Method for measuring particles on surface of quartz product

Abstract

The invention discloses a method for measuring particles on the surface of a quartz product, and aims to overcome the defect of poor detection accuracy of the particles on the surface of the quartz product. The method comprises the following steps: S1, cleaning an ultrasonic cleaning tank; s2, clear water is poured into the ultrasonic cleaning tank; s3, putting the quartz product into an ultrasonic cleaning tank; s4, the ultrasonic cleaning tank is started to conduct ultrasonic cleaning on the quartz product, so that particles on the surface of the quartz product are washed down and mixed into the cleaning solution; s5, the cleaning liquid is sucked, and the solid particle concentration a is measured through a liquid particle counter. The quartz product surface particulate matter measurement method can realize measurement of quartz product surface particulate matters, and is accurate in detection.

Description

Technical Field

[0001] The invention relates to a surface particle measurement technology, and more specifically, to a method for measuring surface particles of a quartz product. Background Art

[0002] At present, the semiconductor equipment production process has very high requirements for cleanliness. Even small particles can cause defects in the final semiconductor products, thus affecting their performance and yield. Therefore, it is necessary to measure the particles on the surface of quartz products to ensure that the quartz products meet the use requirements. The commonly used method is to use vacuuming to absorb the particles on the surface of quartz products, and then use a measuring device to detect the number of particles. This detection method does not completely adsorb the particles on the surface of quartz products, resulting in poor detection accuracy. Summary of the invention

[0003] In order to overcome the above-mentioned shortcomings, the present invention provides a method for measuring particles on the surface of a quartz product, which can measure particles on the surface of a quartz product with high accuracy.

[0004] In order to solve the above technical problems, the present invention adopts the following technical scheme: a method for measuring particles on the surface of a quartz product, comprising the following steps: S1, cleaning an ultrasonic cleaning tank; S2, pouring clean water into the ultrasonic cleaning tank; S3, placing a quartz product into the ultrasonic cleaning tank; S4, starting the ultrasonic cleaning tank to perform ultrasonic cleaning on the quartz product, so that particles on the surface of the quartz product are washed down and mixed into the cleaning liquid; S5, aspirating the cleaning liquid and measuring the solid particle concentration a through a liquid particle counter.

[0005] In this patent application, the detection of particles is performed by an indirect detection method. During the detection, the particles on the surface of the quartz product are removed by ultrasonic cleaning. The removed particles are mixed in the cleaning liquid, the concentration of the particles in the cleaning liquid is detected, and then the number of particles is calculated. The particles on the surface of the quartz product can be completely removed by ultrasonic cleaning, and the residual particles are not likely to appear, which is conducive to ensuring the accuracy of the detection data. During the measurement, a certain amount of cleaning liquid is sucked to measure the concentration, and then the specific number of particles is obtained by calculation, which is convenient to operate. The method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products, and the detection is accurate.

[0006] Preferably, in the S2 process, the test fixture is loaded into the ultrasonic cleaning tank, the ultrasonic cleaning tank is started to clean the test fixture, and then the cleaning liquid after cleaning the test fixture is sucked out to measure the solid particle concentration n through the liquid particle counter; in the S3 process, the quartz product is loaded on the test fixture.

[0007] The test fixture is placed in the ultrasonic cleaning tank to facilitate the loading of quartz products and prevent the quartz products from contacting the tank wall during the cleaning process. After the test fixture is placed in the ultrasonic cleaning tank, it is cleaned and the particle concentration is measured to prevent the residual particles in the test fixture from affecting the accuracy of the particle detection of the quartz product.

[0008] Preferably, the upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, the mounting frame is equipped with a rotating shaft, the rotating shaft is connected to a rotating arm, and a suspension rod is connected between the rotating arm and the test fixture; during S4, the rotating shaft rotates to rotate the test fixture and the quartz product in the ultrasonic cleaning tank.

[0009] The test fixture is connected to the rotating arm through a suspension rod, so that the test fixture is suspended in the ultrasonic cleaning tank to avoid contact with the tank wall and affect the cleaning effect. During the cleaning process, the shaft rotates to make the concentration of particles in the cleaning liquid at various positions in the ultrasonic cleaning tank more uniform, which is conducive to improving the accuracy of the detection.

[0010] In the second solution, the upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, a universal ball head is installed on the mounting frame, the universal ball head is rotatably connected to a crossbeam, and a pull rod is connected between the crossbeam and the test fixture; during the S4 process, the crossbeam is moved to make the test fixture and the quartz product rotate in the ultrasonic cleaning tank and swing up and down at the same time.

