Polishing solution circulating equipment for surface processing

Abstract

The invention relates to the technical field of experimental analysis, in particular to surface processing polishing solution circulating equipment which comprises an experimental instrument body, a platform is arranged at the upper end of the experimental instrument body, the middle of the upper end face of the platform is sunken downwards to form a functional groove, a solution feeding part is arranged on the inner wall of the functional groove, a U-shaped frame is installed at the right end of the platform, and a solution feeding tank is arranged at the upper end of the U-shaped frame. A functional cylinder is arranged at the top end of the interior of the U-shaped frame, a liquid outlet pipe is installed in the middle of the upper end of the functional cylinder in a communicating mode, the other end of the liquid outlet pipe is communicated with the lower end of the liquid feeding tank, a piston is slidably connected into the functional cylinder, and a liquid suction pipe is installed at the rear end of the functional cylinder in a communicating mode; by means of the design, the polishing liquid can be dripped and fed, the probability that the polishing liquid is wasted due to factors such as splashing is effectively reduced, the polishing effect is effectively guaranteed, and the utilization rate of the polishing liquid is effectively guaranteed.

Description

Technical Field

[0001] The invention relates to a polishing liquid circulation device for surface processing, belonging to the technical field of experimental analysis. Background Art

[0002] In order to analyze the failure phenomenon of semiconductors such as optical components, it is generally necessary to solve the observability and testability of the multi-layer structure of the semiconductor itself when performing failure analysis. Polishing and de-layering are generally used to assist failure analysis operations. Polishing equipment and polishing liquid are generally used in combination to perform de-layering operations. At present, when the polishing equipment is in use, the polishing liquid is generally delivered to the polishing position by pumping. However, the pumping method makes the polishing liquid delivery speed faster, which makes it easy for a large impact force to occur between the polishing liquid and the polishing position, resulting in a high probability of random splashing of the polishing liquid, and the splashing polishing liquid is easy to pollute the working environment and cause waste of the polishing liquid. Traditionally, an outer cover is used to block the splashing polishing liquid. Although this method blocks the splashing polishing liquid, the splashing polishing liquid is easy to adhere to the inner wall of the outer cover, making it impossible to perform polishing operations with the splashing polishing liquid, which still causes waste of polishing liquid, affects the polishing effect, and has poor utilization of the polishing liquid. Summary of the invention

[0003] In view of the problems in the prior art, the present invention provides a polishing liquid circulation device for surface processing.

[0004] The technical solution adopted by the present invention to solve its technical problems is: a polishing liquid circulation device for surface processing, comprising an experimental instrument body, a platform is arranged at the upper end of the experimental instrument body, the middle position of the upper end surface of the platform is depressed downward to form a functional groove, an upper liquid part is arranged on the inner wall of the functional groove, a U-shaped frame is installed at the right end of the platform, and the U-shaped frame is arranged vertically, an upper liquid tank is arranged at the upper end of the U-shaped frame, and the upper liquid tank is located on the upper side of the platform, the lower left end of the upper liquid tank is connected to and installed with an upper liquid pipe, and the other end of the upper liquid pipe is connected and arranged with the upper liquid part, a functional cylinder is arranged at the top end of the U-shaped frame, a liquid outlet pipe is connected and installed in the middle of the upper end of the functional cylinder, and a first one-way valve is installed on the liquid outlet pipe, the other end of the liquid outlet pipe is connected and arranged with the lower end of the upper liquid tank, a piston is slidably connected in the functional cylinder, a liquid pipe is connected and installed at the rear end of the functional cylinder, and the position where the liquid pipe and the functional cylinder are connected is located on the upper side of the piston;

[0005] The other end of the pipette is connected to a liquid storage part, and the pipette is equipped with a second one-way valve. The liquid storage part is installed at the right end of the main body of the experimental instrument, and the liquid storage part is located on the rear side of the U-shaped frame. The rear end of the functional cylinder is connected to a recovery part, and the communication position between the recovery part and the functional cylinder is located on the lower side of the piston. The other end of the recovery part is connected to the liquid storage part. A liquid return part is installed at the right end of the main body of the experimental instrument, and the liquid return part is located on the front side of the U-shaped frame. The liquid return part is connected to the functional groove, and the other end of the liquid return part is connected to the front end of the functional cylinder, and the communication position between the liquid return part and the functional cylinder is located on the lower side of the piston. A straight rod is installed in the middle position of the lower end of the piston, and the straight rod extends out of the lower side of the functional cylinder. A driving part is installed at the lower end of the straight rod. A lifting device is set at the lower end of the U-shaped frame, and the movable part of the lifting device is connected to the lower end of the driving part.

[0006] Furthermore, the liquid return part includes a recovery box, which is installed at the right end of the main body of the experimental instrument, and the recovery box is located on the front side of the U-shaped frame. The upper right end of the recovery box is connected to a recovery pipe, and the other end of the recovery pipe extends to the bottom end of the functional slot. A filter is installed inside the recovery box, and the filter is inclined with the left lower and the right higher. The right end of the recovery box is connected to a liquid return pipe, and the connection position between the liquid return pipe and the recovery box is located on the lower side of the filter. The other end of the liquid return pipe is connected to the functional cylinder, and the connection position between the liquid return pipe and the functional cylinder is located on the lower side of the piston. A third one-way valve is installed on the liquid return pipe.

