Recovery and purification equipment for hydrogen, tail gas treatment system and semiconductor process system

Abstract

The utility model relates to recovery and purification equipment for hydrogen, a tail gas treatment system and a semiconductor process system. The recovery and purification equipment comprises a condensation part, a liquid storage part, a first purification part, a second purification part and a conveying part, the device has the advantages that the condensation part is communicated with upstream gas treatment equipment and the liquid storage part, so that liquid molecules carried in high-temperature gas can be completely condensed, and condensed liquid is stored in the liquid storage part; the first purification component is communicated with the liquid storage component, so that liquid molecules in the first mixed gas can be further removed, and the dryness of the second mixed gas is ensured; the second purification component is communicated with the first purification component, and the second purification component only allows the small-molecule hydrogen to pass through, so that impurity gas in the first mixed gas is removed and conveyed to the tail gas combustion treatment equipment to be treated, and the purity of the hydrogen is further improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor gas process treatment, in particular to a hydrogen recovery and purification device, a tail gas treatment system and a semiconductor process system. Background Art

[0002] The most widely used and largest amount of gas in semiconductor process is hydrogen. This system is for H 2 Exhaust gas recovery system. Currently, in semiconductor process production, the residual gases after these processes come out of the clean room through the vacuum tube, and need to be treated by exhaust gas treatment equipment through combustion or water washing, condensation, adsorption and other methods before being discharged into the central exhaust gas treatment system. This treatment method causes great waste.

[0003] In the process of hydrogen production, the produced gas contains a large amount of impurities that need to be filtered and purified. 2 Purification and filtration, Chinese invention patent (CN117531327A) discloses a hydrogen purification device in a modified Siemens process for producing polysilicon, a front condensation unit, connected to the tail gas of the modified Siemens process for producing polysilicon, the tail gas is treated by the front condensation unit to obtain a first treatment gas; a compression unit, connected to the front condensation unit, the first treatment gas is compressed by the compression unit to obtain a second treatment gas, the pressure of the second treatment gas is 1.2-1.5MPa; a rear condensation unit, connected to the compression unit, the second treatment gas is cooled step by step by the rear condensation unit to obtain a third treatment fluid, the temperature of the third treatment fluid is not higher than -70°C; an absorption and analysis unit, connected to the rear condensation unit, the third treatment fluid can remove at least 99% of HCl by the absorption and analysis unit to obtain a fourth treatment gas; a desorption and adsorption unit, connected to the absorption and analysis unit, the fourth treatment gas is treated by the desorption and adsorption unit to obtain H with a purity of not less than 99.999% 2 .

[0004] However, the above hydrogen purification device has the following defects in actual use:

[0005] 1. The working environment requirements of the hydrogen purification device in the prior art are relatively high, requiring a low-temperature environment, and are not suitable for use in semiconductor machines;

[0006] 2. The hydrogen purification device in the prior art can only separate hydrogen from HCl gas, which has limitations;

[0007] 3. The adsorption barrel in the hydrogen purification device in the prior art needs to be replaced from time to time, and when the adsorption barrel is replaced or a separate device needs to be repaired, it needs to be shut down, which affects the efficiency;

[0008] 4. The hydrogen purification device in the prior art has no detection equipment and safety equipment, and is unable to monitor the status of the pipeline in real time, and cannot play a protective role in the event of an accident in the overall device.

[0009] Currently, no effective solution has been proposed for the problems existing in the relevant technologies, such as high working environment requirements, only being able to separate hydrogen from HCl gas, low efficiency, and inability to perform real-time status monitoring of pipelines. Utility Model Content

[0010] The purpose of the utility model is to provide a hydrogen recovery and purification device, an exhaust gas treatment system and a semiconductor process system in view of the deficiencies in the prior art, so as to solve the problems existing in the related technology, such as high requirements for the working environment, only being able to separate hydrogen from HCl gas, low efficiency and inability to perform real-time status monitoring of the pipeline.

[0011] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0012] In a first aspect, the utility model provides a hydrogen recovery and purification device, comprising:

[0013] A condensation component, the condensation component is connected to the upstream gas processing equipment, and is used to condense the water-washed high-temperature gas to obtain a first mixed gas and a condensed liquid;

[0014] A liquid storage component, which is respectively connected to the condensation component, the waste liquid treatment equipment, and the tail gas combustion treatment equipment, and is located downstream of the condensation component, and is used to store condensed liquid;

[0015] a first purification component, which is in communication with the liquid storage component and is located downstream of the liquid storage component, and is used to filter H in the first mixed gas; 2 O and obtain a second mixed gas;

[0016] A second purification component, which is connected to the first purification component and the tail gas combustion treatment equipment respectively and is located downstream of the first purification component, and is used to filter impurities in the second mixed gas and obtain high-purity hydrogen;

[0017] A conveying component is connected to the second purification component and the downstream semiconductor process equipment respectively, and is used to convey high-purity hydrogen to the downstream semiconductor process equipment.

[0018] In some of the embodiments, the condensing component comprises:

[0019] A condenser, the condenser is connected to the upstream gas processing equipment and the liquid storage component respectively, and is used to condense the washed high-temperature gas to obtain a first mixed gas and a condensed liquid;

[0020] a first condensation pipeline, wherein a first end of the first condensation pipeline is connected to an upstream gas processing device, and a second end of the first condensation pipeline is connected to the condenser for conveying high-temperature gas;

[0021] a second condensation pipeline, wherein a first end of the second condensation pipeline is communicated with the condenser, and a second end of the second condensation pipeline is communicated with the liquid storage component, and is used for conveying the first mixed gas and the condensed liquid;

[0022] A water bath is communicated with the condensation assembly and is used for conveying low-temperature liquid to the condenser.

[0023] In some embodiments, the liquid storage component includes:

[0024] A liquid storage tank, which is respectively connected to the condensing component, the first purification component, the waste liquid treatment equipment, and the tail gas combustion treatment equipment, and is located downstream of the condensing component and upstream of the first purification component, and is used to store condensed liquid;

[0025] a first liquid storage pipeline, wherein a first end of the first liquid storage pipeline is communicated with the condensing component, and a second end of the first liquid storage pipeline is communicated with the liquid storage tank, and is used for conveying condensed liquid and a first mixed gas;

[0026] a second liquid storage pipeline, wherein a first end of the second liquid storage pipeline is connected to the liquid storage tank, and a second end of the second liquid storage pipeline is connected to the first purification component, and is used to transport a first mixed gas;

[0027] a third liquid storage pipeline, a first end of which is connected to the liquid storage tank, and a second end of which is connected to the waste liquid treatment equipment, for conveying condensed liquid;

[0028] a fourth liquid storage pipeline, wherein a first end of the fourth liquid storage pipeline is in communication with the second liquid storage pipeline, and a second end of the fourth liquid storage pipeline is in communication with an exhaust gas combustion treatment device, for direct discharge under special circumstances;

[0029] A cooling coil is coiled around the outer wall of the liquid storage tank to maintain a constant temperature inside the liquid storage tank.

[0030] In some of these embodiments, the first purification component comprises:

[0031] a desorption adsorption tank, which is connected to the liquid storage component and the second purification component respectively, and is located downstream of the liquid storage component and upstream of the second purification component, and is used to filter H in the first mixed gas; 2 0 and obtain a second mixed gas;

[0032] a first adsorption pipeline, wherein a first end of the first adsorption pipeline is connected to the liquid storage component, and a second end of the first adsorption pipeline is connected to the desorption adsorption tank, and is used to transport a first mixed gas;

[0033] a second adsorption pipeline, wherein a first end of the second adsorption pipeline is connected to the desorption adsorption tank, and a second end of the second adsorption pipeline is connected to a second purification component for conveying a second mixed gas;

[0034] a first desorption pipeline, wherein a first end of the first desorption pipeline is connected to a nitrogen source, and a second end of the first desorption pipeline is connected to the desorption adsorption tank, for conveying high-temperature nitrogen;

[0035] A second desorption pipeline, wherein a first end of the second desorption pipeline is connected to the desorption adsorption tank, and a second end of the second desorption pipeline is connected to a waste collection device for transporting waste.

[0036] In some of these embodiments, the second purification component comprises:

[0037] A separation membrane tank, which is connected to the first purification component, the conveying component, and the tail gas combustion treatment equipment respectively, and is located downstream of the first purification component and upstream of the conveying component, and is used to filter impurities in the second mixed gas and obtain high-purity hydrogen;

[0038] a first purification pipeline, wherein a first end of the first purification pipeline is connected to the first purification component, and a second end of the first purification pipeline is connected to the separation membrane tank, and is used for conveying a first mixed gas;

[0039] a second purification pipeline, wherein a first end of the second purification pipeline is in communication with the separation membrane tank, and a second end of the second purification pipeline is in communication with the delivery component, and is used for delivering high-purity hydrogen;

[0040] A third purification pipeline, wherein a first end of the third purification pipeline is connected to the separation membrane tank, and a second end of the third purification pipeline is connected to the tail gas combustion treatment equipment, and is used for conveying impurity gas.

[0041] In some embodiments, the conveying component includes:

[0042] A first delivery pipeline, wherein a first end of the first delivery pipeline is connected to the second purification component, and a second end of the first delivery pipeline is connected to a downstream semiconductor process equipment for delivering high-purity hydrogen;

[0043] A vacuum pump, which is arranged in the first delivery pipeline and is used to provide a vacuum negative pressure at the connection point between the first delivery pipeline and the second purification component;

[0044] A second delivery pipeline, wherein the first end of the second delivery pipeline is connected to the first delivery pipeline and is located upstream of the vacuum pump, and the second end of the second delivery pipeline is connected to the first delivery pipeline and is located downstream of the vacuum pump, for delivering high-purity hydrogen.

[0045] In some of the embodiments, it also includes:

[0046] The first pressure relief component is connected to the liquid storage component and the tail gas combustion treatment equipment respectively, and is used for relieving pressure on the pipeline.

[0047] In some embodiments, the first pressure relief component includes:

[0048] a first pressure relief pipeline, wherein a first end of the first pressure relief pipeline is connected to the liquid storage component, and a second end of the first pressure relief pipeline is connected to the tail gas combustion treatment equipment for conveying gas;

[0049] The first pressure relief valve is arranged in the first pressure relief pipeline, and is used for automatically relieving pressure when the internal pressure of the first pressure relief pipeline is high.

[0050] In some of the embodiments, it also includes:

[0051] The second pressure relief component is connected to the conveying component and the tail gas combustion treatment equipment respectively, and is used for relieving pressure on the pipeline.