[0011] During the ultrasonic cleaning of the quartz product, the crossbeam is moved, and the crossbeam can rotate and shake, so that the quartz product suspended on the test fixture can swing and rotate, and the posture of the quartz product in the tank can be adjusted, which is beneficial to improve the cleaning effect and avoid the residue of particles in narrow places and gaps, thereby improving the accuracy of detection.

[0012] In the third solution, the upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, the mounting frame is equipped with a rotating shaft, the rotating shaft is connected to a hanging arm, a plurality of hanging ropes are connected to the hanging arm, the lower ends of the hanging ropes are connected to a hook, and the quartz product is hung on the hook; during S4, the rotating shaft rotates to rotate the quartz product in the ultrasonic cleaning tank.

[0013] The quartz product is hung in the ultrasonic cleaning tank with a hook. The contact area between the quartz product and other objects during the cleaning process is small, which is conducive to improving the cleaning effect and avoiding particles remaining on the surface of the quartz product. During the rotation of the shaft, the quartz product rotates with the shaft, which is not only beneficial to remove particles on the surface of the quartz product, but also can stir the cleaning liquid, making the concentration of particles in the cleaning liquid at various positions in the ultrasonic cleaning tank more uniform, which is conducive to improving the accuracy of detection.

[0014] Preferably, the boom and the rotating shaft are circumferentially locked and axially slide, a guide sleeve is installed on the mounting frame, a guide groove is arranged on the side wall of the guide sleeve, a guide rod is arranged on the boom, the end of the guide rod is movably inserted in the guide groove, the guide groove is arranged circumferentially, the guide groove includes an ascending section and a descending section, and the ascending section and the descending section are both inclined; during the rotation of the boom, the end of the guide rod slides along the guide groove to make the boom move up and down.

[0015] Since the arm and the shaft are locked circumferentially and slide axially, the shaft can drive the arm to rotate, and the arm can move axially while rotating. The guide groove includes an ascending section and a descending section. When the end of the guide rod passes through the ascending section, the arm can be driven to rise upward, and when the end of the guide rod passes through the descending section, the arm can be driven to move downward. The arm can be raised and lowered while rotating, thereby adjusting the height position of the quartz product in the groove, which is beneficial to improving the cleaning effect of the quartz product.

[0016] Another scheme is that the boom is rotatably installed on the rotating shaft, and a positioning sleeve is installed on the mounting frame. A positioning surface is set at the lower end of the positioning sleeve. The positioning surface includes a plurality of upward inclined sections and downward inclined sections, and the upward inclined sections and the downward inclined sections are set correspondingly; during the rotation process of the boom, one side is close to the upward inclined section, and the other side is close to the downward inclined section, so that the boom tilts.

[0017] The middle part of the arm is rotatably connected to the rotating shaft. During the rotation of the arm, the two sides are respectively in contact with the upward and downward inclined sections, so that one end of the arm is high and the other end is low, and it is in an inclined state, so that the quartz product on the hook can adjust its posture. The quartz product can adjust its posture while rotating, which is conducive to improving the cleaning effect of the quartz product.

[0018] Preferably, a plurality of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank, and the vibration frequency of each transducer is controlled individually; in the S2 process, the ultrasonic cleaning tank is started, and then the vibration intensity of each position in the tank is measured, and the vibration frequency of the transducers at different positions is adjusted according to the measurement results until the vibration intensity of each position in the tank is uniform and stable.

[0019] By adjusting the vibration frequency of the transducer and measuring the vibration intensity at each position in the slot, the vibration intensity at each position in the slot can be adjusted to a uniform and stable state, which is beneficial to improving the cleaning effect of the quartz product.

[0020] Preferably, multiple quartz products are loaded at one time in the S3 process.

[0021] Cleaning and testing multiple quartz products at the same time is helpful to improve the accuracy of testing.

[0022] Preferably, during S3, clean gloves are worn to pick up the quartz product.

[0023] Wear clean gloves when operating to prevent contamination of the quartz product and affect the detection accuracy.

[0024] Compared with the prior art, the present invention has the following beneficial effects: (1) the method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products with accurate detection; (2) during the cleaning process of the quartz product in the ultrasonic cleaning tank, the quartz product can adjust its posture, which is beneficial to improving the cleaning effect of the quartz product. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a schematic diagram of the present invention.

