Tail gas treatment device for crystal growth equipment

Abstract

The invention relates to the technical field of gas treatment, and discloses a tail gas treatment device for crystal growth equipment, the tail gas treatment device comprises a main frame body, a plurality of supporting frames are fixedly mounted in the main frame body and used for fixing each mechanism, and a filtering mechanism is fixedly mounted on the left side of the interior of the main frame body and used for filtering the tail gas. The main frame body is used for filtering exhausted tail gas, a cooling mechanism used for cooling the tail gas is fixedly mounted on the middle left side of the interior of the main frame body, and a chemical absorption mechanism is mounted in the middle of the main frame body and is used for absorbing impurities in the tail gas by using chemicals; an adsorption mechanism is fixedly mounted on the middle right side of the interior of the main frame body and is used for carrying out re-adsorption treatment on the absorbed tail gas, and an exhaust mechanism used for exhausting the treated tail gas is fixedly mounted on the rightmost side of the interior of the main frame body. And the circulating device is arranged, so that the filter screen is more convenient to replace, and the working efficiency is improved to a certain extent.

Description

Technical Field

[0001] The invention relates to the technical field of gas treatment, in particular to a tail gas treatment device for crystal growth equipment. Background Art

[0002] In the field of crystal growth, with the continuous development of technology, various crystal growth equipment has been widely used. However, in the process of crystal growth, a large amount of exhaust gas will inevitably be generated. These exhaust gases usually contain a variety of complex components, including unreacted raw gas, reaction by-products, volatile organic compounds, dust particles and possible toxic and harmful substances.

[0003] In the prior art, the exhaust gas with complex components is not treated thoroughly: the exhaust gas components generated during the crystal growth process are complex and diverse, and may contain various organic compounds, inorganic compounds, tiny particles, etc. The existing treatment devices are often difficult to efficiently treat all components, and there is a problem of low removal rate of certain components, resulting in the exhaust gas still containing a certain amount of harmful substances.

[0004] Therefore, the present invention aims to provide a tail gas treatment device for a crystal growth device, so as to improve the problem of incomplete treatment of tail gas with complex components in the prior art. Summary of the invention

[0005] In view of the deficiencies in the prior art, the present invention provides an exhaust gas treatment device for a crystal growth device, which solves the problem of incomplete treatment of exhaust gas with complex components.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: an exhaust gas treatment device for crystal growth equipment, including a main frame, a plurality of support frames are fixedly installed inside the main frame, which are used to fix each mechanism, a filtering mechanism is fixedly installed on the left side inside the main frame, which is used to filter the discharged exhaust gas, a cooling mechanism is fixedly installed on the middle left side inside the main frame for cooling the exhaust gas, a chemical absorption mechanism is installed in the middle of the main frame, which absorbs impurities in the exhaust gas with chemicals, an adsorption mechanism is fixedly installed on the middle right side inside the main frame, which re-adsorbs the absorbed exhaust gas, an exhaust mechanism for discharging treated exhaust gas is fixedly installed on the rightmost side inside the main frame, an operating end for controlling the entire equipment is fixedly installed on the front side of the main frame, and a ladder is fixedly installed on one side of the support frame.

[0007] Preferably, the filtering mechanism comprises a chassis fixedly mounted on a support frame, a first exhaust fan fixedly mounted at one end inside the chassis, a protective cover installed in the middle of the chassis, and a first electric rotating shaft fixedly mounted in the middle of the protective cover.

[0008] Preferably, a plurality of fixing blocks are installed around the first electric rotating shaft, a plurality of limiting grooves are installed around the inside of the protective cover, filtering devices are installed in the grooves of the plurality of limiting grooves, and the filtering device includes two filters. A rotating door is installed on one side of the protective cover.