[0007] Further, the liquid storage part includes a placement box, which is installed at the right end of the main body of the experimental instrument, and the placement box is located at the rear side of the U-shaped frame, the bottom end of the placement box is rotatably connected to the positioning cylinder, the bottom end of the positioning cylinder is installed with an elastic member, the upper end of the elastic member is provided with a top plate, and the top plate is slidably connected in the positioning cylinder, the upper end of the top plate is in contact with the polishing liquid barrel, and the polishing liquid barrel extends out of the upper side of the positioning cylinder;

[0008] The upper end of the polishing liquid barrel is threadedly connected to the end cover, and the polishing liquid barrel extends into the end cover, the other end of the suction pipe passes through the placement box and the end cover and extends into the polishing liquid barrel, the other end of the suction pipe is connected to the installation auxiliary pipe, and the auxiliary pipe is located in the polishing liquid barrel.

[0009] Further, the recovery part includes a functional tube, which is arranged at the upper end of the placement box and is located at the lower side of the platform. A conical tube is installed on the inner wall of the polishing liquid barrel, and the conical tube is arranged to be narrow at the top and wide at the bottom. The conical tube is located outside the auxiliary tube. The lower end of the functional tube passes through the placement box and the end cover and extends into the polishing liquid barrel. The functional tube is located outside the liquid suction tube, and the lower end opening of the functional tube extends between the outer end of the conical tube and the inner wall of the polishing liquid barrel.

[0010] The outer end surface of the conical cylinder is recessed inward to form a plurality of through grooves, and the plurality of through grooves are all fitted on the inner wall of the polishing liquid barrel. A connecting pipe is arranged at the rear end of the lower part of the functional cylinder, and the connecting position between the connecting pipe and the functional cylinder is located on the lower side of the piston. A fourth one-way valve is installed on the connecting pipe, and the other end of the connecting pipe is connected to the functional pipe, and the connecting position between the connecting pipe and the functional pipe is located on the upper side of the placement box.

[0011] Further, the driving member includes an L-shaped plate, the upper end of the transverse portion of the L-shaped plate is connected to the lower end of the straight rod, and the lower end of the transverse portion of the L-shaped plate is connected to the movable part of the lifting device, the left end of the vertical portion of the L-shaped plate is slidably connected to the right end of the transverse portion located on the upper side of the U-shaped frame, and the vertical portion of the L-shaped plate is located on the right side of the functional cylinder;

[0012] A rack is installed at the front end of the vertical part of the L-shaped plate, and the front end of the rack is engaged with a first gear. A rotating shaft is installed at the left end of the first gear, and the rotating shaft is located on the front side of the U-shaped frame. The rotating shaft is rotatably connected to the upper end of the platform through a bearing seat. A second gear is set at the left end of the rotating shaft, and the lower end of the second gear is engaged with a ring gear, and the ring gear is located on the upper side of the platform.

[0013] Furthermore, the upper liquid part includes an annular cylinder, which is rotatably connected to the inner wall of the functional groove and extends out of the upper side of the functional groove. The outer end of the annular cylinder is connected to the inner wall of the annular gear. An annular tube is arranged on the inner wall of the annular cylinder. The upper end of the annular tube is connected to an upper liquid pipe, and the other end of the upper liquid pipe is connected to an upper liquid tank. A plurality of flexible tubes are equidistantly connected to the inner wall of the annular tube, and the other ends of the plurality of flexible tubes are connected to drip heads.

[0014] Furthermore, the lower end of the functional tube is threadedly connected to a plug, and the plug is slidably connected to the outer end of the straight rod, the inner wall of the plug is recessed outward to form a sealing groove, a sealing member is assembled on the sealing groove, and the sealing member is located on the outer end of the straight rod.

[0015] Beneficial effects of the present invention:

[0016] 1. Through the first electric push rod, the L-shaped plate and the straight rod, the piston is moved up and down along the functional cylinder, thereby generating negative pressure in the functional cylinder, and under the action of the negative pressure, the mixed polishing liquid in the polishing liquid barrel is continuously transported to the upper liquid tank, and the mixed polishing liquid temporarily stored in the upper liquid tank will drip along the upper liquid pipe, the annular pipe, multiple flexible pipes and multiple drip heads to the polishing position, realizing the dripping operation of the polishing liquid, effectively reducing the probability of waste of the polishing liquid due to factors such as splashing, effectively ensuring the polishing effect, and effectively ensuring the utilization rate of the polishing liquid.

[0017] 2. By using the L-shaped plate, the rack, the first gear, the rotating shaft and the second gear, the annular gear is made to perform a circular motion within a certain range, and then the annular cylinder is made to perform a circular motion within a corresponding range, and then the annular tube, multiple drip heads and multiple flexible tubes are made to perform a circular motion within a certain range, so as to realize the fan-shaped motion dripping and liquid application operation on the polishing position, effectively reducing the probability of the polishing position having a local area without liquid application due to factors such as dripping of the polishing liquid, effectively ensuring the polishing effect, and achieving the linkage between the circular motion and the liquid application motion, and effectively reducing the equipment cost.

[0018] 3. The recovered polishing liquid is purified and recovered through the functional groove, recovery pipe, recovery box, filter, piston, return pipe and functional cylinder and other components, and the conical cylinder and multiple through grooves are used to purify the recovered polishing liquid so that it flows downward along the inner wall of the polishing liquid barrel. At the same time, when the mixed gas is discharged in time through the functional pipe, the polishing liquid is recovered and reused, so that the polishing liquid can be recycled, effectively avoiding the collision between the recovered polishing liquid and the polishing liquid in the polishing liquid barrel, effectively reducing the probability of bubbles in the polishing liquid in the polishing liquid barrel due to recovery operations, and effectively ensuring the polishing effect.