[0026] Figure 2 It is a structural diagram of an ultrasonic cleaning tank according to Example 1 of the present invention.

[0027] Figure 3 It is a structural diagram of an ultrasonic cleaning tank according to Embodiment 2 of the present invention.

[0028] Figure 4 It is a structural diagram of an ultrasonic cleaning tank according to Example 3 of the present invention.

[0029] Figure 5 It is a structural diagram of an ultrasonic cleaning tank according to embodiment 4 of the present invention.

[0030] In the figure: 1, ultrasonic cleaning tank, 2, test fixture, 3, bottom plate, 4, limit stop rod, 5, mounting frame, 6, rotating shaft, 7, rotating arm, 8, suspension rod, 9, column, 10, jack, 11, connecting beam, 12, flange, 13, limit ring, 14, rotating handle, 15, liquid particle counter, 16, universal ball head, 17, crossbeam, 18, positioning ring, 19, suspension arm, 20, suspension rope, 21, hook, 22, guide sleeve, 23, guide rod, 24, positioning sleeve, 25, positioning surface. DETAILED DESCRIPTION

[0031] The technical solution of the present invention is further described in detail below through specific embodiments and in conjunction with the accompanying drawings: Example 1: A method for measuring particles on the surface of a quartz product (see Appendix Figure 1 , Attachment Figure 2 ), including the following steps: S1, cleaning the ultrasonic cleaning tank 1; during the cleaning process, the staff wears clean gloves to clean the tank to prevent residual particles in the tank from affecting the detection results.

[0032] S2, pour clean water into the ultrasonic cleaning tank 1; record the volume L of the clean water. A number of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank 1, and the vibration frequency of each transducer is controlled separately; during S2, start the ultrasonic cleaning tank 1, and then measure the vibration intensity at various positions in the tank, and adjust the vibration frequency of the transducers at different positions according to the measurement results until the vibration intensity at various positions in the tank is uniform and stable. Then load the test fixture 2 into the ultrasonic cleaning tank 1. The test fixture 2 includes a bottom plate 3 with a mesh structure, and a number of limit bars 4 are arranged at intervals on the edge of the bottom plate 3.

[0033] The upper end of the ultrasonic cleaning tank 1 is detachably connected to the mounting frame 5, the mounting frame 5 is equipped with a rotating shaft 6, the rotating shaft 6 is connected to the rotating arm 7, and the hanging rod 8 is connected between the rotating arm 7 and the test fixture 2; the mounting frame 5 includes a connecting beam 11 and a plurality of columns 9 connected to the connecting beam 11, and a plurality of sockets 10 are arranged one by one on the upper end of the ultrasonic cleaning tank 1 and the columns 9, and the lower ends of the columns 9 are adapted to be inserted into the sockets 10 to realize the positioning of the entire mounting frame 5. The rotating shaft 6 is rotatably mounted on the connecting beam 11, the rotating arm 7 is connected to the rotating shaft 6 in a sleeve-type connection, and the rotating arm 7 and the rotating shaft 6 are circumferentially locked. A flange 12 is arranged on the rotating shaft 6, and a mounting hole is arranged on the connecting beam 11. The rotating shaft 6 is rotatably connected to the mounting hole, and the flange 12 is supported on the upper surface of the connecting beam 11, and a limiting ring 13 is connected to the rotating shaft 6, and the rotating arm 7 is supported on the limiting ring 13. The upper end of the rotating shaft 6 is connected to a rotating handle 14.

[0034] The ultrasonic cleaning tank 1 is started to clean the test fixture 2 for 10 minutes, and then the cleaning liquid after cleaning the test fixture 2 is sucked and the solid particle concentration n is measured through the liquid particle counter 15. Multiple groups of data are measured, and the average value n is obtained after eliminating abnormal data. The volume of the cleaning liquid sucked is Z.

[0035] S3, the quartz product is loaded into the ultrasonic cleaning tank 1; the quartz product is loaded on the test fixture 2, and the quartz product is picked up by wearing clean gloves. Multiple quartz products are loaded at one time during S3.

[0036] S4, start the ultrasonic cleaning tank 1 to perform ultrasonic cleaning on the quartz product, so that the particles on the surface of the quartz product are washed off and mixed into the cleaning liquid; during S4, the rotating shaft 6 rotates, so that the test fixture 2 and the quartz product rotate in the ultrasonic cleaning tank 1.

