Reaction chamber structure
By introducing an electrical connection between the switch sensor and the corrugated stop valve into the reaction chamber structure, the automatic discharge of exhaust gas is realized to the treatment device, solving the problem of harmful gas residue in the dry etching process, and ensuring safety and sealing.
Patent Information
- Application Number
- CN202420813777.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-18
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2034-04-18
AI Technical Summary
In the dry etching process, harmful gases such as fluorine, chlorine, bromine and other residual gases in the reaction chamber cannot be effectively discharged during the opening operation, resulting in contamination and health risks.
A reaction chamber structure is designed, including an inspection door, exhaust gas outlet, vacuum atmosphere adjustment port, open chamber exhaust gas exhaust pipe, corrugated pipe shut-off valve and exhaust gas treatment device. After the switch sensor is electrically connected to the corrugated pipe shut-off valve, it will be triggered. Open the corrugated shut-off valve to realize automatic discharge of exhaust gas to the treatment device.
It effectively avoids the problem of residual gas failure to discharge during opening the cavity, ensures the health and safety of the staff, and improves the seal reliability of the equipment and the waste gas treatment effect.
Smart Images
Figure CN222168344U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of semiconductor integrated circuit manufacturing, and in particular to a reaction chamber structure. Background Art
[0002] In the dry etching process, the etching gas in the reaction chamber generates glow discharge in a low-pressure, high-frequency and high-voltage environment, decomposing the gas into a large number of active free radicals, ions and electrons with energy, and etching the silicon wafer in a plasma manner. There will be residual etching gas and other gas products in the reaction process. Most of these are toxic gases containing fluorine, chlorine and bromine. Although there will be a corresponding polymer cleaning process during the etching process, there will still be residual gas retained in the cavity.
[0003] During the equipment maintenance process, the reaction chamber needs to be opened. The exhaust gas exhaust pipeline in the related technology usually needs to be in a shutdown state during the chamber opening process, so that the harmful gas remaining in the chamber cannot be discharged. Once the chamber is opened, the harmful gas will diffuse out and affect the health of the staff, and it is easy to trigger the alarm of the nearby environmental detection point. Summary of the invention
[0004] The present application provides a reaction chamber structure, which can solve the problem in the related art that harmful gases remaining in the chamber cannot be discharged when the chamber is opened.
[0005] In order to solve the technical problems described in the background technology, the present application provides a reaction chamber structure, the reaction chamber structure comprising:
[0006] A reaction chamber body, wherein the reaction chamber body is provided with an inspection door, an exhaust gas outlet and a vacuum atmosphere adjustment port;
[0007] An open-cavity exhaust gas discharge pipe, one end of which is connected to the exhaust gas discharge port, and the other end of which is connected to the exhaust gas treatment device;
[0008] a bellows stop valve, the bellows stop valve connecting the exhaust gas outlet and the open-cavity exhaust gas discharge pipe; a switch sensor is provided on the inspection door, the switch sensor is electrically connected to the bellows stop valve;
[0009] A vacuum atmosphere regulating device is connected to the vacuum atmosphere regulating port.
[0010] Optionally, the bellows stop valve comprises a first communicating chamber, a second communicating chamber and a driving device which are connected to each other;
[0011] The opening end of the first communication cavity forms a first connection port, and the first connection port is connected to and communicates with the exhaust gas outlet;
[0012] The opening end of the second connecting cavity forms a second connecting port, and the second connecting port is connected to and communicates with one end of the open cavity exhaust gas discharge pipe;
[0013] The driving device is disposed on the first communicating cavity at the other end relative to the first connecting port;
[0014] A bellows expansion and contraction device is provided in the first connecting cavity, a sealing member is provided at one end of the bellows expansion and contraction device in the expansion and contraction direction, and the other end of the bellows expansion and contraction device in the expansion and contraction direction is connected to the driving device;
[0015] The driving device can drive the bellows expansion and contraction device to extend until the sealing member seals the first connection port; the driving device can drive the bellows expansion and contraction device to shorten until the sealing member is away from the first connection port.
[0016] Optionally, the switch sensor is electrically connected to a drive device of the bellows stop valve;
[0017] When the switch sensor is not triggered, the driving device can drive the bellows expansion and contraction device to extend until the seal seals the first connection port. When the switch sensor is triggered, the driving device can drive the bellows expansion and contraction device to shorten until the seal is away from the first connection port.
[0018] Optionally, the first connecting cavity is connected to the second connecting cavity in an L-shape.
[0019] Optionally, the first connecting port is connected to the exhaust gas outlet via a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluororubber.
[0020] Optionally, the second connection port is connected to one end of the open-cavity exhaust gas discharge pipe via a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluororubber.
[0021] Optionally, the vacuum atmosphere regulating device comprises a connected spiral molecular pump and a dry pump.
[0022] Optionally, the exhaust gas outlet and the vacuum atmosphere adjustment port are arranged at the bottom end of the reaction chamber body.
