Vacuum transmission valve, control method and semiconductor film equipment

Abstract

The invention discloses a vacuum transmission valve, a control method and semiconductor thin film equipment, the vacuum transmission valve is applied to the semiconductor thin film equipment, the vacuum transmission valve comprises a sealing valve box, a first sealing element is arranged between the sealing valve box and a process chamber, and the vacuum transmission valve further comprises a second sealing element arranged on the sealing valve box and used for sealing the process chamber. The first sealing element is positioned between the first sealing element and the process chamber; and the switching part is arranged on the sealing valve box and is used for fixedly mounting the second sealing element on the sealing valve box. According to the vacuum transmission valve, the switching part and the second sealing piece are arranged on the sealing valve box of the vacuum transmission valve, and the second sealing piece is located between the first sealing piece and the process cavity, so that even if the second sealing piece is corroded or gas leakage occurs, the second sealing piece can be sealed; in addition, the effect of replacing the second sealing element can be achieved by directly disassembling the switching part, so that the sealing valve box is prevented from being disconnected from the process chamber, the downtime of equipment is shortened, and the replacement efficiency of the sealing element is improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor process technology, and in particular to a vacuum transmission valve, a control method and a semiconductor thin film device. Background Art

[0002] Semiconductor thin film equipment generally includes EFEM (equipment front-end module), LL (vacuum and atmosphere switching chamber), TM (transmission module) and PM (process module), among which different modules are separated by pneumatic or electrically controlled vacuum transmission valves. The vacuum transmission valve is generally composed of a driving mechanism, a sealing valve plate and a sealing valve box. Among them, the valve located between the transmission module TM and the process module PM is directly exposed to the process reaction process, so it will be corroded by high temperature, plasma and some special gases, causing the valve plate seal and the valve box seal on the side of the process module PM to leak easily, which in turn causes the wafer to be contaminated, affecting the final product yield, and even causing downtime and damage to other vacuum components. In addition, since there is an atmospheric pressure difference in the radial direction of the rubber ring between the transmission module TM and the process module PM, the service life of the rubber ring will be affected, thereby affecting the product production process.

[0003] To ensure the normal operation of the equipment, the sealing valve plate (or rubber ring) of the vacuum transmission valve and the sealing rubber ring on the sealing valve box need to be replaced regularly. The sealing valve plate (or rubber ring) can be replaced by disassembling the drive mechanism or the valve box top cover, but the replacement of the sealing ring on the sealing valve box requires disconnecting the process module PM from the sealing valve box. Before disconnecting the process module PM, the equipment needs to be cooled, purged, and the special gas pipeline disconnected, and the exhaust pipeline will also be connected to other factory services. At the same time, after replacing the rubber ring, it takes the same amount of time to restore the machine. Therefore, in actual applications, this complete process takes at least 7 to 10 days, which will seriously affect the normal operation time of the machine and bring considerable costs. In addition, due to differences in the thickness of the deposited film, the cleaning time of the chamber, the type of reaction gas, and the temperature in the chamber, the service life of the sealing ring on the sealing valve box varies, for example, as short as 6 months or as long as 18 to 36 months, etc. In other words, it is difficult for the staff to accurately control the replacement cycle of the sealing rubber ring, which further leads to leakage during equipment operation, causing wafer contamination, further affecting the product yield. Summary of the invention

[0004] The embodiments of the present invention provide a vacuum transmission valve, a control method and a semiconductor thin film device, which are intended to solve the problem of equipment downtime when replacing a seal and improve the replacement efficiency of the seal.

[0005] In a first aspect, an embodiment of the present invention provides a vacuum transmission valve, which is applied to a semiconductor thin film device, wherein the semiconductor thin film device includes a process chamber and a transmission chamber, wherein the vacuum transmission valve includes a sealing valve box, wherein the sealing valve box is arranged between the process chamber and the transmission chamber, wherein a first sealing member is arranged between the sealing valve box and the process chamber, and wherein the vacuum transmission valve further includes:

[0006] a second sealing member, disposed on the sealing valve box and located between the first sealing member and the process chamber;

[0007] The adapter is detachably arranged on the sealing valve box and is used for fixing the second sealing member on the sealing valve box.

