Polishing device for diamond crystal and polishing method thereof

Abstract

The present invention belongs to the field of polishing equipment, and specifically provides a polishing equipment for diamond crystals and a polishing method thereof, wherein the polishing equipment for diamond crystals comprises: a support frame; a rotating table, which is rotatably arranged on the support frame, and a plurality of concentrically arranged annular liquid storage tanks are provided on the top surface of the rotating table; a driving mechanism, which is arranged on the support frame and used to drive the rotating table to rotate; and a polishing cloth, which is arranged on the rotating table and used for chamfering and polishing the diamond crystal. By arranging a plurality of concentrically arranged annular liquid storage tanks on the top surface of the rotating table, when the rotating table rotates, the polishing liquid in the annular liquid storage tanks splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth facing the annular liquid storage tanks, maintaining sufficient water in the polishing cloth, thereby avoiding the phenomenon of crystallization of the polishing liquid in the polishing cloth. At the same time, the utilization efficiency of the polishing liquid is improved, the waste of the polishing liquid is reduced, and the cost of polishing is reduced.

Description

Technical Field

[0001] The invention belongs to the technical field of polishing equipment, and specifically relates to equipment or a device for polishing diamond crystals, and in particular to a polishing equipment for diamond crystals and a polishing method thereof. Background Art

[0002] Diamond crystals are important semiconductor materials. During the manufacturing process, they are often hit by tools such as manipulators, which causes stress concentration at the edges of diamond crystals and makes them prone to cracking. Chamfering can eliminate these sharp edges, reduce stress concentration, and thus improve the mechanical strength and service life of diamond crystals.

[0003] Due to the high hardness of diamond crystals, during the chamfering process, the abrasive grains are broken due to wear, resulting in blunting of the abrasive grain toughness and reduced strength, making it easier for the abrasive grains to form debris. During the subsequent chamfering, the diamond crystals will be scratched, forming a damaged layer at the chamfer. In the subsequent process, the damaged layer at the chamfer is prone to residual debris, which will adhere to the surface of the diamond crystal during heat treatment.

[0004] In the related art, the problem caused by the damaged layer is solved by polishing the chamfer of the diamond crystal. When polishing the chamfer of the diamond crystal, the water in the polishing liquid will gradually evaporate. Therefore, the polishing equipment needs to be frequently stopped to re-wet the polishing cloth, which leads to an increase in the amount of polishing liquid used. In addition, during each re-wetting, the excess polishing liquid will flow down the rotating table, resulting in a waste of polishing liquid.

[0005] Therefore, how to reduce the water loss of the polishing liquid in the polishing cloth and improve the utilization rate of the polishing liquid is a technical problem that needs to be solved urgently.

[0006] It should be noted that the above information disclosed in this background technology section is only used to understand the background technology of the present application concept, and therefore, the above description is not considered to constitute information of the prior art. Summary of the invention

[0007] The embodiments of the present disclosure at least provide a polishing device for diamond crystal and a polishing method thereof.

[0008] In a first aspect, an embodiment of the present disclosure provides a polishing device for a diamond crystal, comprising:

[0009] Support frame;

[0010] A rotating table, which is rotatably arranged on the support frame, and a top surface of the rotating table is provided with a plurality of concentrically arranged annular liquid storage tanks;

[0011] A driving mechanism, which is arranged on the supporting frame and is used to drive the rotating table to rotate;

[0012] A polishing cloth, which is arranged on the rotating table and is used for chamfer polishing of diamond crystals;

[0013] During polishing, when the driving mechanism drives the rotating table to rotate, the polishing liquid in the annular liquid storage tank splashes outwards under the action of centrifugal force, thereby continuously infiltrating the polishing cloth facing the annular liquid storage tank.

[0014] In an optional embodiment, the width of the annular liquid storage tank is L;

[0015] The thickness of the diamond crystal to be polished is H;

[0016] Among them, L≥1.5H;

[0017] During polishing, the diamond crystal is tilted close to the polishing cloth, and the polishing cloth located above any annular liquid reservoir is pressed against and squeezed, so that the chamfer of the diamond crystal and the corresponding polishing cloth are sunk into the annular liquid reservoir, thereby increasing the stability of the contact between the chamfer of the diamond crystal and the polishing cloth.

