Polycrystalline silicon wafer cleaning equipment

Abstract

The utility model relates to the technical field of polycrystalline silicon wafer cleaning, and discloses polycrystalline silicon wafer cleaning equipment which comprises a box body, fixing plates are fixedly connected to the middle sides of the left portion and the right portion of the box body, four air drying mechanisms are arranged on the right side of the upper portion of the box body at equal intervals, and rotating shafts are rotatably connected to the two sides of the interior of the box body at equal intervals. A conveying belt is arranged between the rotating shafts, a plurality of water leakage holes are formed in the upper side portion of the conveying belt at equal intervals, the rear end of the rotating shaft on the left side is fixedly connected to the output end of a first motor, and a second filtering box is fixedly connected to the lower side of the interior of the box body; sliding grooves are formed in the front side and the rear side of the interior of the box body, and filtering mechanisms are arranged in the sliding grooves. According to the polycrystalline silicon wafer cleaning device, through the synergistic effect of the water pump and the filtering mechanism, recycling of pure water after polycrystalline silicon wafers are cleaned is achieved, meanwhile, silicon powder is gradually removed and collected through the coarse filter screen, the medium filter screen and the fine filter screen, resource waste is effectively reduced, and cleaning efficiency and environmental friendliness are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of polycrystalline silicon slice cleaning, in particular to polycrystalline silicon slice cleaning equipment. Background Art

[0002] The background technology of polysilicon wafer cleaning equipment covers a variety of processes, including chemical cleaning, physical cleaning and ultrapure water rinsing. These technologies are designed to remove impurities, grease and other contaminants on the surface of silicon wafers to ensure that the silicon wafers have good electrical and mechanical properties in subsequent processes. Cleaning equipment usually includes multiple processing steps, such as pre-cleaning, main cleaning, rinsing and drying, to ensure that the cleaning effect meets the requirements and meets the strict standards of semiconductor manufacturing;

[0003] Polycrystalline silicon wafer cleaning equipment usually consists of multiple parts, including pre-cleaning, main cleaning, rinsing and drying. The pre-cleaning stage is used to remove most surface contaminants. The main cleaning stage uses a combination of chemical cleaning and physical cleaning to completely remove residual organic and inorganic contaminants. The rinsing stage uses pure water for neutralization and flushing, and finally the drying system completes the cleaning process.

[0004] During the cleaning process of polysilicon wafer cleaning equipment, the equipment needs to use a large amount of pure water, resulting in waste of water resources and increased costs; secondly, the silicon powder washed away cannot be effectively collected during the cleaning process and cannot be reused, resulting in waste of resources and environmental pressure. Therefore, a polysilicon wafer cleaning equipment is proposed to solve the above problems. Utility Model Content

[0005] In order to make up for the above shortcomings, the utility model provides a polycrystalline silicon wafer cleaning device, aiming to improve the problems of water waste and failure to effectively reuse silicon powder in the polycrystalline silicon wafer cleaning device in the prior art.

[0006] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a polycrystalline silicon wafer cleaning device, comprising a box body, a fixed plate is fixedly connected to the middle side of the left and right parts of the box body, four air-drying mechanisms are equidistantly arranged on the upper right side of the box body, rotating shafts are equidistantly connected to the inner sides of the box body, a conveyor belt is arranged between the rotating shafts, a plurality of water leakage holes are equidistantly opened on the upper side of the conveyor belt, the rear end of the rotating shaft on the left side is fixedly connected to the output end of the first motor, a second filter box is fixedly connected to the lower side of the inner part of the box body, a slide groove is opened on the front and rear sides of the inner part of the box body and a filter mechanism is arranged in the slide groove, and the inner part of the box body A first filter box is fixedly connected to the bottom side, a plurality of nozzles are equidistantly fixedly connected to the right side of the interior of the box, a plurality of nozzles are equidistantly fixedly connected to the lower part of the nozzles, a water spray pipe is fixedly connected to the rear end of the nozzles, a water pump is fixedly connected to the lower rear side of the box, a water spray pipe is fixedly connected to the output end of the water pump, an input end of the water pump is fixedly connected to the rear side of the first filter box through a water suction pipe, a booster pump is fixedly connected to the lower rear side of the box, an output end of the booster pump is fixedly connected to the rear side of the second filter box through a booster pipe, and the upper left and right sides of the box are rotatably connected to the side close to the box door through a hinge;