[0019] 4. Through multiple second electric push rods, multiple arc frames, multiple T-shaped columns, multiple flexible tubes and multiple arms, on the one hand, multiple drip heads are made to circulate inward and outward, realizing the dripping and liquid application operation of the polishing position by combining diffusion movement and fan-shaped movement, further effectively reducing the probability of the polishing position having no liquid application due to factors such as dripping of polishing liquid, and effectively ensuring the polishing effect. On the other hand, the moving drip heads are restricted, effectively reducing the probability of the drip heads having position changes due to factors such as movement operations, effectively reducing the probability of the dripping polishing liquid not dripping onto the polishing position, effectively ensuring the polishing effect, and effectively ensuring the utilization rate of the polishing liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Other features, objects and advantages of the present invention will become more apparent from the detailed description of non-limiting embodiments made with reference to the following drawings:

[0021] Figure 1 It is a structural schematic diagram of a polishing liquid circulation device for surface processing of the present invention;

[0022] Figure 2 A three-dimensional diagram of a polishing liquid circulation device for surface processing according to the present invention;

[0023] Figure 3 A cross-sectional view of a polishing liquid circulation device for surface processing according to the present invention;

[0024] Figure 4 for Figure 3 Enlarged view of part A in the middle;

[0025] Figure 5 It is an assembly diagram of a placement box and a functional cylinder in a polishing liquid circulation device for surface processing of the present invention;

[0026] Figure 6 A cross-sectional view of a placement box in a polishing liquid circulation device for surface processing of the present invention;

[0027] Figure 7 It is an assembly diagram of a ring gear, a ring cylinder, a ring tube, a dripping head and a flexible tube in a polishing liquid circulation device for surface processing of the present invention;

[0028] Figure 8 A three-dimensional diagram of a platform in a polishing liquid circulation device for surface processing of the present invention;

[0029] Fig. 9 It is a cross-sectional view of a recovery box in a polishing liquid circulation device for surface processing of the present invention;

[0030] Fig.10 It is a schematic diagram of another embodiment of a polishing liquid circulation device for surface processing of the present invention;

[0031] Fig.11 It is an assembly diagram of a ring pipe, a dripping head, a flexible pipe, an arc frame, a second electric push rod, a support arm and a T-shaped column in a polishing liquid circulation device for surface processing of the present invention;

[0032] Fig.12 The present invention is a three-dimensional diagram of an arc-shaped frame in a polishing liquid circulation device for surface processing.

[0033] In the figure: 1. Experimental instrument body, 2. Platform, 3. Upper liquid tank, 4. U-shaped frame, 5. Recovery box, 6. First electric push rod, 7. Placement box, 8. Function cylinder, 21. Ring gear, 22. Ring cylinder, 23. Ring tube, 24. Drip head, 25. Flexible tube, 26. Upper liquid tube, 27. Function slot, 31. Pipette, 41. Rack, 42. First gear, 43. Rotating shaft, 44. Second gear, 51. Return Liquid pipe, 52, filter screen, 53, recovery pipe, 71, end cover, 72, polishing liquid barrel, 73, auxiliary pipe, 74, positioning cylinder, 75, top plate, 76, elastic member, 77, tapered cylinder, 78, through groove, 81, functional pipe, 82, connecting pipe, 83, L-shaped plate, 84, straight rod, 85, piston, 86, liquid outlet pipe, 201, arc frame, 202, second electric push rod, 203, support arm, 204, T-shaped column. DETAILED DESCRIPTION

[0034] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further explained below in conjunction with specific implementation methods.

[0035] Embodiment 1: Figure 1-Figure 8 As shown, a polishing liquid circulation device for surface processing is provided, including an experimental instrument body 1, a platform 2 is arranged on the upper end of the experimental instrument body 1, and a mounting carrier is provided for components such as a U-shaped frame 4 through the platform 2. The working principle of the experimental instrument body 1 is to make the grinding disc rotate at a high speed and work together with the polishing liquid to polish the surface of optical semiconductors, thereby removing the oxide layer on the upper surface of the semiconductor, and then analyzing and calculating the polished semiconductor, thereby completing the online material performance test operation. The structure and principle of the experimental instrument body 1 are existing public technologies and will not be repeated;

[0036] A functional groove 27 is formed by recessing downward at the middle of the upper end surface of the platform 2. The functional groove 27 provides installation space for components such as the annular tube 22. The annular tube 22 extending from the upper side of the functional groove 27 is rotatably connected to the inner wall of the functional groove 27. The annular tube 22 provides an installation carrier for components such as the annular gear 21. The inner wall of the annular gear 21 on the upper side of the platform 2 is connected to the outer end of the annular tube 22. The annular tube 22 is rotated through the annular gear 21. The annular tube 23 is then set on the inner wall of the annular tube 22. The annular tube 23 provides an installation carrier for the flexible tube 25.