[0052] In some embodiments, the second pressure relief component includes:

[0053] A second pressure relief pipeline, a first end of which is in communication with the delivery component, and a second end of which is in communication with the tail gas combustion treatment equipment, for delivering gas;

[0054] The second pressure relief valve is arranged in the second pressure relief pipeline, and is used for automatically relieving pressure when the internal pressure of the second pressure relief pipeline is high.

[0055] In some of the embodiments, it also includes:

[0056] An analysis component is connected to the conveying component and is located at the connection point between the conveying component and downstream semiconductor process equipment, and is used for analyzing the high-purity hydrogen input to the downstream semiconductor process equipment.

[0057] In a second aspect, the utility model also provides an exhaust gas treatment system, comprising:

[0058] The recovery and purification equipment as described in the first aspect;

[0059] A waste liquid treatment device, the waste liquid treatment device is connected to the liquid storage component in the recovery and purification device, and is used to treat and discharge the waste liquid stored in the liquid storage component;

[0060] The tail gas combustion treatment equipment is connected with the liquid storage part, the second purification component, the first pressure relief component and the second pressure relief component in the recovery and purification equipment, and is used for burning and discharging the impurities generated by filtration and the gas in the pressure relief process.

[0061] In a third aspect, the utility model further provides a semiconductor process system, comprising:

[0062] The recovery and purification equipment as described in the first aspect; or

[0063] An exhaust gas treatment system as described in the second aspect.

[0064] The utility model adopts the above technical solution, and compared with the prior art, has the following technical effects:

[0065] The utility model discloses a hydrogen recovery and purification device, an exhaust gas treatment system and a semiconductor process system. By connecting a condensing component with an upstream gas treatment device and a liquid storage component, all liquid molecules carried in the high-temperature gas can be condensed, and the condensed liquid can be stored inside the liquid storage component; by connecting a first purification component with the liquid storage component, the liquid molecules in the first mixed gas can be further removed to ensure the dryness of the second mixed gas; by connecting a second purification component with the first purification component, only small-molecule hydrogen can pass through the second purification component, thereby removing impurities in the first mixed gas and transporting the impurities to the exhaust gas combustion treatment equipment for treatment, thereby further improving the purity of the hydrogen. BRIEF DESCRIPTION OF THE DRAWINGS

[0066] Figure 1 is a schematic diagram of a recovery and purification device according to an embodiment of the utility model (I);

[0067] Figure 2 1 is a schematic diagram of a condensing component, a liquid storage component, a first purification component, a second purification component and a conveying component according to an embodiment of the utility model (I);

[0068] Figure 3 Schematic diagram (II) of a condensing component, a liquid storage component, a first purification component, a second purification component and a conveying component according to an embodiment of the utility model;

[0069] Figure 4 is a schematic diagram of a recovery and purification device according to an embodiment of the utility model (II);

[0070] Figure 5 is a schematic diagram of a first pressure relief component, a second pressure relief component and an analysis component according to an embodiment of the utility model;

[0071] Figure 6 It is a schematic diagram of a specific implementation of the recovery and purification equipment according to an embodiment of the utility model.

[0072] The reference numerals are: 100, condensation component; 101, condenser; 102, first condensation pipeline; 103, second condensation pipeline; 104, water bath; 105, first switch valve; 106, second switch valve; 107, third switch valve; 108, first temperature sensor;

[0073] 200, liquid storage component; 201, liquid storage tank; 202, first liquid storage pipeline; 203, second liquid storage pipeline; 204, third liquid storage pipeline; 205, fourth liquid storage pipeline; 206, cooling coil; 207, fourth switch valve; 208, fifth switch valve; 209, sixth switch valve; 210, seventh switch valve; 211, second temperature sensor; 212, liquid level sensor; 213, third temperature sensor; 214, first pressure sensor;

[0074] 300, first purification component; 301, desorption adsorption tank; 302, first adsorption pipeline; 303, second adsorption pipeline; 304, first desorption pipeline; 305, second desorption pipeline; 306, eighth switch valve; 307, ninth switch valve; 308, first check valve; 309, second pressure sensor

[0075] 400, second purification component; 401, separation membrane tank; 402, first purification pipeline; 403, second purification pipeline; 404, third purification pipeline; 405, tenth switch valve; 406, eleventh switch valve; 407, twelfth switch valve; 408, second check valve; 409, third pressure sensor; 410, fourth pressure sensor;

[0076] 500, conveying component; 501, first conveying pipeline; 502, vacuum pump; 503, second conveying pipeline; 504, thirteenth switch valve; 505, third one-way valve; 506, fourteenth switch valve; 507, fifth pressure sensor;

[0077] 600, first pressure relief component; 601, first pressure relief pipeline; 602, first pressure relief valve; 603, fourth one-way valve;

[0078] 700, second pressure relief component; 701, second pressure relief pipeline; 702, second pressure relief valve; 703, fifteenth switch valve; 704, fifth one-way valve;

[0079] 800. Analytical components. DETAILED DESCRIPTION

[0080] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0081] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0082] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0083] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units that are not listed, or may also include other steps or units inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there may be three relationships, for example, "A and / or B" can represent: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0084] Example 1

[0085] This embodiment relates to the recovery and purification equipment in the utility model.

[0086] like Figure 1 As shown, a hydrogen recovery and purification device includes a condensation component 100, a liquid storage component 200, a first purification component 300, a second purification component 400 and a transportation component 500. Among them, the condensing component 100 is connected to the upstream gas processing equipment, and is used to condense the high-temperature gas that has been washed with water to obtain a first mixed gas and a condensed liquid; the liquid storage component 200 is respectively connected to the condensing component 100, the waste liquid treatment equipment, and the exhaust gas combustion treatment equipment, and is located downstream of the condensing component 100, and is used to store the condensed liquid; the first purification component 300 is connected to the liquid storage component 200, and is located downstream of the liquid storage component 200, and is used to filter H2O in the first mixed gas and obtain a second mixed gas; the second purification component 400 is respectively connected to the first purification component 300 and the exhaust gas combustion treatment equipment, and is located downstream of the first purification component 300, and is used to filter impurities in the second mixed gas and obtain high-purity hydrogen; the transportation component 500 is respectively connected to the second purification component 400 and the downstream semiconductor process equipment, and is used to transport high-purity hydrogen to the downstream semiconductor process equipment.

[0087] like Figure 2As shown, the condensation component 100 includes a condenser 101, a first condensation pipeline 102, a second condensation pipeline 103 and a water bath 104. The condenser 101 is respectively connected to the upstream gas processing equipment and the liquid storage component 200, and is used to condense the high-temperature gas after water washing and obtain the first mixed gas and condensed liquid; the first end of the first condensation pipeline 102 is connected to the upstream gas processing equipment, and the second end of the first condensation pipeline 102 is connected to the condenser 101, and is used to transport the high-temperature gas after water washing; the first end of the second condensation pipeline 103 is connected to the condenser 101, and the second end of the second condensation pipeline 103 is connected to the liquid storage component 200, and is used to transport the first mixed gas and condensed liquid; the water bath 104 is connected to the condensation component, and is used to transport low-temperature liquid to the condenser 101.

[0088] Specifically, the condenser 101 includes a condenser body, a first condensation inlet, a first condensation outlet, a second condensation inlet, a second condensation outlet, a first valve, and a second valve. The first condensation inlet is formed on the condenser body, and the first condensation inlet is connected to the first condensation pipeline 102; the second condensation outlet is formed on the condenser body, and the first condensation outlet is connected to the second condensation pipeline 103; the second condensation inlet is formed on the condenser body, and the second condensation inlet is connected to the water bath 104; the second condensation outlet is formed on the condenser body, and the second condensation outlet is connected to the water bath 104; in addition, the working environment of the condenser body is between 1 and 10 degrees Celsius, and the condenser body can liquefy liquid molecules in high-temperature gas.

[0089] In some of the embodiments, the condenser 101 includes but is not limited to a water-cooled condenser.

[0090] Specifically, the first condensation pipeline 102 includes a first condensation main pipeline and a first condensation branch pipeline. The first end of the first condensation main pipeline is connected to the upstream gas processing equipment, and the second end of the first condensation main pipeline is connected to the first condensation branch pipeline; the first end of the first condensation branch pipeline is connected to the second end of the first condensation main pipeline, and the second end of the first condensation branch pipeline is connected to the first condensation inlet of the condenser 101. It should be noted that the first end and the second end of the first condensation main pipeline are respectively the two ends in the length direction; the first end and the second end of the first condensation branch pipeline are respectively the two ends in the length direction.

[0091] In some of the embodiments, the first condensation line 102 includes but is not limited to a stainless steel tube.

[0092] Specifically, the second condensation pipeline 103 includes a second condensation branch pipeline and a second condensation main pipeline. The first end of the second condensation branch pipeline is connected to the first condensation outlet of the condenser 101, and the second end of the second condensation branch pipeline is connected to the second condensation main pipeline; the first end of the second condensation main pipeline is connected to the second end of the second condensation branch pipeline, and the second end of the second condensation main pipeline is connected to the liquid storage unit. It should be noted that the first end and the second end of the second condensation branch pipeline are respectively the two ends of its length direction; the first end and the second end of the second condensation main pipeline are respectively the two ends of its length direction.

[0093] In some of the embodiments, the second condensation pipeline 103 includes but is not limited to a stainless steel pipe.

[0094] Specifically, the water bath 104 includes a water bath body, a first heat exchange pipeline and a second heat exchange pipeline. The water bath body is connected to the condenser 101 through the first heat exchange pipeline and the second heat exchange pipeline; the first end of the first heat exchange pipeline is connected to the water bath 104, and the second end of the first heat exchange pipeline is connected to the condenser 101; the first end of the second heat exchange pipeline is connected to the condenser 101, and the second end of the second heat exchange pipeline is connected to the water bath body.

[0095] More specifically, the water bath body further includes a water bath inlet and a water bath outlet, wherein the water bath inlet is formed in the water bath body and can be communicated with the first heat exchange pipeline; the water bath outlet is formed in the water bath body and can be communicated with the second heat exchange pipeline.

[0096] In some of these embodiments, water bath 104 includes, but is not limited to, a heat exchanger.

[0097] More specifically, the first end of the first heat exchange pipeline is connected to the water bath outlet of the water bath body, and the second end of the first heat exchange pipeline is connected to the second condensation inlet of the condenser body; it should be noted that the first end and the second end of the first heat exchange pipeline are respectively the two ends in its length direction.

[0098] In some of the embodiments, the first heat exchange pipeline includes but is not limited to a stainless steel pipe.

