System control equipment for methanation reaction system

Abstract

The embodiment of the invention discloses system control equipment for a methanation reaction system. The equipment comprises a methanation reaction system, a distributed control system and an advanced control system, the distributed control system is used for collecting the real-time flow value of the raw material gas passing through the flow control main valve and the flow control slave valve, the temperature value of the first gas passing through the first reactor and the temperature value of the second gas passing through the second reactor; sending the feed gas real-time flow value, the first gas temperature value and the second gas temperature value to an advanced control system; and the advanced control system is used for determining the valve opening degrees of the flow control main valve and the flow control slave valve according to the real-time flow value of the raw material gas, determining the valve opening degree of the distribution valve according to the second gas temperature value, and determining the valve opening degrees of the anti-surge valve and the guide vane valve according to the first gas temperature value. By applying the scheme provided by the embodiment of the invention, the methanation reaction system can be accurately controlled, so that the quality of finished gas is ensured to meet the process requirements.

Description

Technical Field

[0001] The present application relates to the technical field of methanation reaction, and in particular to a system control device for a methanation reaction system. Background Art

[0002] In the actual production process of the methanation reaction system, due to the instability of the quality of the gasification raw materials and the degree of reaction, as well as the frequent occurrence of abnormal failures in the process, various production parameters (gas flow, system temperature, etc.) are often in change accordingly.

[0003] In the control process of the known methanation reaction system, the process control cannot be changed with the change of working conditions, or it is completely controlled manually, which will cause the control results to deviate greatly due to the deviation of the actual working conditions, thus failing to ensure the normal operation of the reaction system, resulting in the quality of the finished gas failing to meet the process requirements. Therefore, how to accurately control the methanation reaction system to ensure that the quality of the finished gas meets the process requirements has become a technical problem that needs to be solved urgently. Summary of the invention

[0004] The present application provides a system control device for a methanation reaction system to accurately control the methanation reaction system, thereby ensuring that the quality of the finished gas meets the process requirements. The specific technical solution is as follows.

[0005] The embodiment of the present application provides a system control device for a methanation reaction system, the device comprising: a methanation reaction system, a distributed control system and an advanced control system; the distributed control system is connected to both the methanation reaction system and the advanced control system;

[0006] The methanation reaction system at least includes: a flow control main valve, a flow control slave valve, a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve and a guide vane valve; the air inlets of the flow control main valve and the flow control slave valve are connected to the upstream device through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the first reactor through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the distribution valve through a gas pipeline, and the air outlet of the distribution valve and the air outlet of the first reactor are connected to the air inlet of the second reactor through a gas pipeline. The gas outlet of the second reactor is connected to the gas inlet of the guide vane valve and the gas outlet of the anti-surge valve through a gas pipeline; the gas outlet of the guide vane valve is connected to the gas inlet of the circulating compressor through a gas pipeline, and the gas outlet of the circulating compressor is connected to the gas outlet of the anti-surge valve and the gas inlet of the first reactor through a gas pipeline; the valve size of the flow control main valve is larger than the valve size of the flow control slave valve; the valve size of the guide vane valve is larger than the valve size of the anti-surge valve; the upstream device is used to transport the raw gas to the first reactor and the second reactor through the flow control main valve and the flow control slave valve;

[0007] The distributed control system is used to collect the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor, and send the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value to the advanced control system;

[0008] The advanced control system is used to obtain the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value, and determine the valve opening of the flow control main valve and the flow control slave valve according to the real-time flow value of the raw gas, determine the valve opening of the distribution valve according to the second gas temperature value, and determine the valve opening of the anti-surge valve and the guide vane valve according to the first gas temperature value.

[0009] Optionally, the advanced control system includes: a master-slave valve flow control model, a reactor temperature control model, and a flow ratio control model;

[0010] The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve according to the real-time flow value of the raw gas;

[0011] The reactor temperature control model is used to determine the valve opening of the distribution valve according to the second gas temperature value;

[0012] The flow ratio control model is used to determine the valve openings of the anti-surge valve and the guide vane valve according to the first gas temperature value.

[0013] Optionally, the master-slave valve flow control model is specifically used for:

[0014] When the real-time flow value of the raw gas is greater than or equal to the upper limit of the preset interval range, the flow control slave valve is closed; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, the flow control main valve is closed;

[0015] When the real-time flow value of the raw gas is less than or equal to the lower limit of the preset interval range, the flow control slave valve is opened; when the difference between the current opening of the flow control slave valve and the preset upper limit of the slave valve opening is less than or equal to the preset second opening threshold, the flow control main valve is opened.