[0009] Preferably, the cooling mechanism includes an absorption box fixedly mounted on a support frame, a water tank fixedly mounted on one side of the absorption box, a water pipe fixedly mounted around the periphery of the absorption box, a water pump fixedly mounted at the water inlet end of the water pipe, the water inlet end of the water pipe is connected to the water pump, and the water outlet end of the water pipe is mounted inside the water tank.

[0010] Preferably, the chemical absorption mechanism comprises a reactor fixedly mounted on a support frame, a ventilation pipe fixedly mounted on the upper end of the reactor, reagent boxes mounted on both sides of the reactor, and electric sprayers mounted inside the two reagent boxes respectively.

[0011] Preferably, the adsorption mechanism includes an adsorption box fixedly installed on the right side inside the main frame, a transport pipe is fixedly installed on one side of the adsorption box, a plurality of adsorption devices are fixedly installed inside the adsorption box, and a shielding cover is fixedly installed above the adsorption box.

[0012] Preferably, the exhaust mechanism includes an air collecting cylinder fixedly mounted on the rightmost side of the main frame, a second exhaust fan fixedly mounted on a lower portion of one side of the air collecting cylinder, and an exhaust port fixedly mounted on an upper end of the air collecting cylinder.

[0013] Preferably, the operating end includes an operating table fixedly mounted on one side of the front portion of the main frame, a control panel fixedly mounted on the upper portion of the operating table, a plurality of controllers fixedly mounted on the rear side of the control panel, and an alarm button fixedly mounted on one side of the control panel.

[0014] Working principle: When the present invention is used, it specifically includes the following steps:

[0015] First, the exhaust gas emitted by the crystal growth is absorbed into the chassis through the first exhaust fan. When the exhaust gas passes through the filter device, some larger wastes are first filtered out through the first filter, and then some smaller wastes are filtered out through the second filter. A circulation device is set in the middle of the chassis, which circulates through multiple filter devices set inside the protective cover. The first electric shaft is responsible for providing power to rotate it. When the filter device needs to be replaced, the staff climbs up with a ladder, opens the revolving door, and takes out the filter device that needs to be replaced through the set limit slot for replacement.

[0016] The exhaust gas after filtration is transported to the cooling mechanism through a pipeline. Considering that the exhaust gas temperature just discharged is too high, when passing through the absorption box, the absorption box is composed of heat conduction plates. Water is cooled around the absorption box through a water pipe installed in the water tank. The water source here is circulated and then enters the next stage.

[0017] Considering that the exhaust gas contains a lot of pollutants, when the exhaust gas is transported to the reactor through the ventilation pipe, the liquid in the reagent boxes installed on both sides of the reactor is sprayed on the exhaust gas inside the reactor through an electric sprayer, and the impurities in the exhaust gas are removed by the chemical reaction produced by the combination of chemicals and exhaust gas, and then enter the next stage.

[0018] When the exhaust gas is transported to the adsorption box through the transport pipe, the adsorption devices set at the upper and lower ends can adsorb the treated exhaust gas to adsorb the impurities remaining in the exhaust gas. Considering that the adsorbent needs to be replaced when it is used up, adsorbents are set on both sides of the adsorption plate, and the use of the adsorbent is replaced by rotating the second electric shaft inside. After a series of treatments, the exhaust gas is sucked into the gas collection cylinder through the second exhaust fan and then discharged through the exhaust port.

[0019] The operation of the entire equipment can be observed through the control panel set on the operating table. When a problem occurs in the mechanism, the set alarm button will send a signal to remind the staff, and the operating mechanism can be controlled through the controller.

[0020] The present invention provides an exhaust gas treatment device for a crystal growth device. It has the following beneficial effects:

[0021] 1. The present invention provides a circulation device in the middle of the chassis, and circulates through multiple filter devices arranged inside the protective cover. The first electric shaft is responsible for providing power to rotate it. When the filter device needs to be replaced, the staff climbs up with a ladder, opens the rotating door, and takes out the filter device that needs to be replaced through the set limit groove for replacement, thereby achieving more convenient replacement of the filter net and improving work efficiency to a certain extent.

