Target structure of electron accelerator

Abstract

The utility model relates to an electron accelerator target structure, which comprises a target material, a window and a cooling system, the target material and the window are arranged on a barrel of an electron accelerator below an accelerating tube, the cooling system is arranged between the target material and the window to cool the target material, and the target material is of a composite film structure. The thickness of the graphene film layer ranges from 1 nm to 50 nm, and the graphene film layer adheres to and grows on the surface, opposite to an electron beam, of the tungsten or tantalum base material. According to the electron accelerator target structure provided by the utility model, due to excellent thermal conductivity and wear resistance of graphene, heat on a target surface can be rapidly taken away, the service life of a tungsten (tantalum) target is greatly prolonged, excellent performance is shown in an electron accelerator, and the graphene film layer is attached and grown on the surface, back to an electron beam, of the tungsten or tantalum base material, so that the electron accelerator target structure is more compact. The thermal conductivity, the wear resistance and the service life of the target material are effectively improved, and powerful support is provided for development of the electron accelerator technology.

Description

Technical Field

[0001] The utility model relates to an electron accelerator, and more specifically to a target structure of an electron accelerator. Background Art

[0002] The known electron accelerator includes a cylinder, an electron gun, an accelerating tube and a target material, wherein the accelerating tube is installed in the cylinder, the electron gun is installed at the top of the accelerating tube, and the target material is installed on the cylinder below the accelerating tube. The electron beam generated by the electron gun is accelerated when passing through the accelerating tube, and the high-speed / high-energy electrons act on the target material. Obviously, the target material is a key component that receives the bombardment of high-energy electrons.

[0003] Usually, the target material is a tungsten target or a tantalum target. Tungsten or tantalum is widely used as a target material due to its high melting point, high hardness, good chemical stability and radiation resistance. However, when high-speed electrons hit the target material, part of the kinetic energy is converted into heat energy, causing the target material temperature to rise. Overheating will affect the performance and life of the tungsten target or tantalum target. Utility Model Content

[0004] In order to improve the life of a tungsten target or a tantalum target, etc., the utility model provides an electron accelerator target structure.

[0005] According to the electron accelerator target structure of the utility model, it includes a target material, a window and a cooling system, wherein the target material and the window are installed on the cylinder of the electron accelerator below the accelerating tube, and the cooling system is arranged between the target material and the window to cool the target material. The target material is a composite film structure, which includes a tungsten or tantalum substrate and a graphene film layer with a thickness between 1 and 50 nm, wherein the graphene film layer is attached and grown on the surface of the tungsten or tantalum substrate facing away from the electron beam.

[0006] Preferably, the graphene film layer comprises a plurality of graphene monolayers deposited layer by layer on a tungsten or tantalum substrate.

[0007] Preferably, the graphene film layer is a uniform and dense graphene film layer directly deposited on a tungsten or tantalum substrate.

[0008] Preferably, the thickness of the graphene film layer is 1-10 nm.

[0009] Preferably, the thickness of the graphene film layer is 5-10 nm.

[0010] Preferably, the window is a titanium foil.

[0011] Preferably, the cooling system comprises an intense cooling water flow at high velocity.

[0012] Preferably, the target is mounted and fixed on the cylinder through a first flange.

[0013] Preferably, the window is mounted and fixed on the cylinder below the target through a second flange.

[0014] Preferably, the cooling system is arranged between the first flange and the second flange.

[0015] According to the electron accelerator target structure of the utility model, due to the excellent thermal conductivity and wear resistance of graphene, the heat of the target surface can be quickly taken away, the life of the tungsten (tantalum) target is greatly improved, and excellent performance is shown in the electron accelerator. The graphene film layer with a thickness between 1 and 50 nm is attached and grown on the surface of the tungsten or tantalum substrate facing away from the electron beam, so the thermal conductivity, wear resistance and service life of the target material are effectively improved, which provides strong support for the development of electron accelerator technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of an electron accelerator target structure according to a preferred embodiment of the utility model. DETAILED DESCRIPTION

[0017] The preferred embodiments of the present utility model are given below in conjunction with the accompanying drawings and described in detail.

[0018] like Figure 1 As shown, the electron accelerator target structure according to a preferred embodiment of the utility model includes a target material 1, a window 2 and a cooling system 3, wherein the target material 1 and the window 2 are mounted on the cylinder (not shown) of the electron accelerator below the accelerating tube 4, and the cooling system 3 is arranged between the target material 1 and the window 2 to cool the target material 1. Specifically, the target material 1 is mounted and fixed on the cylinder through the first flange 5, the window 2 is mounted and fixed on the cylinder below the target material 1 through the second flange 6, and the cooling system 3 is arranged between the first flange 5 and the second flange 6. The electron beam 7 generated by the electron gun (not shown) is accelerated when passing through the accelerating tube 4, and the high-speed / high-energy electrons act on the target material 1, and then pass through the window 2 to perform radiation processing on the product.