[0007] As a further description of the above technical solution: the filtering mechanism includes a frame, the front and rear sides of the box body are provided with slide grooves and the frame is slidably connected in the slide grooves, the frame is equidistantly fixedly connected with fixed blocks, the upper part of the fixed blocks is respectively provided with a fine filter screen, a medium filter screen and a coarse filter screen, the right part of the frame is fixedly connected with a sealing block, and the middle side of the right part of the sealing block is fixedly connected with a second handle;

[0008] As a further description of the above technical solution: the air-drying mechanism includes a shell, four shells are fixedly connected to the upper right side of the box body at equal distances, the inner middle side of the shell is fixedly connected to a mounting plate, the lower middle side of the mounting plate is fixedly connected to a second motor, and the output end of the second motor is fixedly connected to a fan blade;

[0009] As a further description of the above technical solution: a control panel is fixedly connected to one side of the front portion of the box, and the control panel is electrically connected to the water pump, the first motor, the booster pump and the second motor respectively;

[0010] As a further description of the above technical solution: the upper sides of the left and right parts and the upper side of the front part of the box body are respectively fixedly connected with the second glass window and the first glass window;

[0011] As a further description of the above technical solution: the first handle is fixedly connected to the far side of the door, and the front and rear sides of the lower part of the door are connected to the front and rear sides of the inner part of the box body through a support rod;

[0012] As a further description of the above technical solution: the four corners of the bottom of the box are equidistantly and fixedly connected with a base;

[0013] As a further description of the above technical solution: a plurality of placement boxes are equidistantly arranged on the upper part of the conveyor belt, and a plurality of polycrystalline silicon wafers are equidistantly placed on the upper part of the placement boxes.

[0014] The utility model has the following beneficial effects:

[0015] 1. In the utility model, through the coordinated action of structures such as a water pump, the water pump is first used to extract pure water from the first filter box, and the polycrystalline silicon wafers are cleaned through a nozzle; the cleaned pure water flows to the second filter box, and after being filtered, it flows back to the first filter box again, forming a water circulation system, realizing the recycling of water resources; after cleaning, the polycrystalline silicon wafers are air-dried by an air-drying mechanism to ensure that the surface is dry, thereby improving the cleaning effect.

[0016] 2. In the utility model, through the synergistic effect of key components such as the filtering mechanism, the cleaned pure water is filtered through the coarse filter, the medium filter, and the fine filter in sequence, effectively removing the silicon powder therein and successfully collecting it, thereby realizing the effective reuse of the silicon powder, reducing resource waste, and improving the cleaning efficiency and environmental friendliness. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is an overall structural diagram of a polycrystalline silicon wafer cleaning device proposed by the utility model;

[0018] Figure 2 This is a rear view of a polysilicon wafer cleaning device proposed by the utility model;

[0019] Figure 3 This is a front sectional view of a polysilicon wafer cleaning device proposed by the utility model;

[0020] Figure 4 This is a right sectional view of a polysilicon wafer cleaning device proposed by the utility model:

[0021] Figure 5 for Figure 1 A detailed enlarged view of the air-drying mechanism in the overall structural diagram;

[0022] Figure 6 for Figure 3 Detailed exploded view of the filter mechanism in the front-center section view.

[0023] Legend:

[0024] 1. Box body; 2. Base; 3. Control panel; 4. First glass window; 5. Air drying mechanism; 6. Second glass window; 7. Box door; 8. First handle; 9. Fixed plate; 10. Support rod; 11. First filter box; 12. Filter mechanism; 13. Water pump; 14. First motor; 15. Suction pipe; 16. Water spray pipe; 17. Booster pump; 18. Booster pipe; 19. Spray pipe; 20. Spray head; 21. Conveyor belt; 22. Leakage hole; 23. Rotating shaft; 24. Polycrystalline silicon wafer; 25. Placement box; 26. Second filter box; 27. Mounting plate; 28. Second motor; 29. ​​Fan blade; 30. Frame; 31. Second handle; 32. Sealing block; 33. Coarse filter; 34. Medium filter; 35. Fine filter; 36. Fixed block; 37. Casing. DETAILED DESCRIPTION