[0022] 2. The present invention sets a cooling mechanism, and the exhaust gas after filtering is transported to the cooling mechanism through a pipeline. Considering that the exhaust gas temperature just discharged is too high, when passing through the absorption box, the absorption box is composed of a heat conducting plate. Water is cooled around the absorption box through a water pipe set in the water tank. The water source here is circulated and then enters the next stage, thereby improving the problem of too high exhaust temperature.

[0023] 3. The present invention sets an adsorbent exchange device. Considering that the adsorbent needs to be replaced when it is used up, adsorbents are set on both sides of the adsorption plate, and the use of the adsorbent is replaced by rotating the second electric shaft inside. After a series of treatments, the exhaust gas is sucked into the gas collection cylinder through the second exhaust fan and then discharged through the exhaust port, which realizes the convenient replacement of the adsorbent and improves the work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a schematic diagram of the right rear side of the present invention;

[0025] Figure 2 It is a schematic diagram of the left front side of the present invention;

[0026] Figure 3 It is a schematic diagram of the filtering mechanism of the present invention;

[0027] Figure 4 It is a schematic diagram of the cooling mechanism of the present invention;

[0028] Figure 5 It is a schematic diagram of the chemical absorption mechanism of the present invention;

[0029] Figure 6 It is a schematic diagram of the adsorption mechanism of the present invention;

[0030] Figure 7 It is a schematic diagram of the exhaust mechanism of the present invention;

[0031] Figure 8 It is a schematic diagram of the operating end of the present invention.

[0032] Among them, 1. main frame; 2. support frame; 3. filtering mechanism; 301. chassis; 302. first exhaust fan; 303. protective cover; 304. first electric shaft; 305. fixing block; 306. limiting groove; 307. filtering device; 308. rotating door; 4. cooling mechanism; 401. absorption box; 402. water tank; 403. water pipe; 404. water pump; 5. chemical absorption mechanism; 501. reactor; 502, ventilation pipe; 503, medicine box; 504, electric sprayer; 6, adsorption mechanism; 601, adsorption box; 602, transport pipe; 603, adsorption device; 604, shielding cover; 7, exhaust mechanism; 701, gas collecting cylinder; 702, second exhaust fan; 703, exhaust port; 8, operating end; 801, operating table; 802, control panel; 803, controller; 804, alarm button; 9, ladder. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0034] Please refer to the attached Figure 1 -Attached Figure 8 An embodiment of the present invention provides an exhaust gas treatment device for a crystal growth device, comprising a main frame 1, wherein a plurality of support frames 2 are fixedly installed inside the main frame 1, which are used to fix each mechanism, a filtering mechanism 3 is fixedly installed on the left side inside the main frame 1, which is used to filter the discharged exhaust gas, a cooling mechanism 4 is fixedly installed on the middle left side inside the main frame 1 for cooling the exhaust gas, a chemical absorption mechanism 5 is installed in the middle part of the main frame 1, which absorbs and treats impurities in the exhaust gas by using chemicals, an adsorption mechanism 6 is fixedly installed on the middle right side inside the main frame 1, which re-adsorbs the absorbed exhaust gas, an exhaust mechanism 7 for discharging the treated exhaust gas is fixedly installed on the rightmost side inside the main frame 1, an operating end 8 for controlling the entire device is fixedly installed on the front side of the main frame 1, and a ladder 9 is fixedly installed on one side of the support frame 2.

[0035] The filtering mechanism 3 includes a chassis 301 fixedly mounted on the support frame 2, a first exhaust fan 302 fixedly mounted at one end inside the chassis 301, a protective cover 303 installed in the middle of the chassis 301, a first electric shaft 304 fixedly mounted in the middle of the protective cover 303, a plurality of fixed blocks 305 installed around the first electric shaft 304, a plurality of limiting grooves 306 installed around the inside of the protective cover 303, filtering devices 307 are installed in the grooves of the plurality of limiting grooves 306, the filtering device 307 includes two filters, and a rotating door 308 is installed on one side of the protective cover 303.

