Polishing pad, polishing disc of polishing equipment and polishing equipment

Abstract

The utility model discloses a polishing pad, a polishing disk of polishing equipment and the polishing equipment, the polishing pad comprises a polishing pad main body, the polishing pad main body is provided with polishing patterns, the polishing patterns comprise a plurality of first arc-shaped lines and a plurality of second arc-shaped lines, one ends of the multiple first arc-shaped lines are arranged at intervals in the circumferential direction of the center of the polishing pad body, the other ends of the multiple first arc-shaped lines extend towards the edge of the polishing pad body, the multiple first arc-shaped lines are integrally spiral, and the second arc-shaped lines are arranged between at least two adjacent first arc-shaped lines at intervals. Therefore, the plurality of first arc-shaped lines are integrally arranged in the spiral shape, and the second arc-shaped lines are arranged between at least two adjacent first arc-shaped lines at intervals, so that more polishing runners can be realized, the polishing liquid can be uniformly distributed, and sharp corners formed by staggering among the polishing patterns are avoided; and scratches caused by the polishing pad to the material sheet are reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing, in particular to a polishing pad, a polishing disc of a polishing device and a polishing device. Background Art

[0002] SiC (Silicon Carbide) is an excellent third-generation semiconductor material, mainly used in high-power applications, with the characteristics of high hardness, corrosion resistance and fragility. CMP (Chemical Mechanical Polishing) is the final process of SiC substrate processing, used to obtain a defect-free surface.

[0003] The mainstream polishing equipment in the industry is single-sided polishing equipment, which uses a polishing head with an air film to absorb the SiC sheet and applies pressure to press the SiC sheet onto the polishing disc for polishing. The polishing disc is attached with a polishing pad to provide friction and a channel for the polishing liquid to flow. The polishing pad is provided with a pattern, which is a flow channel for the polishing liquid. The pattern has a significant effect on the surface morphology and surface defects of the SiC sheet after polishing.

[0004] In the prior art, there are sharp angles formed by interlacing patterns on the surface of the polishing pad. After polishing, the surface morphology of the sheet is unqualified and has many defects. In addition, arc-shaped polishing lines will appear on the back of the sheet, which will affect the quality of the sheet and reduce the performance of the sheet. Utility Model Content

[0005] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, one purpose of the utility model is to provide a polishing pad, which can improve the quality of the material after being polished by the polishing pad.

[0006] The utility model further provides a polishing disc of a polishing device.

[0007] The utility model further provides a polishing device.

[0008] In order to achieve the above-mentioned purpose, according to an embodiment of the utility model, a polishing pad is proposed, including: a polishing pad body, on which a polishing pattern is arranged, the polishing pattern including a first arc-shaped pattern and a second arc-shaped pattern, there are multiple first arc-shaped patterns, one end of each of the multiple first arc-shaped patterns is located at the center of the polishing pad body, one end of each of the multiple first arc-shaped patterns is spaced apart along the center circumference of the polishing pad body, the other end of each of the multiple first arc-shaped patterns extends toward the edge of the polishing pad body, the multiple first arc-shaped patterns are spiral-shaped as a whole, and the second arc-shaped patterns are spaced apart between at least two adjacent first arc-shaped patterns.

[0009] Therefore, by arranging multiple first arc-shaped patterns in a spiral shape as a whole, and arranging the second arc-shaped patterns at intervals between at least two adjacent first arc-shaped patterns, more polishing channels can be provided, so that the polishing liquid can be evenly distributed, and there are no sharp corners formed by interlacing between the polishing patterns, thereby reducing scratches on the sheet caused by the polishing pad.

[0010] According to some embodiments of the present invention, there are a plurality of second arc-shaped lines, and the plurality of second arc-shaped lines are circumferentially spaced apart, and at least one second arc-shaped line is disposed between two adjacent first arc-shaped lines.

[0011] According to some embodiments of the present invention, in a direction radially away from the center of the polishing pad body, the distance between two adjacent first arc-shaped lines gradually increases, and the second arc-shaped lines are arranged adjacent to the edge of the polishing pad body.