[0099] More specifically, the first end of the second heat exchange pipeline is connected to the second condensation outlet of the condenser body, and the second end of the second heat exchange pipeline is connected to the water bath inlet of the water bath 104; it should be noted that the first end and the second end of the second heat exchange pipeline are respectively the two ends in its length direction.

[0100] In some of the embodiments, the second heat exchange pipeline includes but is not limited to a stainless steel pipe.

[0101] Furthermore, the condensing component 100 further includes a first switch valve 105, a second switch valve 106 and a third switch valve 107. The first switch valve 105 is disposed on the first condensing pipeline 102 to control the flow of the first condensing pipeline 102; the second switch valve 106 is disposed on the second condensing pipeline 103 to control the flow of the second condensing pipeline 103; the third switch valve 107 is disposed on the pipeline connecting the water bath 104 and the condenser 101 to control the flow of the pipeline.

[0102] Specifically, the first switch valve 105 includes a first manual diaphragm valve and a second manual diaphragm valve. The first manual diaphragm valve is arranged in the first condensation main pipeline to control the flow of the first condensation main pipeline; the second manual diaphragm valve is arranged in the first condensation branch pipeline to control the flow of the first condensation branch pipeline.

[0103] In some of the embodiments, the first switch valve 105 includes but is not limited to a diaphragm valve.

[0104] Specifically, the second switch valve 106 includes a third manual diaphragm valve and a fourth manual diaphragm valve. The third manual diaphragm valve is arranged in the second condensation branch pipeline to control the flow of the second condensation branch pipeline; the fourth manual diaphragm valve is arranged in the second condensation main pipeline to control the flow of the second condensation main pipeline.

[0105] In some of the embodiments, the second switch valve 106 includes but is not limited to a diaphragm valve.

[0106] Specifically, the third switch valve 107 includes a first valve and a second valve. The first valve is connected to the second condensation inlet for controlling the connection between the second condensation inlet and the water bath 104 ; the second valve is connected to the second condensation outlet for controlling the connection between the second condensation inlet and the water bath 104 .

[0107] In some of the embodiments, the third switch valve 107 includes but is not limited to a diaphragm valve.

[0108] like Figure 2As shown, the liquid storage component 200 includes a liquid storage tank 201, a first liquid storage pipeline 202, a second liquid storage pipeline 203, a third liquid storage pipeline 204, a fourth liquid storage pipeline 205 and a cooling coil 206. The liquid storage tank 201 is respectively connected to the condensation component 100, the first purification component 300, the waste liquid treatment equipment, and the tail gas combustion treatment equipment, and is located downstream of the condensation component 100 and upstream of the first purification component 300, and is used to store condensed liquid; the first end of the first liquid storage pipeline 202 is connected to the condensation component 100, and the second end of the first liquid storage pipeline 202 is connected to the liquid storage tank 201, and is used to transport the condensed liquid and the first mixed gas; the first end of the second liquid storage pipeline 203 is connected to the liquid storage tank 201, and the second end of the second liquid storage pipeline 203 is connected to the liquid storage tank 201. It is connected to the first purification component 300 and is used to transport the first mixed gas; the first end of the third liquid storage pipeline 204 is connected to the liquid storage tank 201, and the second end of the third liquid storage pipeline 204 is connected to the waste liquid treatment equipment for transporting condensed liquid; the first end of the fourth liquid storage pipeline 205 is connected to the second liquid storage pipeline 203, and the second end of the fourth liquid storage pipeline 205 is connected to the exhaust gas combustion treatment equipment for direct discharge under special circumstances; the cooling coil 206 is coiled on the outer wall of the liquid storage tank 201, and is used to maintain a constant temperature inside the liquid storage tank 201.

[0109] Specifically, the liquid storage tank 201 includes a liquid storage tank body, a first liquid storage port, a second liquid storage port, and a third liquid storage port. The first liquid storage port is formed at the top of the liquid storage tank body, and the first liquid storage port can be connected to the first liquid storage pipeline 202; the second liquid storage port is formed at the top of the liquid storage tank body, and the second liquid storage port can be connected to the second liquid storage pipeline 203; the third liquid storage port is formed at the bottom of the liquid storage tank body, and the third liquid storage port can be connected to the third liquid storage pipeline 204.

[0110] In some of the embodiments, the liquid storage tank 201 includes but is not limited to a stainless steel tank.

[0111] More specifically, the first liquid storage pipeline 202 includes a first liquid storage main pipeline and a first liquid storage branch pipeline. The first end of the first liquid storage main pipeline is connected to the second end of the second condensation main pipeline, and the second end of the second liquid storage main pipeline is connected to the first liquid storage branch pipeline; the first end of the second liquid storage branch pipeline is connected to the second end of the second liquid storage main pipeline, and the second end of the second liquid storage branch pipeline is connected to the first liquid storage port of the liquid storage tank body. It should be noted that the first end and the second end of the first liquid storage main pipeline are respectively the two ends in the length direction; the first end and the second end of the first liquid storage branch pipeline are respectively the two ends in the length direction.

[0112] In some of the embodiments, the first liquid storage pipeline 202 includes but is not limited to a stainless steel tube.

[0113] More specifically, the second liquid storage pipeline 203 includes a second liquid storage branch pipeline and a second liquid storage main pipeline. The first end of the second liquid storage branch pipeline is connected to the second liquid storage port of the liquid storage tank body, and the second end of the second liquid storage branch pipeline is connected to the second liquid storage main pipeline; the first end of the second liquid storage main pipeline is connected to the second end of the second liquid storage branch pipeline, and the second end of the second liquid storage main pipeline is connected to the first purification component 300. It should be noted that the first end and the second end of the second liquid storage branch pipeline are respectively the two ends of its length direction; the first end and the second end of the second liquid storage main pipeline are respectively the two ends of its length direction.

[0114] In some of the embodiments, the second liquid storage pipeline 203 includes but is not limited to a stainless steel tube.

[0115] More specifically, the third liquid storage pipeline 204 includes a third liquid storage branch pipeline and a third liquid storage main pipeline. The first end of the third liquid storage branch pipeline is connected to the third liquid storage port of the liquid storage tank body, and the second end of the third liquid storage branch pipeline is connected to the third liquid storage main pipeline; the first end of the third liquid storage main pipeline is connected to the second end of the third liquid storage branch pipeline, and the second end of the third liquid storage main pipeline is connected to the waste liquid treatment equipment. It should be noted that the first end and the second end of the third liquid storage branch pipeline are respectively the two ends of its length direction; the first end and the second end of the third liquid storage main pipeline are respectively the two ends of its length direction.

[0116] In some of the embodiments, the third liquid storage pipeline 204 includes but is not limited to a stainless steel tube.

[0117] More specifically, the first end of the fourth liquid storage pipeline 205 is connected to the second liquid storage main pipeline, and the second end of the fourth liquid storage pipeline 205 is connected to the exhaust gas combustion treatment device. It should be noted that the first end and the second end of the fourth liquid storage pipeline 205 are the two ends of its length direction.

[0118] In some of the embodiments, the fourth liquid storage pipeline 205 includes but is not limited to a stainless steel tube.

[0119] Specifically, the cooling coil 206 is coiled around the outer wall of the liquid storage tank 201 , and the temperature inside the liquid storage tank 201 can be kept constant through heat exchange between the cooling coil 206 and the liquid storage tank 201 .

[0120] In some of these embodiments, the cooling coil 206 includes, but is not limited to, a thermostatic refrigerator compressor.

[0121] Furthermore, the liquid storage component 200 further includes a fourth switch valve 207, a fifth switch valve 208, a sixth switch valve 209 and a seventh switch valve 210. Among them, the fourth switch valve 207 is arranged on the first liquid storage pipeline 202, and is used to control the circulation of the first liquid storage pipeline 202; the fifth switch valve 208 is arranged on the second liquid storage pipeline 203, and is used to control the circulation of the second liquid storage pipeline 203; the sixth switch valve 209 is arranged on the third liquid storage pipeline 204, and is used to control the circulation of the third liquid storage pipeline 204; the seventh switch valve 210 is arranged on the fourth liquid storage pipeline 205, and is used to control the circulation of the fourth liquid storage pipeline 205.

[0122] Specifically, the fourth switch valve 207 includes a fifth manual diaphragm valve, wherein the fifth manual diaphragm valve is disposed in the first liquid storage branch pipeline and is used to control the flow of the first liquid storage branch pipeline.

[0123] In some of the embodiments, the fourth switch valve 207 includes but is not limited to a diaphragm valve.

[0124] Specifically, the fifth switch valve 208 includes a sixth manual diaphragm valve and a seventh manual diaphragm valve. The sixth manual diaphragm valve is arranged in the second liquid storage branch pipeline to control the flow of the second liquid storage branch pipeline; the seventh manual diaphragm valve is arranged in the second liquid storage main pipeline to control the flow of the second liquid storage main pipeline.

[0125] In some of the embodiments, the fifth switch valve 208 includes but is not limited to a diaphragm valve.

[0126] Specifically, the sixth switch valve 209 includes an eighth manual diaphragm valve. The eighth manual diaphragm valve is disposed in the third liquid storage branch pipeline to control the flow of the third liquid storage branch pipeline.

[0127] In some of the embodiments, the sixth switch valve 209 includes but is not limited to a diaphragm valve.

[0128] Specifically, the seventh switch valve 210 includes a ninth manual diaphragm valve and a tenth manual diaphragm valve, wherein the ninth manual diaphragm valve and the tenth manual diaphragm valve are arranged in the fourth liquid storage pipeline 205, and the tenth manual diaphragm valve is located downstream of the ninth manual diaphragm valve, for controlling the flow of the fourth liquid storage pipeline 205.

[0129] In some of the embodiments, the seventh switch valve 210 includes but is not limited to a diaphragm valve.

[0130] like Figure 2As shown, the first purification component 300 includes a desorption adsorption tank 301 , a first adsorption pipeline 302 , a second adsorption pipeline 303 , a first desorption pipeline 304 and a second desorption pipeline 305 . Among them, the desorption adsorption tank 301 is connected to the liquid storage part 200 and the second purification part 400 respectively, and is located downstream of the liquid storage part 200 and upstream of the second purification part 400, and is used to filter H20 in the first mixed gas and obtain the second mixed gas; the first end of the first adsorption pipeline 302 is connected to the liquid storage part 200, and the second end of the first adsorption pipeline 302 is connected to the desorption adsorption tank 301, which is used to transport the first mixed gas; the first end of the second adsorption pipeline 303 is connected to the desorption adsorption tank 301, and the second end of the second adsorption pipeline 303 is connected to the second purification part 400, which is used to transport the second mixed gas; the first end of the first desorption pipeline 304 is connected to the nitrogen source, and the second end of the first desorption pipeline 304 is connected to the desorption adsorption tank 301, which is used to transport high-temperature nitrogen; the first end of the second desorption pipeline 305 is connected to the desorption adsorption tank 301, and the second end of the second desorption pipeline 305 is connected to the waste collection equipment, which is used to transport waste.