[0018] In an optional embodiment, a rotation axis is provided on the bottom surface of the rotating table;

[0019] The rotating platform is rotatably connected to the supporting frame via a rotating shaft;

[0020] The axis center of the rotating shaft coincides with the center center of the annular liquid storage tank.

[0021] In an optional embodiment, the polishing device for diamond crystals further comprises a liquid supply pipe; the liquid supply pipe is arranged above the rotating table;

[0022] Before polishing, the polishing liquid is delivered to the surface of the polishing cloth through the liquid supply pipe to wet the polishing cloth.

[0023] In an optional embodiment, after the polishing liquid has completely soaked the polishing cloth, the remaining polishing liquid permeates from the polishing cloth and flows into the annular liquid storage tank, thereby reducing the loss of the polishing liquid.

[0024] In an optional embodiment, a lifting ring is provided in the annular liquid storage tank;

[0025] The size of the lifting ring is adapted to the size of the annular liquid storage tank;

[0026] The polishing device for diamond crystals also includes a lifting member;

[0027] The side wall of the rotating table is provided with a plug hole connected to each of the annular liquid storage tanks along the diameter direction;

[0028] The lifting member is arranged in the insertion hole, and when the lifting member is pulled out from the insertion hole, the lifting ring in each of the annular liquid storage tanks is quickly lifted to complete the washing of the residue on the polishing cloth.

[0029] In an optional embodiment, the lifting member includes:

[0030] Insert the rod;

[0031] A lifting portion, which is arranged at one end of the insertion rod inserted into the insertion hole;

[0032] The lifting portion includes a lifting inclined surface and an insertion inclined surface;

[0033] When the insertion rod is inserted into the insertion hole, the lifting part is inserted from below each lifting ring in sequence through the guidance of the insertion slope until the lifting part is inserted into the center of the rotating table;

[0034] When the insertion rod is pulled out of the insertion hole, the lifting inclined surface of the lifting part sequentially lifts the lifting ring in the corresponding annular liquid storage tank from the inside to the outside, thereby cleaning the polishing cloth in a wave form and completing the rinsing of the residue on the polishing cloth.

[0035] In an optional embodiment, the polishing cloth is bonded to the top surface of the rotating table;

[0036] During bonding, the polishing cloth is pressed by external force to discharge the air in the bulging part of the polishing cloth into the annular liquid storage tank.

[0037] In an optional embodiment, a plurality of auxiliary support wheels are provided on the support frame;

[0038] A plurality of auxiliary support wheels are arranged along the circumference of the rotating table and are used to support the rotating table.

[0039] In a second aspect, an embodiment of the present disclosure provides a polishing method applied to the polishing device for diamond crystal as described above, the polishing method comprising:

[0040] delivering polishing liquid to the polishing cloth;

[0041] Wait for the polishing liquid to soak the polishing cloth and flow into the annular liquid reservoir;

[0042] The rotating table is driven to rotate by a driving mechanism;

[0043] Tilt the diamond crystal close to the polishing cloth, and press against and squeeze the polishing cloth above any annular liquid reservoir until the chamfer of the diamond crystal and the polishing cloth at the corresponding position are sunk into the annular liquid reservoir;

[0044] Polishing is accomplished by rotating the diamond crystal.

[0045] The beneficial effect of the present invention is that the polishing equipment and polishing method for diamond crystals are provided with a plurality of concentrically arranged annular liquid storage tanks on the top surface of the rotating table. When the rotating table rotates, the polishing liquid in the annular liquid storage tanks splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth directly facing the annular liquid storage tanks, maintaining sufficient moisture in the polishing cloth, thereby delaying the loss of moisture in the polishing liquid in the polishing cloth, reducing the probability of crystallization, and at the same time, improving the utilization efficiency of the polishing liquid, reducing the waste of the polishing liquid, and thus reducing the cost of polishing.

[0046] Other features and advantages of the present invention will be described in the following description, and partly become apparent from the description, or understood by practicing the present invention. The purpose and other advantages of the present invention are realized and obtained by the structures particularly pointed out in the description and the drawings.

