the magnetic adsorption unit 40 can be a permanent magnet. A piece of permanent magnet plate is cut into several small magnet blocks of the same size using a precision cutting machine. The size of each magnet block is not more than 5cm*3cm*5cm. It is placed as a magnetic adsorption unit 40 on the side of the substrate 20 to be evaporated away from the mask 10. Compared with the use of a whole magnetic adsorption structure, the use of multiple magnetic adsorption units 40 can effectively reduce the volume and weight of the magnetic adsorption unit 40, thereby reducing its pressure on the mask 10 to reduce the generation of wrinkles. When the above-mentioned magnetic adsorption unit 40 is a permanent magnet, when it is necessary to change the adsorption force of the magnetic adsorption unit 40 on the mask 10, the distance between the magnetic adsorption unit 40 and the mask 10 can be changed, or the size, number or magnetization intensity of the magnetic adsorption unit 40 can be directly changed to change the magnetic field intensity generated by the magnetic adsorption unit 40. In addition, the magnetic adsorption unit 40 can also be an electromagnet. When the above-mentioned magnetic adsorption unit 40 is an electromagnet, after the electromagnet is energized, it can generate a magnetic adsorption force that adsorbs the above-mentioned mask 10.

[0052] Reference Figure 3 As shown, in one embodiment, the magnetic isolation structure 50 includes a first isolation plate 51 and a second isolation plate 52. The first isolation plate 51 and the second isolation plate 52 intersect to form a plurality of isolation spaces, and the magnetic adsorption unit 40 is located in the isolation space.

[0053] The evaporation device 100 provided in this embodiment forms an independent isolation space by means of the criss-crossing first isolation plates 51 and second isolation plates 52, and places the magnetic adsorption unit 40 in the isolation space, so that the magnetic fields between adjacent magnetic adsorption units 40 do not interfere with each other, further ensuring that the magnetic adsorption units 40 located in the isolation space generate more independent and uniform magnetic adsorption forces on each area of ​​the mask plate 10.

[0054] In one embodiment, the thickness of the first isolation plate 51 and the second isolation plate 52 is 0.5-1.5 mm. For example, the thickness of the first isolation plate 51 can be 0.5 mm, 0.8 mm, 1 mm, 1.2 mm, 1.5 mm, etc.; the thickness of the second isolation plate 52 can be 0.5 mm, 0.8 mm, 1 mm, 1.2 mm, 1.5 mm, etc.

[0055] In one embodiment, the first isolation plate 51 and the second isolation plate 52 both include non-magnetic metal isolation plates. Preferably, the material of the first isolation plate 51 and the second isolation plate 52 includes aluminum or aluminum alloy.

[0056] In one embodiment, a plurality of magnetic adsorption units 40 are arranged in a matrix. Optionally, the first isolation plate 51 and the second isolation plate 52 are perpendicular to each other. The rectangular isolation space formed by the cross-arranged first isolation plate 51 and the second isolation plate 52 can accommodate the magnetic adsorption units 40 arranged in a matrix. In other embodiments, the plurality of magnetic adsorption units 40 can also be distributed in a corresponding shape according to the shape and pattern of the mask 10.

[0057] In one embodiment, in the evaporation device 100, the plurality of magnetic adsorption units 40 are configured such that the magnetic field strength gradually decreases or increases from the center position to the edge position of the substrate 20 to be evaporated. The magnetic field strength of the plurality of magnetic adsorption units 40 located on the substrate 20 to be evaporated presents a gradient or linear change, so that the mask 10 is gradually attached from the middle area with a large sagging amount to the surrounding areas with a small sagging amount, which can effectively eliminate the wrinkles and poor attachment of the mask 10 during the attachment process.

[0058] Specifically, when the sagging amount of the center area of ​​the mask 10 is large, the magnetic force from the magnetic adsorption unit 40 at the center position of the substrate 20 to be evaporated to the magnetic adsorption unit 40 at the edge position gradually decreases, and accordingly, the magnetic adsorption force of the magnetic adsorption unit 40 on the mask 10 from the center position to the edge position gradually decreases, so that the mask 10 is gradually fitted from the center to the periphery, thereby reducing the sagging amount of the center area of ​​the mask 10 and avoiding wrinkles during the fitting process. When the sagging amount of the edges around the mask 10 is large, the magnetic force from the magnetic adsorption unit 40 at the center position of the substrate 20 to be evaporated to the magnetic adsorption unit 40 at the edge position gradually increases, and accordingly, the magnetic adsorption force of the magnetic adsorption unit 40 on the mask 10 from the center position to the edge position gradually increases, thereby reducing the sagging amount at the edge position of the mask 10.

