A temperature control method and system for shuttle kiln

Abstract

The present invention relates to the technical field of kilns, and in particular to a temperature control method and system for a shuttle kiln, wherein the system comprises a PLC, wherein the PLC is connected to at least two gas valve actuators, each of which is connected to a plurality of gas pipelines, wherein the end of each gas pipeline extends to the interior of the kiln, and a burner or a temperature sensor is arranged at the end of each gas pipeline; each burner has a different height; and each temperature sensor is connected to the PLC; the method comprises: the PLC obtains a temperature signal obtained by each temperature sensor for detecting the interior of the kiln, and if the internal temperature of the kiln is uneven, the opening of each gas pipeline is determined according to each temperature signal, so as to adjust the internal atmosphere of the kiln to an oxidizing atmosphere; the gas valve actuator adjusts the opening according to the opening control signal, so as to adjust the ratio of gas to air entering the burner; the present invention improves the temperature uniformity and stability of the kiln, and improves the firing quality of the kiln.

Description

Technical Field

[0001] The present invention relates to the technical field of kilns, and in particular to a temperature control method and system for a shuttle kiln. Background Art

[0002] The shuttle kiln is a shuttle kiln used for intermittent firing, and its structure is similar to a matchbox. Since the shuttle kiln is used for intermittent firing, the heat storage loss and heat dissipation loss of the shuttle kiln are often large. In order to compensate for the heat loss of the shuttle kiln, the relevant operators usually adjust the gas flow or air supply of the shuttle kiln based on experience.

[0003] However, this adjustment method is usually not precise enough, which often causes the firing temperature of the shuttle kiln to be too high or too low, and the operator cannot accurately understand the working conditions of the shuttle kiln. At the same time, the temperature inside the shuttle kiln is uneven and unstable, which will also affect the firing quality of the objects. Summary of the invention

[0004] To solve the above problems, the present invention provides a temperature control method and system for a shuttle kiln to solve one or more technical problems existing in the prior art and at least provide a beneficial choice or create conditions.

[0005] In order to achieve the above object, the present invention provides the following technical solutions:

[0006] In a first aspect, an embodiment of the present invention provides a temperature control method for a shuttle kiln, the method being applied to a temperature control system of a shuttle kiln, the system comprising a PLC, the PLC being connected to at least two gas valve actuators, each of the gas valve actuators being connected to a plurality of gas pipelines, the end of each of the gas pipelines extending to the interior of the kiln, a burner or a temperature sensor being arranged at the end of each of the gas pipelines; each burner having a different height; the temperature sensor being connected to the PLC;

[0007] The method comprises the following steps:

[0008] Step S100, PLC obtains the temperature signal obtained by each temperature sensor detecting the inside of the kiln;

[0009] Step S200, the PLC determines whether the internal temperature of the kiln is uniform according to each temperature signal;

[0010] Step S300: If the PLC determines that the internal temperature of the kiln is uneven, the opening of each gas pipeline is determined according to each temperature signal to adjust the internal atmosphere of the kiln to an oxidizing atmosphere;

[0011] Step S400, the PLC sends a corresponding opening control signal to the gas valve actuator on each gas pipeline according to the opening of each gas pipeline;

[0012] Step S500: After receiving the opening control signal sent by the PLC, the gas valve actuator adjusts the opening to adjust the ratio of gas to air entering the burner.

[0013] As an optional implementation, in a first aspect of the embodiment of the present invention, the PLC determines whether the internal temperature of the kiln is uniform according to each temperature signal, including:

[0014] It is determined whether the temperature value of each temperature signal is within a preset temperature range. If so, it is determined that the internal temperature of the kiln is uniform; otherwise, it is determined that the internal temperature of the kiln is non-uniform.

