Cleaning fluid output device
By setting nozzles on both sides of the brush and swinging of the nozzles using the connecting arms and control components, the problem of uneven distribution of cleaning liquid is solved and the cleaning effect of the wafer is improved.
Patent Information
- Application Number
- CN202420613509.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-03-27
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2034-03-27
AI Technical Summary
In the prior art, the cleaning liquid is unevenly distributed on the wafer surface and cannot effectively enter the brush and wafer, resulting in insufficient cleaning and product defects.
A cleaning liquid output device is designed, including a support arm and a spray head. The spray head is arranged on both sides of the brush, and the swing and rotation of the spray head is realized by connecting the arm and the control assembly to ensure that the cleaning liquid is evenly distributed.
By setting the nozzles on both sides of the brush and adjusting the swing of the nozzles, the uniform distribution of the cleaning liquid is achieved, the cleaning effect is improved, and the degree of cleaning of the product is ensured.
Smart Images
Figure CN222300627U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of wafer cleaning, in particular to a cleaning liquid output device. Background Art
[0002] CMP (Chemical Mechanical Planarization) is a process that uses chemical etching and mechanical force to planarize silicon wafers or other substrate materials during processing and perform post-cleaning. Therefore, the post-polishing CMP cleaning process is a key technology for the successful application of CMP in semiconductor processes.
[0003] In the prior art, the cleaning liquid output structure outputs the cleaning liquid to a fixed position on the wafer surface and distributes the cleaning liquid to various places on the wafer surface by rotating the wafer. However, the cleaning liquid cannot be evenly distributed on the wafer surface when the wafer rotates, and it cannot be guaranteed that the cleaning liquid effectively enters between the brush and the wafer. Since the cleaning liquid can only be distributed on one side of the brush, the cleaning liquid is unevenly distributed, resulting in insufficient product cleaning and product defects. Utility Model Content
[0004] Therefore, the technical problem to be solved by the present invention is to overcome the defect of uneven distribution of cleaning liquid in the prior art, thereby providing a cleaning liquid output device.
[0005] The utility model provides a cleaning liquid output device, comprising:
[0006] A support arm, the interior of which is suitable for arranging an infusion tube;
[0007] A nozzle is connected to the support arm; the nozzle is suitable for being connected to the infusion tube; and there is at least one nozzle on each side of the brush.
[0008] As a preferred solution, there are two nozzles; the two nozzles are respectively arranged on both sides of the brush.
[0009] As a preferred solution, it includes:
[0010] A connecting arm is arranged between the supporting arm and the nozzle; the two nozzles are respectively fixedly arranged at the two ends of the connecting arm; the extending direction of the connecting arm is perpendicular to the extending direction of the brush; the connecting arm is rotatably connected to the supporting arm; and the connecting arm is suitable for driving the nozzle to swing.
[0011] As a preferred solution, it also includes:
[0012] A control component is connected to the connecting arm; the control component is suitable for controlling the rotation of the connecting arm.
[0013] As a preferred solution, the control component includes a driving structure and a gear structure; the gear structure is connected to the connecting arm; the driving structure is connected to the gear structure; and the driving structure provides driving force for the rotation of the connecting arm.
[0014] As a preferred solution, the gear structure includes a first gear and a second gear; the first gear is fixedly connected to the connecting arm; the first gear rotates synchronously with the connecting arm; and the second gear is meshingly connected to the first gear.
[0015] As a preferred solution, the driving structure includes a motor; an output end of the motor is fixedly connected to the second gear.
[0016] As a preferred solution, the driving structure further includes a controller, and the controller is connected to the motor.
[0017] As a preferred solution, the length of the connecting arm is 100 mm-240 mm.
[0018] As a preferred solution, the diameter of the liquid outlet of the nozzle is 0.5mm-5mm.
[0019] The technical solution of this utility model has the following advantages:
[0020] 1. The utility model provides a cleaning liquid output device, comprising: a support arm and a nozzle, wherein the support arm is suitable for arranging a liquid infusion tube; the nozzle is connected to the support arm; the nozzle is suitable for communicating with the liquid infusion tube; and there is at least one nozzle on each side of the brush. In this solution, nozzles are arranged on both sides of the brush, so that the cleaning liquid can be distributed on both sides of the brush at the same time, thereby making the cleaning liquid more evenly distributed on the surface of the wafer, ensuring the degree of product cleaning.
[0021] 2. The utility model provides a cleaning liquid output device, which is provided with a connecting arm, which is rotatably connected to the supporting arm, wherein a nozzle is arranged at the end of the connecting arm, and the connecting arm can drive the nozzle to swing on both sides of the brush, so that the nozzle can further swing during the wafer cleaning process, which can further make the cleaning liquid more evenly distributed on the wafer surface.
[0022] 3. The utility model provides a cleaning liquid output device, which is also provided with a control component, which is connected to the connecting arm, and the control component can control the rotation of the connecting arm. The rotation direction and rotation speed of the connecting arm are controlled by the control component, and the speed of the connecting arm can be synchronously adjusted according to the rotation speed of the wafer, thereby further increasing the uniformity of the cleaning liquid on the wafer surface.