[0012] According to some embodiments of the present invention, the length of the second arc-shaped lines is smaller than the length of the first arc-shaped lines.

[0013] According to some embodiments of the present invention, one end of the second arc-shaped pattern is connected to the edge of the polishing pad body, and the other end of the second arc-shaped pattern is spaced apart from the center of the polishing pad body.

[0014] According to some embodiments of the present invention, one second arc-shaped line is arranged between two adjacent first arc-shaped lines, and the distances from the second arc-shaped line to two adjacent first arc-shaped lines are equal.

[0015] According to some embodiments of the present invention, the other ends of the plurality of first arc-shaped lines extending toward the edge of the polishing pad body are all connected to the edge of the polishing pad body.

[0016] According to an embodiment of the utility model, a polishing disc of a polishing device is provided, comprising: a polishing disc body; and the polishing pad mentioned above, wherein the polishing pad is arranged on the upper side of the polishing disc body.

[0017] According to an embodiment of the utility model, a polishing device is provided, comprising: the polishing disk of the polishing device described above.

[0018] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0020] Figure 1 It is a partial schematic diagram of a polishing device according to an embodiment of the utility model.

[0021] Figure 2 Schematic diagram of a polishing pad according to an embodiment of the utility model.

[0022] Reference numerals:

[0023] 1000. Polishing equipment;

[0024] 100. Polishing disc;

[0025] 10. Polishing disc body;

[0026] 20. polishing pad; 21. polishing pad body; 22. polishing pattern; 221. first arc-shaped pattern; 223. second arc-shaped pattern;

[0027] 200. Polishing head; 300. Polishing liquid delivery pipe. DETAILED DESCRIPTION

[0028] The embodiments of the present utility model are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present utility model are described in detail below.

[0029] Reference below Figure 1-Figure 2 The polishing pad 20 according to the embodiment of the present invention is described. The polishing pad 20 can be applied to a polishing plate 100 , and the polishing plate 100 can be applied to a polishing device 1000 .

[0030] Combination Figure 1-Figure 2 As shown, the polishing pad 20 according to the embodiment of the utility model may mainly include: a polishing pad body 21, on which a polishing pattern 22 is arranged, the polishing pattern 22 includes a plurality of first arcuate lines 221, one end of each of the plurality of first arcuate lines 221 is located at the center of the polishing pad body 21, one end of each of the plurality of first arcuate lines 221 is spaced apart along the center circumference of the polishing pad body 21, the other end of each of the plurality of first arcuate lines 221 is extended toward the edge of the polishing pad body 21, and the plurality of first arcuate lines 221 are spiral in shape as a whole.

[0031] Specifically, by arranging a polishing pattern 22 on the polishing pad body 21, the polishing pattern 22 is a flow channel for the polishing liquid, so that the polishing liquid can be evenly distributed on the polishing pad 20 during the polishing process. The polishing pattern 22 includes a plurality of first arcuate patterns 221, and one end of the plurality of first arcuate patterns 221 is arranged at the center of the polishing pad body 21, and one end of the plurality of first arcuate patterns 221 is arranged at intervals along the center circumference of the polishing pad body 21. This can not only prevent the polishing pattern 22 from having sharp corners formed by interlacing with each other, but also reduce the scratches of the sheet by the polishing pattern 22 during the polishing process, reduce the scratch defects on the surface of the sheet after polishing, improve the quality of the sheet, and improve the yield rate after polishing of the sheet.

[0032] In addition, the multiple first arc-shaped patterns 221 are spiral in shape as a whole, which can reduce the rotation of the sheet during the polishing process compared to the circular ring-shaped patterns used in the prior art, thereby preventing the appearance of arc-shaped polishing patterns on the back of the sheet, and further improving the quality of the sheet. Such a setting can improve the stability and reliability of the polishing pad 20, thereby improving the performance of the polishing equipment 1000.