[0037] S5, after cleaning for 10 minutes, the cleaning liquid is sucked and the solid particle concentration a is measured through the liquid particle counter 15, and multiple groups of data are measured, and the average value a is obtained after eliminating abnormal data.

[0038] The liquid particle counter 15 used in this patent is an existing device, which measures the concentration, size and quantity distribution of particles through different principles such as ionization, optics, acoustics or magnetism. Among them, the most commonly used principle is the optical principle. This principle uses a laser beam to pass through particles in the liquid, and the scattered light of the reflected beam of the particles is received by the detector, and then processed by the optical system and the test results are displayed. In order to improve the test accuracy, the instrument needs to be calibrated regularly every year. The calibration of the automatic particle counter is to use the known calibration particle size value and the corresponding number of particles to calibrate a set of threshold voltages that reflect the instrument measurement value, which is also called size-threshold voltage calibration. Each instrument needs to be calibrated by relevant calibration personnel according to the requirements specified in the relevant technical documents. In addition, after the instrument has an abnormal situation or after maintenance, the instrument also needs to be recalibrated to ensure its accuracy and reliability.

[0039] In this patent application, the detection of particles is carried out by indirect detection. During the detection, the particles on the surface of the quartz product are removed by ultrasonic cleaning. The removed particles are mixed in the cleaning liquid, the concentration of the particles in the cleaning liquid is detected, and then the number of particles is calculated. During the calculation, the number of particles detected in all quartz products is X, X=(an)*(LZ), and the number of particles on the surface of each quartz product can be easily calculated by this formula.

[0040] Ultrasonic cleaning can completely remove particles on the surface of quartz products, and it is not easy to have residual particles, which is conducive to ensuring the accuracy of the test data. During the measurement, a certain amount of cleaning liquid is absorbed to measure the concentration, and then the specific number of particles is obtained by calculation. The operation is convenient. The method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products with accurate detection.

[0041] Example 2: A method for measuring particles on the surface of a quartz product (see Appendix Figure 3 ), including the following steps: S1, cleaning the ultrasonic cleaning tank 1; during the cleaning process, the staff wears clean gloves to clean the tank to prevent residual particles in the tank from affecting the detection results.

[0042] S2, pour clean water into the ultrasonic cleaning tank 1; record the volume L of the clean water. A number of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank 1, and the vibration frequency of each transducer is controlled separately; during S2, start the ultrasonic cleaning tank 1, and then measure the vibration intensity at various positions in the tank, and adjust the vibration frequency of the transducers at different positions according to the measurement results until the vibration intensity at various positions in the tank is uniform and stable. Then load the test fixture 2 into the ultrasonic cleaning tank 1. The test fixture 2 includes a bottom plate 3 with a mesh structure, and a number of limit bars 4 are arranged at intervals on the edge of the bottom plate 3.

[0043] The upper end of the ultrasonic cleaning tank 1 is detachably connected to the mounting frame 5, and a universal ball head 16 is installed on the mounting frame 5. The universal ball head 16 is rotatably connected to the cross beam 17, and a pull rod is connected between the cross beam 17 and the test fixture 2; the mounting frame 5 includes a connecting beam 11 and a plurality of columns 9 connected to the connecting beam 11. A plurality of sockets 10 are arranged on the upper end of the ultrasonic cleaning tank 1 and the columns 9 in a one-to-one correspondence, and the lower ends of the columns 9 are adapted to be inserted in the sockets 10 to realize the positioning of the entire mounting frame 5. The upper part of the universal ball head 16 is fastened to the connecting beam 11, and a hemispherical mounting groove is arranged on the cross beam 17. The mounting groove is rotatably connected to the universal ball head 16. A positioning ring 18 is fastened to the cross beam 17, and the positioning ring 18 is connected to the universal ball head 16 in a sleeve, and the positioning ring 18 is fastened to the cross beam 17.

[0044] The ultrasonic cleaning tank 1 is started to clean the test fixture 2 for 10 minutes, and then the cleaning liquid after cleaning the test fixture 2 is sucked and the solid particle concentration n is measured through the liquid particle counter 15. Multiple groups of data are measured, and the average value n is obtained after eliminating abnormal data. The volume of the cleaning liquid sucked is Z.

[0045] S3, the quartz product is loaded into the ultrasonic cleaning tank 1; the quartz product is loaded on the test fixture 2, and the quartz product is picked up by wearing clean gloves. Multiple quartz products are loaded at one time during S3.

