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A kind of visible light photoresistor and its making method

A technology for photosensitive resistors and manufacturing methods, applied in the direction of sustainable manufacturing/processing, circuits, electrical components, etc., can solve the problems of reduced performance parameters of photosensitive resistors, high scrap rate, poor stability, etc. The effect of lowering and high stability

Active Publication Date: 2017-03-22
NANYANG NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although adding CuCl 2 The material method can improve the sensitivity of photoresistors, but due to the instability of copper ions, that is, monovalent copper ions and divalent copper ions will change each other, which will cause the performance parameters of photoresistors to decrease after the aging process, and the stability is relatively low. Poor, one of the outstanding performances is the high scrap rate, reaching about 15%

Method used

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  • A kind of visible light photoresistor and its making method
  • A kind of visible light photoresistor and its making method
  • A kind of visible light photoresistor and its making method

Examples

Experimental program
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Effect test

Embodiment 1

[0035] Embodiment 1: A visible light photoresistor, including a ceramic substrate, a photosensitive layer and two electrodes, the photosensitive layer is coated on the surface of the ceramic substrate, the photosensitive layer and the ceramic substrate form the main body of the visible light photoresistor, and the two electrodes are respectively installed on the visible light photoresistor At both ends of the main body, the photosensitive layer consists of the following components:

[0036]

[0037] The rare earth chloride is one of europium chloride, cerium chloride and lutetium chloride or a mixture of two or more of holmium chloride, europium chloride, cerium chloride and lutetium chloride.

Embodiment 2

[0038] Embodiment 2: A visible light photoresistor, including a ceramic substrate, a photosensitive layer and two electrodes, the photosensitive layer is coated on the surface of the ceramic substrate, the photosensitive layer and the ceramic substrate form the main body of the visible light photoresistor, and the two electrodes are respectively installed on the visible light photoresistor At both ends of the main body, the photosensitive layer consists of the following components:

[0039]

[0040] The rare earth chloride is one of europium chloride, cerium chloride and lutetium chloride or a mixture of two or more of holmium chloride, europium chloride, cerium chloride and lutetium chloride.

[0041] In this embodiment, the rare earth chloride is a mixture of holmium chloride, europium chloride, cerium chloride and lutetium chloride, and the rare earth chloride is composed of the following components:

[0042]

[0043]In this embodiment, the thickness of the photosensi...

Embodiment 3

[0045] Embodiment 3: A visible light photoresistor, including a ceramic substrate, a photosensitive layer and two electrodes, the photosensitive layer is coated on the surface of the ceramic substrate, the photosensitive layer and the ceramic substrate form the main body of the visible light photoresistor, and the two electrodes are respectively installed on the visible light photoresistor At both ends of the main body, the photosensitive layer consists of the following components:

[0046]

[0047]

[0048] The rare earth chloride is one of europium chloride, cerium chloride and lutetium chloride or a mixture of two or more of holmium chloride, europium chloride, cerium chloride and lutetium chloride.

[0049] In this embodiment, the rare earth chloride is a mixture of holmium chloride, europium chloride, cerium chloride and lutetium chloride, and the rare earth chloride is composed of the following components:

[0050]

[0051] In this embodiment, the thickness of t...

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Abstract

The invention discloses a visible light photosensitive resistor and a manufacturing method thereof. Rare-earth chloride is adopted to replace CyCl2, the rare-earth chloride with the weight percentage being 0.1% is added in photosensitive layer materials comprising CdS, CdSe and CdCl2 and is the mixture of one or two or more of holmium chloride, neodymium chloride, dysprosium chloride and samarium chloride, the matching ratio of the CdS to the CdSe to the CdCl2 is adjusted, and the content of the rare-earth chloride is quite small so that the material cost of the visible light photosensitive resistor cannot be affected; by combining the rare-earth chloride with the materials comprising the CdS, the CdSe and the CdCl2, the dark resistance of the visible light photosensitive resistor can be increased, and the bright resistance of the visible light photosensitive resistor can be reduced. The visible light photosensitive resistor has the advantages that the sensitivity of the visible light photosensitive resistor can be improved, the rare-earth chloride is high in stability, the visible light photosensitive resistor is not likely to be changed in the aging process, other performance parameters of the visible light photosensitive resistor are not reduced, the stability of the visible light photosensitive resistor is high in the aging process, and the rejection rate is greatly reduced.

Description

technical field [0001] The invention relates to a visible light photoresistor, in particular to a visible light photoresistor and a manufacturing method thereof. Background technique [0002] Visible light photoresistors are mainly used in various photoelectric control systems, such as photoelectric automatic switch portals, automatic lighting systems, automatic water supply devices, mechanical automatic protection devices, photoelectric counters, and photoelectric tracking systems. [0003] Existing visible light photoresistors generally include a ceramic substrate, a photosensitive layer and two electrodes. The photosensitive layer is coated on the surface of the ceramic substrate. The photosensitive layer and the ceramic substrate form the main body of the photoresistor. The two electrodes are respectively installed at both ends of the main body of the photoresistor. The resistance value of the photoresistor measured after a certain period of time after it is completely d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/08H01L31/0328H01L31/18
CPCH01L31/0328H01L31/08H01L31/18Y02P70/50
Inventor 鲁道邦宋玉玲朱永胜惠明赵俊峰孙国良
Owner NANYANG NORMAL UNIV
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