[0033] Combination Figure 2 As shown, the polishing pattern 22 further includes a second arc-shaped pattern 223, and the second arc-shaped pattern 223 is arranged at intervals between at least two adjacent first arc-shaped patterns 221. Specifically, the second arc-shaped pattern 223 is arranged at intervals between at least two adjacent first arc-shaped patterns 221, and the number of polishing patterns 22 can be increased under the premise of ensuring that the first arc-shaped patterns 221 and the second arc-shaped patterns 223 do not intersect with each other to form sharp angles, so that the amount of polishing liquid flowing in the polishing pattern 22 can be increased, and the surface of the sheet can be smoother after the polishing pad 20 finishes polishing the sheet, which can improve the polishing effect of the polishing pad 20 on the sheet and the quality of the sheet.

[0034] Combination Figure 2 As shown, the other ends of the plurality of first arc-shaped lines 221 extending toward the edge of the polishing pad body 21 are all connected to the edge of the polishing pad body 21. Specifically, the other ends of the plurality of first arc-shaped lines 221 extending toward the edge of the polishing pad body 21 are connected to the edge of the polishing pad body 21, so that when the polishing liquid flows in the plurality of first arc-shaped lines 221, the distribution on the polishing pad 20 is more uniform, thereby improving the contact uniformity between the polishing liquid and the sheet, improving the polishing effect of the polishing pad 20 on the sheet, and further improving the performance of the polishing device 1000.

[0035] Combination Figure 2As shown, there are multiple second arc-shaped lines 223, and the multiple second arc-shaped lines 223 are arranged at intervals in the circumferential direction, and at least one second arc-shaped line 223 is arranged between two adjacent first arc-shaped lines 221. Specifically, the second arc-shaped lines 223 are arranged in multiples, and at least one second arc-shaped line 223 is arranged between two adjacent first arc-shaped lines 221, so that not only the number of second arc-shaped lines 223 can be further increased, thereby increasing the amount of polishing liquid on the polishing pad 20, and further improving the flatness of the polishing of the material sheet by the polishing pad 20, but also the distribution of the multiple first arc-shaped lines 221 and the multiple second arc-shaped lines 223 on the polishing pad body 21 can be more uniform, which can prevent the uneven distribution of the polishing liquid on the polishing pad 20, thereby further improving the polishing effect of the polishing pad 20 on the material sheet.

[0036] Combination Figure 2 As shown, the length of the second arc-shaped lines 223 is less than the length of the first arc-shaped lines 221. Specifically, the length of the second arc-shaped lines 223 is set to be less than the length of the first arc-shaped lines 221, which can not only prevent the first arc-shaped lines 221 and the second arc-shaped lines 223 from interlacing with each other to form a sharp angle, but also improve the uniformity and reliability of the distribution between the first arc-shaped lines 221 and the second arc-shaped lines 223, so that the structural design of the polishing pattern 22 can be further optimized.

[0037] Combination Figure 2 As shown, one end of the second arc-shaped pattern 223 is connected to the edge of the polishing pad body 21, and the other end of the second arc-shaped pattern 223 is spaced apart from the center of the polishing pad body 21. Specifically, since the distance between two adjacent first arc-shaped patterns 221 gradually increases in the direction away from the center of the polishing pad body 21, one end of the second arc-shaped pattern 223 is connected to the edge of the polishing pad body 21, and the other end of the second arc-shaped pattern 223 is spaced apart from the center of the polishing pad body 21, so that the second arc-shaped pattern 223 corresponds to a position with a relatively large distance from two adjacent first arc-shaped patterns 221, so that the polishing pattern 22 is prevented from being densely distributed in the part adjacent to the center of the polishing pad body 21, and the polishing pattern 22 is sparsely distributed in the part away from the center of the polishing pad body 21, and the distribution uniformity of the polishing pattern 22 on the polishing pad 20 can be further improved.

[0038] Combination Figure 2As shown, a second arc-shaped pattern 223 is provided between two adjacent first arc-shaped patterns 221, and the distances between the second arc-shaped pattern 223 and the two adjacent first arc-shaped patterns 221 are equal. Specifically, by providing a second arc-shaped pattern 223 between two adjacent first arc-shaped patterns 221, and making the distances between the second arc-shaped pattern 223 and the two adjacent first arc-shaped patterns 221 equal, in this way, on the basis of providing a second arc-shaped pattern 223 between two adjacent first arc-shaped patterns 221, the first arc-shaped patterns 221 and the second arc-shaped patterns 223 can be distributed more evenly on the polishing pad body 21, so that the structural performance of the polishing pattern 22 can be further improved, and the reliability of the polishing of the sheet can be improved.