[0037] The upper liquid pipe 26 whose other end is connected to the lower left end of the upper liquid tank 3 is connected and installed on the upper end of the annular pipe 23. The annular pipe 23 and the upper liquid tank 3 are connected and arranged through the upper liquid pipe 26. A plurality of flexible pipes 25 are connected and arranged on the inner wall of the annular pipe 23 at equal intervals. The plurality of flexible pipes 25 are used in combination to divert the polishing liquid in the annular pipe 23. A plurality of dripping heads 24 are respectively connected and installed on the other ends of the plurality of flexible pipes 25. The plurality of dripping heads 24 are used in combination to apply liquid to the surface of the grinding disc.

[0038] The vertical part of the vertically arranged U-shaped frame 4 is installed on the right end of the platform 2, and the upper liquid tank 3 and other components are provided with a mounting carrier through the U-shaped frame 4, and the upper liquid tank 3 located on the upper side of the platform 2 is arranged on the upper end of the U-shaped frame 4, and the polishing liquid is temporarily stored through the upper liquid tank 3, and then the functional cylinder 8 is arranged on the top of the inner part of the U-shaped frame 4, and the piston 85 and other components are provided with a mounting carrier through the functional cylinder 8, and the liquid outlet pipe 86 equipped with a first one-way valve and the other end of which is connected to the lower end of the upper liquid tank 3 is connected and installed on the middle part of the upper end of the functional cylinder 8, and the functional cylinder 8 and the upper liquid tank 3 are connected through the liquid outlet pipe 86;

[0039] The piston 85 is slidably connected in the functional cylinder 8, and the polishing liquid in the functional cylinder 8 is squeezed into the liquid outlet pipe 86 through the piston 85, and the suction pipe 31, which is located on the upper side of the piston 85 and is connected to the functional cylinder 8 and is equipped with a second one-way valve, and the other end of which passes through the placement box 7 and the end cover 71 and extends into the polishing liquid barrel 72, is connected and installed on the rear end of the functional cylinder 8, and the functional cylinder 8 and the polishing liquid barrel 72 are connected through the suction pipe 31. Then, the straight rod 84 extending from the lower side of the functional cylinder 8 is installed in the middle position of the lower end of the piston 85, and the piston 85 is moved up and down through the straight rod 84, and the auxiliary pipe 73 located in the polishing liquid barrel 72 is connected and arranged with the other end of the suction pipe 31, and the polishing liquid on the lower side of the polishing liquid barrel 72 can be extracted through the auxiliary pipe 73;

[0040] The placing box 7 located at the rear side of the U-shaped frame 4 is installed at the right end of the experimental instrument body 1, and the placing box 7 is used to provide installation space for the positioning cylinder 74 and other components, and the positioning cylinder 74 is rotatably connected to the bottom end of the placing box 7, and the polishing liquid barrel 72 is positioned and placed through the positioning cylinder 74, and then the elastic member 76 is installed on the bottom end of the positioning cylinder 74, and the top plate 75 is returned to its original position through the elastic member 76. The elastic member 76 can be a spring, and the top plate 75 slidably connected in the positioning cylinder 74 is set on the upper end of the elastic member 76, and the polishing liquid barrel 72 is lifted through the top plate 75, and then the polishing liquid barrel 72 extending from the upper side of the positioning cylinder 74 and extending into the end cover 71 and threadedly connected to the lower end of the end cover 71 is attached to the upper end of the top plate 75, and a storage container is provided for the polishing liquid through the polishing liquid barrel 72, and the opening of the polishing liquid barrel 72 is blocked by the end cover 71;

[0041] The left end of the vertical part is slidably connected to the right end of the horizontal part located on the upper side of the U-shaped frame 4, and the upper end of the horizontal part of the L-shaped plate 83 whose vertical part is located on the right side of the functional tube 8 is connected to the lower end of the straight rod 84. The L-shaped plate 83 is used to provide a mounting carrier for the rack 41, and the fixed part of the lifting device whose movable part is connected to the lower end of the horizontal part of the L-shaped plate 83 is set on the lower end of the U-shaped frame 4. The L-shaped plate 83 is driven to move up and down through the lifting device, and the lifting device can use the first electric push rod 6;

[0042] The rack 41 is installed on the front end of the vertical part of the L-shaped plate 83. The first gear 42 is rotated through the rack 41, and the first gear 42 is meshed with the front end of the rack 41. The rotating shaft 43 is rotated through the first gear 42. Then, the rotating shaft 43 located on the front side of the U-shaped frame 4 and rotatably connected to the upper end of the platform 2 through the bearing seat is installed on the left end of the first gear 42. The rotating shaft 43 is used to provide a mounting carrier for the first gear 42 and other components, and the second gear 44 with the lower end meshing with the ring gear 21 is set on the left end of the rotating shaft 43. The ring gear 21 is rotated through the second gear 44.

[0043] Before use, first put an appropriate amount of polishing liquid into the polishing liquid barrel 72, then add corrosion inhibitors such as organic amines into the polishing liquid barrel 72 in a certain order, and mix the polishing liquid and the corrosion inhibitor, so that the mixed polishing liquid has a fast chemical polishing speed, and has a good protective effect on semiconductor silicon and other metals, preventing oxidation from occurring on the polishing surface, effectively ensuring the polishing effect, and effectively solving the problem that the current polishing liquid is easy to corrode optical semiconductors or cannot achieve smoothness during polishing operations;