[0015] As an optional implementation, in the first aspect of the embodiment of the present invention, each of the pipelines connected to the gas valve actuator includes at least one pipeline for conveying gas and at least one pipeline for conveying combustion-supporting air, and the method of determining the opening of each gas pipeline according to each temperature signal to adjust the internal atmosphere of the kiln to an oxidizing atmosphere includes:

[0016] The valve opening ratio of the gas valve actuator to control the pipeline for conveying gas and the pipeline for conveying combustion air is determined according to the oxidizing atmosphere, and the opening of each gas pipeline is determined according to the valve opening ratio.

[0017] In a second aspect, an embodiment of the present invention further provides a temperature control system for a shuttle kiln, characterized in that: it comprises a PLC, the PLC is connected to at least two gas valve actuators, each of the gas valve actuators is connected to a plurality of gas pipelines, the end of each of the gas pipelines extends to the interior of the kiln, and a burner or a temperature sensor is provided at the end of each of the gas pipelines; each burner has a different height; the temperature sensor is connected to the PLC;

[0018] The PLC includes a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the temperature control method for the shuttle kiln as described in any one of the first aspects is implemented.

[0019] As an optional implementation, in the second aspect of the embodiment of the present invention, the temperature sensor adopts an S-type thermocouple.

[0020] As an optional implementation, in the second aspect of the embodiment of the present invention, the PLC adopts the Omron CP1H series programmable controller.

[0021] As an optional implementation, in a second aspect of the embodiment of the present invention, the system further includes a touch screen connected to the PLC.

[0022] As an optional implementation, in the second aspect of the embodiment of the present invention, the touch screen adopts the Wellentone MT8121iE TPC.

[0023] The beneficial effects of the present invention are as follows: the temperature control method and system of a shuttle kiln provided by the present invention determine the opening of each gas pipeline according to each temperature signal, and send a corresponding opening control signal to the gas valve actuator on each gas pipeline according to the opening of each gas pipeline; it is capable of realizing precise regulation of the temperature in the kiln; and the temperature uniformity and stability of the kiln are improved through dynamic control of time and space, thereby improving the firing quality of the kiln. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0025] Figure 1 It is a flow chart of a temperature control method of a shuttle kiln in an embodiment of the present invention;

[0026] Figure 2 It is a schematic structural diagram of a temperature control system of a shuttle kiln in an embodiment of the present invention;

[0027] Figure 3 The present invention is a circuit block diagram of a temperature control system of a shuttle kiln in an embodiment of the present invention. DETAILED DESCRIPTION

[0028] This section will describe in detail the specific embodiments of the present invention. The preferred embodiments of the present invention are shown in the accompanying drawings. The purpose of the accompanying drawings is to supplement the description of the text part of the specification with graphics, so that people can intuitively and vividly understand each technical feature and the overall technical solution of the present invention, but it cannot be understood as a limitation on the scope of protection of the present invention.

[0029] In the description of the present invention, it should be understood that descriptions involving orientations, such as up, down, front, back, left, right, etc., and orientations or positional relationships indicated are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0030] In the description of the present invention, if there are words such as "several", it means one or more, and "more" means more than two. Greater than, less than, and exceed are understood as not including the number, and above, below, and within are understood as including the number.

[0031] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0032] Reference Figure 1-Figure 3 The embodiment of the present invention provides a temperature control method of a shuttle kiln, and the method is applied to a temperature control system of a shuttle kiln. The system includes a PLC 100, and the PLC 100 is connected to at least two gas valve actuators 200. Each of the gas valve actuators 200 is connected to a plurality of gas pipelines, and the end of each of the gas pipelines extends to the interior of the kiln 10. A burner 400 or a temperature sensor 300 is provided at the end of each of the gas pipelines; each burner 400 has a different height; each of the temperature sensors 300 is connected to the PLC 100;

[0033] The method comprises the following steps:

[0034] Step S100, PLC100 obtains the temperature signal obtained by each temperature sensor 300 detecting the inside of the kiln 10;

[0035] Step S200, PLC100 determines whether the internal temperature of the kiln 10 is uniform according to each temperature signal;

[0036] Step S300: If the PLC 100 determines that the internal temperature of the kiln 10 is uneven, the opening of each gas pipeline is determined according to each temperature signal to adjust the internal atmosphere of the kiln 10 to an oxidizing atmosphere;

[0037] Step S400, PLC100 sends a corresponding opening control signal to the gas valve actuator 200 on each gas pipeline according to the opening of each gas pipeline;

[0038] Step S500 : After receiving the opening control signal sent by the PLC 100 , the gas valve actuator 200 performs opening adjustment to adjust the ratio of gas to air entering the burner 400 .