[0047] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, this article specifically cites preferred embodiments and provides detailed descriptions as follows in conjunction with the attached drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0049] Figure 1 A cross-sectional view of a polishing device for a diamond crystal provided in accordance with an embodiment of the present disclosure;

[0050] Figure 2 A schematic structural diagram of a polishing device for diamond crystals provided in an embodiment of the present disclosure;

[0051] Figure 3 A schematic diagram of a portion of the structure of a polishing device for diamond crystals provided in an embodiment of the present disclosure;

[0052] Figure 4 A schematic diagram of the structure of a rotating table and a polishing cloth provided in an embodiment of the present disclosure;

[0053] Figure 5 A schematic diagram of a portion of the structure of a polishing device for diamond crystals provided in an embodiment of the present disclosure;

[0054] Figure 6A flow chart of a grinding method for a polishing device for a diamond crystal provided in an embodiment of the present disclosure;

[0055] Figure 7 A half-sectional view of a polishing device for a diamond crystal provided according to an embodiment of the present disclosure.

[0056] In the figure: 100, support frame; 110, rotating shaft; 200, rotating table; 210, annular liquid storage tank; 220, lifting ring; 230, lifting member; 231, insertion rod; 232, lifting part; 232a, lifting slope; 232b, insertion slope; 240, socket; 300, driving mechanism; 400, polishing cloth; 500, liquid supply pipe; 600, diamond crystal; 700, auxiliary support wheel. DETAILED DESCRIPTION

[0057] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0058] The defects existing in the above solutions are the results obtained by the inventor after practice and careful research. Therefore, the discovery process of the above problems and the solutions proposed by the present invention in this article for the above problems should be the contributions made by the inventor to the present invention during the disclosure process.

[0059] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0060] Some embodiments of the present invention are described in detail below in conjunction with the accompanying drawings. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0061] See also Figure 1 and Figure 2At least one embodiment provides a polishing device for diamond crystals, comprising: a support frame 100; a rotating table 200, which is rotatably arranged on the support frame 100, and a top surface of the rotating table 200 is provided with a plurality of concentrically arranged annular liquid storage grooves 210; a driving mechanism 300, which is arranged on the support frame 100 and is used to drive the rotating table 200 to rotate; a polishing cloth 400, which is arranged on the rotating table 200 and is used for chamfering and polishing the diamond crystal 600; during polishing, when the driving mechanism 300 drives the rotating table 200 to rotate, the polishing liquid in the annular liquid storage groove 210 splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth 400 directly facing the annular liquid storage groove 210. By arranging a plurality of concentrically arranged annular liquid storage tanks 210 on the top surface of the rotating table 200, when the rotating table 200 rotates, the polishing liquid in the annular liquid storage tank 210 splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth 400 directly facing the annular liquid storage tank 210, maintaining sufficient water in the polishing cloth 400, thereby delaying the loss of water in the polishing liquid in the polishing cloth, and reducing the probability of crystal precipitation. At the same time, the utilization efficiency of the polishing liquid is improved, the waste of the polishing liquid is reduced, and the cost of polishing is reduced.

[0062] The diamond crystal 600 is in the shape of a disk.

[0063] Since, when polishing the chamfer of the diamond crystal 600, a constant angle needs to be maintained, when the angle changes, the contact surface between the chamfer and the polishing cloth 400 changes, thereby reducing the polishing quality. In order to solve this problem, the polishing equipment for diamond crystals limits the size of the annular liquid reservoir 210. When chamfering, the diamond crystal 600 is inserted into the annular liquid reservoir 210 at an angle. On the one hand, the diamond crystal 600 is supported by the two side walls of the annular liquid reservoir 210, reducing the manual force required to maintain the angle of the diamond crystal 600. On the other hand, the contact area between the polishing cloth 400 and the chamfer of the diamond crystal 600 is increased. When the angle of the diamond crystal 600 changes, the polishing cloth 400 can still be against the chamfer of the diamond crystal 600.

[0064] For more information, please see Figure 1 , the width of the annular liquid reservoir 210 is L; the thickness of the diamond crystal 600 to be polished is H; wherein L≥1.5H; during polishing, the diamond crystal 600 is tilted close to the polishing cloth 400, and the polishing cloth 400 located above any annular liquid reservoir 210 is pressed against and squeezed, so that the chamfer of the diamond crystal 600 and the corresponding polishing cloth 400 are sunk into the annular liquid reservoir 210, so as to increase the stability of the contact between the chamfer of the diamond crystal 600 and the polishing cloth 400.

[0065] At the same time, due to the chamfer of the diamond crystal 600 and the corresponding polishing cloth 400 sinking into the annular liquid reservoir 210, the distance between the polishing liquid in the annular liquid reservoir 210 and the polishing surface is reduced. When the rotating table 200 rotates, the polishing liquid splashing outward can better infiltrate the polishing cloth 400 facing the annular liquid reservoir 210.

