Photomask Storage Apparatus

Abstract

A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.

Description

[0001] This application is a divisional application, the application number of its parent application is 200810130539.3, the application date is July 7, 2008, and the invention name is "photomask storage device". technical field [0002] The invention relates to a storage and / or delivery device, in particular to a storage and / or delivery device related to photomasks. Background technique [0003] The photomask is used to image a specific circuit design pattern on a substrate (such as a semiconductor wafer) through the process steps in the photolithography process to form the features of an integrated circuit. A general photomask includes a transparent substrate, which has a specific circuit pattern designed or required by a customer on the transparent substrate, so that light can pass through the specific circuit pattern of the transparent substrate to provide a specific circuit pattern imaged on the substrate (such as on the semiconductor wafer). Usually photomasks are oft...

AI Technical Summary

Problems solved by technology

Usually photomasks are often stored, shipped or otherwise handled during the manufacturing process. Improper storage and transportation may lead to photomask damage, such as: wrong handling, dust, contamination, edge scratches or other defect causes

Furthermore, the containers of general photomasks are difficult to manufacture, clean and use due to too many parts.

Photomask containers with too many parts are more likely to cause parts to loosen due to long-term use and indirectly cause production tool failures, which may affect the cycle time of the process

[0004] Furthermore, with the reduction of the line width of the photomask in the integrated circuit manufacturing process and the increase in the complexity of Resolution Enhancement Techniques (RETs), defects or contamination of the photomask may cause serious impact on the manufacturing process, such as : Decreased yield, impact on process cycle time, or reduced process reliability

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