[0039] In this embodiment, the mixed gas sprayed by the burners 400 at different heights can strengthen the circulation disturbance of the gas in the kiln, so that the oxidation atmosphere in the kiln can reach uniformity faster. Setting the oxidation atmosphere in the kiln actually determines the ratio of gas to air in the mixed gas sprayed by the power burner 400, and controls the order of the burner 400 spraying the mixed gas and the ratio of gas to air in the mixed gas, thereby improving the firing quality of the kiln 10. Through the dynamic symmetrical alternating operation of the burner 400, the mixed gas sprayed by the four burners 400 can strengthen the circulation disturbance of the gas in the kiln, so that the atmosphere in the kiln can reach uniformity faster. In this embodiment, the opening of each gas pipeline is determined according to each temperature signal, and the corresponding opening control signal is sent to the gas valve actuator 200 on each gas pipeline according to the opening of each gas pipeline; it can realize the precise adjustment of the temperature in the kiln 10; through the dynamic control of time and space, the uniformity and stability of the temperature of the kiln 10 are improved, and the firing quality of the kiln 10 is improved.

[0040] As an optional embodiment, the PLC 100 determines whether the internal temperature of the kiln 10 is uniform according to each temperature signal, including:

[0041] It is determined whether the temperature value of each temperature signal is within a preset temperature range. If so, it is determined that the internal temperature of the kiln 10 is uniform; otherwise, it is determined that the internal temperature of the kiln 10 is non-uniform.

[0042] As an optional embodiment, each of the pipelines connected to the gas valve actuator 200 includes at least one pipeline for conveying gas and at least one pipeline for conveying combustion-supporting air, and the opening of each gas pipeline is determined according to each temperature signal to adjust the internal atmosphere of the kiln 10 to an oxidizing atmosphere, including:

[0043] The valve opening ratio of the gas valve actuator 200 to control the pipeline for conveying gas and the pipeline for conveying combustion air is determined according to the oxidizing atmosphere, and the opening of each gas pipeline is determined according to the valve opening ratio.

[0044] In the embodiment provided by the present invention, due to the different heights of the burner 400, an up-down drop distribution can be formed. The mixed gas ejected by the burner 400 at different heights can strengthen the circulation disturbance of the gas in the kiln. When the burner 400 is dynamically controlled according to the temperature feedback from the temperature sensor 300, a certain airflow can be formed in the kiln 10, so that the temperature in the kiln 10 is more uniform, and the oxidation atmosphere in the kiln reaches uniformity faster. After the temperature sensor 300 measures the temperature in the kiln, the temperature signal is transmitted to the PLC 100. The PLC 100 sends a corresponding control command to the two gas valve actuators 200 for self-adjustment according to the temperature signal. After receiving the control command sent by the PLC 100, the two gas valve actuators 200 perform self-adjustment of the opening. In this way, the regulation and control of the gas and the auxiliary gas entering the burner 400 through the gas pipeline is realized, thereby improving the combustion efficiency of the gas and ultimately improving the firing quality of the kiln 10. The kiln 10 can also be monitored in real time through the touch screen 500.

[0045] An embodiment of the present disclosure further provides a temperature control system for a shuttle kiln 10, comprising a PLC 100, wherein the PLC 100 is connected to at least two gas valve actuators 200, each of the gas valve actuators 200 is connected to a plurality of gas pipelines, the end of each of the gas pipelines extends to the interior of the kiln 10, and a burner 400 or a temperature sensor 300 is disposed at the end of each of the gas pipelines; each burner 400 has a different height; the temperature sensor 300 is connected to the PLC 100;

[0046] The PLC 100 includes a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the temperature control method of the shuttle kiln 10 described in any one of the above items is implemented.