[0066] Please continue reading Figure 1 In some embodiments, a rotating shaft 110 is disposed on the bottom surface of the rotating platform 200; the rotating platform 200 is rotatably connected to the support frame 100 via the rotating shaft 110; the axis of the rotating shaft 110 coincides with the center of the annular liquid storage tank 210. The axis of the rotating shaft 110 coincides with the center of the annular liquid storage tank 210, thereby ensuring that the annular liquid storage tank 210 will not be eccentric when rotating, that is, will not interfere with the chamfering and polishing of the diamond crystal 600.

[0067] See also Figure 3 The polishing device for diamond crystals also includes a liquid supply pipe 500; the liquid supply pipe 500 is arranged above the rotating table 200; before polishing, the polishing liquid is transported to the surface of the polishing cloth 400 through the liquid supply pipe 500 to wet the polishing cloth 400. Figure 3 The direction indicated by F is the rotation direction of the rotating table 200 .

[0068] After the polishing liquid has completely soaked the polishing cloth 400 , the remaining polishing liquid penetrates from the polishing cloth 400 and flows into the annular liquid storage tank 210 , thereby reducing the loss of the polishing liquid.

[0069] See also Figure 1 , Figure 4 and Figure 7 In some embodiments, a lifting ring 220 is provided in the annular liquid storage tank 210; the size of the lifting ring 220 is adapted to the size of the annular liquid storage tank 210; the polishing equipment for diamond crystals also includes a lifting member 230; the side wall of the rotating table 200 is provided with a socket 240 connected to each of the annular liquid storage tanks 210 along the diameter direction; the lifting member 230 is arranged in the socket 240, and when the lifting member 230 is pulled out of the socket 240, the lifting ring 220 in each of the annular liquid storage tanks 210 is quickly lifted to complete the flushing of the residue on the polishing cloth 400.

[0070] It should be noted that the gap between the lifting ring 220 and the annular liquid storage tank 210 is very small, and the amount of polishing liquid flowing out of the gap is very small. Even if a small amount of polishing liquid flows out of the gap, it will not affect the entire polishing process.

[0071] The lifting member 230 includes: an insertion rod 231; a lifting portion 232, which is arranged at one end of the insertion rod 231 inserted into the insertion hole 240; the lifting portion 232 includes a lifting slope 232a and an insertion slope 232b; when the insertion rod 231 is inserted into the insertion hole 240, the lifting portion 232 is inserted from the bottom of each lifting ring 220 in turn through the guidance of the insertion slope 232b until the lifting portion 232 is inserted into the center of the rotating table 200; when the insertion rod 231 is pulled out from the insertion hole 240, the pulling direction is as follows: Figure 4 As shown in F1, the lifting slope 232a of the lifting portion 232 sequentially lifts the lifting ring 220 in the corresponding annular liquid storage tank 210 from the inside to the outside, and the lifting direction is as shown in FIG. Figure 4 As shown in F2, the polishing cloth 400 is cleaned in a wave form to complete the washing of the residue on the polishing cloth 400. Figure 4 When pulled out in the middle F1 direction, the lifting slope 232a of the lifting part 232 lifts the corresponding lifting ring 220 in turn. At this time, the polishing liquid in the annular liquid storage tank 210 rises with the lifting ring 220, thereby washing the polishing residue on the polishing cloth 400, and using waves from the inside to the outside to push the residue off the polishing surface.

[0072] It should be noted that the polishing cloth 400 has unevenly distributed pores, and the waste chips from grinding will remain in the pores and exist on the upper surface of the polishing cloth 400. The lifting inclined surface 232a of the lifting portion 232 lifts the corresponding lifting ring 220 in turn, and the polishing liquid in the annular liquid storage tank 210 rises with the lifting ring 220, and squeezes the polishing liquid from the polishing cloth 400 from bottom to top, thereby completing the cleaning of the waste chips in the pores of the polishing cloth.

[0073] Please continue reading Figure 1 , the polishing cloth 400 is bonded to the top surface of the rotating table 200; during bonding, the polishing cloth 400 is pressed by external force to discharge the air in the bulging part of the polishing cloth 400 into the annular liquid reservoir 210. If there is a bulging part at the bonding part of the polishing cloth 400, the bulging part is pressed by external force to discharge the air into the annular liquid reservoir 210, thereby ensuring the stability of the bonding of the polishing cloth 400.