[0025] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0026] Reference Figure 1-Figure 6A polysilicon wafer cleaning device comprises a box body 1, a fixing plate 9 is fixedly connected to the middle side of the left and right parts of the box body 1, four air drying mechanisms 5 are equidistantly arranged on the upper right side of the box body 1, rotating shafts 23 are equidistantly connected to the two sides of the box body 1, a conveyor belt 21 is arranged between the rotating shafts 23, a plurality of water leakage holes 22 are equidistantly opened on the upper side of the conveyor belt 21, a rear end of the left rotating shaft 23 is fixedly connected to the output end of the first motor 14, a second filter box 26 is fixedly connected to the lower side of the box body 1, and the box body 1 is provided with a plurality of water leakage holes 22, and the rear end of the left rotating shaft 23 is fixedly connected to the output end of the first motor 14, and a second filter box 26 is fixedly connected to the lower side of the box body 1. 1 has a chute at the front and rear sides thereof and a filtering mechanism 12 is arranged in the chute, a first filtering box 11 is fixedly connected to the bottom side of the box 1, a plurality of nozzles 19 are fixedly connected to the right side of the box 1 at equal intervals, a plurality of nozzles 20 are fixedly connected to the lower part of the nozzles 19 at equal intervals, a water spray pipe 16 is fixedly connected to the rear end of the nozzles 19, a water pump 13 is fixedly connected to the lower rear side of the box 1, a water spray pipe 16 is fixedly connected to the output end of the water pump 13, and an input end of the water pump 13 is connected to the first filtering box 11. The rear side is fixedly connected by a water pump 15, the rear lower side of the box body 1 is fixedly connected with a booster pump 17, the output end of the booster pump 17 is fixedly connected to the rear side of the second filter box 26 by a booster pipe 18, the upper side of the left and right parts of the box body 1 is rotatably connected to the side close to the box door 7 by a hinge, the filter mechanism 12 includes a frame 30, the front and rear sides of the box body 1 are provided with a slide groove, and the frame 30 is slidably connected in the slide groove, and the interior of the frame 30 is equidistantly fixedly connected with a fixed block 36, and the upper part of the fixed block 36 A fine filter 35, a medium filter 34 and a coarse filter 33 are respectively provided, a sealing block 32 is fixedly connected to the right side of the frame 30, a second handle 31 is fixedly connected to the right middle side of the sealing block 32, the air-drying mechanism 5 includes a shell 37, four shells 37 are fixedly connected to the upper right side of the box body 1 at equal distances, a mounting plate 27 is fixedly connected to the inner middle side of the shell 37, a second motor 28 is fixedly connected to the lower middle side of the mounting plate 27, and a fan blade 29 is fixedly connected to the output end of the second motor 28.

[0027] Four air-drying mechanisms 5 are equidistantly arranged on the upper right side of the box body 1. The air-drying mechanism 5 includes an outer shell 37, a mounting plate 27, a second motor 28, a fan blade 29 and other components. The polysilicon wafers 24 are air-dried through the air-drying mechanism 5. A plurality of water leakage holes 22 are equidistantly provided on the upper side of the conveyor belt 21. The rear end of the left rotating shaft 23 is fixedly connected to the output end of the first motor 14. A second filter box 26 is fixedly connected to the lower inner side of the box body 1. A slide groove is provided on the front and rear sides of the inner part of the box body 1 and a filter mechanism 12 is arranged in the slide groove. The filter mechanism 12 includes a frame 30, a fixing block 36, a fine filter screen 35, a medium filter screen 34 and a coarse filter screen 33 and other components. The cleaned pure water passes through the coarse filter screen 33, the medium filter screen 34, the fine filter screen 35, the medium filter screen 34 and the coarse filter screen 33. The filter screen 35 filters in sequence, and a first filter box 11 is fixedly connected to the inner bottom side of the box body 1, and a plurality of nozzles 19 are equidistantly fixedly connected to the inner right side of the box body 1, and a plurality of nozzles 20 are equidistantly fixedly connected to the lower part of the nozzles 19, and a water spray pipe 16 is fixedly connected to the rear end of the nozzles 19, and a water pump 13 is fixedly connected to the lower rear side of the box body 1, and a water spray pipe 16 is fixedly connected to the output end of the water pump 13, and an input end of the water pump 13 is fixedly connected to a rear side of the first filter box 11 through a water pumping pipe 15, and the water pump 13 extracts pure water from the first filter box 11, and cleans the polysilicon wafers 24 through the nozzles 20, and a booster pump 17 is fixedly connected to the lower rear side of the box body 1, and an output end of the booster pump 17 is fixedly connected to a rear side of the second filter box 26 through a booster pipe 18.