[0047] As an optional embodiment, the temperature sensor 300 adopts an S-type thermocouple.

[0048] As an optional embodiment, the PLC100 adopts the Omron CP1H series programmable controller.

[0049] As an optional embodiment, the system further includes a touch screen 500 connected to the PLC 100 .

[0050] As an optional embodiment, the touch screen 500 adopts the Wellentone MT8121iE TPC.

[0051] Although the description of the present invention has been quite detailed and specifically describes several described embodiments, it is not intended to be limited to any of these details or embodiments or any particular embodiment, but should be regarded as providing a broad possible interpretation of these claims by reference to the appended claims, taking into account the prior art, so as to effectively cover the intended scope of the present invention. In addition, the above description of the present invention is based on the embodiments foreseeable by the inventor, and its purpose is to provide a useful description, and those non-substantial changes to the present invention that have not yet been foreseen may still represent equivalent changes to the present invention.

Claims

1. A temperature control method for a shuttle kiln, characterized in that: The method is applied to a temperature control system of a shuttle kiln, the system comprises a PLC, the PLC is connected to at least two gas valve actuators, each of the gas valve actuators is connected to a plurality of gas pipelines, the end of each gas pipeline extends to the interior of the kiln, and a burner or a temperature sensor is arranged at the end of each gas pipeline; each burner has a different height; the temperature sensor is connected to the PLC; The method comprises the following steps: Step S100, PLC obtains the temperature signal obtained by each temperature sensor detecting the inside of the kiln; Step S200, the PLC determines whether the internal temperature of the kiln is uniform according to each temperature signal; Step S300: If the PLC determines that the internal temperature of the kiln is uneven, the opening of each gas pipeline is determined according to each temperature signal to adjust the internal atmosphere of the kiln to an oxidizing atmosphere; Step S400, the PLC sends a corresponding opening control signal to the gas valve actuator on each gas pipeline according to the opening of each gas pipeline; Step S500: the gas valve actuator adjusts the opening after receiving the opening control signal sent by the PLC to adjust the ratio of gas and air entering the burner; The PLC determines whether the internal temperature of the kiln is uniform according to each temperature signal, including: Determine whether the temperature value of each temperature signal is within a preset temperature range, if so, determine that the internal temperature of the kiln is uniform, otherwise determine that the internal temperature of the kiln is uneven; The pipelines connected to each of the gas valve actuators include at least one pipeline for conveying gas and at least one pipeline for conveying combustion-supporting air, and the opening of each gas pipeline is determined according to each temperature signal to adjust the internal atmosphere of the kiln to an oxidizing atmosphere, including: The valve opening ratio of the gas valve actuator to control the pipeline for conveying gas and the pipeline for conveying combustion air is determined according to the oxidizing atmosphere, and the opening of each gas pipeline is determined according to the valve opening ratio.

2. A temperature control system for a shuttle kiln, characterized in that: It includes a PLC, the PLC is connected to at least two gas valve actuators, each of the gas valve actuators is connected to a plurality of gas pipelines, the end of each gas pipeline extends to the interior of the kiln, and a burner or a temperature sensor is arranged at the end of each gas pipeline; each burner has a different height; the temperature sensor is connected to the PLC; The PLC includes a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the temperature control method of the shuttle kiln according to claim 1 is implemented.

3. The temperature control system of a shuttle kiln according to claim 2, characterized in that: The temperature sensor adopts an S-type thermocouple.

4. The temperature control system of a shuttle kiln according to claim 2, characterized in that: The PLC adopts Omron CP1H series programmable controller.

5. The temperature control system of a shuttle kiln according to claim 2, characterized in that: The system also includes a touch screen connected to the PLC.

6. The temperature control system of a shuttle kiln according to claim 5, characterized in that: The touch screen adopts Wellentong MT8121iE TPC.

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