[0046] S4, start the ultrasonic cleaning tank 1 to perform ultrasonic cleaning on the quartz product, so that the particles on the surface of the quartz product are washed off and mixed into the cleaning liquid; during S4, move the crossbeam 17 to make the test fixture 2 and the quartz product rotate in the ultrasonic cleaning tank 1 and swing up and down.

[0047] S5, after cleaning for 10 minutes, the cleaning liquid is sucked and the solid particle concentration a is measured through the liquid particle counter 15, and multiple groups of data are measured, and the average value a is obtained after eliminating abnormal data.

[0048] The liquid particle counter 15 used in this patent is an existing device, which measures the concentration, size and quantity distribution of particles through different principles such as ionization, optics, acoustics or magnetism. Among them, the most commonly used principle is the optical principle. This principle uses a laser beam to pass through particles in the liquid, and the scattered light of the reflected beam of the particles is received by the detector, and then processed by the optical system and the test results are displayed. In order to improve the test accuracy, the instrument needs to be calibrated regularly every year. The calibration of the automatic particle counter is to use the known calibration particle size value and the corresponding number of particles to calibrate a set of threshold voltages that reflect the instrument measurement value, which is also called size-threshold voltage calibration. Each instrument needs to be calibrated by relevant calibration personnel according to the requirements specified in the relevant technical documents. In addition, after the instrument has an abnormal situation or after maintenance, the instrument also needs to be recalibrated to ensure its accuracy and reliability.

[0049] In this patent application, the detection of particles is carried out by indirect detection. During the detection, the particles on the surface of the quartz product are removed by ultrasonic cleaning. The removed particles are mixed in the cleaning liquid, the concentration of the particles in the cleaning liquid is detected, and then the number of particles is calculated. During the calculation, the number of particles detected in all quartz products is X, X=(an)*(LZ), and the number of particles on the surface of each quartz product can be easily calculated by this formula.

[0050] Ultrasonic cleaning can completely remove particles on the surface of quartz products, and it is not easy to have residual particles, which is conducive to ensuring the accuracy of the test data. During the measurement, a certain amount of cleaning liquid is absorbed to measure the concentration, and then the specific number of particles is obtained by calculation. The operation is convenient. The method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products with accurate detection.

[0051] Example 3: A method for measuring particles on the surface of a quartz product (see Appendix Figure 4 ), including the following steps: S1, cleaning the ultrasonic cleaning tank 1; during the cleaning process, the staff wears clean gloves to clean the tank to prevent residual particles in the tank from affecting the detection results.

[0052] S2, pour clean water into the ultrasonic cleaning tank 1; record the volume L of the clean water. A number of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank 1, and the vibration frequency of each transducer is controlled separately; during S2, start the ultrasonic cleaning tank 1, and then measure the vibration intensity at various positions in the tank, and adjust the vibration frequency of the transducers at different positions according to the measurement results until the vibration intensity at various positions in the tank is uniform and stable. Then load the test fixture 2 into the ultrasonic cleaning tank 1. The test fixture 2 includes a bottom plate 3 with a mesh structure, and a number of limit bars 4 are arranged at intervals on the edge of the bottom plate 3.

[0053] The upper end of the ultrasonic cleaning tank 1 is detachably connected to the mounting frame 5, the mounting frame 5 is installed with a rotating shaft 6, the rotating shaft 6 is connected to the suspension arm 19, a plurality of suspension ropes 20 are connected to the suspension arm 19, the lower ends of the suspension ropes 20 are connected to the hooks 21, and the quartz product is hung on the hooks 21; the mounting frame 5 includes a connecting beam 11 and a plurality of columns 9 connected to the connecting beam 11, a plurality of sockets 10 are arranged on the upper end of the ultrasonic cleaning tank 1 and the columns 9 in a one-to-one correspondence, and the lower ends of the columns 9 are adapted to be inserted into the sockets 10 to realize the positioning of the entire mounting frame 5. The rotating shaft 6 is rotatably mounted on the connecting beam 11, and the boom 19 and the rotating shaft 6 are locked circumferentially and slide axially. A guide sleeve 22 is installed on the mounting frame 5, and a guide groove is arranged on the side wall of the guide sleeve 22, and the guide groove is arranged on the outer wall of the guide sleeve 22. An L-shaped guide rod 23 is arranged on the boom 19, and two guide rods 23 are arranged opposite to each other. The ends of the guide rod 23 are movably inserted in the guide groove, and the guide groove is arranged circumferentially. The guide groove includes an ascending section and a descending section, and the ascending section and the descending section are both inclined. During the rotation of the boom 19, the ends of the guide rod 23 slide along the guide groove, so that the boom 19 moves up and down. A flange 12 is arranged on the rotating shaft 6, and a mounting hole is arranged on the connecting beam 11. The rotating shaft 6 is rotatably connected with the mounting hole, and the flange 12 is supported on the upper surface of the connecting beam 11. A limit ring 13 is connected to the rotating shaft 6, and the boom 19 is supported on the limit ring 13. The upper end of the rotating shaft 6 is connected to a rotating handle 14.