[0023] 4. The utility model provides a cleaning liquid output device, wherein the gear structure includes a first gear and a second gear, and the transmission effect is achieved by the mutual engagement of the first gear and the second gear. The gear transmission has the advantages of high transmission accuracy and wide applicability. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] In order to more clearly illustrate the specific implementation methods of the utility model or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0025] Figure 1 The utility model provides a schematic diagram of the overall structure of a cleaning liquid output device.
[0026] Figure 2 The utility model provides a schematic diagram of the movement of a cleaning liquid output device.
[0027] Description of reference numerals:
[0028] 1. Support arm; 2. Nozzle; 3. Connecting arm; 4. Control assembly; 41. Gear structure; 411. First gear; 412. Second gear; 42. Driving structure; 421. Motor; 422. Controller; 5. Brush. DETAILED DESCRIPTION
[0029] The technical solution of the utility model will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.
[0030] In the description of the present invention, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limitations on the present invention.
[0031] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0032] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.
[0033] like Figure 1 As shown, this embodiment provides a cleaning liquid output device, including a support arm 1 and a nozzle 2, wherein the support arm 1 is suitable for arranging a liquid infusion tube; the nozzle 2 is connected to the support arm 1; the nozzle 2 is suitable for communicating with the liquid infusion tube; and there is at least one nozzle 2 on both sides of the brush 5. In this solution, by arranging nozzles 2 on both sides of the brush 5, the cleaning liquid can be distributed on both sides of the brush 5 at the same time, so that the cleaning liquid is more evenly distributed on the surface of the wafer, thereby ensuring the degree of product cleaning.
[0034] It should be noted that a mounting hole suitable for mounting an infusion tube is provided inside the support arm 1. In this embodiment, the support arm 1 is L-shaped, and the shape of the support arm 1 can be adjusted arbitrarily according to the installation environment.
[0035] like Figure 1 As shown, further, in this embodiment, there are two nozzles 2, and the two nozzles 2 are respectively arranged on both sides of the brush 5. If the output speed of the cleaning liquid is to be increased, the number of nozzles 2 can be increased, for example, two nozzles 2 are respectively arranged on both sides of the brush 5.
[0036] Furthermore, the diameter of the liquid outlet of the nozzle 2 is 0.5 mm to 5 mm. The diameter of the liquid outlet of the nozzle 2 is changed according to the diameter of the wafer to ensure that there is sufficient cleaning liquid on the surface of the wafer.
[0037] Furthermore, a connecting arm 3 is provided, and the connecting arm 3 is provided between the supporting arm 1 and the nozzle 2. Two nozzles 2 are provided at the two ends of the connecting arm 3, respectively. The extension direction of the connecting arm 3 is perpendicular to the extension direction of the brush 5, so as to ensure that the nozzle 2 can be located on both sides of the brush 5. The connecting arm 3 is rotatably connected to the supporting arm 1, and the connecting arm 3 is suitable for driving the nozzle 2 to rotate on both sides of the brush 5. During the wafer cleaning process, the nozzle 2 is also moved, which can maximize the distribution of the cleaning liquid on the wafer surface, so that the cleaning liquid can more easily enter between the wafer and the brush 5, and it is easier and more sufficient for the wafer to contact and react with the cleaning liquid, and improve the removal rate of particles.
[0038] In this embodiment, the infusion tube passes through the support arm 1 and the connecting arm 3 and is connected to the nozzle 2 .
[0039] It should be noted that in order to adapt to wafers of different sizes such as six inches, eight inches, twelve inches, etc., the length of the connecting arm 3 can be adjusted. The length of the connecting arm 3 is 100mm-240mm. The connecting arm 3 within this range can adapt to most wafers.
[0040] It should be noted that, in this embodiment, in order to improve cleaning efficiency, a group of brushes 5 are also provided at the bottom of the wafer, and a cleaning liquid output device matching the brushes 5 is provided, so that the top and bottom of the wafer can be cleaned simultaneously, thereby increasing the cleaning efficiency.
[0041] Furthermore, a control component 4 is provided, which is connected to the connecting arm 3. The control component 4 is suitable for controlling the rotation of the connecting arm 3. The control component 4 can control the rotation angle and rotation speed of the connecting arm 3, so that the nozzle 2 on the connecting arm 3 can be adjusted according to the rotation speed of the wafer.
[0042] In this embodiment, the control component 4 controls the two nozzles 2 on the connecting arm 3 to perform reciprocating swinging motions, so that the nozzles 2 can spray the cleaning liquid onto the wafer surface more evenly.
[0043] Further, the control assembly 4 includes a drive structure 42 and a gear structure 41, wherein the gear structure 41 is connected to the connecting arm 3. The drive structure 42 is connected to the gear structure 41, and the drive structure 42 provides a driving force for the rotation of the connecting arm 3. The gear structure 41 mainly plays a transmission role.