[0131] Specifically, the desorption adsorption tank 301 includes a desorption adsorption tank body, a first adsorption port, a second adsorption port, a third adsorption port and a fourth adsorption port. The first adsorption port is formed on the desorption adsorption tank body, and the first adsorption port can be connected to the first adsorption pipeline 302; the second adsorption port is formed on the desorption adsorption tank body, and the second adsorption port can be connected to the second adsorption pipeline 303; the third adsorption port is formed on the desorption adsorption tank body, and the third adsorption port can be connected to the desorption element; the fourth adsorption port is formed on the desorption adsorption tank body, and the fourth adsorption port can be connected to the waste collection device.

[0132] In some of the embodiments, the adsorption tank desorption tank 301 includes but is not limited to an activated carbon adsorption tank.

[0133] More specifically, the first adsorption pipeline 302 includes a first adsorption main pipeline and a first adsorption branch pipeline. The first end of the first adsorption main pipeline is connected to the second liquid storage main pipeline, and the second end of the first adsorption main pipeline is connected to the first adsorption branch pipeline; the first end of the first adsorption branch pipeline is connected to the second end of the first adsorption main pipeline, and the second end of the first adsorption branch pipeline is connected to the first adsorption port of the desorption adsorption tank body. It should be noted that the first end and the second end of the first adsorption main pipeline are respectively the two ends of its length direction; the first end and the second end of the first adsorption branch pipeline are respectively the two ends of its length direction.

[0134] In some of the embodiments, the first adsorption pipeline 302 includes but is not limited to a stainless steel tube.

[0135] More specifically, the second adsorption pipeline 303 includes a second adsorption branch pipeline and a second adsorption main pipeline. The first end of the second adsorption branch pipeline is connected to the second adsorption port of the desorption adsorption tank body, and the second end of the second adsorption branch pipeline is connected to the second adsorption main pipeline; the first end of the second adsorption main pipeline is connected to the second end of the second adsorption branch pipeline, and the second end of the second adsorption main pipeline is connected to the waste liquid treatment equipment. It should be noted that the first end and the second end of the second adsorption branch pipeline are respectively the two ends of its length direction; the first end and the second end of the second adsorption main pipeline are respectively the two ends of its length direction.

[0136] In some of the embodiments, the second adsorption pipeline 303 includes but is not limited to a stainless steel tube.

[0137] Specifically, the first end of the first desorption pipeline 304 is connected to the desorption gas source, and the second end of the first desorption pipeline 304 is connected to the third adsorption port of the desorption adsorption tank body. It should be noted that the first end and the second end of the first adsorption pipeline 302 are the two ends in its length direction.

[0138] Among them, the desorption gas source is a high-temperature nitrogen source.

[0139] In some embodiments, the first desorption pipeline 304 includes but is not limited to a stainless steel pipe.

[0140] Specifically, the first end of the second adsorption pipeline 303 is connected to the fourth adsorption port of the desorption adsorption tank body, and the second end of the second adsorption pipeline 303 is connected to the waste collection device. It should be noted that the first end and the second end of the second adsorption pipeline 303 are the two ends in its length direction.

[0141] In some embodiments, the second desorption pipeline 305 includes but is not limited to a stainless steel pipe.

[0142] Furthermore, the first purification component 300 further includes an eighth switch valve 306, a ninth switch valve 307 and a first check valve 308. The eighth switch valve 306 is disposed in the first adsorption pipeline 302 to control the flow of the first adsorption pipeline 302; the ninth switch valve 307 is disposed in the second adsorption pipeline 303 to control the flow of the second adsorption pipeline 303; the first check valve 308 is disposed in the second adsorption pipeline 303 to prevent the gas inside the second adsorption pipeline 303 from backflowing.

[0143] Specifically, the eighth switch valve 306 includes an eleventh manual diaphragm valve, wherein the eleventh manual diaphragm valve is disposed in the first adsorption branch pipeline to control the flow of the first adsorption branch pipeline.

[0144] In some of the embodiments, the eighth switch valve 306 includes but is not limited to a diaphragm valve.

[0145] Specifically, the ninth switch valve 307 includes a twelfth manual diaphragm valve and a thirteenth manual diaphragm valve. The twelfth manual diaphragm valve is arranged in the second adsorption branch pipeline to control the flow of the second adsorption branch pipeline; the thirteenth manual diaphragm valve is arranged in the second adsorption main pipeline to control the flow of the second adsorption main pipeline.

[0146] In some of the embodiments, the ninth switch valve 307 includes but is not limited to a diaphragm valve.

[0147] Specifically, the first one-way valve 308 is disposed in the second adsorption main line and is located upstream of the thirteenth manual diaphragm valve, so as to prevent the gas in the second adsorption main line from flowing back.

[0148] In some of these embodiments, the first one-way valve 308 includes, but is not limited to, a one-way valve.

[0149] like Figure 2 As shown, the second purification component 400 includes a separation membrane tank 401, a first purification pipeline 402, a second purification pipeline 403 and a third purification pipeline 404. The separation membrane tank 401 is respectively connected to the first purification component 300, the conveying component 500 and the tail gas combustion treatment equipment, and is located downstream of the first purification component 300 and upstream of the conveying component 500, and is used to filter the impurities in the second mixed gas and obtain high-purity hydrogen; the first end of the first purification pipeline 402 is connected to the first purification component 300, and the second end of the first purification pipeline 402 is connected to the separation membrane tank 401, and is used to transport the first mixed gas; the first end of the second purification pipeline 403 is connected to the separation membrane tank 401, and the second end of the second purification pipeline 403 is connected to the conveying component 500, and is used to transport high-purity hydrogen; the first end of the third purification pipeline 404 is connected to the separation membrane tank 401, and the second end of the third purification pipeline 404 is connected to the tail gas combustion treatment equipment, and is used to transport impurities.

[0150] Specifically, the separation membrane tank 401 includes a separation membrane tank body, a first purification port, a second purification port, and a third purification port. The first purification port is formed at the bottom of the separation membrane tank body, and the first purification port can be connected to the first purification pipeline 402; the second purification port is formed at the top of the separation membrane tank body, and the second purification port can be connected to the second purification pipeline 403; the third purification port is formed at the top of the separation membrane tank body, and the third purification port can be connected to the third purification pipeline 404.

[0151] In some of the embodiments, the separation membrane tank 401 includes but is not limited to a small molecule separation membrane tank.

[0152] Specifically, the first purification pipeline 402 includes a first purification main pipeline and a first purification branch pipeline. The first end of the first purification main pipeline is connected to the second end of the second adsorption main pipeline, and the second end of the first purification main pipeline is connected to the first purification branch pipeline; the first end of the first purification branch pipeline is connected to the second end of the first purification main pipeline, and the second end of the first purification branch pipeline is connected to the first purification port of the separation membrane tank body. It should be noted that the first end and the second end of the first purification main pipeline are respectively the two ends in the length direction; the first end and the second end of the first purification branch pipeline are respectively the two ends in the length direction.

[0153] In some of the embodiments, the first purification line 402 includes, but is not limited to, a stainless steel pipe.

[0154] Specifically, the second purification pipeline 403 includes a second purification branch pipeline and a second purification main pipeline. The first end of the second purification branch pipeline is connected to the second purification port of the separation membrane tank body, and the second end of the second purification branch pipeline is connected to the second purification main pipeline; the first end of the second purification main pipeline is connected to the second end of the second purification branch pipeline, and the second end of the second purification main pipeline is connected to the conveying unit. It should be noted that the first end and the second end of the second purification branch pipeline are respectively the two ends of its length direction; the first end and the second end of the second purification main pipeline are respectively the two ends of its length direction.

[0155] In some of the embodiments, the second purification line 403 includes but is not limited to a stainless steel pipe.

[0156] Specifically, a first end of the third purification pipeline 404 is communicated with a third purification port of the separation membrane tank body, and a second end of the third purification pipeline 404 is communicated with the tail gas combustion treatment equipment.

[0157] It should be noted that the first end and the second end of the third purification pipeline 404 are respectively the two ends in the length direction thereof.

[0158] In some of the embodiments, the third purification line 404 includes but is not limited to a stainless steel pipe.

[0159] Furthermore, the second purification component 400 further includes a tenth switch valve 405, an eleventh switch valve 406, a twelfth switch valve 407 and a second one-way valve 408. The tenth switch valve 405 is provided in the first purification pipeline 402 to control the circulation of the first purification pipeline 402; the eleventh switch valve 406 is provided in the second purification pipeline 403 to control the circulation of the second purification pipeline 403; the twelfth switch valve 407 is provided in the third purification pipeline 404 to control the circulation of the third purification pipeline 404; the second one-way valve 408 is provided in the third purification pipeline 404 to prevent the gas inside the third purification pipeline 404 from backflowing.

[0160] Specifically, the tenth switch valve 405 includes a fourteenth manual diaphragm valve, wherein the fourteenth manual diaphragm valve is arranged in the first purification branch pipeline, and is used to control the flow of the first purification branch pipeline.

[0161] In some of the embodiments, the tenth switch valve 405 includes but is not limited to a diaphragm valve.

[0162] Specifically, the eleventh switch valve 406 includes a fifteenth manual diaphragm valve and a sixteenth manual diaphragm valve. The fifteenth manual diaphragm valve is arranged in the second purification branch pipeline to control the flow of the second purification branch pipeline; the sixteenth manual diaphragm valve is arranged in the second purification main pipeline to control the flow of the second purification main pipeline.

[0163] In some of the embodiments, the eleventh switch valve 406 includes but is not limited to a diaphragm valve.

[0164] Specifically, the twelfth switch valve 407 includes a seventeenth manual diaphragm valve. The seventeenth manual diaphragm valve is disposed in the third purification pipeline 404 to control the flow of the third purification pipeline 404.

[0165] In some of the embodiments, the twelfth switch valve 407 includes but is not limited to a diaphragm valve.

[0166] Specifically, the second one-way valve 408 includes a second one-way valve. The second one-way valve is disposed in the third purification pipeline 404 and is located downstream of the seventeenth manual diaphragm valve to prevent the gas in the third purification pipeline 404 from flowing back.

