Preparation method of nanofluidic chip based on carbon nanotubes

Abstract

The invention provides a high-precision processing method for a nano channel based on a carbon nano tube, a corresponding application and a product. The processing method comprises the following steps: etching a mark on a substrate, growing a carbon nano tube horizontal array, protecting a required carbon nano tube by photoresist, etching the carbon nano tube by oxygen plasma, constructing a micro-channel by photoetching, breaking the carbon nano tube, bonding PDMS and installing a liquid inlet tube and a liquid outlet tube. The method is high in machining precision, easy to operate, high in compatibility with a traditional technology and large in designable space, the prepared nano-channel has the high length-diameter ratio and has good uniformity and stability in the axis direction of the nano-tube, the minimum size can be reduced to 0.4 nm, the size is accurate and controllable, the sealing performance is good, and the method is suitable for large-scale production. When a fluid medium moves along the nano channel, liquid leakage is not prone to occurring.

Description

Technical field

[0001] The present application belongs to the field of biomedical materials, in particular, the present application relates to a high-precision machining method based on carbon nanotubes and its use in biomedical fields. Background technique

[0002] The nanochannel has a wide range of applications in multiple fields, such as biosensor, nano-drug development, nanofluidic chip, high heat flow density chip, and the like can be used for viruses and biological macromolecular detection. Whether it is a current change in the detection or the precise delivery and detection of the drug, it is required to have good uniformity (generally referring to the height uniformity of the nanochannel length), sealing property, and economy. High letter to noise ratio and practical value.

[0003] Currently used nanochannel preparation methods include traditional photolithography, high energy beam processing, nano-compact photolithography, etc .:

[0004] Conventional photolithography,...

Examples

Embodiment 1

[0042] Example 1 Basic preparation process of nano flow control chip

[0043] The basic preparation process of the nanofluid chip includes the following steps:

[0044] Step 1, in Si / Sio 2 On-chip etch mark;

[0045] Step 2, in etching good markers Si / Sio 2 Growing carbon nanotube horizontal array on a piece;

[0046] Step three, protect the needed carbon nanotubes by photoresist;

[0047] Step 4, eliminate other excess carbon nanotubes to etiogenize the oxygen plasma;

[0048] Step 5, by photolithography, two separate SU-8 micro-track is constructed on the carbon nanotube;

[0049] Step 6. Use FIB precision etching technology to interrupt both ends of the carbon nanotubes;

[0050] Step 7. The pDMS of a pre-punched PDMS is bonded to the surface of the SU-8 microoflow;

[0051] Step 8. Insert the liquid pipe and the liquid pipe in the reserved punch, and the electrode can be inserted into the liquid opening if the electrical measurement is required.

Embodiment 2

[0052]Example 2 The process of protecting the required carbon nanotubes by photoresist

[0053] Huysis: This process uses AZ 1500 4.4CP lithographic positive glue, verification table, in order to obtain a thickness of 1 um, the speed is set to 500 rpm 10s, and then 2000 rpm 30s.

[0054] Front baking: baked for 1 min at 100 ° C above the hot plate.

[0055] Exposure: G-line contact exposure machine exposure 5s.

[0056] Development: Soak the substrate in the sink with AZ300MIF (2.38%) for 1 min.

[0057] Cleaning: Clean 30s with deionized water.

Embodiment 3

[0058] Example 3 The process of constructing micro tracking

[0059] Homorite: Add the SU-8 2050 lithography negatively to the substrate, and the substrate is attached to the hierarchy machine for a period of time. According to the structure of the thickness 50 um, the speed is set to 500 rpm 10s, and then 3000 rpm 30s.

[0060] Front baking: It was baked at 65 ° C for 4 min on the hot plate, and then baked 9 min at 95 ° C. A piece of filter paper is then placed in a large plastic culture dish, and the hot silicon wafer is placed on the filter paper to room temperature.

[0061] Exposure: Contactless exposure machine exposure 20s.

[0062] After the hot plate, it was baked at 65 ° C for 2 min first, then baked at 95 ° C for 7 min. A piece of filter paper is then placed in a large plastic culture dish, and the hot silicon wafer is placed on the filter paper to room temperature.

[0063] Development: It is completely immersed in the developer for 7 minutes, and then the Fresh develo...

Technical field

[0001] The present application belongs to the field of biomedical materials, in particular, the present application relates to a high-precision machining method based on carbon nanotubes and its use in biomedical fields. Background technique

[0002] The nanochannel has a wide range of applications in multiple fields, such as biosensor, nano-drug development, nanofluidic chip, high heat flow density chip, and the like can be used for viruses and biological macromolecular detection. Whether it is a current change in the detection or the precise delivery and detection of the drug, it is required to have good uniformity (generally referring to the height uniformity of the nanochannel length), sealing property, and economy. High letter to noise ratio and practical value.

[0003] Currently used nanochannel preparation methods include traditional photolithography, high energy beam processing, nano-compact photolithography, etc .:

[0004] Conventional photolithography,...

Examples

Embodiment 1

[0042] Example 1 Basic preparation process of nano flow control chip

[0043] The basic preparation process of the nanofluid chip includes the following steps:

[0044] Step 1, in Si / Sio 2 On-chip etch mark;

[0045] Step 2, in etching good markers Si / Sio 2 Growing carbon nanotube horizontal array on a piece;

[0046] Step three, protect the needed carbon nanotubes by photoresist;

[0047] Step 4, eliminate other excess carbon nanotubes to etiogenize the oxygen plasma;

[0048] Step 5, by photolithography, two separate SU-8 micro-track is constructed on the carbon nanotube;

[0049] Step 6. Use FIB precision etching technology to interrupt both ends of the carbon nanotubes;

[0050] Step 7. The pDMS of a pre-punched PDMS is bonded to the surface of the SU-8 microoflow;

[0051] Step 8. Insert the liquid pipe and the liquid pipe in the reserved punch, and the electrode can be inserted into the liquid opening if the electrical measurement is required.

Embodiment 2

[0052]Example 2 The process of protecting the required carbon nanotubes by photoresist

[0053] Huysis: This process uses AZ 1500 4.4CP lithographic positive glue, verification table, in order to obtain a thickness of 1 um, the speed is set to 500 rpm 10s, and then 2000 rpm 30s.

[0054] Front baking: baked for 1 min at 100 ° C above the hot plate.

[0055] Exposure: G-line contact exposure machine exposure 5s.

[0056] Development: Soak the substrate in the sink with AZ300MIF (2.38%) for 1 min.

[0057] Cleaning: Clean 30s with deionized water.

Embodiment 3

[0058] Example 3 The process of constructing micro tracking

[0059] Homorite: Add the SU-8 2050 lithography negatively to the substrate, and the substrate is attached to the hierarchy machine for a period of time. According to the structure of the thickness 50 um, the speed is set to 500 rpm 10s, and then 3000 rpm 30s.

[0060] Front baking: It was baked at 65 ° C for 4 min on the hot plate, and then baked 9 min at 95 ° C. A piece of filter paper is then placed in a large plastic culture dish, and the hot silicon wafer is placed on the filter paper to room temperature.

[0061] Exposure: Contactless exposure machine exposure 20s.

[0062] After the hot plate, it was baked at 65 ° C for 2 min first, then baked at 95 ° C for 7 min. A piece of filter paper is then placed in a large plastic culture dish, and the hot silicon wafer is placed on the filter paper to room temperature.

[0063] Development: It is completely immersed in the developer for 7 minutes, and then the Fresh develo...

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