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Array substrate and manufacturing method, display panel

A technology of an array substrate and a manufacturing method, applied in the display field

Active Publication Date: 2022-02-08
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, a larger thickness of the insulating layer will reduce the capacitance between the first functional area and the active layer, thereby reducing the effect of the first functional area to improve display crosstalk

Method used

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  • Array substrate and manufacturing method, display panel
  • Array substrate and manufacturing method, display panel
  • Array substrate and manufacturing method, display panel

Examples

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Embodiment Construction

[0037] An example embodiment will now be described more fully with reference to the accompanying drawings. However, an example embodiment can be implemented in a variety of forms, and is not to be construed as being limited to the examples described herein; in contrast, the present invention will make the present invention will more comprehensive and complete, and the concept of example embodiments is fully conveyed A technician to those skilled in the art. The same reference numerals in the figure indicate the same or similar structures, and therefore will be omitted in detail.

[0038] While the relative references are used in this specification, such as "" Under "" Under ", one component of the icon is described for another component, but these terms are used in this specification only for convenience, such as according to the drawings. The direction of the example described. It will be appreciated that if the device of the icon is turned over down, the described components des...

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Abstract

The invention relates to the field of display technology, and provides an array substrate, a manufacturing method, and a display panel. The array substrate includes an active layer and a gate layer for forming transistors, and the array substrate further includes: an insulating layer and an electrode layer. An insulating layer is disposed above the gate layer; an electrode layer is disposed above the insulating layer and includes a plurality of functional areas; wherein, the insulating layer is located in a groove with a preset depth at the position of the functional areas. The fabrication method of the array substrate provided in the present disclosure can control the capacitance between different functional regions and the active layer or the gate layer by providing grooves in the insulating layer.

Description

Technical field [0001] The present invention relates to the field of display, and in particular, to an array substrate and a manufacturing method, a display panel. Background technique [0002] The array substrate typically includes an active layer and a gate layer for forming a transistor, and an electrode layer having an insulated electrode layer is provided on the gate layer. The electrode layer includes a plurality of functional regions, each having a different function. For example, the electrode layer can include a first functional region, a second functional region, and other functional zones, and the capacitance formed by the first functional region and the active layer can reduce the display crosstalk problem; the second functional region can form savings with the gate layer. Capacitor; other functional districts have other specific functions. [0003] In the related art, the method of fabricating the array substrate is generally formed on the gate layer, and an electrod...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77
Inventor 张倩倩刘亮亮彭利满刘祺吴岩张国苹
Owner BOE TECH GRP CO LTD