[0167] In some of these embodiments, the second one-way valve 408 includes, but is not limited to, a one-way valve.

[0168] like Figure 2 As shown, the delivery component 500 includes a first delivery pipeline 501, a vacuum pump 502, and a second delivery pipeline 503. The first end of the first delivery pipeline 501 is connected to the second purification component 400, and the second end of the first delivery pipeline 501 is connected to the downstream semiconductor process equipment for delivering high-purity hydrogen; the vacuum pump 502 is arranged on the first delivery pipeline 501, and is used to provide vacuum negative pressure at the connection point between the first delivery pipeline 501 and the second purification component 400; the first end of the second delivery pipeline 503 is connected to the first delivery pipeline 501 and is located upstream of the vacuum pump 502, and the second end of the second delivery pipeline 503 is connected to the first delivery pipeline 501 and is located downstream of the vacuum pump 502, and is used to deliver high-purity hydrogen.

[0169] Specifically, the first end of the first delivery pipeline 501 is connected to the second end of the second purification main pipeline, and the second end of the first delivery pipeline 501 is connected to the downstream semiconductor process equipment. It should be noted that the first end and the second end of the first delivery pipeline 501 are respectively the two ends in its length direction.

[0170] In some of the embodiments, the first delivery pipeline 501 includes but is not limited to a stainless steel pipe.

[0171] Specifically, the second delivery pipeline 503 can discharge the gas in the first delivery pipeline 501 to the downstream semiconductor process equipment when the vacuum pump 502 is under maintenance. It should be noted that the first end and the second end of the second delivery pipeline 503 are the two ends in the length direction thereof.

[0172] In some of the embodiments, the second delivery pipeline 503 includes but is not limited to a stainless steel pipe.

[0173] Specifically, the vacuum pump 502 is disposed on the first delivery pipeline 501 and is located between the connecting points of the first delivery pipeline 501 and the second delivery pipeline 503 .

[0174] In some of the embodiments, the vacuum pump 502 includes, but is not limited to, a dry screw vacuum pump.

[0175] Furthermore, the delivery component 500 further includes a thirteenth switch valve 504, a third check valve 505 and a fourteenth switch valve 506. The thirteenth switch valve 504 is disposed in the first delivery pipeline 501 to control the flow of the first delivery pipeline 501; the third check valve 505 is disposed in the first delivery pipeline 501 to prevent the gas inside the first delivery pipeline 501 from flowing back; and the fourteenth switch valve 506 is disposed in the second delivery pipeline 503 to control the flow of the second delivery pipeline 503.

[0176] Specifically, the thirteenth switch valve 504 includes an eighteenth manual diaphragm valve, a nineteenth manual diaphragm valve, a twentieth manual diaphragm valve, a twenty-first manual diaphragm valve and a pneumatic diaphragm valve. Among them, the eighteenth manual diaphragm valve is arranged in the first delivery pipeline 501, and is located downstream of the connection point between the first end of the second delivery pipeline 503 and the first delivery pipeline 501; the nineteenth manual diaphragm valve is arranged in the first delivery pipeline 501, and is located upstream of the connection point between the second end of the second delivery pipeline 503 and the first delivery pipeline 501; the twentieth manual diaphragm valve is arranged in the first delivery pipeline 501, and is located downstream of the connection point between the second end of the second delivery pipeline 503 and the first delivery pipeline 501; the pneumatic diaphragm valve is arranged in the first delivery pipeline 501, and is located downstream of the twentieth manual diaphragm valve; the twenty-first manual diaphragm valve is arranged in the second delivery pipeline 503, and is used to control the flow of the second delivery pipeline 503.

[0177] In some of the embodiments, the thirteenth switch valve 504 includes but is not limited to a diaphragm valve.

[0178] Specifically, the third one-way valve 505 includes a third one-way valve, which is disposed in the first delivery pipeline 501 and located between the twenty-first manual diaphragm valve and the pneumatic diaphragm valve, and is used to prevent the gas in the first delivery pipeline 501 from flowing back.

[0179] In some of the embodiments, the third one-way valve 505 includes but is not limited to a one-way valve.

[0180] Specifically, the fourteenth switch valve 506 includes a twenty-second manual diaphragm valve. The twenty-second manual diaphragm valve is disposed in the second delivery pipeline 503 to control the flow of the second delivery pipeline 503.

[0181] In some of the embodiments, the fourteenth switch valve 506 includes but is not limited to a diaphragm valve.

[0182] The method of using this embodiment is as follows:

[0183] (1) Open the first valve and the second valve to allow the cryogenic liquid in the water bath 104 to flow to the condenser 101;

[0184] (2) opening the first manual diaphragm valve and the second manual diaphragm valve so that the high-temperature gas flows to the condenser 101, and the condenser 101 condenses the high-temperature gas to obtain condensed liquid and condensed gas;

[0185] (3) Opening the third manual diaphragm valve, the fourth manual diaphragm valve, and the fifth manual diaphragm valve allows the condensed liquid and the condensed gas to flow to the liquid storage tank 201, and the liquid storage tank 201 can store the condensed liquid;

[0186] (4) opening the sixth manual diaphragm valve, the seventh manual diaphragm valve, and the eleventh manual diaphragm valve so that the condensed gas can flow to the adsorption tank, and the adsorption tank can adsorb the liquid molecules in the condensed gas to obtain dry gas;

[0187] (5) Open the twelfth manual diaphragm valve, the thirteenth manual diaphragm valve and the fourteenth manual diaphragm valve, so that the dry gas can flow to the separation membrane tank 401, and the separation membrane tank 401 only allows small molecular hydrogen to pass through and obtain high-purity hydrogen and impurity gases;

[0188] (6) Open the fifteenth manual diaphragm valve and the sixteenth manual diaphragm valve to allow high-purity hydrogen to flow into the first delivery pipeline 501 .

[0189] (7) Start the vacuum pump 502 and open the eighteenth manual diaphragm valve, the nineteenth manual diaphragm valve, the twentieth manual diaphragm valve and the pneumatic diaphragm valve. The vacuum pump 502 forms a vacuum negative pressure in the first delivery pipeline 501, and the high-purity hydrogen can flow to the downstream semiconductor process equipment through the first delivery pipeline 501.

[0190] The advantage of this embodiment is that by connecting the condensing component with the upstream gas processing equipment and the liquid storage component, all the liquid molecules carried in the high-temperature gas can be condensed, and the condensed liquid can be stored in the interior of the liquid storage component; by connecting the first purification component with the liquid storage component, the liquid molecules in the first mixed gas can be further removed to ensure the dryness of the second mixed gas; by connecting the second purification component with the first purification component, the second purification component only allows small molecular hydrogen to pass through, thereby achieving the removal of impurities in the first mixed gas and transporting the impurities to the exhaust gas combustion treatment equipment for treatment, thereby further improving the purity of the hydrogen.

[0191] Example 2

[0192] This embodiment is a variation of Embodiment 1.

[0193] like Figure 3 As shown, the condensing component 100 further includes a first temperature sensor 108 . The first temperature sensor 108 is disposed in the second condensing pipeline 103 , and is used to monitor the temperature in the second condensing pipeline 103 .

[0194] Specifically, the first temperature sensor 108 is in communication with the second condensation branch pipeline and is located upstream of the third manual diaphragm valve.

[0195] In some embodiments, the first temperature sensor 108 includes, but is not limited to, a thermocouple sensor, a thermistor sensor, a resistance temperature detector (RTD), and an IC temperature sensor.

[0196] like Figure 3 As shown, the liquid storage component 200 further includes a second temperature sensor 211 and / or a liquid level sensor 212 and / or a third temperature sensor 213 and / or a first pressure sensor 214. The second temperature sensor 211 is connected to the liquid storage tank 201 and is used to monitor the temperature inside the liquid storage tank 201; the liquid level sensor 212 is disposed inside the liquid storage tank 201 and is used to monitor the liquid level inside the liquid storage tank 201; the third temperature sensor 213 is disposed in the second liquid storage pipeline 203 and is used to monitor the temperature inside the second liquid storage pipeline 203; and the first pressure sensor 214 is disposed in the second liquid storage pipeline 203 and is used to monitor the pressure inside the second liquid storage pipeline 203.

[0197] Specifically, the second temperature sensor 211 is connected to the liquid storage tank 201, and is used to monitor the temperature inside the liquid storage tank 201 in real time; the liquid level sensor 212 is installed inside the liquid storage tank 201, and is used to monitor the liquid level inside the liquid storage tank 201 in real time; the third temperature sensor 213 is connected to the second liquid storage main line, and is located downstream of the seventh manual diaphragm valve, and is used to monitor the temperature inside the second liquid storage main line in real time; the first pressure sensor 214 is connected to the second liquid storage main line, and is located downstream of the fourth monitoring element, and is used to monitor the pressure inside the second liquid storage main line in real time.

[0198] In some embodiments, the second temperature sensor 211 includes but is not limited to a thermocouple sensor, a thermistor sensor, a resistance temperature detector (RTD), and an IC temperature sensor.

[0199] In some of the embodiments, the liquid level sensor 212 includes but is not limited to a float sensor.

[0200] In some embodiments, the third temperature sensor 213 includes but is not limited to a thermocouple sensor, a thermistor sensor, a resistance temperature detector (RTD), and an IC temperature sensor.

[0201] In some embodiments, the first pressure sensor 214 includes but is not limited to a piezoresistive sensor, a capacitive sensor, and an inductive sensor.

[0202] like Figure 3 As shown, the first purification component 300 further includes a second pressure sensor 309 . The second pressure sensor 309 is disposed in the second adsorption pipeline 303 to monitor the pressure inside the second adsorption pipeline 303 .

[0203] Specifically, the second pressure sensor 309 is disposed in the second adsorption main line and is located upstream of the first one-way valve element, and is used to monitor the pressure inside the second adsorption main line in real time.

[0204] In some of the embodiments, the second pressure sensor 309 includes but is not limited to a piezoresistive sensor, a capacitive sensor, and an inductive sensor.

[0205] like Figure 3 As shown, the second purification component 400 further includes a third pressure sensor 409 and / or a fourth pressure sensor 410. The third pressure sensor 409 is connected to the separation membrane tank 401 to monitor the pressure inside the separation membrane tank 401; the fourth pressure sensor 410 is connected to the second purification pipeline 403 to monitor the pressure inside the second purification pipeline 403.

[0206] Specifically, the third pressure sensor 409 is connected to the separation membrane tank 401 for real-time monitoring of the pressure inside the separation membrane tank 401; the fourth pressure sensor 410 is disposed in the second purification main line for real-time monitoring of the pressure inside the second purification main line.