[0054] The ultrasonic cleaning tank 1 is started to clean the test fixture 2 for 10 minutes, and then the cleaning liquid after cleaning the test fixture 2 is sucked and the solid particle concentration n is measured through the liquid particle counter 15. Multiple groups of data are measured, and the average value n is obtained after eliminating abnormal data. The volume of the cleaning liquid sucked is Z.

[0055] S3, the quartz product is loaded into the ultrasonic cleaning tank 1; the quartz product is loaded on the test fixture 2, and the quartz product is picked up by wearing clean gloves. Multiple quartz products are loaded at one time during S3.

[0056] S4, start the ultrasonic cleaning tank 1 to perform ultrasonic cleaning on the quartz product, so that the particles on the surface of the quartz product are washed off and mixed into the cleaning liquid; during S4, the rotating shaft 6 rotates, so that the quartz product rotates in the ultrasonic cleaning tank 1, and can move axially up and down while rotating.

[0057] S5, after cleaning for 10 minutes, the cleaning liquid is sucked and the solid particle concentration a is measured through the liquid particle counter 15, and multiple groups of data are measured, and the average value a is obtained after eliminating abnormal data.

[0058] The liquid particle counter 15 used in this patent is an existing device, which measures the concentration, size and quantity distribution of particles through different principles such as ionization, optics, acoustics or magnetism. Among them, the most commonly used principle is the optical principle. This principle uses a laser beam to pass through particles in the liquid, and the scattered light of the reflected beam of the particles is received by the detector, and then processed by the optical system and the test results are displayed. In order to improve the test accuracy, the instrument needs to be calibrated regularly every year. The calibration of the automatic particle counter is to use the known calibration particle size value and the corresponding number of particles to calibrate a set of threshold voltages that reflect the instrument measurement value, which is also called size-threshold voltage calibration. Each instrument needs to be calibrated by relevant calibration personnel according to the requirements specified in the relevant technical documents. In addition, after the instrument has an abnormal situation or after maintenance, the instrument also needs to be recalibrated to ensure its accuracy and reliability.

[0059] In this patent application, the detection of particles is carried out by indirect detection. During the detection, the particles on the surface of the quartz product are removed by ultrasonic cleaning. The removed particles are mixed in the cleaning liquid, the concentration of the particles in the cleaning liquid is detected, and then the number of particles is calculated. During the calculation, the number of particles detected in all quartz products is X, X=(an)*(LZ), and the number of particles on the surface of each quartz product can be easily calculated by this formula.

[0060] Ultrasonic cleaning can completely remove particles on the surface of quartz products, and it is not easy to have residual particles, which is conducive to ensuring the accuracy of the test data. During the measurement, a certain amount of cleaning liquid is absorbed to measure the concentration, and then the specific number of particles is obtained by calculation. The operation is convenient. The method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products with accurate detection.

[0061] Example 4: A method for measuring particles on the surface of a quartz product (see Appendix Figure 5 ), including the following steps: S1, cleaning the ultrasonic cleaning tank 1; during the cleaning process, the staff wears clean gloves to clean the tank to prevent residual particles in the tank from affecting the detection results.

[0062] S2, pour clean water into the ultrasonic cleaning tank 1; record the volume L of the clean water. A number of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank 1, and the vibration frequency of each transducer is controlled separately; during S2, start the ultrasonic cleaning tank 1, and then measure the vibration intensity at various positions in the tank, and adjust the vibration frequency of the transducers at different positions according to the measurement results until the vibration intensity at various positions in the tank is uniform and stable. Then load the test fixture 2 into the ultrasonic cleaning tank 1. The test fixture 2 includes a bottom plate 3 with a mesh structure, and a number of limit bars 4 are arranged at intervals on the edge of the bottom plate 3.