[0016] Optionally, the reactor temperature control model is specifically used for:

[0017] When the temperature value of the second gas is greater than or equal to the upper limit value of the preset temperature range, closing the distribution valve;

[0018] When the second gas temperature value is less than or equal to the lower limit of the preset temperature range, the distribution valve is opened.

[0019] Optionally, the flow ratio control model is specifically used for:

[0020] When the first gas temperature value is greater than or equal to the upper limit of the preset temperature range, the anti-surge valve is closed; when the difference between the current opening of the anti-surge valve and the preset lower limit of the anti-surge valve opening is less than or equal to a preset third opening threshold, the guide vane valve is closed;

[0021] When the first gas temperature value is less than or equal to the upper limit of the preset temperature range, the anti-surge valve is opened; when the difference between the current opening of the anti-surge valve and the preset upper limit of the anti-surge valve opening is less than or equal to the preset fourth opening threshold, the guide vane valve is opened.

[0022] Optionally, the advanced control system is further used to send the valve openings of the flow control master valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve to the distributed control system;

[0023] The distributed control system is also used to receive the valve openings of the flow control main valve and the flow control slave valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and control each valve accordingly according to the valve openings of the flow control main valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve.

[0024] Optionally, the distributed control system and the advanced control system perform data communication based on a real-time data interface OPC protocol.

[0025] In the embodiment of the present application, during the operation of the methanation reaction system, a plurality of relevant parameters can be collected through the distributed control system. Specifically, the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor can be collected. It can be understood that during the operation of the methanation reaction system, the above parameters can reflect the gas circulation conditions and the system temperature in the entire system. Therefore, in the embodiment of the present application, by collecting the above three parameters, the operation conditions of each device in the entire reaction system can be obtained. Furthermore, based on the advanced control system, according to the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value, the valve opening of the flow control main valve, the valve opening of the flow control slave valve, the valve opening of the distribution valve, the anti-surge valve and the valve opening of the guide vane valve can be fully automatically determined. That is to say, the opening and closing degrees of each valve can be automatically adjusted according to the acquired parameters, so that the corresponding parameters after adjustment are within the set range, thereby ensuring that the quality of the finished gas meets the process requirements. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the drawings required for use in the embodiments or the prior art description are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative work.

[0027] Figure 1 A schematic diagram of the structure of a system control device for a methanation reaction system provided in an embodiment of the present application;

[0028] Figure 2 A schematic diagram of the structure of a methanation reaction system provided in an embodiment of the present application;

[0029] Figure 3 Another structural schematic diagram of a system control device for a methanation reaction system provided in an embodiment of the present application. DETAILED DESCRIPTION

[0030] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0031] It should be noted that the terms "including" and "having" and any variations thereof in the embodiments of the present application and the accompanying drawings are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device comprising a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units that are not listed, or may optionally include other steps or units that are inherent to these processes, methods, products or devices.

[0032] The embodiment of the present application discloses a system control device for a methanation reaction system to accurately control the methanation reaction system, thereby ensuring that the quality of the finished gas meets the process requirements. The embodiment of the present application is described in detail below.

[0033] Figure 1 A schematic diagram of the structure of a system control device for a methanation reaction system provided in an embodiment of the present application is shown. Figure 1 As shown, the device includes: a methanogenic reaction system, a distributed control system and an advanced control system; the distributed control system is connected to both the methanogenic reaction system and the advanced control system. The distributed control system and the advanced control system can be connected by wire or wirelessly, which is possible.

[0034] Among them, Figure 2As shown, it shows a structural schematic diagram of a methanation reaction system provided in an embodiment of the present application, and the methanation reaction system may at least include: a flow control main valve (A valve), a flow control slave valve (B valve), a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve and a guide vane valve; the air inlets of the flow control main valve and the flow control slave valve are connected to the upstream device through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the first reactor through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the distribution valve through a gas pipeline, and the air outlet of the distribution valve is connected to the first reactor The gas outlets of (1# reactor) are connected to the gas inlet of the second reactor (2# reactor) through gas pipelines; the gas outlet of the second reactor is connected to the gas inlet of the guide vane valve and the gas outlet of the anti-surge valve through a gas pipeline; the gas outlet of the guide vane valve is connected to the gas inlet of the circulation compressor through a gas pipeline, and the gas outlet of the circulation compressor is connected to the gas outlet of the anti-surge valve and the gas inlet of the first reactor through a gas pipeline; the valve size of the flow control main valve is larger than the valve size of the flow control slave valve; the valve size of the guide vane valve is larger than the valve size of the anti-surge valve; an upstream device is used to transport the raw gas to the first reactor and the second reactor through the flow control main valve and the flow control slave valve.