[0044] It should be noted that the gear structure 41 may also be replaced by other transmission structures, such as belt transmission.
[0045] like Figure 1 As shown, in this embodiment, the gear structure 41 includes a first gear 411 and a second gear 412, wherein the first gear 411 is fixedly connected to the connecting arm 3, and the first gear 411 and the connecting arm 3 can be fixedly connected by welding or bonding, etc., to ensure that the first gear 411 can rotate synchronously with the connecting arm 3. In this solution, the center of the first gear 411 coincides with the midpoint of the connecting arm 3, so that the rotation speeds of the two nozzles 2 are the same, and the cleaning liquid is evenly sprayed on the surface of the wafer. The second gear 412 is meshed with the first gear 411. The transmission effect is achieved by the mutual meshing of the first gear 411 and the second gear 412, and the advantages of high transmission accuracy and wide range of application of gear transmission are utilized.
[0046] Furthermore, the driving structure 42 includes a motor 421, and the output end of the motor 421 is fixedly connected to the second gear 412. The rotation of the output end of the motor 421 drives the rotation of the second gear 412, thereby realizing the rotation of the connecting arm 3.
[0047] It should be noted that in this embodiment, the motor 421 is a servo motor 421. The servo motor 421 has the advantages of high precision and stable output. As an alternative implementation, in the case of reducing costs, manual control of the rotation of the connecting arm 3 can also be selected.
[0048] Furthermore, the driving structure 42 further includes a controller 422, which is connected to the motor 421. The controller 422 can control the output power of the motor 421 and the output direction of the motor 421. In this embodiment, Figure 2 As shown, the controller 422 controls the nozzle 2 to have a swing angle between -120° and 120° and a swing speed between 10 mm / min and 60 mm / min.
[0049] It should be noted that if the controller 422 is not provided, the swing of the connecting arm 3 can be achieved by turning the power on and off and the forward and reverse connection of the circuit.
[0050] It should be noted that the controller 422 can also control the connection arm 3 to swing according to the opening and closing of the infusion tube. When the infusion tube is opened, the connection arm 3 swings. When the infusion tube is closed, the connection arm 3 stops swinging.
[0051] In this embodiment, the wafer cleaning process is as follows: the wafer enters the cleaning unit with the grinding head, the nozzle 2 starts to swing, and the cleaning liquid pre-flows for 5s-8s. Then the brush 5 starts to work, and the flow rate of the cleaning liquid is 800ml / min; the nozzle 2 swings at a speed of 20mm / min, the swing angle is 60°, and the cleaning time is 15s. The wafer is cleaned and enters the next unit.
[0052] Obviously, the above embodiments are merely examples for the purpose of clear explanation, and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived therefrom are still within the scope of protection of the invention of the utility model.
Claims
1. A cleaning liquid output device, characterized in that: include: A support arm (1), the interior of which is suitable for arranging an infusion tube; A nozzle (2) is connected to the support arm (1); the nozzle (2) is suitable for being connected to the infusion tube; and there is at least one nozzle (2) on each side of the brush (5).
2. The cleaning liquid output device according to claim 1, characterized in that: There are two spray heads (2); the two spray heads (2) are respectively arranged on both sides of the brush (5).
3. The cleaning liquid output device according to claim 2, characterized in that: include: A connecting arm (3) is arranged between the supporting arm (1) and the spray head (2); the two spray heads (2) are respectively fixedly arranged at the two ends of the connecting arm (3); the extending direction of the connecting arm (3) and the extending direction of the brush (5) are mutually perpendicular; the connecting arm (3) is rotatably connected to the supporting arm (1); and the connecting arm (3) is suitable for driving the spray head (2) to swing.
4. The cleaning liquid output device according to claim 3, characterized in that: Also includes: A control component (4) is connected to the connecting arm (3); the control component (4) is suitable for controlling the rotation of the connecting arm (3).
5. The cleaning liquid output device according to claim 4, characterized in that: The control component (4) comprises a driving structure (42) and a gear structure (41); the gear structure (41) is connected to the connecting arm (3); the driving structure (42) is connected to the gear structure (41); and the driving structure (42) provides driving force for the rotation of the connecting arm (3).
6. The cleaning liquid output device according to claim 5, characterized in that: The gear structure (41) comprises a first gear (411) and a second gear (412); the first gear (411) is fixedly connected to the connecting arm (3); the first gear (411) and the connecting arm (3) rotate synchronously; and the second gear (412) is meshingly connected to the first gear (411).
7. The cleaning liquid output device according to claim 6, characterized in that: The driving structure (42) comprises a motor (421); an output end of the motor (421) is fixedly connected to the second gear (412).
8. The cleaning liquid output device according to claim 7, characterized in that: The driving structure (42) further includes a controller (422), and the controller (422) is connected to the motor (421).
9. The cleaning liquid output device according to claim 3, characterized in that: The length of the connecting arm (3) is 100 mm-240 mm.
10. The cleaning liquid output device according to claim 1, characterized in that: The diameter of the liquid outlet of the nozzle (2) is 0.5 mm-5 mm.