Mobile phone camera frame and coating process thereof

Abstract

The invention relates to the technical field of coating, in particular to a mobile phone camera frame and a coating technology thereof.The coating technology comprises the following steps that (1) the mobile phone camera frame with the cleaned surface is loaded into a coating jig and placed into a coating cavity, and the outer side of the mobile phone camera frame is provided with a to-be-coated area; (2) starting a pump for vacuumizing and a heating device for heating, and sequentially carrying out six times of coating in the to-be-coated area by adopting a physical vapor deposition method; (3) plating an AF film layer on the surface of the sixth film plating layer; a test shows that the coated mobile phone camera frame has excellent adhesive force and wear resistance, and also has excellent high temperature resistance, temperature shock resistance, hand sweat resistance, cosmetic resistance, salt mist resistance, low-temperature storage, high-temperature storage, constant temperature and humidity and alcohol resistance.

Description

Technical Field

[0001] The present invention relates to the field of film coating technology, and in particular to a mobile phone camera frame and a film coating process thereof. Background Art

[0002] With the rapid development of electronic technology and the popularization of mobile phones, more and more mobile phones are now equipped with cameras. In order to better fix and protect the camera, a camera frame is generally set at the camera setting position of the mobile phone shell. Furthermore, in addition to the basic fixing function, the camera frame generally needs to be coated with a certain color and set with a certain pattern on the surface of the camera frame to play the role of identification and beauty. There is no process for coating the frame of the mobile phone camera in the prior art. Summary of the invention

[0003] In order to overcome the shortcomings and deficiencies in the prior art, an object of the present invention is to provide a mobile phone camera frame and a coating process thereof.

[0004] The purpose of the present invention is achieved through the following technical solution: A coating process for a mobile phone camera frame comprises the following steps:

[0005] (1) placing the cleaned mobile phone camera frame into a coating fixture and placing it into a coating chamber, wherein the outer side of the mobile phone camera frame has an area to be coated;

[0006] (2) Turn on the pump to evacuate and the heating device to heat, and perform six coating operations in sequence using the physical vapor deposition method on the area to be coated:

[0007] A. Select a first coating material and perform a first coating in a reaction gas environment to deposit a first coating layer in the area to be coated, wherein the first coating material is Si-Cr2O3-CrN-CrC and the reaction gas is oxygen;

[0008] B. Select a second coating material and perform a second coating in a reaction gas environment to deposit the second coating layer on the surface of the first coating layer, wherein the second coating material is Si-Cr2O3 and Si-Cr2O3-CrN-CrC, and the reaction gas is nitrogen;

[0009] C. Select a third coating material and perform a third coating in a reaction gas environment to deposit a third coating layer on the surface of the second coating layer. The third coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is nitrogen and oxygen.

[0010] D. Select a fourth coating material and perform a fourth coating in a reaction gas environment to deposit a fourth coating layer on the surface of the third coating layer, wherein the fourth coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is oxygen;

[0011] E. Select a fifth coating material and perform a fifth coating in an environment of working gas to deposit a fifth coating layer on the surface of the fourth coating layer, wherein the fifth coating material is Si-Cr2O3 and the working gas is argon;

[0012] F. Select a sixth coating material and perform a sixth coating in a reaction gas environment to deposit a sixth coating layer on the surface of the fifth coating layer, wherein the sixth coating material is Si-Cr2O3 and the reaction gas is oxygen;

[0013] (3) An AF film layer is coated on the surface of the sixth coating layer.

[0014] Preferably, in the steps B, E and F, the mass content of Si in Si-Cr2O3 is 10%-20%, and the balance is Cr2O3. Silicon has a high refractive index and a low absorption coefficient, and also has a high substrate adhesion; chromium trioxide has high wear resistance and hardness as well as good chemical stability. The coating process of the present invention strictly controls the mass ratio of Si and Cr2O3 in Si-Cr2O3, and the obtained coating layer has good hardness, wear resistance and impact resistance.