[0063] The upper end of the ultrasonic cleaning tank 1 is detachably connected to the mounting frame 5, the mounting frame 5 is equipped with a rotating shaft 6, the rotating shaft 6 is connected to the suspension arm 19, the suspension arm 19 is connected to a plurality of suspension ropes 20, the lower end of the suspension rope 20 is connected to a hook 21, and the quartz product is hung on the hook 21; the mounting frame 5 includes a connecting beam 11 and a plurality of columns 9 connected to the connecting beam 11, the upper end of the ultrasonic cleaning tank 1 and the columns 9 are provided with a plurality of sockets 10 corresponding to each other, and the lower end of the column 9 is adapted to be inserted in the socket 10 to realize the positioning of the entire mounting frame 5. The rotating shaft 6 is rotatably installed on the connecting beam 11, the suspension arm 19 is rotatably installed on the rotating shaft 6, the mounting frame 5 is equipped with a positioning sleeve 24, and a positioning surface 25 is provided at the lower end of the positioning sleeve 24, and the positioning surface 25 includes a plurality of upward tilting sections and downward tilting sections, and the upward tilting sections and the downward tilting sections are provided correspondingly; during the rotation process of the suspension arm 19, one side is close to the upward tilting section, and the other side is close to the downward tilting section, so that the suspension arm 19 is tilted. A flange 12 is provided on the rotating shaft 6, and a mounting hole is provided on the connecting beam 11. The rotating shaft 6 is rotatably fitted and connected with the mounting hole, and the flange 12 is supported on the upper surface of the connecting beam 11. A rotating handle 14 is connected to the upper end of the rotating shaft 6.

[0064] The ultrasonic cleaning tank 1 is started to clean the test fixture 2 for 10 minutes, and then the cleaning liquid after cleaning the test fixture 2 is sucked and the solid particle concentration n is measured through the liquid particle counter 15. Multiple groups of data are measured, and the average value n is obtained after eliminating abnormal data. The volume of the cleaning liquid sucked is Z.

[0065] S3, the quartz product is loaded into the ultrasonic cleaning tank 1; the quartz product is loaded on the test fixture 2, and the quartz product is picked up by wearing clean gloves. Multiple quartz products are loaded at one time during S3.

[0066] S4, start the ultrasonic cleaning tank 1 to perform ultrasonic cleaning on the quartz product, so that the particles on the surface of the quartz product are washed down and mixed into the cleaning liquid; during S4, the rotating shaft 6 rotates, driving the suspension arm 19 to rotate and the two sides of the suspension arm 19 are respectively close to the upward inclined section and the downward inclined section, so that one end of the suspension arm 19 is high and the other end is low, and it is in an inclined state, so that the quartz product on the hook 21 adjusts its posture. The quartz product rotates and adjusts its posture at the same time, which is conducive to improving the cleaning effect of the quartz product.

[0067] S5, after cleaning for 10 minutes, the cleaning liquid is sucked and the solid particle concentration a is measured through the liquid particle counter 15, and multiple groups of data are measured, and the average value a is obtained after eliminating abnormal data.

[0068] The liquid particle counter 15 used in this patent is an existing device, which measures the concentration, size and quantity distribution of particles through different principles such as ionization, optics, acoustics or magnetism. Among them, the most commonly used principle is the optical principle. This principle uses a laser beam to pass through particles in the liquid, and the scattered light of the reflected beam of the particles is received by the detector, and then processed by the optical system and the test results are displayed. In order to improve the test accuracy, the instrument needs to be calibrated regularly every year. The calibration of the automatic particle counter is to use the known calibration particle size value and the corresponding number of particles to calibrate a set of threshold voltages that reflect the instrument measurement value, which is also called size-threshold voltage calibration. Each instrument needs to be calibrated by relevant calibration personnel according to the requirements specified in the relevant technical documents. In addition, after the instrument has an abnormal situation or after maintenance, the instrument also needs to be recalibrated to ensure its accuracy and reliability.

[0069] In this patent application, the detection of particles is carried out by indirect detection. During the detection, the particles on the surface of the quartz product are removed by ultrasonic cleaning. The removed particles are mixed in the cleaning liquid, the concentration of the particles in the cleaning liquid is detected, and then the number of particles is calculated. During the calculation, the number of particles detected in all quartz products is X, X=(an)*(LZ), and the number of particles on the surface of each quartz product can be easily calculated by this formula.