[0207] In some of the embodiments, the third pressure sensor 409 includes but is not limited to a piezoresistive sensor, a capacitive sensor, and an inductive sensor.

[0208] In some of the embodiments, the fourth pressure sensor 410 includes but is not limited to a piezoresistive sensor, a capacitive sensor, and an inductive sensor.

[0209] like Figure 3 As shown, the delivery component 500 further includes a fifth pressure sensor 507 . The fifth pressure sensor 507 is disposed in the first delivery pipeline 501 and is used to monitor the pressure inside the first delivery pipeline 501 .

[0210] Specifically, the fifth pressure sensor 507 is communicated with the first delivery pipeline 501 and is located between the twenty-first manual diaphragm valve and the third one-way valve, and is used to monitor the pressure inside the first delivery pipeline 501 in real time.

[0211] In some of the embodiments, the fifth pressure sensor 507 includes but is not limited to a piezoresistive sensor, a capacitive sensor, and an inductive sensor.

[0212] The usage and advantages of this embodiment are the same as those of Embodiment 1 and will not be described in detail here.

[0213] Example 3

[0214] This embodiment is a variation of Embodiments 1 to 2.

[0215] like Figure 4 As shown, the recovery and purification equipment further includes a first pressure relief component 600 and / or a second pressure relief component 700 and / or an analysis component 800. The first pressure relief component 600 is respectively connected to the liquid storage component 200 and the tail gas combustion treatment equipment for relieving pressure on the pipeline; the second pressure relief component 700 is respectively connected to the conveying component 500 and the tail gas combustion treatment equipment for relieving pressure on the pipeline; the analysis component 800 is connected to the conveying component 500 and is located at the connection point between the conveying component 500 and the downstream semiconductor process equipment, and is used to analyze the high-purity hydrogen input to the downstream semiconductor process equipment.

[0216] like Figure 5As shown, the first pressure relief component 600 includes a first pressure relief pipeline 601 and a first pressure relief valve 602. The first end of the first pressure relief pipeline 601 is connected to the liquid storage component 200, and the second end of the first pressure relief pipeline 601 is connected to the tail gas combustion treatment equipment for conveying gas; the first pressure relief valve 602 is arranged on the first pressure relief pipeline 601, and is used for automatically relieving pressure when the internal pressure of the first pressure relief pipeline 601 is high.

[0217] Specifically, the first end of the first pressure relief pipeline 601 is connected to the fourth liquid storage pipeline 205, and the connection point between the first end of the first pressure relief pipeline 601 and the fourth liquid storage pipeline 205 is located between the ninth manual diaphragm valve and the tenth manual diaphragm valve. The second end of the first pressure relief pipeline 601 is connected to the exhaust gas combustion treatment equipment; the first pressure relief valve 602 is arranged on the first pressure relief pipeline 601 and is located downstream of the ninth manual diaphragm valve, and is used to relieve pressure on the liquid storage tank 201 through the first pressure relief pipeline 601 and the second liquid storage pipeline 203. It should be noted that the first end and the second end of the first pressure relief pipeline 601 are the two ends in its length direction.

[0218] In some of the embodiments, the first pressure relief line 601 includes but is not limited to a stainless steel pipe.

[0219] In some of the embodiments, the first pressure relief valve 602 includes but is not limited to a spring-loaded pressure relief valve.

[0220] Furthermore, the first pressure relief component 600 further includes a fourth one-way valve 603. The fourth one-way valve 603 is disposed in the first pressure relief pipeline 601 to prevent the gas inside the first pressure relief pipeline 601 from flowing back.

[0221] Specifically, the fourth one-way valve 603 includes a fourth one-way valve, wherein the fourth one-way valve is arranged in the first pressure relief pipeline 601 and is located downstream of the first pressure relief valve 602 , and is used to prevent the gas inside the first pressure relief pipeline 601 from flowing back.

[0222] In some of these embodiments, the fourth one-way valve element includes, but is not limited to, a one-way valve.

[0223] like Figure 5 As shown, the second pressure relief component 700 includes a second pressure relief pipeline 701 and a second pressure relief valve 702. The first end of the second pressure relief pipeline 701 is connected to the delivery component 500, and the second end of the second pressure relief pipeline 701 is connected to the tail gas combustion treatment equipment for delivering gas; the second pressure relief valve 702 is arranged on the second pressure relief pipeline 701, and is used for automatically relieving pressure when the internal pressure of the second pressure relief pipeline 701 is high.

[0224] Specifically, the first end of the second pressure relief pipeline 701 is connected to the first delivery pipeline 501, the connection point between the first end of the second pressure relief pipeline 701 and the first delivery pipeline 501 is located between the nineteenth manual diaphragm valve and the twentieth manual diaphragm valve, and the second end of the second pressure relief pipeline 701 is connected to the tail gas combustion treatment equipment; the second pressure relief valve 702 is provided on the second pressure relief pipeline 701, and is used to relieve pressure on the first delivery pipeline 501 through the second pressure relief pipeline 701. It should be noted that the first end and the second end of the second pressure relief pipeline 701 are respectively the two ends in the length direction thereof.

[0225] In some of the embodiments, the second pressure relief line 701 includes but is not limited to a stainless steel pipe.

[0226] In some of the embodiments, the second pressure relief valve 702 includes but is not limited to a spring-loaded pressure relief valve.

[0227] Furthermore, the second pressure relief component 700 further includes a fifteenth switch valve 703 and a fifth check valve 704. The fifteenth switch valve 703 is disposed in the second pressure relief pipeline 701 to control the flow of the second pressure relief pipeline 701; the fifth check valve 704 is disposed in the second pressure relief pipeline 701 to prevent the gas inside the second pressure relief pipeline 701 from flowing back.

[0228] Specifically, the fifteenth switch valve 703 includes a twenty-second manual diaphragm valve, wherein the twenty-second manual diaphragm valve is disposed in the second pressure relief pipeline 701 and is located upstream of the second pressure relief valve 702 , and is used to control the flow of the second pressure relief pipeline 701 .

[0229] In some of the embodiments, the fifteenth switch valve 703 includes but is not limited to a diaphragm valve.

[0230] Specifically, the fifth one-way valve 704 includes a fifth one-way valve, wherein the fifth one-way valve is arranged in the second pressure relief pipeline 701 and is located downstream of the second pressure relief valve 702 , and is used to prevent the gas inside the second pressure relief pipeline 701 from flowing back.

[0231] In some of the embodiments, the fifth one-way valve 704 includes but is not limited to a one-way valve.

[0232] The method of using this embodiment is as follows:

[0233] (1) Open the first valve and the second valve to allow the cryogenic liquid in the water bath 104 to flow to the condenser 101;

[0234] (2) opening the first manual diaphragm valve and the second manual diaphragm valve so that the high-temperature gas flows to the condenser 101, and the condenser 101 condenses the high-temperature gas to obtain condensed liquid and condensed gas;

[0235] (3) Opening the third manual diaphragm valve, the fourth manual diaphragm valve, and the fifth manual diaphragm valve allows the condensed liquid and the condensed gas to flow to the liquid storage tank 201, and the liquid storage tank 201 can store the condensed liquid;

[0236] (4) opening the sixth manual diaphragm valve, the seventh manual diaphragm valve, and the eleventh manual diaphragm valve so that the condensed gas can flow to the adsorption tank, and the adsorption tank can adsorb the liquid molecules in the condensed gas to obtain dry gas;

[0237] (5) Open the twelfth manual diaphragm valve, the thirteenth manual diaphragm valve and the fourteenth manual diaphragm valve, so that the dry gas can flow to the separation membrane tank 401, and the separation membrane tank 401 only allows small molecular hydrogen to pass through and obtain high-purity hydrogen and impurity gases;

[0238] (6) Open the fifteenth manual diaphragm valve and the sixteenth manual diaphragm valve to allow high-purity hydrogen to flow into the first delivery pipeline 501 .

[0239] (7) Start the vacuum pump 502 and open the eighteenth manual diaphragm valve, the nineteenth manual diaphragm valve, the twentieth manual diaphragm valve and the pneumatic diaphragm valve. The vacuum pump 502 forms a vacuum negative pressure in the first delivery pipeline 501, and the high-purity hydrogen can flow to the downstream semiconductor process equipment through the first delivery pipeline 501.

[0240] Furthermore, the recovery and purification method of this embodiment also includes:

[0241] (8) when the liquid level inside the liquid storage tank 201 monitored by the third liquid level monitoring element exceeds a preset threshold, opening the eighth manual diaphragm valve so that the liquid inside the liquid storage tank 201 can be discharged to the waste liquid treatment device;

[0242] (9) When it is necessary to exhaust the gas inside the liquid storage tank 201, open the ninth manual diaphragm valve to discharge the gas inside the liquid storage tank 201 to the exhaust gas combustion treatment device;

[0243] (10) When the pressure inside the separation membrane tank 401 monitored by the seventh monitoring element is too high, the seventeenth manual diaphragm valve is opened so that the impurity gas in the separation membrane tank 401 can flow to the tail gas combustion treatment device;

[0244] (11) When the vacuum pump 502 needs to be repaired, the twenty-first manual diaphragm valve is opened so that the gas at both ends of the vacuum pump 502 can be discharged through the second delivery pipeline 503;

[0245] (12) When the pressure inside the fourth liquid storage pipeline 205 is too high, the first pressure relief valve 602 automatically opens, and the gas inside the fourth liquid storage pipeline 205 can flow to the exhaust gas combustion treatment device through the first pressure relief pipeline 601;

[0246] (13) When the pressure inside the first delivery pipeline 501 is too high, the twenty-second manual diaphragm valve is opened, and the second pressure relief valve 702 is automatically opened, and the gas inside the first delivery pipeline 501 can flow to the exhaust gas combustion treatment device through the second pressure relief pipeline 701.

[0247] The advantage of this embodiment is that by connecting the first pressure relief component to the liquid storage component and the exhaust gas combustion treatment equipment respectively, and connecting the second pressure relief component to the conveying component and the exhaust gas combustion treatment equipment respectively, the liquid storage component and the conveying component can be depressurized when the pressure in the device pipeline is too high, thereby ensuring the safety of the overall device operation.

[0248] Example 4

[0249] This embodiment is a variation of Embodiments 1 to 3.