[0044] Then, the polishing liquid barrel 72 storing the mixed polishing liquid is placed in the placement box 7, and inserted into the positioning cylinder 74 and fits the upper end of the top plate 75, and at the same time, the polishing liquid barrel 72 is pressed downward to make the top plate 75 move downward along the positioning cylinder 74, thereby compressing the elastic member 76, so that the elastic member 76 generates an elastic force, thereby positioning and placing the polishing liquid barrel 72, and then under the elastic force of the elastic member 76, the polishing liquid barrel 72 moves up and contacts the lower end of the end cover 71, and then the polishing liquid barrel 72 is rotated to make the polishing liquid barrel 72 and the end cover 71 threadedly connected. At this time, the auxiliary pipe 73 is located in the polishing liquid barrel 72, so that the polishing liquid barrel 72 is positioned and installed, and the polishing liquid barrel 72 is conveniently disassembled and assembled for easy use;

[0045] When in use, firstly, the plurality of flexible tubes 25 are bent according to the size of the optical semiconductor to be polished, so that the plurality of drip heads 24 are moved to a suitable position, and the outlet of the drip head 24 faces the polishing position, so as to adjust the dripping position, effectively satisfy the liquid application operation for semiconductors of different sizes, and improve the scope of use, and then the first electric push rod 6 is started to drive the L-shaped plate 83 and the straight rod 84 to move up and down in a circular motion, thereby causing the piston 85 to move up and down in a circular motion along the functional cylinder 8,

[0046] The piston 85 moves downward, so that negative pressure is generated in the space above the piston 85 in the functional cylinder 8, and under the action of the negative pressure, the mixed polishing liquid in the polishing liquid barrel 72 enters the functional cylinder 8 along the auxiliary pipe 73 and the liquid suction pipe 31, and then the piston 85 moves upward by using the first electric push rod 6, the L-shaped plate 83 and the straight rod 84, so that the mixed polishing liquid in the functional cylinder 8 enters the upper liquid tank 3 through the liquid outlet pipe 86. Therefore, the piston 85 circulates up and down, which causes the mixed polishing liquid in the polishing liquid barrel 72 to be continuously transported to the upper liquid tank 3;

[0047] The mixed polishing liquid temporarily stored in the upper liquid tank 3 enters the annular tube 23 along the upper liquid pipe 26, and then the mixed polishing liquid in the annular tube 23 is divided into a plurality of flexible tubes 25, and then the mixed polishing liquid in the flexible tube 25 is dripped to the polishing position through the dripping head 24, so as to realize the dripping operation of the polishing liquid, effectively reduce the probability of waste of the polishing liquid due to splashing and other factors, effectively ensure the polishing effect, and effectively ensure the utilization rate of the polishing liquid;

[0048] During the up and down circular movement of the L-shaped plate 83, the rack 41 will move up and down, thereby causing the first gear 42 to rotate forward and reversely, thereby causing the rotating shaft 43 to rotate forward and reversely, thereby causing the second gear 44 to rotate forward and reversely. Since the second gear 44 and the ring gear 21 are meshed with each other, the forward and reverse rotation of the second gear 44 will cause the ring gear 21 to perform circular motion within a certain range.

[0049] The circular motion of the annular gear 21 within a certain range will cause the annular cylinder 22 to perform a circular motion within a corresponding range, and then the annular tube 23 to perform a circular motion within a certain range, so that the multiple drip heads 24 and the multiple flexible tubes 25 can perform a circular motion within a certain range, thereby realizing a fan-shaped motion-type dripping and liquid application operation on the polishing position, effectively reducing the probability of the polishing position having a local area without liquid application due to factors such as dripping of the polishing liquid, effectively ensuring the polishing effect, and achieving linkage between the circular motion and the liquid application motion, thereby effectively reducing the equipment cost.

[0050] Embodiment 2: Using components such as an upper liquid tank 3, a functional cylinder 8, an annular cylinder 22, an annular tube 23, a dripping head 24, a flexible tube 25, an upper liquid tube 26, a liquid suction tube 31 and a piston 85, the polishing liquid is dripped and loaded, and the functional cylinder 8 and the piston 85 are used to recover the recovery liquid, so that the polishing liquid can be recycled. However, the dripping of the upper liquid will slow down the flow rate of the recovered polishing liquid, which may cause the recovered polishing liquid to collide with the polishing liquid in the polishing liquid barrel 72 during the recovery process. In addition, the slow recovery operation may easily cause gas to be mixed in the recovery tube 53, which may cause the gas to be easily filled into the polishing liquid in the polishing liquid barrel 72 after recovery, resulting in a high probability of bubbles in the polishing liquid in the polishing liquid barrel 72.

[0051] In order to solve the above problems, Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 , Figure 6 , Figure 8 and Fig. 9 As shown, the plug slidably connected to the outer end of the straight rod 84 is threadedly connected to the lower end of the functional tube 8, and the opening of the functional tube 8 is blocked by the plug. The inner wall surface of the plug is recessed outward to form a sealing groove. The sealing groove provides installation space for the seal, and the seal located at the outer end of the straight rod 84 is assembled on the sealing groove. The plug and the straight rod 84 are sealed by the seal. The seal can be an O-ring. The functional tube 81 located at the lower side of the platform 2 and whose lower end opening passes through the placement box 7 and the end cover 71 and extends into between the outer end of the tapered tube 77 and the inner wall of the polishing liquid barrel 72 and is located outside the liquid suction tube 31 is arranged at the upper end of the placement box 7. The connecting tube 82 and the polishing liquid barrel 72 are connected by the functional tube 81.