[0039] Combination Figure 1 As shown, the polishing disc 100 of the polishing device 1000 according to the embodiment of the utility model may mainly include: a polishing disc body 10 and the above-mentioned polishing pad 20 , and the polishing pad 20 is arranged on the upper side of the polishing disc body 10 .

[0040] Specifically, by setting the polishing pad 20 on the upper side of the polishing disk body 10, when the polishing disk 100 rotates, the polishing pad 20 can rotate along with the polishing disk 100, thereby polishing the sheet. During the polishing process, the polishing liquid delivery pipe 300 can deliver the polishing liquid to the polishing pad 20, and the polishing liquid can flow in the polishing pattern 22, thereby being evenly distributed in the polishing pad 20.

[0041] Combination Figure 2 As shown, the polishing device 1000 according to the embodiment of the utility model can mainly include: the polishing disk 100 of the above-mentioned polishing device 1000, the polishing head 200 of the polishing device 1000 can adsorb the sheet onto the polishing disk 100, and when the polishing device 1000 polishes the sheet, the polishing head 200 and the polishing disk 100 will both rotate to polish the sheet.

[0042] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0043] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic expressions of the above terms do not necessarily refer to the same embodiment or example.

[0044] Although the embodiments of the present invention have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A polishing pad, characterized in that: include: A polishing pad body (21), wherein a polishing pattern (22) is arranged on the polishing pad body (21), wherein the polishing pattern (22) comprises a first arc-shaped pattern (221) and a second arc-shaped pattern (223), wherein the first arc-shaped pattern (221) is multiple, and one end of each of the multiple first arc-shaped patterns (221) is located at the center of the polishing pad body (21), one end of each of the multiple first arc-shaped patterns (221) is arranged at intervals along the central circumference of the polishing pad body (21), and the other ends of each of the multiple first arc-shaped patterns (221) are extended toward the edge of the polishing pad body (21), and the multiple first arc-shaped patterns (221) are spiral-shaped as a whole, and the second arc-shaped patterns (223) are arranged at intervals between at least two adjacent first arc-shaped patterns (221).

2. The polishing pad according to claim 1, characterized in that There are a plurality of the second arc-shaped lines (223), the plurality of the second arc-shaped lines (223) are arranged at intervals in the circumferential direction, and at least one second arc-shaped line (223) is arranged between two adjacent first arc-shaped lines (221).

3. The polishing pad according to claim 2, characterized in that In a direction radially away from the center of the polishing pad body (21), the distance between two adjacent first arc-shaped lines (221) gradually increases, and the second arc-shaped lines (223) are arranged adjacent to the edge of the polishing pad body (21).

4. The polishing pad according to claim 2, characterized in that The length of the second arc-shaped lines (223) is shorter than the length of the first arc-shaped lines (221).

5. The polishing pad according to claim 2, characterized in that One end of the second arc-shaped pattern (223) is connected to the edge of the polishing pad body (21), and the other end of the second arc-shaped pattern (223) is spaced from the center of the polishing pad body (21).

6. The polishing pad according to claim 2, characterized in that A second arc-shaped pattern (223) is arranged between two adjacent first arc-shaped patterns (221), and the distances from the second arc-shaped pattern (223) to two adjacent first arc-shaped patterns (221) are equal.

7. The polishing pad according to claim 1, characterized in that The other ends of the plurality of first arc-shaped lines (221) extending toward the edge of the polishing pad body (21) are all connected to the edge of the polishing pad body (21).

8. A polishing disc of a polishing device, characterized in that: include: Polishing disc body (10); The polishing pad (20) according to any one of claims 1 to 7, wherein the polishing pad (20) is arranged on the upper side of the polishing disc body (10).

9. A polishing device, characterized in that: include: The polishing disc (100) of the polishing device (1000) according to claim 8.

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