[0250] There are at least two condensing components 100, liquid storage components 200, first purification components 300, second purification components 400, and first pressure relief components 600. Among them, several condensing components 100 are arranged in parallel, several liquid storage components 200 are arranged in parallel, several first purification components 300 are arranged in parallel, and several second purification components 400 are arranged in parallel; the first pressure relief components 600 are respectively connected to the corresponding liquid storage components 200.

[0251] In some of the embodiments, there are two condensing components 100, two liquid storage components 200, two first purification components 300, two second purification components 400, and two first pressure relief components 600. The two condensing components 100 are arranged in parallel, the two liquid storage components 200 are arranged in parallel, the two first purification components 300 are arranged in parallel, and the two second purification components 400 are arranged in parallel; the two first pressure relief components 600 are respectively connected to the corresponding liquid storage components 200.

[0252] It should be noted that, when one condensing component 100 needs to be repaired, it is possible to switch to another condensing component 100 .

[0253] It should be noted that, when one liquid storage component 200 needs to be repaired, it is possible to switch to another liquid storage component 200 .

[0254] It should be noted that, when one first purification component 300 needs to be repaired, it is possible to switch to another first purification component 300 .

[0255] It should be noted that, when one second purification component 400 needs to be repaired, it is possible to switch to another second purification component 400 .

[0256] In some of the embodiments, two condensing components 100 share a first condensing main line.

[0257] In some of the embodiments, two condensing components 100 share a second main condensing line.

[0258] In some of the embodiments, the two liquid storage components 200 share a first main liquid storage line.

[0259] In some of the embodiments, two liquid storage components 200 share a second liquid storage main circuit.

[0260] In some of the embodiments, two liquid storage components 200 share a third liquid storage main circuit.

[0261] In some of the embodiments, two first purification components 300 share a first adsorption main line.

[0262] In some of the embodiments, two first purification components 300 share one second adsorption main line.

[0263] In some of the embodiments, two second purification components 400 share a first purification main line.

[0264] In some of the embodiments, two second purification components 400 share a second purification main line.

[0265] The usage and advantages of this embodiment are the same as those of Embodiment 3 and will not be described in detail here.

[0266] Example 5

[0267] This embodiment relates to a specific implementation of the recovery and purification equipment.

[0268] like Figure 6 As shown, the condensation component 100 includes a condenser (CONDA, CONDB), a manual diaphragm valve (MV1, MV2A, MV2B, MV3A, MV3B, MV4), a ball valve (BV1A, BV1B, BV2A, BV2B), a pressure sensor (PT1A, PT1B), and a water bath device (HX1).

[0269] The liquid storage component 200 includes a liquid storage tank (CANA, CANB), a manual diaphragm valve (MV5A, MV5B, MV6A, MV6B, MV7, MV8A, MV8B, MV9A, MV9B, MV10A, MV10B), a cooling coil (HX2A, HX2B), a liquid level sensor (LEA, LEB), a pressure sensor (PT2A, PT2B, PT4), and a temperature sensor (PT3).

[0270] The first purification component 300 includes desorption adsorption tanks (TDA, TDB), manual diaphragm valves (MV11A, MV11B, MV12A, MV12B, MV13), a one-way valve (CV1), and a pressure sensor (PT5).

[0271] The second purification component 400 includes separation membrane tanks (ROA, ROB), manual diaphragm valves (MV14A, MV14B, MV15A, MV15B, MV16, MV17A, MV17B), a one-way valve (CV2A, CV2B), and pressure sensors (PT6A, PT6B, PT7).

[0272] The conveying component 500 includes a vacuum pump (DRY), manual diaphragm valves (MV18, MV19, MV20, MV21), a one-way valve (CV3), a pressure sensor (PT8), and a pneumatic diaphragm valve (PV1).

[0273] The first pressure relief component 600 includes a pressure relief valve (SV1A, SV1B) and a check valve (CV4A, CV4B).

[0274] The second pressure relief component 700 includes a pressure relief valve (SV2), a one-way valve (CV5), and a manual diaphragm valve (MV22).

[0275] The gas analysis component 800 includes a gas analyzer (GD).

[0276] The specific implementation methods are as follows:

[0277] (1) When using CONDA, open BV1A and BV1B so that the low-temperature liquid in HX1 flows to the condenser; when using CONDB, open BV2A and BV2B so that the low-temperature liquid in HX1 flows to the condenser;

[0278] (2) Open MV1 and MV2A to allow the high-temperature gas to flow to CONDA, which condenses the high-temperature gas to obtain condensed liquid and condensed gas; when switching to CONDB, open MV1 and MV2B to allow the high-temperature gas to flow to CONDB;

[0279] (3) When using CONDA, open MV3A, MV4, and MV5A so that the condensed liquid and condensed gas flow to CANA, which can store the condensed liquid;

[0280] When CONDB is used, MV3B, MV4 and MV5A are opened so that the condensed liquid and condensed gas flow to CANA, which can store the condensed liquid.

[0281] If it is necessary to switch to CANB, open MV5 B so that the condensed liquid and condensed gas flow to CANB;

[0282] (4) When using CANA, open MV6A, MV7 and MV11A so that the condensed gas can flow to TDA, and TDA can adsorb the liquid molecules in the condensed gas to obtain dry gas;

[0283] When CANB is used, MV6B, MV7 and MV11A are opened so that the condensed gas can flow to TDA, and TDA can adsorb the liquid molecules in the condensed gas and obtain dry gas;

[0284] If it is necessary to switch to TDB, open MV11B so that the condensed gas can flow to TDB;

[0285] (5) When using TDA, open MV12A, MV13 and MV14A so that the dry gas can flow to ROA, and ROA only allows small molecular hydrogen to pass through and obtain high-purity hydrogen and impurity gases;

[0286] When using TDB, open MV12B, MV13 and MV14A so that the dry gas can flow to ROA, which only allows small molecule hydrogen to pass through and obtains high-purity hydrogen and impurity gases;

[0287] In case it is necessary to switch to ROB, open MV14B so that the dry gas can flow to ROA;

[0288] (6) When using ROA, open MV15A and MV16 so that high-purity hydrogen can flow to the first delivery pipeline; when using ROB, open MV15B and MV16 so that high-purity hydrogen can flow to the first delivery pipeline;

[0289] (7) Start DRY and open MV18, MV19, MV20 and PV1. DRY forms a vacuum negative pressure in the first delivery pipeline, and high-purity hydrogen can flow to the downstream semiconductor process equipment through the first delivery pipeline.

[0290] Furthermore, the tail gas recovery and treatment method of this embodiment also includes:

[0291] (8) When the liquid level inside CANA and CANB monitored by LEA and LEB exceeds a preset threshold, MV8A and MV8B are opened so that the liquid inside CANA and CANB can be discharged to the waste liquid treatment device;

[0292] (9) When it is necessary to exhaust the gas inside CANA and CANB, open MV9A, MV9B, MV10A, and MV10B to exhaust the gas inside CANA and CANB to the exhaust gas combustion treatment device;

[0293] (10) When the internal pressure of ROA and ROB monitored by PT6A and PT6B is too high, open MV17A and MV17B so that the impurities of ROA and ROB can flow to the exhaust gas combustion treatment device;

[0294] (11) When DRY needs maintenance, open MV21 so that the gas at both ends of DRY can be discharged through the second delivery pipeline;

[0295] (12) When the internal pressure of CANA and CANB is too high, SV1A and SV1B are automatically opened, and the gas inside the fourth liquid storage pipeline can flow to the exhaust gas combustion treatment device through the first pressure relief pipeline;

[0296] (13) When the pressure inside the first delivery pipeline is too high, MV22 is opened, SV2 is automatically opened, and the gas inside the first delivery pipeline can flow to the exhaust gas combustion treatment device through the second pressure relief pipeline.

[0297] Example 6

[0298] This embodiment relates to the exhaust gas treatment system in the utility model.

[0299] A tail gas treatment system includes the recovery and purification equipment, waste liquid treatment equipment and tail gas combustion treatment equipment as described in Examples 1 to 4. The waste liquid treatment equipment is connected to the liquid storage component 200 in the recovery and purification equipment, and is used to treat and discharge the waste liquid stored in the liquid storage component 200; the tail gas combustion treatment equipment is connected to the liquid storage part, the second purification component 400, the first pressure relief component 600, and the second pressure relief component 700 in the recovery and purification equipment, and is used to burn and discharge the impurities generated by filtration and the gas in the pressure relief process.

[0300] Example 7

[0301] A semiconductor process system includes the recovery and purification equipment described in Examples 1 to 4.

[0302] Furthermore, the recovery and purification equipment is also connected to the waste liquid treatment equipment, the tail gas combustion treatment equipment, the upstream gas treatment equipment, and the downstream semiconductor process equipment.

[0303] A semiconductor process system, such as the tail gas treatment system described in Example 5.

[0304] Furthermore, the tail gas treatment system is also connected to upstream gas processing equipment and downstream semiconductor process equipment.

[0305] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0306] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the utility model patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A hydrogen recovery and purification device, characterized in that: include: A condensation component, the condensation component is connected to the upstream gas processing equipment, and is used to condense the water-washed high-temperature gas to obtain a first mixed gas and a condensed liquid; A liquid storage component, which is respectively connected to the condensation component, the waste liquid treatment equipment, and the tail gas combustion treatment equipment, and is located downstream of the condensation component, and is used to store condensed liquid; a first purification component, the first purification component being in communication with the liquid storage component and being located downstream of the liquid storage component, and being used for filtering H2O in the first mixed gas to obtain a second mixed gas; A second purification component, which is connected to the first purification component and the tail gas combustion treatment equipment respectively and is located downstream of the first purification component, and is used to filter impurities in the second mixed gas and obtain high-purity hydrogen; A conveying component is connected to the second purification component and the downstream semiconductor process equipment respectively, and is used to convey high-purity hydrogen to the downstream semiconductor process equipment.