[0035] A distributed control system (DCS) is used to collect the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor, and send the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value to the advanced control system.

[0036] The advanced control system (APC, Advanced Process Control) is used to obtain the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value, and determine the valve opening of the flow control main valve and the flow control slave valve according to the real-time flow value of the raw gas, determine the valve opening of the distribution valve according to the second gas temperature value, and determine the valve opening of the anti-surge valve and the guide vane valve according to the first gas temperature value.

[0037] like Figure 1 As shown, a flow meter can be installed after valve A and valve B to measure the flow value of raw gas after valve A and valve B, and a thermometer can be installed after reactor 1# and reactor 2# to measure the temperature of gas after reactor 1# and reactor 2#.

[0038] It can be understood that the raw gas flow value can reflect the raw gas flow entering the system. Usually, in order to ensure the normal operation of the system, the raw gas flow needs to be controlled within a range. The reactor is an exothermic reaction. The gas temperature after passing through the 1# reactor and the 2# reactor can characterize the gas reaction intensity in the reactor. The greater the gas reaction intensity, the higher the gas temperature after passing through the reactor.

[0039] Figure 2 The control scheme of the system shown is as follows:

[0040] The flow rate of raw gas entering the system is controlled by valve A and valve B. Valve A is a large valve responsible for coarse adjustment, which has a greater impact on the flow rate and generally needs to be actuated when the flow rate changes greatly; valve B is a small valve suitable for precise adjustment, and is mostly adjusted by valve B in daily production. In addition, valve B has a valve position control range, and the control effect of valve B will drop sharply if the valve position control range is exceeded. In the control process of this system, valve B is used to control the flow rate, and the valve position adjustment range of valve B is set at the same time. Valve A is used as an auxiliary control valve of valve B. The impact of valve position on flow rate is several times that of valve B, and valve A is used to directly control the valve position range of valve B.

[0041] When the flow rate increases, valve B closes and valve A does not move. When valve B closes to the lower limit, valve A moves in advance. Closing valve A by a certain threshold will directly reduce the flow rate significantly. After valve B detects the flow rate reduction, it will no longer close, but open wider to maintain it within the upper and lower limits. Similarly, when the flow rate decreases, valve B opens wider and valve A does not move. When valve B approaches the upper limit, valve A opens wider. After the flow rate increases significantly, valve B’s callback decreases, maintaining valve B within the appropriate range. At the same time, flow control will be more stable.

[0042] The 1# methanation synthesis reactor and the 2# methanation synthesis reactor are regarded as a whole. The reactor outlet temperature is controlled by the 2# main reactor inlet flow control valve (distribution valve), the circulating compressor anti-surge valve and the circulating compressor guide vane valve to maintain the stable reaction in the reactor.

[0043] Methanation synthesis reaction is an exothermic reaction. When the outlet temperature of the 2# reactor increases, close the 2# main reactor air inlet valve (distribution valve), and pay attention to controlling the outlet temperature of the 1# reactor. Closing the 2# reactor air inlet valve will increase the flow rate of fresh raw gas entering the 1# main reactor, increasing the outlet temperature of the 1# reactor. It is necessary to adjust the circulating compressor guide vane valve and anti-surge valve to increase the circulating gas volume entering the 1# reactor, so as to reduce the reaction intensity of the 1# reactor, reduce the outlet temperature of the 1# reactor, and balance the reaction temperature of the entire system.

[0044] Similarly, when the outlet temperature of the 2# reactor is low, the inlet valve of the 2# reactor will be opened to increase the fresh gas volume of the 2# reactor, increase the reaction intensity, and raise the outlet temperature of the 2# reactor. At the same time, the opening of the inlet valve of the 2# reactor will reduce the fresh gas volume of the 1# reactor, causing the temperature of the 1# reactor to drop. It is necessary to reduce the amount of circulating gas entering the 1# reactor, increase the reaction temperature of the 1# reactor, and balance the temperature of the entire system.