[0074] See also Figure 4When the polishing cloth 400 needs to be replaced, the insertion rod 231 is pulled out from the insertion hole 240 until the lifting portion 232 lifts the lifting ring 220 in the outermost annular liquid storage tank 210, and then the insertion rod 231 is bent upward, so that the lifting portion 232 continues to push the lifting ring 220 until the lifting ring 220 lifts the polishing cloth 400, thereby facilitating manual tearing of the polishing cloth 400 and improving the replacement efficiency of the polishing cloth 400.

[0075] To prevent the rotating table 200 from shaking during rotation, refer to Figure 1 and Figure 5 In some embodiments, a plurality of auxiliary support wheels 700 are disposed on the support frame 100 ; the plurality of auxiliary support wheels 700 are disposed along the circumference of the rotating table 200 and are used to support the rotating table 200 .

[0076] See also Figure 6 At least one embodiment further provides a polishing method applied to the polishing equipment for diamond crystals as described above, wherein a plurality of concentrically arranged annular liquid storage tanks 210 are provided on the top surface of the rotating table 200. When the rotating table 200 rotates, the polishing liquid in the annular liquid storage tanks 210 splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth 400 facing the annular liquid storage tanks 210, thereby maintaining sufficient moisture in the polishing cloth 400.

[0077] Specifically, the polishing method comprises the following steps:

[0078] S110: delivering the polishing liquid to the polishing cloth 400;

[0079] S120: Waiting for the polishing liquid to soak the polishing cloth 400 and flow into the annular liquid storage tank 210;

[0080] S130: driving the rotating table 200 to rotate via the driving mechanism 300;

[0081] S140: Tilt the diamond crystal 600 close to the polishing cloth 400, and press the polishing cloth 400 located above any annular liquid reservoir 210, until the chamfer of the diamond crystal 600 and the polishing cloth 400 at the corresponding position are sunk into the annular liquid reservoir 210;

[0082] S150: Rotate the diamond crystal 600 to complete polishing.

[0083] Specifically, the diamond crystal 600 is manually rotated at a speed of 4-10 revolutions per minute to polish the circumferential chamfers of the diamond crystal 600.

[0084] In summary, the present invention provides a polishing device for diamond crystals and a polishing method thereof, wherein the polishing device for diamond crystals comprises: a support frame 100; a rotating table 200, which is rotatably arranged on the support frame 100, and a plurality of concentrically arranged annular liquid storage tanks 210 are provided on the top surface of the rotating table 200; a driving mechanism 300, which is arranged on the support frame 100 and is used to drive the rotating table 200 to rotate; a polishing cloth 400, which is arranged on the rotating table 200 and is used for chamfering and polishing the diamond crystal 600; during polishing, when the driving mechanism 300 drives the rotating table 200 to rotate, the polishing liquid in the annular liquid storage tank 210 splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth 400 directly facing the annular liquid storage tank 210. By arranging a plurality of concentrically arranged annular liquid storage tanks 210 on the top surface of the rotating table 200, when the rotating table 200 rotates, the polishing liquid in the annular liquid storage tank 210 splashes outward under the action of centrifugal force, thereby continuously infiltrating the polishing cloth 400 directly facing the annular liquid storage tank 210, thereby delaying the loss of water in the polishing liquid in the polishing cloth, and reducing the probability of crystal precipitation. At the same time, the utilization efficiency of the polishing liquid is improved, the waste of the polishing liquid is reduced, and the cost of polishing is reduced.

[0085] Based on the above ideal embodiments of the present invention, the relevant staff can make various changes and modifications without departing from the technical concept of the present invention through the above description. The technical scope of the present invention is not limited to the contents of the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A polishing device for diamond crystals, characterized in that: include: Support frame (100); A rotating table (200) is rotatably disposed on the support frame (100), and a top surface of the rotating table (200) is provided with a plurality of concentrically disposed annular liquid storage tanks (210); a driving mechanism (300), which is arranged on the supporting frame (100) and is used to drive the rotating platform (200) to rotate; A polishing cloth (400) disposed on the rotating table (200) and used for chamfer polishing of a diamond crystal (600); During polishing, when the driving mechanism (300) drives the rotating table (200) to rotate, the polishing liquid in the annular liquid storage tank (210) splashes outwards under the action of centrifugal force, thereby continuously soaking the polishing cloth (400) facing the annular liquid storage tank (210); A lifting ring (220) is arranged in the annular liquid storage tank (210); The size of the lifting ring (220) is adapted to the size of the annular liquid storage tank (210); The polishing device for diamond crystals further includes a lifting member (230); A plug hole (240) communicating with each of the annular liquid storage tanks (210) is provided on the side wall of the rotating table (200) along the diameter direction; The lifting member (230) is disposed in the insertion hole (240), and when the lifting member (230) is pulled out of the insertion hole (240), the lifting ring (220) in each of the annular liquid storage tanks (210) is quickly lifted to complete the flushing of residues on the polishing cloth (400).