2. The recovery and purification equipment according to claim 1, characterized in that: The condensing component comprises: A condenser, the condenser is connected to the upstream gas processing equipment and the liquid storage component respectively, and is used to condense the high-temperature gas after water washing to obtain a first mixed gas and a condensed liquid; a first condensation pipeline, wherein a first end of the first condensation pipeline is connected to an upstream gas processing device, and a second end of the first condensation pipeline is connected to the condenser, and is used to transport the water-washed high-temperature gas; a second condensation pipeline, wherein a first end of the second condensation pipeline is communicated with the condenser, and a second end of the second condensation pipeline is communicated with the liquid storage component, and is used for conveying the first mixed gas and the condensed liquid; a water bath, the water bath being in communication with the condenser and being used for conveying cryogenic liquid to the condenser; and / or The liquid storage component comprises: A liquid storage tank, which is respectively connected to the condensing component, the first purification component, the waste liquid treatment equipment, and the tail gas combustion treatment equipment, and is located downstream of the condensing component and upstream of the first purification component, and is used to store condensed liquid; a first liquid storage pipeline, wherein a first end of the first liquid storage pipeline is communicated with the condensing component, and a second end of the first liquid storage pipeline is communicated with the liquid storage tank, and is used for conveying condensed liquid and a first mixed gas; a second liquid storage pipeline, wherein a first end of the second liquid storage pipeline is connected to the liquid storage tank, and a second end of the second liquid storage pipeline is connected to the first purification component, and is used for conveying a first mixed gas; a third liquid storage pipeline, a first end of the third liquid storage pipeline being in communication with the liquid storage tank, and a second end of the third liquid storage pipeline being in communication with the waste liquid treatment equipment, for conveying condensed liquid; a fourth liquid storage pipeline, wherein a first end of the fourth liquid storage pipeline is in communication with the second liquid storage pipeline, and a second end of the fourth liquid storage pipeline is in communication with an exhaust gas combustion treatment device, for direct discharge under special circumstances; A cooling coil, the cooling coil being coiled around the outer wall of the liquid storage tank to maintain a constant temperature inside the liquid storage tank; and / or The first purification component comprises: a desorption adsorption tank, which is connected to the liquid storage component and the second purification component respectively, and is located downstream of the liquid storage component and upstream of the second purification component, and is used to filter H2O in the first mixed gas to obtain a second mixed gas; a first adsorption pipeline, wherein a first end of the first adsorption pipeline is connected to the liquid storage component, and a second end of the first adsorption pipeline is connected to the desorption adsorption tank, and is used to transport a first mixed gas; a second adsorption pipeline, wherein a first end of the second adsorption pipeline is connected to the desorption adsorption tank, and a second end of the second adsorption pipeline is connected to a second purification component for conveying a second mixed gas; a first desorption pipeline, wherein a first end of the first desorption pipeline is connected to a nitrogen source, and a second end of the first desorption pipeline is connected to the desorption adsorption tank, for conveying high-temperature nitrogen; a second desorption pipeline, wherein a first end of the second desorption pipeline is connected to the desorption adsorption tank, and a second end of the second desorption pipeline is connected to a waste collection device for conveying waste; and / or The second purification component comprises: A separation membrane tank, which is connected to the first purification component, the conveying component, and the tail gas combustion treatment equipment respectively, and is located downstream of the first purification component and upstream of the conveying component, and is used to filter impurities in the second mixed gas and obtain high-purity hydrogen; a first purification pipeline, wherein a first end of the first purification pipeline is connected to the first purification component, and a second end of the first purification pipeline is connected to the separation membrane tank, and is used for conveying a first mixed gas; a second purification pipeline, wherein a first end of the second purification pipeline is in communication with the separation membrane tank, and a second end of the second purification pipeline is in communication with the delivery component, and is used for delivering high-purity hydrogen; A third purification pipeline, wherein a first end of the third purification pipeline is connected to the separation membrane tank, and a second end of the third purification pipeline is connected to the tail gas combustion treatment equipment, for conveying impurity gas; and / or The conveying component comprises: A first delivery pipeline, wherein a first end of the first delivery pipeline is connected to the second purification component, and a second end of the first delivery pipeline is connected to a downstream semiconductor process equipment for delivering high-purity hydrogen; A vacuum pump, which is arranged in the first delivery pipeline and is used to provide a vacuum negative pressure at the connection point between the first delivery pipeline and the second purification component; A second delivery pipeline, wherein the first end of the second delivery pipeline is connected to the first delivery pipeline and is located upstream of the vacuum pump, and the second end of the second delivery pipeline is connected to the first delivery pipeline and is located downstream of the vacuum pump, for delivering high-purity hydrogen.

3. The recovery and purification equipment according to claim 2, characterized in that: The condensing component also includes: a first switch valve, the first switch valve being arranged in the first condensation pipeline and being used for controlling the flow of the first condensation pipeline; a second switch valve, the second switch valve being arranged in the second condensation pipeline and being used for controlling the flow of the second condensation pipeline; a third switch valve, the third switch valve being arranged on a pipeline connecting the water bath and the condenser, and being used for controlling the flow of the pipeline; and / or The liquid storage component also includes: a fourth switch valve, the fourth switch valve being arranged in the first liquid storage pipeline and being used for controlling the flow of the first liquid storage pipeline; a fifth switch valve, the fifth switch valve being arranged in the second liquid storage pipeline and being used for controlling the flow of the second liquid storage pipeline; a sixth switch valve, the sixth switch valve being arranged in the third liquid storage pipeline and being used for controlling the flow of the third liquid storage pipeline; a seventh switch valve, the seventh switch valve being arranged in the fourth liquid storage pipeline and being used for controlling the flow of the fourth liquid storage pipeline; and / or The first purification component also includes: an eighth switch valve, the eighth switch valve being disposed in the first adsorption pipeline and being used to control the flow of the first adsorption pipeline; a ninth switch valve, the ninth switch valve being arranged in the second adsorption pipeline and being used for controlling the flow of the second adsorption pipeline; A first one-way valve, which is disposed in the second adsorption pipeline and is used to prevent the gas inside the second adsorption pipeline from flowing back; and / or The second purification component also includes: a tenth switch valve, the tenth switch valve being disposed in the first purification pipeline and being used to control the flow of the first purification pipeline; an eleventh switch valve, the eleventh switch valve being arranged in the second purification pipeline and being used for controlling the flow of the second purification pipeline; a twelfth switch valve, the twelfth switch valve being arranged in the third purification pipeline and being used for controlling the flow of the third purification pipeline; a second one-way valve, which is disposed in the third purification pipeline and is used to prevent the gas inside the third purification pipeline from flowing back; and / or The conveying component also includes: a thirteenth switch valve, the thirteenth switch valve being arranged in the first delivery pipeline and being used for controlling the flow of the first delivery pipeline; a third one-way valve, the third one-way valve being arranged in the first delivery pipeline and being used to prevent the gas inside the first delivery pipeline from flowing back; A fourteenth switch valve is arranged in the second delivery pipeline, and is used to control the flow of the second delivery pipeline.

4. The recovery and purification equipment according to claim 2, characterized in that: The condensing component also includes: A first temperature sensor, which is disposed in the second condensation pipeline and is used to monitor the temperature in the second condensation pipeline; and / or The liquid storage component also includes: A second temperature sensor, the second temperature sensor is connected to the liquid storage tank and is used to monitor the temperature inside the liquid storage tank; and / or The liquid storage component also includes: a liquid level sensor, the liquid level sensor being disposed inside the liquid storage tank and used to monitor the liquid level inside the liquid storage tank; and / or The liquid storage component also includes: A third temperature sensor, which is disposed in the second liquid storage pipeline and is used to monitor the temperature inside the second liquid storage pipeline; and / or The liquid storage component also includes: A first pressure sensor, which is disposed in the second liquid storage pipeline and is used to monitor the pressure inside the second liquid storage pipeline; and / or The first purification component also includes: A second pressure sensor, which is disposed in the second adsorption pipeline and is used to monitor the pressure inside the second adsorption pipeline; and / or The second purification component also includes: A third pressure sensor, the third pressure sensor is connected to the separation membrane tank and is used to monitor the pressure inside the separation membrane tank; and / or The second purification component also includes: a fourth pressure sensor, the fourth pressure sensor being in communication with the second purification pipeline and configured to monitor the pressure inside the second purification pipeline; and / or The conveying component also includes: A fifth pressure sensor is disposed in the first delivery pipeline and is used to monitor the pressure inside the first delivery pipeline.

5. The recovery and purification equipment according to any one of claims 1 to 4, characterized in that: Also includes: A first pressure relief component, which is connected to the liquid storage component and the tail gas combustion treatment equipment respectively, and is used to relieve pressure on the pipeline; and / or A second pressure relief component, which is connected to the conveying component and the tail gas combustion treatment equipment respectively, and is used to relieve pressure on the pipeline; and / or An analysis component is connected to the conveying component and is located at the connection point between the conveying component and downstream semiconductor process equipment, and is used for analyzing the high-purity hydrogen input to the downstream semiconductor process equipment.

6. The recovery and purification equipment according to claim 5, characterized in that: The first pressure relief component comprises: a first pressure relief pipeline, wherein a first end of the first pressure relief pipeline is connected to the liquid storage component, and a second end of the first pressure relief pipeline is connected to the tail gas combustion treatment equipment for conveying gas; A first pressure relief valve, which is disposed in the first pressure relief pipeline and is used for automatically relieving pressure when the internal pressure of the first pressure relief pipeline is high; and / or The second pressure relief component comprises: A second pressure relief pipeline, a first end of which is in communication with the delivery component, and a second end of which is in communication with the tail gas combustion treatment equipment, for delivering gas; The second pressure relief valve is arranged in the second pressure relief pipeline, and is used for automatically relieving pressure when the internal pressure of the second pressure relief pipeline is high.

7. The recovery and purification equipment according to claim 6, characterized in that: The first pressure relief component also includes: a fourth one-way valve, the fourth one-way valve being arranged in the first pressure relief pipeline and being used for preventing the gas inside the first pressure relief pipeline from flowing back; and / or The second pressure relief component also includes: a fifteenth switch valve, the fifteenth switch valve being disposed in the second pressure relief pipeline and being used to control the flow of the second pressure relief pipeline; A fifth one-way valve is provided in the second pressure relief pipeline to prevent the gas inside the second pressure relief pipeline from flowing back.

8. The recovery and purification equipment according to claim 1, characterized in that: There are at least two of the condensing component, the liquid storage component, the first purification component, and the second purification component; Among them, several of the condensation components are arranged in parallel, several of the liquid storage components are arranged in parallel, several of the first purification components are arranged in parallel, and several of the second purification components are arranged in parallel.

9. An exhaust gas treatment system, characterized in that: include: The recovery and purification equipment according to any one of claims 1 to 8; A waste liquid treatment device, the waste liquid treatment device is connected to the liquid storage component in the recovery and purification device, and is used to treat and discharge the waste liquid stored in the liquid storage component; The tail gas combustion treatment equipment is connected with the liquid storage part, the second purification component, the first pressure relief component and the second pressure relief component in the recovery and purification equipment, and is used for burning and discharging the impurities generated by filtration and the gas in the pressure relief process.

10. A semiconductor process system, characterized in that: include: The recovery and purification equipment according to any one of claims 1 to 8; or The exhaust gas treatment system as claimed in claim 9.

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