Novel nasal suction type mask

A nasal suction and mask technology, which is applied in clothing, clothing, protective clothing, etc., can solve the problems of easily damaged facial make-up effect, facial stasis, hot and humid, and uncomfortable fit of the mask, and achieve light weight, keep dry, and simple structure Effect

Pending Publication Date: 2017-10-20
王恒成
View PDF16 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a new type of nasal suction mask, which solves the problems of poor air tightness of the above-mentioned conventional masks, discomfort when worn too tight, accumulation of breathing gas on the face, sultry humidity, and peculiar smell caused by long-term wearing, and the mask is directly attached to the face. Uncomfortable and easy to damage the effect of facial makeup, and it is not conducive to the use of glasses, which isolate the breathing gas and gas filtering mask from the face, so that it is convenient to breathe through the nose

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel nasal suction type mask
  • Novel nasal suction type mask
  • Novel nasal suction type mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] according to Figure 1~3 Describe in detail the concrete structure of the present invention, as figure 1 with 2 Shown, embodiment is a kind of novel nasal suction respirator, comprises the mask part 2 that has lanyard 1, and mask part is formed the mask body by the gas filter mesh cloth that has one-way outlet valve 7, and mask body utilizes filter screen Cloth filters the inhaled air, which can block the dust in the external air; the inner edge of the mask portion is connected with a gas isolation cloth layer 5, and the gas isolation cloth layer is a filter material cloth layer with airtight or weak air permeability. Its edge is bonded or sewn to the mask body, and a ventilation cavity 4 is formed between the gas isolation cloth layer 5 and the mask part 2, which plays the role of buffering and storing gas; People's facial side is bonded with the snorkel type rubber nose plug 3 of support section 3-1, as image 3 As shown, the shape of the rubber nasal plug can be s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a novel nasal suction type mask, for solving the problems that the air tightness of the existing mask is poor, the breathing gas is deposited on the face, so that the stiflingly hot and damp feeling and foreign smell are generated, and the facial makeup-up effect is easily damaged. According to the technical scheme: the novel nasal suction type mask comprises a facial mask part with hanging belts; the technical key points are as follows: the facial mask part is a facial mask body formed by gas filter screen cloth with a one-way air outlet valve, wherein a gas isolating cloth layer is arranged along the inner side edge of the facial mask part, a ventilation cavity is formed between the gas isolating cloth layer and the facial mask part, a ventilation pipe type rubber nasal plug with a supporting section is arranged on the side, facing the human face, of the gas isolating cloth layer, and a ventilation pipe of the rubber nasal plug communicates with the ventilation cavity. The novel nasal suction type mask does not attach to the face, the air tightness is extremely good, the comfort feeling is improved, the phenomenon that the exhaled damp gas is deposited on the face is avoided, so that the face is dry and clean and is free of foreign smell, the novel nasal suction type mask is particularly suitable for wearing of people wearing glasses, the facial makeup-up effect is protected from being damaged, and in addition, the novel nasal suction type mask is simple in structure, light in weight, comfortable to wear and obvious in effect.

Description

technical field [0001] The invention relates to a dustproof mask, in particular to a novel nasal suction mask, which is suitable for daily life and dusty environments. Background technique [0002] The main function of the mask is to prevent the inhalation of dust, so it needs to have two functions, one is to filter the inhaled air, and the other is to ensure the airtightness of the mask. At present, conventional masks use a single-layer gas filter mask that fits the face. Its disadvantages are: 1. In order to increase the airtightness, the edge of the mask is tight with the face, which makes it uncomfortable to wear for a long time; Wearing glasses will blur your vision, so it is not suitable for wearing glasses; 3. When inhaling through the mouth and nose, the air pressure inside the mask becomes smaller, and the mask shrinks and deforms to fit directly on the face. When exhaling, the air pressure inside the mask increases, and the exhaled gas Humidity is high, filling th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A41D13/11
CPCA41D13/11
Inventor 王恒成
Owner 王恒成
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products