[0059] In one embodiment, the magnetic adsorption unit 40 includes an electromagnet; the evaporation device further includes a controller, which is electrically connected to the magnetic adsorption unit 40 and is used to control the magnetic field strength of each magnetic adsorption unit 40 .

[0060] Among them, the controller controls the magnitude or direction of the current passing through the electromagnet to adjust the magnitude or direction of the magnetic field strength of a single magnetic adsorption unit 40, and then adjusts the magnitude of the adsorption force of the magnetic adsorption unit 40 on the mask plate 10, so as to achieve local adjustment of the adsorption force of the magnetic adsorption unit 40 on the mask plate 10. In the process of using the mask plate 10 to evaporate the substrate 20 to be evaporated, it is beneficial to reduce the phenomenon of wrinkles on the mask plate 10 and improve the tightness of the fit between the mask plate 10 and the substrate 20 to be evaporated. In this way, in the process of using the mask plate 10 to evaporate the substrate 20 to be evaporated, it is beneficial to reduce the risk of poor evaporation such as color mixing.

[0061] Furthermore, in one embodiment, the evaporation device 100 further includes a magnetic field detector, which is used to detect the magnetic field strength of each magnetic adsorption unit 40 and feed it back to the controller.

[0062] Specifically, the magnetic field intensity of each magnetic adsorption unit 40 can be monitored in real time by a magnetic field detector, and a high-precision sensor can be used, and the monitoring result is fed back to the controller of the magnetic adsorption unit 40. Then, the magnetic field intensity of the magnetic adsorption unit 40 is controlled by the controller to strengthen the fit of the position where the wrinkles of the mask 10 are large. The precise control system formed by the controller and the magnetic field detector can realize precise control of the magnetic adsorption unit 40 and simplify the operation.

[0063] Reference Figure 5 , Figure 6 As shown, in one embodiment, the mask 10 includes a mask body 110 and a support bar 120, the support bar 120 is used to support the mask body 110, the support bar 120 includes a telescopic portion 121, the telescopic portion 121 includes a magnetostrictive material, and is used to shrink or stretch along the length direction of the support bar 120 under the action of a magnetic field. Specifically, the support bar 120 can be correspondingly arranged at the peripheral position of the mask opening so as not to affect the evaporation effect. Among them, the support bar 120 supports the mask body 110 upward, which can reduce the sagging of the mask body 110 due to gravity or other reasons. For example, during evaporation, the two ends of the support bar 120 are fixed to the mounting frame. When the magnetostrictive material in the support bar 120 is subjected to the magnetic field and shrinks and deforms along the length direction, it can automatically move upward in a direction perpendicular to the length direction, which can reduce the sagging of the mask body 110 in the corresponding area. Alternatively, when the magnetostrictive material in the control support bar 120 is extended by the magnetic field, the mask body 110 is driven to arch upward to balance the sagging tendency.

[0064] Specifically, the mask version body 110 can be an integrally formed structure, including a plurality of evaporation openings and a shielding area, the shielding area is arranged around the evaporation openings, and two adjacent evaporation openings are separated by the shielding area, and the shielding area can be a cross-arranged grid structure. In this case, the support bars 120 can be arranged in a grid shape and correspondingly arranged in the shielding area of ​​the mask version body 110. Alternatively, the mask version body 110 can also be a non-integrated structure, for example, the mask version body 110 can include a plurality of mask bars, and the plurality of mask bars are cross-arranged. In this case, the support bars 120 can be supported between adjacent mask bars.

[0065] Specifically, magnetostrictive materials will undergo a slight elongation or shortening deformation along the direction of the magnetic field when placed in a magnetic field. This phenomenon is called magnetostriction.

[0066] In one embodiment, the magnetostrictive material includes a giant magnetostrictive material. The giant magnetostrictive material has a significantly increased amount of expansion and contraction strain. For example, the giant magnetostrictive material is a rare earth-iron-based giant magnetostrictive material, wherein the rare earth element may be at least one of terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), samarium (Sm), and thulium (Tm). Preferably, the magnetostrictive material includes an alloy based on TbFe2 or DyFe2.

[0067] In one embodiment, the telescopic portion 121 is configured to shrink under the magnetic field of the magnetic adsorption unit 40. The magnetic adsorption unit 40 located on one side of the mask 10 not only makes the mask 10 adsorb and adhere, but also applies a magnetic field to the telescopic portion 121 in the support bar 120 on the other side, so that it shrinks under the action of the magnetic field, thereby reducing the sagging amount of the mask 10, without setting an additional magnetic field source.

[0068] In one embodiment, the orthographic projection of the retractable portion 121 on the mask 10 at least partially overlaps with the orthographic projection of the plurality of magnetic adsorption units 40 on the mask 10 .