2. The polishing device for diamond crystal according to claim 1, characterized in that The width of the annular liquid storage tank (210) is L; The thickness of the diamond crystal (600) to be polished is H; Among them, L≥1.5H; During polishing, the diamond crystal (600) is tilted close to the polishing cloth (400), and the polishing cloth (400) located above any annular liquid reservoir (210) is pressed against and squeezed, so that the chamfer of the diamond crystal (600) and the polishing cloth (400) at the corresponding position are sunk into the annular liquid reservoir (210), so as to increase the stability of the contact between the chamfer of the diamond crystal (600) and the polishing cloth (400).

3. The polishing device for diamond crystal according to claim 1, characterized in that The bottom surface of the rotating platform (200) is provided with a rotating shaft (110); The rotating platform (200) is rotatably connected to the supporting frame (100) via a rotating shaft (110); The axis center of the rotating shaft (110) coincides with the center center of the annular liquid storage tank (210).

4. The polishing device for diamond crystal according to claim 1, characterized in that The polishing device for diamond crystals further comprises a liquid supply pipe (500); The liquid supply pipe (500) is arranged above the rotating platform (200); Before polishing, the polishing liquid is delivered to the surface of the polishing cloth (400) through the liquid supply pipe (500) to wet the polishing cloth (400).

5. The polishing device for diamond crystal according to claim 4, characterized in that After the polishing liquid has completely soaked the polishing cloth (400), the remaining polishing liquid permeates from the polishing cloth (400) and flows into the annular liquid storage tank (210), thereby reducing the loss of the polishing liquid.

6. The polishing device for diamond crystal according to claim 1, characterized in that The lifting member (230) comprises: Insertion rod (231); A lifting portion (232) disposed at one end of the insertion rod (231) inserted into the insertion hole (240); The lifting portion (232) comprises a lifting inclined surface (232a) and an insertion inclined surface (232b); When the insertion rod (231) is inserted into the insertion hole (240), the lifting portion (232) is inserted from below each lifting ring (220) in sequence under the guidance of the insertion inclined surface (232b) until the lifting portion (232) is inserted into the center of the rotating table (200); When the insertion rod (231) is pulled out of the insertion hole (240), the lifting inclined surface (232a) of the lifting portion (232) lifts the lifting ring (220) in the corresponding annular liquid storage tank (210) from the inside to the outside in sequence, thereby cleaning the polishing cloth (400) in a wave-like manner, thereby completing the rinsing of residues on the polishing cloth (400).

7. The polishing device for diamond crystal according to claim 1, characterized in that The polishing cloth (400) is bonded to the top surface of the rotating table (200); During bonding, the polishing cloth (400) is pressed by external force to discharge the air in the bulging part of the polishing cloth (400) into the annular liquid storage tank (210).

8. The polishing device for diamond crystal according to claim 1, characterized in that The support frame (100) is provided with a plurality of auxiliary support wheels (700); A plurality of auxiliary support wheels (700) are arranged along the circumference of the rotating table (200) and are used to support the rotating table (200).

9. A polishing method applied to the polishing device for diamond crystals as claimed in claim 1, characterized in that: The polishing method comprises: delivering polishing liquid onto the polishing cloth (400); Waiting for the polishing liquid to soak the polishing cloth (400) and flow into the annular liquid storage tank (210); The rotating platform (200) is driven to rotate by the driving mechanism (300); Tilt the diamond crystal (600) close to the polishing cloth (400), and press against and squeeze the polishing cloth (400) located above any annular liquid storage groove (210), until the chamfer of the diamond crystal (600) and the polishing cloth (400) at the corresponding position are sunk into the annular liquid storage groove (210); The diamond crystal (600) is rotated to complete the polishing.

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