[0028] Working principle: Four air-drying mechanisms 5 are arranged on the upper part of the box body 1. The air-drying mechanism 5 includes the interaction of the housing 37, the mounting plate 27, the second motor 28 and the fan blades 29. The polysilicon wafers 24 are air-dried through the air-drying mechanism 5. A plurality of water leakage holes 22 are opened on the conveyor belt 21. The left rotating shaft 23 is fixedly connected to the first motor 14. The second filter box 26 is arranged inside the box body 1. The filter mechanism 12 is arranged inside the box body 1. The filter mechanism 12 includes the frame 30, the fixing block 36, the fine filter screen 35, the medium filter screen 34 and the coarse filter screen 33. Due to the interaction of the components, the cleaned pure water is filtered through the coarse filter 33, the medium filter 34 and the fine filter 35 in sequence, and the pure water flows into the first filter box 11 inside the box body 1. A plurality of nozzles 20 are arranged inside the box body 1. A water pump 13 is arranged at the rear of the box body 1. A water spray pipe 16 is connected to the output end of the water pump 13. The water pump 13 extracts the pure water in the first filter box 11 and cleans the polycrystalline silicon wafers 24 through the nozzles 20. A booster pump 17 is arranged at the rear of the box body 1. The output end of the booster pump 17 is connected to the second filter box 26 through the booster pipe 18 to increase the filtration speed of the pure water.

[0029] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A polycrystalline silicon wafer cleaning device, comprising a housing (1), characterized in that: A fixing plate (9) is fixedly connected to the middle sides of the left and right parts of the box body (1), four air-drying mechanisms (5) are equidistantly arranged on the upper right side of the box body (1), rotating shafts (23) are equidistantly connected to the two sides of the interior of the box body (1), a conveyor belt (21) is arranged between the rotating shafts (23), a plurality of water leakage holes (22) are equidistantly opened on the upper side of the conveyor belt (21), the rear end of the rotating shaft (23) on the left side is fixedly connected to the output end of the first motor (14), a second filter box (26) is fixedly connected to the lower side of the interior of the box body (1), a slide groove is opened on the front and rear sides of the interior of the box body (1) and a filter mechanism (12) is arranged in the slide groove, a first filter box (11) is fixedly connected to the bottom side of the interior of the box body (1), and the right side of the interior of the box body (1) A plurality of nozzles (19) are fixedly connected at equal intervals, a plurality of nozzles (20) are fixedly connected at equal intervals to the lower part of the nozzles (19), a water spray pipe (16) is fixedly connected to the rear end of the nozzles (19), a water pump (13) is fixedly connected to the lower rear side of the box body (1), the output end of the water pump (13) is fixedly connected to the water spray pipe (16), the input end of the water pump (13) is fixedly connected to the rear side of the first filter box (11) through a water suction pipe (15), a booster pump (17) is fixedly connected to the lower rear side of the box body (1), the output end of the booster pump (17) is fixedly connected to the rear side of the second filter box (26) through a booster pipe (18), and the upper left and right sides of the box body (1) are rotatably connected to the side close to the box door (7) through a hinge.

2. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: The filtering mechanism (12) comprises a frame (30), the front and rear sides of the interior of the box (1) are provided with sliding grooves, and the frame (30) is slidably connected in the sliding grooves, the interior of the frame (30) is equidistantly fixedly connected with fixed blocks (36), the upper part of the fixed blocks (36) is respectively provided with a fine filter screen (35), a medium filter screen (34), and a coarse filter screen (33), the right part of the frame (30) is fixedly connected with a sealing block (32), and the middle side of the right part of the sealing block (32) is fixedly connected with a second handle (31).

3. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: The air-drying mechanism (5) comprises a shell (37), four shells (37) are fixedly connected at equal intervals to the upper right side of the box body (1), the inner middle side of each shell (37) is fixedly connected to a mounting plate (27), the lower middle side of each mounting plate (27) is fixedly connected to a second motor (28), and the output end of each second motor (28) is fixedly connected to a fan blade (29).

4. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: A control panel (3) is fixedly connected to one side of the front portion of the box body (1), and the control panel (3) is electrically connected to the water pump (13), the first motor (14), the booster pump (17) and the second motor (28) respectively.

5. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: The upper sides of the left and right parts and the upper side of the front part of the box body (1) are respectively fixedly connected with a second glass window (6) and a first glass window (4).

6. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: A first handle (8) is fixedly connected to the far side of the box door (7), and the front and rear sides of the lower part of the box door (7) are connected to the front and rear sides of the interior of the box body (1) via a support rod (10).

7. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: The four corners of the bottom of the box body (1) are fixedly connected with a base (2) at equal distances.

8. The polycrystalline silicon wafer cleaning device according to claim 1, characterized in that: A plurality of placement boxes (25) are arranged at equal intervals on the upper part of the conveyor belt (21), and a plurality of polycrystalline silicon wafers (24) are placed at equal intervals on the upper part of the placement boxes (25).

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