[0015] Preferably, in steps C and D, the mass content of In in In-Si-Cr2O3 is 15%-30%, the mass content of Si is 10%-20%, and the balance is Cr2O3. Indium has high transparency, high adhesion, high temperature resistance and corrosion resistance; silicon has high transparency and high substrate adhesion; chromium trioxide has high wear resistance and hardness as well as good chemical stability. The coating process of the present invention strictly controls the mass ratio of In, Si and Cr2O3 in In-Si-Cr2O3, so that the obtained coating layer has good flexibility, wear resistance and good chemical stability.

[0016] Preferably, in steps C and D, the mass content of Si in Si-TiO2N-Cr2O3 is 20%-40%, the mass content of TiO2N is 20%-30%, and the balance is Cr2O3. Silicon has high transparency and high substrate adhesion; titanium dioxide nitride has excellent optical properties; chromium oxide has high wear resistance and hardness as well as good chemical stability. The coating process of the present invention strictly controls the mass ratio of Si, TiO2N and Cr2O3 in Si-TiO2N-Cr2O3, so that the obtained coating layer has good wear resistance and good chemical stability, and the appearance color of the film layer can also be adjusted.

[0017] Preferably, in steps A and B, the mass content of Si in Si-Cr2O3-CrN-CrC is 7%-15%, the mass content of Cr2O3 is 25%-40%, the mass content of CrN is 15%-25%, and the balance is CrC. Silicon has high transparency and high substrate adhesion; chromium trioxide has high wear resistance and hardness as well as good chemical stability; chromium nitride has high hardness and good wear resistance; chromium carbide has high hardness, wear resistance and corrosion resistance. The coating process of the present invention strictly controls the mass ratio of Si, Cr2O3, CrN and CrC in Si-Cr2O3-CrN-CrC, so that the obtained coating layer has good wear resistance, impact resistance and corrosion resistance.

[0018] Preferably, in step B, the second coating material is Si-Cr2O3 and Si-Cr2O3-CrN-CrC mixed in a mass ratio of 0.1-1.0:0.1-1.0. More preferably, the second coating material is Si-Cr2O3 and Si-Cr2O3-CrN-CrC mixed in a mass ratio of 0.5:0.5. The coating process of the present invention strictly controls the mass ratio of Si-Cr2O3 and Si-Cr2O3-CrN-CrC, and the obtained coating layer has good wear resistance, impact resistance and corrosion resistance.

[0019] In the step C, the third coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.1-1.0:0.1-1.0. More preferably, the third coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.5:0.5. The coating process of the present invention strictly controls the mass ratio of In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the obtained coating layer has good flexibility, wear resistance and good chemical stability.

[0020] In the step D, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.1-1.0:0.1-1.0. More preferably, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.5:0.5. The coating process of the present invention strictly controls the mass ratio of In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the obtained coating layer has good flexibility, wear resistance and good chemical stability.

[0021] Preferably, in steps AF, the coating is performed by vacuum evaporation, vacuum ion plating or magnetron sputtering. More preferably, the coating is performed by magnetron sputtering, which bombards the target material with ions so that atoms on the target surface are splashed onto the substrate to form a thin film. Sputtering coating has good film uniformity and adhesion, and is suitable for large-area coating.

[0022] Preferably, in the steps AF, the gas pressure of the coating is 1.0*10 -4 -1.0*10 -2 Pa, power is 1-15kw, coating temperature is 80-160℃, single coating time is 1-10min, and total coating thickness is 1.5-15.0μm. Under high vacuum environment, the impurity gas content is low, which is conducive to the formation of high-purity film. The deposition temperature affects the crystallization quality and stress of the film, and the appropriate temperature needs to be selected according to the material properties and process requirements. The coating process of the present invention strictly controls the process parameters of the coating, and the obtained film layer has good film uniformity and adhesion.

[0023] Preferably, in steps A, C, D and F, the flow rate of oxygen is 10-1000 sccm, in steps B and C, the flow rate of nitrogen is 10-1000 sccm, and in step E, the flow rate of argon is 10-1000 sccm. The coating process of the present invention can improve the color and optical transmittance of the film layer by strictly controlling the flow rate of the gas.

[0024] Another object of the present invention is achieved through the following technical solution: a mobile phone camera frame, wherein the mobile phone camera frame is manufactured according to the above-mentioned coating process.