[0019] The target material 1 is a composite film structure, which includes a tungsten or tantalum substrate 11 and a graphene film layer 12 , wherein the graphene film layer 12 is attached and grown on the surface of the tungsten or tantalum substrate 11 facing away from the electron beam 7 .

[0020] The graphene film layer 12 includes a plurality of graphene monolayers deposited layer by layer on the tungsten or tantalum substrate 11. It should be understood that the growth of the graphene film layer 12 on the tungsten or tantalum substrate 11 can be achieved by a variety of methods, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). Directly depositing graphene on the tungsten or tantalum substrate 11 can form a uniform and dense graphene film layer 12 on the surface of the tungsten or tantalum substrate 11 and ensure good bonding between the graphene film layer 12 and the tungsten or tantalum substrate 11.

[0021] The thickness of the graphene film layer 12 is between 1 nm and 50 nm, preferably between 1 nm and 10 nm. It should be understood that the thickness of a graphene monolayer is about 0.334 nm, and multiple graphene monolayers grow layer by layer to form the graphene film layer 12. In a preferred embodiment, the thickness of the graphene film layer 12 is 5 nm.

[0022] In this embodiment, the window 2 is a titanium foil.

[0023] In this embodiment, the cooling system 3 includes a strong cooling water flow flowing at a high speed.

[0024] In particular, graphene as a nanomaterial has extremely high thermal conductivity, excellent mechanical properties and good chemical stability. Growing graphene on the surface of a tungsten or tantalum substrate 11 can significantly improve multiple properties of the target material 1, such as thermal conductivity, wear resistance and service life.

[0025] Specifically, the graphene film layer 12 has extremely high thermal conductivity, which can effectively conduct the heat generated by the tungsten or tantalum substrate 11 during the electron bombardment process, reduce the target material temperature, and thus improve the stability and service life of the target material 1. Moreover, the graphene film layer 12 has extremely high hardness and elastic modulus, which can significantly improve the wear resistance of the target material 1 and reduce the wear of the target material 1 caused by electron bombardment and strong cooling water flow. In addition, both the tungsten or tantalum substrate 11 and the graphene film layer 12 have good chemical stability, can resist various chemical corrosion and radiation damage, and ensure the long-term stable operation of the target material 1.

[0026] The above is only a preferred embodiment of the utility model, and is not intended to limit the scope of the utility model. The above embodiments of the utility model can also be modified in various ways. That is, all simple, equivalent changes and modifications made according to the claims and the contents of the specification of the utility model application fall within the scope of protection of the claims of the utility model patent. The conventional technical contents are not described in detail in the utility model.

Claims

1. An electron accelerator target structure, characterized in that: The electron accelerator target structure comprises a target material, a window and a cooling system, wherein the target material and the window are mounted on the cylinder of the electron accelerator below the accelerating tube, the cooling system is arranged between the target material and the window to cool the target material, the target material is a composite film structure, which comprises a tungsten or tantalum substrate and a graphene film layer with a thickness between 1 and 50 nm, wherein the graphene film layer is attached and grown on the surface of the tungsten or tantalum substrate facing away from the electron beam.

2. The electron accelerator target structure according to claim 1, characterized in that: The graphene film layer includes multiple graphene monolayers deposited layer by layer on a tungsten or tantalum substrate.

3. The electron accelerator target structure according to claim 1, characterized in that: The graphene film layer is a uniform and dense graphene film layer directly deposited on a tungsten or tantalum substrate.

4. The electron accelerator target structure according to claim 1, characterized in that: The thickness of the graphene film layer is 1 to 10 nm.

5. The electron accelerator target structure according to claim 4, characterized in that: The thickness of the graphene film layer is 5 to 10 nm.

6. The electron accelerator target structure according to claim 1, characterized in that: The window is titanium foil.

7. The electron accelerator target structure according to claim 1, characterized in that: The cooling system includes an intense cooling water flow at high speed.

8. The electron accelerator target structure according to claim 1, characterized in that: The target material is fixed on the cylinder through the first flange.

9. The electron accelerator target structure according to claim 8, characterized in that: The window is installed and fixed on the cylinder body below the target through the second flange.

10. The electron accelerator target structure according to claim 9, characterized in that: The cooling system is arranged between the first flange and the second flange.

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