[0036] Specifically, the exhaust gas emitted by the crystal growth is absorbed into the chassis 301 through the first exhaust fan 302. When the exhaust gas passes through the filter device 307, some larger wastes are first filtered out through the first filter net, and then some smaller wastes are filtered out through the second filter net. A circulation device is set in the middle of the chassis 301, and circulation is carried out through multiple filter devices 307 set inside the protective cover 303. The first electric shaft 304 is responsible for providing power to rotate it. When the filter device 307 needs to be replaced, the staff climbs up using the ladder 9, opens the rotating door 308, and takes out the filter device 307 that needs to be replaced through the limit slot 306 for replacement.

[0037] The cooling mechanism 4 includes an absorption box 401 fixedly mounted on the support frame 2, a water tank 402 fixedly mounted on one side of the absorption box 401, a water pipe 403 fixedly mounted around the periphery of the absorption box 401, a water pump 404 fixedly mounted at the water inlet end of the water pipe 403, the water inlet end of the water pipe 403 is connected to the water pump 404, and the water outlet end of the water pipe 403 is mounted inside the water tank 402.

[0038] Specifically, the exhaust gas after filtering is transported to the cooling mechanism 4 through a pipeline. Considering that the exhaust gas temperature just discharged is too high, when passing through the absorption box 401, the absorption box 401 is composed of a heat conducting plate. Through the water pipe 403 arranged in the water tank 402, water is cooled around the absorption box 401, and the water source here is circulated.

[0039] The chemical absorption mechanism 5 includes a reactor 501 fixedly mounted on the support frame 2, a ventilation pipe 502 fixedly mounted on the upper end of the reactor 501, reagent boxes 503 mounted on both sides of the reactor 501, and electric sprayers 504 mounted inside the two reagent boxes 503 respectively.

[0040] Specifically, considering that the exhaust gas contains a large amount of pollutants, when the exhaust gas is transported to the reactor 501 through the ventilation pipe 502, the liquid in the reagent box 503 arranged on both sides of the reactor 501 is sprayed on the exhaust gas inside the reactor 501 through the electric sprayer 504, and the impurities in the exhaust gas are removed by the chemical reaction generated by the combination of chemicals and exhaust gas.

[0041] The adsorption mechanism 6 includes an adsorption box 601 fixedly installed on the middle right side of the main frame 1, a transport pipe 602 is fixedly installed on one side of the adsorption box 601, a plurality of adsorption devices 603 are fixedly installed inside the adsorption box 601, a shielding cover 604 is fixedly installed above the adsorption box 601, and the exhaust mechanism 7 includes an air collecting cylinder 701 fixedly installed on the rightmost side of the main frame 1, a second exhaust fan 702 is fixedly installed on the lower part of one side of the air collecting cylinder 701, and an exhaust port 703 is fixedly installed on the upper end of the air collecting cylinder 701.

[0042] Specifically, when the tail gas is transported to the adsorption box 601 through the transport pipe 602, the adsorption devices 603 arranged at the upper and lower ends can adsorb the treated tail gas, with the purpose of adsorbing the impurities remaining in the tail gas. Considering that the adsorbent needs to be replaced when it is used up, adsorbents are arranged on both sides of the adsorption plate, and the use of the adsorbent is replaced by rotating the second electric shaft 605 inside. After a series of treatments, the tail gas is sucked into the gas collection cylinder 701 through the second exhaust fan 702, and then discharged through the exhaust port 703.

[0043] The operating end 8 includes an operating table 801 fixedly installed on the front side of the main frame 1, a control panel 802 is fixedly installed on the upper part of the operating table 801, a plurality of controllers 803 are fixedly installed on the rear side of the control panel 802, and an alarm button 804 is fixedly installed on one side of the control panel 802.