[0025] The beneficial effects of the present invention are as follows: the mobile phone camera frame of the present invention is coated with Si-Cr2O3-CrN-CrC for the first time, with Si-Cr2O3 and Si-Cr2O3-CrN-CrC for the second time, with In-Si-Cr2O3 and Si-TiO2N-Cr2O3 for the third time, with In-Si-Cr2O3 and Si-TiO2N-Cr2O3 for the fourth time, with Si-Cr2O3 for the fifth time and the sixth time, and then coated with an AF film layer. After testing, the coated mobile phone camera frame has excellent adhesion and wear resistance, and also has excellent high temperature resistance, temperature shock resistance, hand sweat resistance, cosmetics resistance, salt spray resistance, low temperature storage, high temperature storage, constant temperature and humidity and alcohol resistance. DETAILED DESCRIPTION

[0026] In order to facilitate the understanding of those skilled in the art, the present invention is further described below in conjunction with embodiments, and the contents mentioned in the implementation modes are not intended to limit the present invention.

[0027] Example 1

[0028] A coating process for a mobile phone camera frame comprises the following steps:

[0029] (1) placing the cleaned mobile phone camera frame into a coating fixture and placing it into a coating chamber, wherein the outer side of the mobile phone camera frame has an area to be coated;

[0030] (2) Turn on the pump to evacuate and the heating device to heat, and perform six coating operations in sequence using the physical vapor deposition method on the area to be coated:

[0031] A. Select a first coating material and perform a first coating in a reaction gas environment to deposit a first coating layer in the area to be coated, wherein the first coating material is Si-Cr2O3-CrN-CrC and the reaction gas is oxygen;

[0032] B. Select a second coating material and perform a second coating in a reaction gas environment to deposit the second coating layer on the surface of the first coating layer, wherein the second coating material is Si-Cr2O3 and Si-Cr2O3-CrN-CrC, and the reaction gas is nitrogen;

[0033] C. Select a third coating material and perform a third coating in a reaction gas environment to deposit a third coating layer on the surface of the second coating layer. The third coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is nitrogen and oxygen.

[0034] D. Select a fourth coating material and perform a fourth coating in a reaction gas environment to deposit a fourth coating layer on the surface of the third coating layer, wherein the fourth coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is oxygen;

[0035] E. Select a fifth coating material and perform a fifth coating in an environment of working gas to deposit a fifth coating layer on the surface of the fourth coating layer, wherein the fifth coating material is Si-Cr2O3 and the working gas is argon;

[0036] F. Select a sixth coating material and perform a sixth coating in a reaction gas environment to deposit a sixth coating layer on the surface of the fifth coating layer, wherein the sixth coating material is Si-Cr2O3 and the reaction gas is oxygen;

[0037] (3) An AF film layer is coated on the surface of the sixth coating layer.

[0038] In the steps B, E and F, the mass content of Si in Si-Cr2O3 is 10%, and the balance is Cr2O3.

[0039] In the steps C and D, the mass content of In in In-Si-Cr2O3 is 15%, the mass content of Si is 10%, and the balance is Cr2O3.

[0040] In the steps C and D, the mass content of Si in Si-TiO2N-Cr2O3 is 20%, the mass content of TiO2N is 20%, and the balance is Cr2O3.

[0041] In the steps A and B, the mass content of Si in Si-Cr2O3-CrN-CrC is 7%, the mass content of Cr2O3 is 25%, the mass content of CrN is 15%, and the balance is CrC.

[0042] In the step B, the second coating material is a mixture of Si-Cr2O3 and Si-Cr2O3-CrN-CrC in a mass ratio of 0.2:0.8; in the step C, the third coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.2:0.8; in the step D, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-Ti02N-Cr2O3 in a mass ratio of 0.2:0.8.

[0043] In the steps AF, the coating is performed by magnetron sputtering, and the gas pressure of the coating is 5.0*10 -4 Pa, power is 5kw, coating temperature is 100℃, single coating time is 5min, total coating thickness is 1.8μm (six layers in total, each layer is 300nm thick), in step (3), the thickness of AF film is 10nm.