[0045] The circulating gas volume is controlled by the guide vane valve and anti-surge valve of the circulating compressor. Similar to the A / B valves jointly controlling the flow, the anti-surge valve mainly controls the flow, and the guide vane valve maintains the anti-surge valve at the appropriate valve position. While meeting the anti-surge curve, the circulating gas volume can be accurately adjusted together. First, the process personnel set the valve position of the anti-surge valve and the guide vane valve, and the upper and lower limits of the circulating gas volume. During the adjustment process, these upper and lower limits must be met before adjustment can be made. When the circulating gas volume needs to be increased, the anti-surge valve is reduced. When the anti-surge valve approaches the lower limit, the guide vane valve acts in advance to increase the processing capacity of the circulating compressor and stabilize the circulating gas volume. When the circulating gas volume needs to be reduced, the anti-surge valve position is increased. When the anti-surge valve approaches the upper limit, the guide vane valve acts in advance to reduce the processing capacity of the circulating compressor and stabilize the circulating gas volume.

[0046] In one implementation, Figure 3 As shown, the advanced control system may include: a master-slave valve flow control model, a reactor temperature control model and a flow ratio control model. In addition, the distributed control system and the advanced control system may communicate data based on the real-time data interface OPC protocol.

[0047] The distributed control system collects production data from the methanation reaction system and sends it to the advanced control system through OPC. After receiving the production data, the advanced control system calculates according to the preset model and transmits the results back to the DCS through OPC. The DCS system then transmits the command to the methanation reaction system for execution. The construction of the advanced control system requires the construction of a host computer on the upper layer of the DCS system. The advanced control system server connects to the OPC server by accessing the relevant IP in the three-layer switching network. The DCS exchanges data with the advanced control system through the OPC protocol to ensure data security and network security.

[0048] The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve according to the real-time flow value of the raw gas; the reactor temperature control model is used to determine the valve opening of the distribution valve according to the second gas temperature value; the flow ratio control model is used to determine the valve opening of the anti-surge valve and the guide vane valve according to the first gas temperature value.

[0049] Among them, the master-slave valve flow control model is specifically used for: when the real-time flow value of the raw gas is greater than or equal to the upper limit of the preset interval range, closing the flow control slave valve; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, closing the flow control master valve; when the real-time flow value of the raw gas is less than or equal to the lower limit of the preset interval range, opening the flow control slave valve; when the difference between the current opening of the flow control slave valve and the preset upper limit of the slave valve opening is less than or equal to the preset second opening threshold, opening the flow control master valve.

[0050] The reactor temperature control model is specifically used to: when the second gas temperature value is greater than or equal to the upper limit of the preset temperature range, close the distribution valve; when the second gas temperature value is less than or equal to the lower limit of the preset temperature range, open the distribution valve.

[0051] The flow ratio control model is specifically used for: when the first gas temperature value is greater than or equal to the upper limit of the preset temperature range, closing the anti-surge valve; when the difference between the current opening of the anti-surge valve and the preset lower limit of the anti-surge valve opening is less than or equal to the preset third opening threshold, closing the guide vane valve; when the first gas temperature value is less than or equal to the upper limit of the preset temperature range, opening the anti-surge valve; when the difference between the current opening of the anti-surge valve and the preset upper limit of the anti-surge valve opening is less than or equal to the preset fourth opening threshold, opening the guide vane valve.

[0052] The advanced control system can also send the valve openings of the flow control main valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve to the distributed control system; the distributed control system can receive the valve openings of the flow control main valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and control each valve accordingly according to the valve openings of the flow control main valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve.

[0053] In the embodiment of the present application, during the operation of the methanation reaction system, a plurality of relevant parameters can be collected through the distributed control system. Specifically, the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor can be collected. It can be understood that during the operation of the methanation reaction system, the above parameters can reflect the gas circulation conditions and the system temperature in the entire system. Therefore, in the embodiment of the present application, by collecting the above three parameters, the operation conditions of each device in the entire reaction system can be obtained. Furthermore, based on the advanced control system, according to the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value, the valve opening of the flow control main valve, the valve opening of the flow control slave valve, the valve opening of the distribution valve, the anti-surge valve and the valve opening of the guide vane valve can be fully automatically determined. That is to say, the opening and closing degrees of each valve can be automatically adjusted according to the acquired parameters, so that the corresponding parameters after adjustment are within the set range, thereby ensuring that the quality of the finished gas meets the process requirements.

[0054] Those skilled in the art can understand that the accompanying drawings are only schematic diagrams of one embodiment, and the modules or processes in the accompanying drawings are not necessarily required to implement the present application.

[0055] Those skilled in the art can understand that the modules in the device in the embodiment can be distributed in the device in the embodiment according to the description of the embodiment, or can be changed accordingly and located in one or more devices different from the embodiment. The modules in the above embodiment can be combined into one module, or can be further divided into multiple sub-modules.