[0023] Optionally, a manual stop valve is provided on the open-cavity exhaust gas discharge pipe.
[0024] The technical solution of the present application includes at least the following advantages: when the staff opens the inspection door to trigger the switch sensor, the switch sensor is electrically connected to the bellows stop valve, so that the triggering of the switch sensor causes the switch sensor to open, and under the action of the exhaust gas treatment device, the residual gas in the reaction chamber body is discharged from the reaction chamber body into the exhaust gas treatment device, thereby avoiding the problem caused by the residual gas failing to be discharged from the reaction chamber during the chamber opening operation. BRIEF DESCRIPTION OF THE DRAWINGS
[0025] In order to more clearly illustrate the specific implementation methods of the present application or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.
[0026] Figure 1 A schematic diagram of the reaction chamber structure provided in one embodiment of the present application is shown;
[0027] Figure 2 A schematic diagram showing the structure of a bellows stop valve in a reaction chamber structure provided in an embodiment of the present application when the bellows stop valve is in a closed state;
[0028] Figure 3 A structural schematic diagram of a bellows stop valve in a reaction chamber structure provided in an embodiment of the present application when in an open state is shown. DETAILED DESCRIPTION
[0029] The following will be combined with the accompanying drawings to clearly and completely describe the technical solutions in this application. Obviously, the described embodiments are part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0030] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.
[0031] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, it can also be the internal connection of two components, it can be a wireless connection, or it can be a wired connection. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0032] In addition, the technical features involved in the different embodiments of the present application described below can be combined with each other as long as they do not conflict with each other.
[0033] Figure 1 The schematic diagram of the reaction chamber structure provided by an embodiment of the present application is shown. Figure 1 It can be seen that the reaction chamber structure includes: a reaction chamber body 100, an open-chamber exhaust gas discharge pipeline 200, a bellows stop valve 300 and a vacuum atmosphere adjustment device 400.
[0034] The reaction chamber body is provided with an inspection door 110 , an exhaust gas outlet 120 and a vacuum atmosphere adjustment port 130 .
[0035] One end of the open-cavity exhaust gas discharge pipe 200 is connected to the exhaust gas discharge port 120 , and the other end is connected to the exhaust gas treatment device 500 .
[0036] The bellows stop valve 300 connects the exhaust gas outlet 120 and the open-cavity exhaust gas discharge pipe 200 ; a switch sensor 140 is provided on the inspection door 110 , and the switch sensor 140 is electrically connected to the bellows stop valve 300 .
[0037] The vacuum atmosphere adjustment device 400 is connected to the vacuum atmosphere adjustment port 130 .
[0038] When the staff opens the inspection door 110, the switch sensor 140 is triggered, and the switch sensor 140 is electrically connected to the bellows stop valve 300, so that the triggering of the switch sensor 140 causes the switch sensor 140 to open. Under the action of the exhaust gas treatment device 500, the residual gas in the reaction chamber body 100 is discharged from the reaction chamber body 100 into the exhaust gas treatment device 500, thereby avoiding the problem caused by the residual gas failing to be discharged from the reaction chamber during the chamber opening operation.
[0039] In order to prevent the problem of the reaction chamber body 100 being connected to the exhaust gas treatment device 500 due to failure of the bellows stop valve 300, causing the atmosphere of the reaction chamber body 100 to be polluted, a manual stop valve 600 is provided on the open-chamber exhaust gas discharge pipeline 200, thereby improving the sealing reliability of the reaction chamber body 100 during operation.
[0040] Figure 2 The structure diagram of the bellows stop valve in the reaction chamber structure provided by one embodiment of the present application when the bellows stop valve is in a closed state is shown. Figure 3 A structural schematic diagram of a bellows stop valve in a reaction chamber structure provided in an embodiment of the present application when in an open state is shown.
[0041] from Figure 2 and Figure 3 As can be seen in the figure, the bellows stop valve 300 includes a first connecting chamber 310, a second connecting chamber 320 and a driving device 330 which are connected to each other.
[0042] The opening end of the first communication cavity 310 forms a first connection port 311 , and the first connection port 311 is connected to and communicates with the exhaust gas outlet.
[0043] The opening end of the second connecting cavity 320 forms a second connecting port 321 , and the second connecting port 321 is connected to and communicates with one end of the open cavity exhaust gas discharge pipe.
[0044] The driving device 330 is disposed on the first connecting cavity 310 at the other end thereof relative to the first connecting port 311 .
[0045] The first connecting cavity 310 is provided with a bellows expansion and contraction device 340 . A sealing member 350 is provided at one end of the bellows expansion and contraction device 340 in the expansion and contraction direction. The other end of the bellows expansion and contraction device 340 in the expansion and contraction direction is connected to the driving device 330 .