[0044] In the steps A, C, D and F, the flow rate of oxygen is 200 sccm, in the steps B and C, the flow rate of nitrogen is 200 sccm, and in the step E, the flow rate of argon is 200 sccm.

[0045] A mobile phone camera frame is manufactured according to the above-mentioned coating process.

[0046] Example 2

[0047] The difference between this embodiment and the above-mentioned embodiment 1 is that in the steps B, E and F, the mass content of Si in Si-Cr2O3 is 15%, and the balance is Cr2O3.

[0048] In the steps C and D, the mass content of In in In-Si-Cr2O3 is 22%, the mass content of Si is 15%, and the balance is Cr2O3.

[0049] In the steps C and D, the mass content of Si in Si-TiO2N-Cr2O3 is 30%, the mass content of TiO2N is 25%, and the balance is Cr2O3.

[0050] In the steps A and B, the mass content of Si in Si-Cr2O3-CrN-CrC is 11%, the mass content of Cr2O3 is 32%, the mass content of CrN is 20%, and the balance is CrC.

[0051] In the step B, the second coating material is a mixture of Si-Cr2O3 and Si-Cr2O3-CrN-CrC in a mass ratio of 0.5:0.5; in the step C, the third coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.5:0.5; in the step D, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-Ti02N-Cr2O3 in a mass ratio of 0.5:0.5.

[0052] In the steps AF, the coating is performed by magnetron sputtering, and the gas pressure of the coating is 5.0*10 -3 Pa, power is 10kw, coating temperature is 120℃, single coating time is 8min, total coating thickness is 3.0μm (six layers in total, each layer is 500nm thick), in step (3), the thickness of AF film is 30nm.

[0053] In the steps A, C, D and F, the flow rate of oxygen is 250 sccm, in the steps B and C, the flow rate of nitrogen is 250 sccm, and in the step E, the flow rate of argon is 250 sccm.

[0054] Example 3

[0055] The difference between this embodiment and the above-mentioned embodiment 1 is that in the steps B, E and F, the mass content of Si in Si-Cr2O3 is 20%, and the balance is Cr2O3.

[0056] In the steps C and D, the mass content of In in In-Si-Cr2O3 is 30%, the mass content of Si is 20%, and the balance is Cr2O3.

[0057] In the steps C and D, the mass content of Si in Si-TiO2N-Cr2O3 is 40%, the mass content of TiO2N is 30%, and the balance is Cr2O3.

[0058] In the steps A and B, the mass content of Si in Si-Cr2O3-CrN-CrC is 15%, the mass content of Cr2O3 is 40%, the mass content of CrN is 25%, and the balance is CrC.

[0059] In the step B, the second coating material is a mixture of Si-Cr2O3 and Si-Cr2O3-CrN-CrC in a mass ratio of 0.8:0.2; in the step C, the third coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.8:0.2; in the step D, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-Ti02N-Cr2O3 in a mass ratio of 0.8:0.2.

[0060] In the steps AF, the coating is performed by magnetron sputtering, and the gas pressure of the coating is 8.0*10 -3 Pa, power is 12kw, coating temperature is 140℃, single coating time is 10min, total coating thickness is 4.8μm (six layers in total, each layer is 800nm ​​thick), in step (3), the thickness of AF film is 50nm.

[0061] In the steps A, C, D and F, the flow rate of oxygen is 300 sccm, in the steps B and C, the flow rate of nitrogen is 300 sccm, and in the step E, the flow rate of argon is 300 sccm.

[0062] The performance test of the mobile phone camera frame after coating of Example 1-3 is shown in the following table:

[0063]

[0064] As can be seen from the above table, the mobile phone camera frame of the present invention is coated with Si-Cr2O3-CrN-CrC for the first time, Si-Cr2O3 and Si-Cr2O3-CrN-CrC for the second time, In-Si-Cr2O3 and Si-TiO2N-Cr2O3 for the third time, In-Si-Cr2O3 and Si-TiO2N-Cr2O3 for the fourth time, Si-Cr2O3 for the fifth and sixth times, and then an AF film layer is coated. After testing, the coated mobile phone camera frame has excellent adhesion and wear resistance, as well as excellent resistance to boiling water, temperature shock, hand sweat, cosmetics, salt spray, low temperature storage, high temperature storage, constant temperature and humidity, and alcohol.