[0070] Ultrasonic cleaning can completely remove particles on the surface of quartz products, and it is not easy to have residual particles, which is conducive to ensuring the accuracy of the test data. During the measurement, a certain amount of cleaning liquid is absorbed to measure the concentration, and then the specific number of particles is obtained by calculation. The operation is convenient. The method for measuring particles on the surface of quartz products can realize the measurement of particles on the surface of quartz products with accurate detection.

[0071] The above-described embodiments are only preferred solutions of the present invention and are not intended to limit the present invention in any form. Other variations and modifications are possible without exceeding the technical solutions described in the claims.

Claims

1. A method for measuring particles on the surface of a quartz product, characterized in that: The following steps are involved: S1, clean the ultrasonic cleaning tank; S2, pour clean water into the ultrasonic cleaning tank; S3, put the quartz product into the ultrasonic cleaning tank; S4, start the ultrasonic cleaning tank to perform ultrasonic cleaning on the quartz product, so that the particles on the surface of the quartz product are washed down and mixed into the cleaning liquid; S5, absorb the cleaning liquid and measure the solid particle concentration a through a liquid particle counter.

2. A method for measuring particles on the surface of a quartz product according to claim 1, characterized in that: In the S2 process, the test fixture is loaded into the ultrasonic cleaning tank, the ultrasonic cleaning tank is started to clean the test fixture, and then the cleaning liquid after cleaning the test fixture is sucked out and the solid particle concentration n is measured by the liquid particle counter; in the S3 process, the quartz product is loaded on the test fixture.

3. A method for measuring particles on the surface of a quartz product according to claim 2, characterized in that: The upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, the mounting frame is equipped with a rotating shaft, the rotating shaft is connected to a rotating arm, and a suspension rod is connected between the rotating arm and the test fixture; during the S4 process, the rotating shaft rotates to rotate the test fixture and the quartz product in the ultrasonic cleaning tank.

4. A method for measuring particles on the surface of a quartz product according to claim 2, characterized in that: The upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, on which a universal ball head is installed, which is rotatably connected to a crossbeam, and a pull rod is connected between the crossbeam and the test fixture; during the S4 process, the crossbeam is moved to make the test fixture and the quartz product rotate in the ultrasonic cleaning tank and swing up and down at the same time.

5. The method for measuring particles on the surface of a quartz product according to claim 1, characterized in that: The upper end of the ultrasonic cleaning tank is detachably connected to a mounting frame, the mounting frame is equipped with a rotating shaft, the rotating shaft is connected to a suspension arm, a plurality of suspension ropes are connected to the suspension arm, the lower ends of the suspension ropes are connected to a suspension hook, and the quartz product is hung on the suspension hook; during the S4 process, the rotating shaft rotates to rotate the quartz product in the ultrasonic cleaning tank.

6. A method for measuring particles on the surface of a quartz product according to claim 5, characterized in that: The boom and the rotating shaft are locked circumferentially and slide axially, a guide sleeve is installed on the mounting frame, a guide groove is arranged on the side wall of the guide sleeve, a guide rod is arranged on the boom, the end of the guide rod is movably inserted in the guide groove, the guide groove is arranged circumferentially, the guide groove includes an ascending section and a descending section, and the ascending section and the descending section are both inclined; during the rotation of the boom, the end of the guide rod slides along the guide groove to make the boom move up and down.

7. A method for measuring particles on the surface of a quartz product according to claim 5, characterized in that: The boom is rotatably mounted on the rotating shaft, a positioning sleeve is installed on the mounting frame, a positioning surface is arranged at the lower end of the positioning sleeve, the positioning surface comprises a plurality of upward tilt sections and downward tilt sections, and the upward tilt sections and the downward tilt sections are arranged correspondingly; during the rotation process of the boom, one side is close to the upward tilt section, and the other side is close to the downward tilt section, so that the boom tilts.

8. A method for measuring particles on the surface of a quartz product according to any one of claims 1 to 7, characterized in that: A number of transducers arranged in a rectangular array are installed at the bottom of the ultrasonic cleaning tank, and the vibration frequency of each transducer is controlled individually; in the S2 process, the ultrasonic cleaning tank is started, and then the vibration intensity at each position in the tank is measured, and the vibration frequency of the transducers at different positions is adjusted according to the measurement results until the vibration intensity at each position in the tank is uniform and stable.

9. A method for measuring particles on the surface of a quartz product according to any one of claims 1 to 7, characterized in that: Multiple quartz products are loaded at one time during the S3 process.

10. A method for measuring particles on the surface of a quartz product according to any one of claims 1 to 7, characterized in that: Wear clean gloves to handle quartz products during S3.

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