[0044] Specifically, the operation of the entire device can be observed through the control panel 802 set on the operating table 801. When a problem occurs in the mechanism, the set alarm button 804 will send a signal to remind the staff, and the operating mechanism can be controlled through the controller 803.

[0045] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A tail gas treatment device for a crystal growth device, characterized in that: The invention comprises a main frame (1), wherein a plurality of support frames (2) are fixedly installed inside the main frame (1) and are used to fix each mechanism. A filtering mechanism (3) is fixedly installed on the left side inside the main frame (1) and is used to filter the discharged exhaust gas. A cooling mechanism (4) is fixedly installed on the middle left side inside the main frame (1) and is used to cool the exhaust gas. A chemical absorption mechanism (5) is installed in the middle of the main frame (1) and is used to absorb impurities in the exhaust gas using chemicals. An adsorption mechanism (6) is fixedly installed on the middle right side inside the main frame (1) and is used to re-adsorb the absorbed exhaust gas. An exhaust mechanism (7) is fixedly installed on the rightmost side inside the main frame (1) and is used to discharge the treated exhaust gas. An operating terminal (8) for controlling the entire device is fixedly installed on the front side of the main frame (1). A ladder (9) is fixedly installed on one side of the support frame (2).

2. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The filtering mechanism (3) comprises a chassis (301) fixedly mounted on a support frame (2), a first exhaust fan (302) fixedly mounted at one end inside the chassis (301), a protective cover (303) mounted in the middle of the chassis (301), and a first electric rotating shaft (304) fixedly mounted in the middle of the protective cover (303).

3. The tail gas treatment device for crystal growth equipment according to claim 2, characterized in that: A plurality of fixing blocks (305) are installed around the first electric rotating shaft (304), a plurality of limiting grooves (306) are installed around the inside of the protective cover (303), and filtering devices (307) are installed in the grooves of the plurality of limiting grooves (306), wherein the filtering device (307) includes two filters, and a rotating door (308) is installed on one side of the protective cover (303).

4. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The cooling mechanism (4) comprises an absorption box (401) fixedly mounted on a support frame (2), a water tank (402) fixedly mounted on one side of the absorption box (401), a water pipe (403) fixedly mounted around the periphery of the absorption box (401), a water pump (404) fixedly mounted at the water inlet end of the water pipe (403), the water inlet end of the water pipe (403) being connected to the water pump (404), and the water outlet end of the water pipe (403) being mounted inside the water tank (402).

5. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The chemical absorption mechanism (5) comprises a reaction kettle (501) fixedly mounted on a support frame (2), a ventilation pipe (502) fixedly mounted on the upper end of the reaction kettle (501), reagent boxes (503) mounted on both sides of the reaction kettle (501), and electric sprayers (504) mounted inside the two reagent boxes (503) respectively.

6. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The adsorption mechanism (6) comprises an adsorption box (601) fixedly mounted on the right side inside the main frame (1), a transport pipe (602) fixedly mounted on one side of the adsorption box (601), a plurality of adsorption devices (603) fixedly mounted inside the adsorption box (601), and a shielding cover (604) fixedly mounted above the adsorption box (601).

7. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The exhaust mechanism (7) comprises an air collecting cylinder (701) fixedly mounted on the rightmost side of the main frame (1), a second exhaust fan (702) fixedly mounted on a lower portion of one side of the air collecting cylinder (701), and an exhaust port (703) fixedly mounted on the upper end of the air collecting cylinder (701).

8. The tail gas treatment device for crystal growth equipment according to claim 1, characterized in that: The operating end (8) comprises an operating table (801) fixedly mounted on one side of the front portion of the main frame (1); a control panel (802) is fixedly mounted on the upper portion of the operating table (801); a plurality of controllers (803) are fixedly mounted on the rear side of the control panel (802); and an alarm button (804) is fixedly mounted on one side of the control panel (802).

Images