[0065] The above embodiments are preferred implementation schemes of the present invention. In addition, the present invention may also be implemented in other ways. Any obvious replacement without departing from the concept of the present invention is within the protection scope of the present invention.

Claims

1. A coating process for a mobile phone camera frame, characterized in that: The steps include: (1) placing the cleaned mobile phone camera frame into a coating fixture and placing it into a coating chamber, wherein the outer side of the mobile phone camera frame has an area to be coated; (2) Turn on the pump to evacuate and the heating device to heat, and perform six coating operations in sequence using the physical vapor deposition method on the area to be coated: A. Select a first coating material and perform a first coating in a reaction gas environment to deposit a first coating layer in the area to be coated, wherein the first coating material is Si-Cr2O3-CrN-CrC and the reaction gas is oxygen; B. Select a second coating material and perform a second coating in a reaction gas environment to deposit the second coating layer on the surface of the first coating layer, wherein the second coating material is Si-Cr2O3 and Si-Cr2O3-CrN-CrC, and the reaction gas is nitrogen; C. Select a third coating material and perform a third coating in a reaction gas environment to deposit a third coating layer on the surface of the second coating layer. The third coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is nitrogen and oxygen. D. Select a fourth coating material and perform a fourth coating in a reaction gas environment to deposit a fourth coating layer on the surface of the third coating layer, wherein the fourth coating material is In-Si-Cr2O3 and Si-TiO2N-Cr2O3, and the reaction gas is oxygen; E. Select a fifth coating material and perform a fifth coating in an environment of working gas to deposit a fifth coating layer on the surface of the fourth coating layer, wherein the fifth coating material is Si-Cr2O3 and the working gas is argon; F. Select a sixth coating material and perform a sixth coating in a reaction gas environment to deposit a sixth coating layer on the surface of the fifth coating layer, wherein the sixth coating material is Si-Cr2O3 and the reaction gas is oxygen; (3) An AF film layer is coated on the surface of the sixth coating layer.

2. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps B, E and F, the mass content of Si in Si-Cr2O3 is 10%-20%, and the balance is Cr2O3.

3. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps C and D, the mass content of In in In-Si-Cr2O3 is 15%-30%, the mass content of Si is 10%-20%, and the balance is Cr2O3.

4. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps C and D, the mass content of Si in Si-TiO2N-Cr2O3 is 20%-40%, the mass content of TiO2N is 20%-30%, and the balance is Cr2O3.

5. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps A and B, the mass content of Si in Si-Cr2O3-CrN-CrC is 7%-15%, the mass content of Cr2O3 is 25%-40%, the mass content of CrN is 15%-25%, and the balance is CrC.

6. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the step B, the second coating material is a mixture of Si-Cr2O3 and Si-Cr2O3-CrN-CrC in a mass ratio of 0.1-1.0:0.1-1.0; in the step C, the third coating material is a mixture of In-Si-Cr2O3 and Si-Ti02N-Cr2O3 in a mass ratio of 0.1-1.0:0.1-1.0; in the step D, the fourth coating material is a mixture of In-Si-Cr2O3 and Si-TiO2N-Cr2O3 in a mass ratio of 0.1-1.0:0.1-1.

0.

7. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In steps AF, the coating is performed by vacuum evaporation, vacuum ion plating or magnetron sputtering.

8. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps AF, the gas pressure of the coating is 1.0*10 -4 -1.0*10 -2 Pa, power is 1-15kw, coating temperature is 80-160℃, single coating time is 1-10min, and total coating thickness is 1.5-15.0μm.

9. The coating process for a mobile phone camera frame according to claim 1, characterized in that: In the steps A, C, D and F, the flow rate of oxygen is 10-1000 sccm, in the steps B and C, the flow rate of nitrogen is 10-1000 sccm, and in the step E, the flow rate of argon is 10-1000 sccm.

10. A mobile phone camera frame, characterized in that: The mobile phone camera frame is made according to the coating process according to any one of claims 1-9.

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