[0069] Reference Figure 7 As shown, in one embodiment, the telescopic portion 121 is located in the middle of the length direction of the support bar 120. When the telescopic portion 121 in the support bar 120 is subjected to the magnetic field, the support bar 120 begins to contract from the middle position, thereby lifting up the middle area of ​​the mask 10 that is prone to sinking, which helps to improve the support effect of the mask 10.

[0070] Reference Figure 8 , Fig. 9 As shown, in one embodiment, the support bar 120 includes at least one pair of telescopic parts 121 symmetrically arranged along the length direction. The paired telescopic parts 121 are located on both sides of the middle position of the support bar 120. When the telescopic parts 121 in the support bar 120 are subjected to the magnetic field, the support bar 120 contracts from both sides at the same time, the contraction is more uniform, and the overall contraction amount of the support bar 120 is increased.

[0071] Reference Fig. 9 As shown, in one embodiment, the telescopic portion 121 includes an arc-shaped structure, and the opening direction of the arc-shaped structure is located in the length direction of the telescopic portion 121.

[0072] Optionally, the support bar 120 includes one or more pairs of arc structures with opposite opening directions. The shape and position of the telescopic portion 121 can be arranged specifically according to the distribution of magnetic lines of force, so as to more accurately control the telescopic action of the support bar 120.

[0073] Although the present application has been described in conjunction with specific embodiments thereof, many alternatives, modifications and variations of these embodiments will be apparent to those skilled in the art in light of the foregoing description.

[0074] It should be noted that the above describes some embodiments of the present application. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps recorded in the claims can be performed in an order different from that in the above embodiments and still achieve the desired results. In addition, the processes depicted in the accompanying drawings do not necessarily require the specific order or continuous order shown to achieve the desired results. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0075] The embodiments of the present application are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the embodiments of the present application should be included in the scope of protection of the present application.

Claims

1. A vapor deposition device, characterized in that: include: A substrate to be evaporated; A mask plate is arranged on one side of the substrate to be evaporated; A plurality of magnetic adsorption units are arranged at intervals on a side of the substrate to be evaporated away from the mask, and the magnetic adsorption units are used to adsorb the mask to the substrate; A magnetic isolation structure, wherein the magnetic isolation structure and the magnetic adsorption unit are located on the same side of the substrate to be evaporated, and is used to isolate any two adjacent magnetic adsorption units.

2. The evaporation device according to claim 1, characterized in that: The magnetic isolation structure comprises a first isolation plate and a second isolation plate, wherein the first isolation plate and the second isolation plate intersect to form a plurality of isolation spaces, and the magnetic adsorption unit is located in the isolation spaces; Preferably, the thickness of the first isolation plate and the second isolation plate is comprised between 0.5 and 1.5 mm; Preferably, the first separator plate and the second separator plate each comprise a non-magnetic metal separator; Preferably, the plurality of magnetic adsorption units are arranged in a matrix; Preferably, the first isolation plate and the second isolation plate are perpendicular to each other.

3. The evaporation device according to claim 1, characterized in that: The plurality of magnetic adsorption units are configured such that the magnetic field strength gradually decreases or increases from the center position to the edge position of the substrate to be evaporated.

4. The evaporation device according to claim 1, characterized in that: The magnetic adsorption unit includes an electromagnet; the evaporation device also includes: A controller, electrically connected to the magnetic adsorption unit, and used to control the magnetic field strength of each magnetic adsorption unit; Preferably, the evaporation device further comprises a magnetic field detector, and the magnetic field detector is used to detect the magnetic field strength of each of the magnetic adsorption units and feed back the strength to the controller.

5. The evaporation device according to claim 1, characterized in that: The mask comprises: Mask version body; The support bar is used to support the mask body, and the support bar includes a telescopic portion, and the telescopic portion includes a magnetostrictive material, which is used to shrink or stretch along the length direction of the support bar under the action of a magnetic field.

6. The evaporation device according to claim 5, characterized in that: The magnetostrictive material includes a giant magnetostrictive material; Preferably, the magnetostrictive material comprises an alloy based on TbFe2 or DyFe2.

7. The evaporation device according to claim 5, characterized in that: The telescopic portion is configured to contract under the action of the magnetic field of the magnetic adsorption unit; Preferably, the orthographic projection of the telescopic portion on the mask at least partially overlaps with the orthographic projections of the plurality of magnetic adsorption units on the mask.

8. The evaporation device according to claim 5, characterized in that: The telescopic portion is located at a middle position of the support bar in the length direction.

9. The evaporation device according to claim 5, characterized in that: The support bar includes at least two telescopic parts arranged at intervals along the length direction.

10. The evaporation device according to claim 5, characterized in that: The telescopic portion comprises an arc-shaped structure, and the opening direction of the arc-shaped structure is located in the length direction of the telescopic portion; Preferably, the support bar comprises at least one pair of arc-shaped structures with opening directions opposite to each other.

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