[0052] A conical cylinder 77 which is arranged to be narrow at the top and wide at the bottom and is located outside the auxiliary tube 73 is installed on the inner wall of the polishing liquid barrel 72. The recovered polishing liquid is collected through the conical cylinder 77. The outer end surface of the conical cylinder 77 is recessed inward to form a plurality of through grooves 78 which fit on the inner wall of the polishing liquid barrel 72. The plurality of through grooves 78 are used in combination to make the polishing liquid collected on the conical cylinder 77 slide downward along the inner wall of the polishing liquid barrel 72. A connecting pipe 82 which is located at the lower side of the piston 85 and is equipped with a fourth one-way valve and whose other end is connected to the functional pipe 81 and is located at the upper side of the placement box 7 is arranged on the lower rear end of the functional cylinder 8. The functional cylinder 8 and the functional pipe 81 are connected through the connecting pipe 82.

[0053] The recovery box 5 located on the front side of the U-shaped frame 4 is installed on the right end of the experimental instrument body 1. Through the recovery box 5, a mounting carrier is provided for components such as the filter 52, and the recovery pipe 53 extending from the other end to the bottom end of the inside of the function slot 27 is connected and installed on the upper end of the right part of the recovery box 5. Through the recovery pipe 53, the function slot 27 and the recovery box 5 are connected. Then, the filter 52 arranged with the left lower and the right higher is installed on the inside of the recovery box 5. The recovered polishing liquid is filtered through the filter 52, and the return pipe 51, which is connected to the recovery box 5 at the lower side of the filter 52 and the other end is connected to the function cylinder 8, and the return pipe 51 equipped with a third one-way valve is connected and arranged on the right end of the recovery box 5. Through the return pipe 51, the recovery box 5 and the function cylinder 8 are connected.

[0054] Before use, the polishing liquid mixed with corrosion inhibitors such as organic amine is first put into the polishing liquid barrel 72, and then the polishing liquid barrel 72 is positioned and installed in the placement box 7. At this time, the auxiliary pipe 73 is located in the polishing liquid barrel 72, and the outlet of the functional pipe 81 is located between the outer end of the conical tube 77 and the inner wall of the polishing liquid barrel 72;

[0055] When in use, the first electric push rod 6, the L-shaped plate 83 and the straight rod 84 are used to make the piston 85 move up and down along the functional cylinder 8, so that the mixed polishing liquid in the polishing liquid barrel 72 is continuously transported to the upper liquid tank 3, and the mixed polishing liquid temporarily stored in the upper liquid tank 3 drips along the upper liquid pipe 26, the annular pipe 23, the multiple flexible pipes 25 and the multiple drip heads 24 to the polishing position.

[0056] The waste liquid generated by polishing will enter the functional tank 27, and then the waste liquid in the functional tank 27 will enter the recovery box 5 through the recovery pipe 53 and drip onto the upper end surface of the filter screen 52. The filter screen 52 will filter the waste liquid, and then filter out the waste debris mixed in the waste liquid, and make the filtered waste liquid fall to the bottom end of the recovery box 5. The filter screen 52 is arranged with the left side lower and the right side higher, so the filtered waste debris will slide to the left along the filter screen 52, so that the waste debris at the filtering position on the filter screen 52 can be cleaned, effectively reducing the probability of blockage at the filtering position on the filter screen 52, and effectively ensuring that the filter screen 52 performs normal filtering operations;

[0057] When the piston 85 moves upward, negative pressure is generated in the space below the piston 85 in the functional cylinder 8. Under the action of the negative pressure, the purified waste liquid inside the lower side of the recovery box 5 enters the functional cylinder 8 along the return pipe 51. When the piston 85 moves downward, the waste liquid in the functional cylinder 8 enters between the outer end of the tapered cylinder 77 and the inner wall of the polishing liquid barrel 72 along the connecting pipe 82 and the functional pipe 81, and then the waste liquid flows downward along the inner wall of the polishing liquid barrel 72 through the multiple through grooves 78.

[0058] At the same time, when gas is transported in the space below the piston 85 in the functional cylinder 8, the transported gas will be directly discharged through the opening on the functional tube 81, so that the polishing liquid can be recovered and reused, thereby recycling the polishing liquid, effectively avoiding collision between the recovered polishing liquid and the polishing liquid in the polishing liquid barrel 72, and effectively reducing the probability of bubbles appearing in the polishing liquid in the polishing liquid barrel 72 due to recovery operations, thereby effectively ensuring the polishing effect.

[0059] Embodiment 3: Using components such as an upper liquid tank 3, a functional cylinder 8, an annular cylinder 22, an annular tube 23, a dripping head 24, a flexible tube 25, an upper liquid tube 26, a suction tube 31 and a piston 85, the polishing liquid is dripped and applied, and through components such as a rack 41, a first gear 42, a rotating shaft 43, a second gear 44, an annular gear 21 and an annular cylinder 22, multiple dripping heads 24 and multiple flexible tubes 25 are made to circulate in a certain range, thereby performing a fan-shaped motion-type dripping and application operation. However, the flexible tube 25 is easily deformed during the movement, resulting in a high probability of the position change of the dripping head 24, resulting in a high probability that the dripping polishing liquid does not drip onto the polishing position.