[0056] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A system control device for a methanation reaction system, characterized in that: The equipment comprises: a methanation reaction system, a distributed control system and an advanced control system; the distributed control system is connected to both the methanation reaction system and the advanced control system; The methanation reaction system at least includes: a flow control main valve, a flow control slave valve, a first reactor, a second reactor, a distribution valve, a circulating compressor, an anti-surge valve and a guide vane valve; the air inlets of the flow control main valve and the flow control slave valve are connected to the upstream device through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the first reactor through a gas pipeline; the air outlets of the flow control main valve and the flow control slave valve are connected to the air inlet of the distribution valve through a gas pipeline, and the air outlet of the distribution valve and the air outlet of the first reactor are connected to the air inlet of the second reactor through a gas pipeline. The gas outlet of the second reactor is connected to the gas inlet of the guide vane valve and the gas outlet of the anti-surge valve through a gas pipeline; the gas outlet of the guide vane valve is connected to the gas inlet of the circulating compressor through a gas pipeline, and the gas outlet of the circulating compressor is connected to the gas outlet of the anti-surge valve and the gas inlet of the first reactor through a gas pipeline; the valve size of the flow control main valve is larger than the valve size of the flow control slave valve; the valve size of the guide vane valve is larger than the valve size of the anti-surge valve; the upstream device is used to transport the raw gas to the first reactor and the second reactor through the flow control main valve and the flow control slave valve; The distributed control system is used to collect the real-time flow value of the raw gas after passing through the flow control main valve and the flow control slave valve, the first gas temperature value after passing through the first reactor, and the second gas temperature value after passing through the second reactor, and send the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value to the advanced control system; The advanced control system is used to obtain the real-time flow value of the raw gas, the first gas temperature value and the second gas temperature value, and determine the valve opening of the flow control main valve and the flow control slave valve according to the real-time flow value of the raw gas, determine the valve opening of the distribution valve according to the second gas temperature value, and determine the valve opening of the anti-surge valve and the guide vane valve according to the first gas temperature value.

2. The device according to claim 1, characterized in that The advanced control system includes: a master-slave valve flow control model, a reactor temperature control model and a flow ratio control model; The master-slave valve flow control model is used to determine the valve opening of the flow control master valve and the flow control slave valve according to the real-time flow value of the raw gas; The reactor temperature control model is used to determine the valve opening of the distribution valve according to the second gas temperature value; The flow ratio control model is used to determine the valve openings of the anti-surge valve and the guide vane valve according to the first gas temperature value.

3. The device according to claim 2, characterized in that The master-slave valve flow control model is specifically used for: When the real-time flow value of the raw gas is greater than or equal to the upper limit of the preset interval range, the flow control slave valve is closed; when the difference between the current opening of the flow control slave valve and the preset lower limit of the slave valve opening is less than or equal to the preset first opening threshold, the flow control main valve is closed; When the real-time flow value of the raw gas is less than or equal to the lower limit of the preset interval range, the flow control slave valve is opened; when the difference between the current opening of the flow control slave valve and the preset upper limit of the slave valve opening is less than or equal to the preset second opening threshold, the flow control main valve is opened.

4. The device according to claim 2, characterized in that The reactor temperature control model is specifically used for: When the temperature of the second gas is greater than or equal to the upper limit of the preset temperature range, closing the distribution valve; When the second gas temperature value is less than or equal to the lower limit of the preset temperature range, the distribution valve is opened.

5. The device according to claim 2, characterized in that The flow ratio control model is specifically used for: When the first gas temperature value is greater than or equal to the upper limit of the preset temperature range, the anti-surge valve is closed; when the difference between the current opening of the anti-surge valve and the preset lower limit of the anti-surge valve opening is less than or equal to a preset third opening threshold, the guide vane valve is closed; When the first gas temperature value is less than or equal to the upper limit of the preset temperature range, the anti-surge valve is opened; when the difference between the current opening of the anti-surge valve and the preset upper limit of the anti-surge valve opening is less than or equal to the preset fourth opening threshold, the guide vane valve is opened.

6. The device according to any one of claims 1 to 5, characterized in that: The advanced control system is further used to send the valve openings of the flow control master valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve to the distributed control system; The distributed control system is also used to receive the valve openings of the flow control main valve and the flow control slave valve, the valve opening of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve, and control each valve accordingly according to the valve openings of the flow control main valve and the flow control slave valve, the valve openings of the distribution valve, and the valve openings of the anti-surge valve and the guide vane valve.

7. The device according to any one of claims 1 to 5, characterized in that: The distributed control system and the advanced control system perform data communication based on the real-time data interface OPC protocol.

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