[0046] The driving device 330 can drive the bellows expansion and contraction device 340 to extend until the sealing member 350 seals the first connection port 311, forming a Figure 2 The driving device 330 can drive the bellows expansion device 340 to shorten the sealing member 350 away from the first connection port 311, forming a closed sealing state; Figure 3 Shown in open state.
[0047] The switch sensor 140 is electrically connected to the driving device 330 of the bellows stop valve 300; when the switch sensor 140 is not triggered, the driving device 330 drives the bellows expansion device 340 to extend until the sealing member 350 seals the first connection port 311, forming a Figure 2When the switch sensor 140 is triggered, the drive device 330 can drive the bellows expansion and contraction device 340 to shorten the sealing member 350 away from the first connection port 311, forming a closed sealing state. Figure 3 Shown in open state.
[0048] Exemplarily, the first connecting cavity 310 and the second connecting cavity 320 are connected and communicated in an L shape. The first connecting port 311 is connected and communicated with the exhaust gas outlet 120 through a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluoro rubber. The second connecting port 321 is connected and communicated with one end of the open-cavity exhaust gas discharge pipe 200 through a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluoro rubber. The sealing gasket made of perfluoro rubber can improve the corrosion resistance of the sealing gasket.
[0049] Continue to refer to Figure 1 The vacuum atmosphere regulating device 400 in this embodiment includes a connected spiral molecular pump 410 and a dry pump 420. The vacuum atmosphere regulating device 400 composed of the spiral molecular pump 410 and the dry pump 420 can control the vacuum atmosphere in the reaction chamber body 100, and remove the reaction tail gas used in the process when the reaction chamber body 100 is working.
[0050] Exemplarily, the exhaust gas outlet 120 and the vacuum atmosphere adjustment port 130 are disposed at the bottom end of the reaction chamber body, thereby improving the exhaust gas exhaust effect.
[0051] In order to prevent the open-cavity exhaust gas discharge pipe 200 from being corroded, the material of the open-cavity exhaust gas discharge pipe 200 can be 316L stainless steel.
[0052] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection created by this application.
Claims
1. A reaction chamber structure, characterized in that: The reaction chamber structure comprises: A reaction chamber body, wherein the reaction chamber body is provided with an inspection door, an exhaust gas outlet and a vacuum atmosphere adjustment port; An open-cavity exhaust gas discharge pipe, one end of which is connected to the exhaust gas discharge port, and the other end of which is connected to the exhaust gas treatment device; a bellows stop valve, the bellows stop valve connecting the exhaust gas outlet and the open-cavity exhaust gas discharge pipe; a switch sensor is provided on the inspection door, the switch sensor is electrically connected to the bellows stop valve; A vacuum atmosphere regulating device is connected to the vacuum atmosphere regulating port.
2. The reaction chamber structure according to claim 1, characterized in that: The bellows stop valve comprises a first communicating chamber, a second communicating chamber and a driving device which are connected to each other; The opening end of the first communication cavity forms a first connection port, and the first connection port is connected to and communicates with the exhaust gas outlet; The opening end of the second connecting cavity forms a second connecting port, and the second connecting port is connected to and communicates with one end of the open cavity exhaust gas discharge pipe; The driving device is disposed on the first communicating cavity at the other end relative to the first connecting port; A bellows expansion and contraction device is provided in the first connecting cavity, a sealing member is provided at one end of the bellows expansion and contraction device in the expansion and contraction direction, and the other end of the bellows expansion and contraction device in the expansion and contraction direction is connected to the driving device; The driving device can drive the bellows expansion and contraction device to extend until the sealing member seals the first connection port; the driving device can drive the bellows expansion and contraction device to shorten until the sealing member is away from the first connection port.
3. The reaction chamber structure according to claim 2, characterized in that: The switch sensor is electrically connected to the drive device of the bellows stop valve; When the switch sensor is not triggered, the driving device can drive the bellows expansion and contraction device to extend until the seal seals the first connection port. When the switch sensor is triggered, the driving device can drive the bellows expansion and contraction device to shorten until the seal is away from the first connection port.
4. The reaction chamber structure according to claim 2, characterized in that: The first communicating cavity is connected to the second communicating cavity in an L-shape.
5. The reaction chamber structure according to claim 2, characterized in that: The first connection port is connected to the exhaust gas outlet via a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluororubber.
6. The reaction chamber structure according to claim 2, characterized in that: The second connection port is connected to one end of the open-cavity exhaust gas discharge pipe through a sealing gasket and a butterfly flange, and the sealing gasket is made of perfluororubber.
7. The reaction chamber structure according to claim 1, characterized in that: The vacuum atmosphere regulating device comprises a connected spiral molecular pump and a dry pump.
8. The reaction chamber structure according to claim 1, characterized in that: The exhaust gas outlet and the vacuum atmosphere adjustment port are arranged at the bottom end of the reaction chamber body.
9. The reaction chamber structure according to claim 1, characterized in that: A manual stop valve is arranged on the open cavity exhaust gas discharge pipeline.