[0060] In order to solve the above problems, Figure 10-12As shown, the fixed parts of multiple second electric push rods 202 located on the upper side of the annular tube 23 and on the outer side of the upper liquid tube 26 are equidistantly installed on the inner wall of the annular tube 22, and the arc frame 201 is driven to circulate inward or outward through the second electric push rods 202, and the multiple arc frames 201 located on the upper side of the drip heads 24 are respectively installed on the inner ends of the movable parts of the multiple second electric push rods 202, and the movement of the T-shaped column 204 is guided by the arc frame 201, and then the two support arms 203 respectively connected to the upper ends of two adjacent drip heads 24 are both fitted to the lower end of the arc frame 201, and the rod part of the T-shaped column 204, whose rod part passes through the arc frame 201 and whose rod part is in contact with the arc frame 201 and whose transverse part is fitted to the upper end of the arc frame 201, is set on the upper end of the support arm 203, and the arc frame 201 and the support arm 203 are movably connected through the T-shaped column 204.

[0061] When in use, the first electric push rod 6, the L-shaped plate 83 and the straight rod 84 are used to make the piston 85 move up and down along the functional cylinder 8, so that the mixed polishing liquid in the polishing liquid barrel 72 is continuously transported to the upper liquid tank 3, and the mixed polishing liquid temporarily stored in the upper liquid tank 3 drips along the upper liquid pipe 26, the annular pipe 23, the multiple flexible pipes 25 and the multiple drip heads 24 to the polishing position.

[0062] During the upward and downward circular movement of the L-shaped plate 83, the rack 41, the first gear 42, the rotating shaft 43, the second gear 44 and the ring gear 21 are used to make the annular cylinder 22 perform circular motion within a corresponding range, thereby making the annular tube 23 perform circular motion within a certain range, thereby making the plurality of drip heads 24 and the plurality of flexible tubes 25 perform circular motion within a certain range;

[0063] At the same time, multiple second electric push rods 202 are started, thereby driving multiple arc frames 201 to circulate inward and outward, so that multiple T-shaped columns 204 move along the inner cavity of the corresponding arc frames 201, and with the assistance of multiple flexible tubes 25 and multiple supporting arms 203, multiple drip heads 24 circulate inward and outward, realizing the dripping and liquid application operation combining diffusion movement and fan-shaped movement on the polishing position, further effectively reducing the probability of the polishing position having a local area without liquid application due to factors such as dripping of polishing liquid, and effectively ensuring the polishing effect;

[0064] At the same time, the structure formed by multiple second electric push rods 202, multiple arc frames 201, multiple T-shaped columns 204 and multiple support arms 203 will restrict multiple drip heads 24, thereby limiting the moving drip heads 24, effectively reducing the probability of position changes of the drip heads 24 due to factors such as moving operations, and effectively reducing the probability of the dripping polishing liquid not dripping onto the polishing position, effectively ensuring the polishing effect, and effectively ensuring the utilization rate of the polishing liquid.

[0065] Although this specification is described according to implementation modes, not every implementation mode includes only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. A polishing liquid circulation device for surface processing, characterized in that: The experimental instrument comprises an experimental instrument body (1), wherein a platform (2) is arranged at the upper end of the experimental instrument body (1), the middle position of the upper end surface of the platform (2) is recessed downward to form a functional groove (27), and an upper liquid component is arranged on the inner wall of the functional groove (27), a U-shaped frame (4) is installed at the right end of the platform (2), and the U-shaped frame (4) is arranged vertically, an upper liquid tank (3) is arranged at the upper end of the U-shaped frame (4), and the upper liquid tank (3) is located on the upper side of the platform (2), and the lower left end of the upper liquid tank (3) is connected to an upper liquid pipe (26), and the upper liquid pipe (2 6) the other end is connected to the upper liquid part, a functional cylinder (8) is arranged at the top end of the U-shaped frame (4), a liquid outlet pipe (86) is connected to the middle of the upper end of the functional cylinder (8), and a first non-return valve is installed on the liquid outlet pipe (86), the other end of the liquid outlet pipe (86) is connected to the lower end of the upper liquid tank (3), a piston (85) is slidably connected in the functional cylinder (8), a liquid suction pipe (31) is connected to the rear end of the functional cylinder (8), and the position where the liquid suction pipe (31) and the functional cylinder (8) are connected is located on the upper side of the piston (85); The other end of the liquid pipette (31) is connected to a liquid storage component, and a second one-way valve is installed on the liquid pipette (31). The liquid storage component is installed at the right end of the experimental instrument body (1), and the liquid storage component is located at the rear side of the U-shaped frame (4). The rear end of the functional cylinder (8) is connected to a recovery component, and the communication position between the recovery component and the functional cylinder (8) is located at the lower side of the piston (85). The other end of the recovery component is connected to the liquid storage component. The right end of the experimental instrument body (1) is equipped with a liquid return component, and the liquid return component is located at the rear side of the U-shaped frame ( 4) on the front side, the liquid return member is arranged in communication with the functional groove (27), the other end of the liquid return member is arranged in communication with the front end of the functional cylinder (8), and the position where the liquid return member is in communication with the functional cylinder (8) is located at the lower side of the piston (85), a straight rod (84) is installed at the middle position of the lower end of the piston (85), and the straight rod (84) extends out of the lower side of the functional cylinder (8), a driving member is installed at the lower end of the straight rod (84), and a lifting device is arranged at the lower end of the U-shaped frame (4), and the movable part of the lifting device is connected to the lower end of the driving member.

2. The surface processing polishing liquid circulation device according to claim 1, characterized in that: The liquid return member comprises a recovery box (5), the recovery box (5) being installed at the right end of the experimental instrument body (1), and the recovery box (5) being located at the front side of the U-shaped frame (4), the upper right end of the recovery box (5) being connected to a recovery pipe (53), the other end of the recovery pipe (53) extending to the bottom end of the function slot (27), a filter screen (52) being installed inside the recovery box (5), and the filter screen (52) being arranged with an inclination with the left side lower and the right side higher, the right end of the recovery box (5) being connected to a liquid return pipe (51), and the position where the liquid return pipe (51) communicates with the recovery box (5) is located below the filter screen (52), the other end of the liquid return pipe (51) being connected to the function cylinder (8), and the position where the liquid return pipe (51) communicates with the function cylinder (8) is located below the piston (85), and a third one-way valve is mounted on the liquid return pipe (51).

3. The surface processing polishing liquid circulation device according to claim 1, characterized in that: The liquid storage part comprises a placement box (7), the placement box (7) is installed at the right end of the experimental instrument body (1), and the placement box (7) is located at the rear side of the U-shaped frame (4), the bottom end of the placement box (7) is rotatably connected to the positioning cylinder (74), the bottom end of the positioning cylinder (74) is installed with an elastic member (76), the upper end of the elastic member (76) is provided with a top plate (75), and the top plate (75) is slidably connected in the positioning cylinder (74), the upper end of the top plate (75) is in contact with the polishing liquid barrel (72), and the polishing liquid barrel (72) extends out of the upper side of the positioning cylinder (74); The upper end of the polishing liquid barrel (72) is threadedly connected to the end cover (71), and the polishing liquid barrel (72) extends into the end cover (71); the other end of the liquid suction pipe (31) passes through the placement box (7) and the end cover (71) and extends into the polishing liquid barrel (72); the other end of the liquid suction pipe (31) is connected to the installation auxiliary pipe (73), and the auxiliary pipe (73) is located in the polishing liquid barrel (72).

4. The surface processing polishing liquid circulation device according to claim 3, characterized in that: The recovery part comprises a functional tube (81), the functional tube (81) is arranged at the upper end of the placement box (7), and the functional tube (81) is located at the lower side of the platform (2); a conical tube (77) is installed on the inner wall of the polishing liquid barrel (72), and the conical tube (77) is arranged to be narrow at the top and wide at the bottom; the conical tube (77) is located outside the auxiliary tube (73); the lower end of the functional tube (81) passes through the placement box (7) and the end cover (71) and extends into the polishing liquid barrel (72); the functional tube (81) is located outside the liquid suction tube (31), and the lower end opening of the functional tube (81) extends between the outer end of the conical tube (77) and the inner wall of the polishing liquid barrel (72); The outer end surface of the conical cylinder (77) is inwardly recessed to form a plurality of through grooves (78), and the plurality of through grooves (78) are all fitted on the inner wall of the polishing liquid barrel (72). A connecting pipe (82) is arranged at the rear end of the lower part of the functional cylinder (8), and the connecting pipe (82) and the functional cylinder (8) are connected at a position located below the piston (85). A fourth one-way valve is mounted on the connecting pipe (82), and the other end of the connecting pipe (82) is connected to the functional pipe (81), and the connecting pipe (82) and the functional pipe (81) are connected at an upper side of the placement box (7).

5. The surface processing polishing liquid circulation device according to claim 1, characterized in that: The driving member comprises an L-shaped plate (83), the upper end of the transverse portion of the L-shaped plate (83) is connected to the lower end of the straight rod (84), and the lower end of the transverse portion of the L-shaped plate (83) is connected to the movable part of the lifting device, the left end of the vertical portion of the L-shaped plate (83) is slidably connected to the right end of the transverse portion located on the upper side of the U-shaped frame (4), and the vertical portion of the L-shaped plate (83) is located on the right side of the functional cylinder (8); A rack (41) is installed at the front end of the vertical portion of the L-shaped plate (83), and the front end of the rack (41) meshes with a first gear (42). A rotating shaft (43) is installed at the left end of the first gear (42), and the rotating shaft (43) is located at the front side of the U-shaped frame (4). The rotating shaft (43) is rotatably connected to the upper end of the platform (2) through a bearing seat. A second gear (44) is arranged at the left end of the rotating shaft (43), and the lower end of the second gear (44) meshes with a ring gear (21), and the ring gear (21) is located on the upper side of the platform (2).

6. The surface processing polishing liquid circulation device according to claim 5, characterized in that: The upper liquid component comprises an annular cylinder (22), the annular cylinder (22) is rotatably connected to the inner wall of the functional groove (27), and the annular cylinder (22) extends out of the upper side of the functional groove (27), the outer end of the annular cylinder (22) is connected to the inner wall of the ring gear (21), an annular tube (23) is arranged on the inner wall of the annular cylinder (22), the upper end of the annular tube (23) is connected to the upper liquid pipe (26), the other end of the upper liquid pipe (26) is connected to the upper liquid tank (3), and a plurality of flexible tubes (25) are equidistantly connected to the inner wall of the annular tube (23), and the other ends of the plurality of flexible tubes (25) are all connected to the dripping heads (24).

7. The surface processing polishing liquid circulation device according to claim 1, characterized in that: The lower end of the functional cylinder (8) is threadedly connected to a plug, and the plug is slidably connected to the outer end of the straight rod (84). The inner wall of the plug is recessed outward to form a sealing groove. A sealing member is installed on the sealing groove, and the sealing member is located on the outer end of the straight rod (84).

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