[0008] Furthermore, the space between the first sealing member and the second sealing member is a sealed cavity.

[0009] Furthermore, it also includes a control valve, which is connected to the sealed cavity through a first gas pipeline and is used to control the gas state in the sealed cavity.

[0010] Furthermore, the control valve includes a first diaphragm valve, which is connected to the first gas pipeline and is used to evacuate the sealed cavity.

[0011] Furthermore, the control valve includes a second diaphragm valve, which is connected to the first gas pipeline and is used to inflate the sealed cavity.

[0012] Furthermore, it also includes a gas detection device, which is connected to the sealed cavity through a second gas pipeline and is used to detect the gas state in the sealed cavity.

[0013] Furthermore, the gas detection device is a residual gas analyzer.

[0014] Furthermore, the adapter portion is an adapter plate, and the adapter plate is detachably mounted on the sealing valve box via a fixing member.

[0015] In a second aspect, an embodiment of the present invention provides a control method for a vacuum transmission valve as described in the first aspect, wherein the space between the first sealing member and the second sealing member is a sealed cavity, the vacuum transmission valve further comprises a gas detection device, and the gas detection device is connected to the sealed cavity through a second gas pipeline, and the control method comprises:

[0016] Detecting the gas state of the sealed chamber between the first sealing member and the second sealing member by a gas detection device;

[0017] Comparing the gas state of the sealed chamber with a first preset threshold and a second preset threshold; wherein the first preset threshold is lower than the second preset threshold;

[0018] If the gas state in the sealed chamber does not reach the first preset threshold, continuing to maintain the detection action of the gas detection device;

[0019] If the gas state in the sealed chamber reaches a first preset threshold but does not reach a second preset threshold, a first level alarm is issued;

[0020] If the gas state in the sealed chamber reaches a second preset threshold, a level 2 alarm is issued; wherein the warning level of the level 1 alarm is lower than the warning level of the level 2 alarm.

[0021] In a third aspect, an embodiment of the present invention provides a semiconductor thin film device, comprising a vacuum transmission valve as described in the first aspect.

[0022] An embodiment of the present invention provides a vacuum transmission valve, a control method and a semiconductor thin film device. The vacuum transmission valve is applied to a semiconductor thin film device. The semiconductor thin film device includes a process chamber and a transmission chamber. The vacuum transmission valve includes a sealing valve box. The sealing valve box is arranged between the process chamber and the transmission chamber. A first sealing member is arranged between the sealing valve box and the process chamber. The vacuum transmission valve also includes: a second sealing member, which is arranged on the sealing valve box and is located between the first sealing member and the process chamber; and a connecting portion, which is detachably arranged on the sealing valve box and is used to fix the second sealing member on the sealing valve box. The embodiment of the present invention provides an adapter on the sealing valve box of the vacuum transmission valve, and provides a second seal based on the adapter, and the second seal is located between the first seal and the process chamber, so that the second seal contacts the gas in the process chamber before the first seal. In this way, even when the second seal is corroded or gas leakage occurs, the second seal can be directly replaced by disassembling the adapter, thereby avoiding the problem of disconnecting the sealing valve box and the process chamber when replacing the seal, thereby shortening the downtime of the equipment or even avoiding downtime, and also improving the replacement efficiency of the seal, saving a lot of time and manpower costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying any creative work.

[0024] Figure 1A schematic diagram of the structure of a vacuum transmission valve provided by an embodiment of the present invention;

[0025] Figure 2 Another structural schematic diagram of a vacuum transmission valve provided by an embodiment of the present invention;

[0026] Figure 3 An exploded schematic diagram of a vacuum transmission valve provided by an embodiment of the present invention;

[0027] Figure 4 Another structural schematic diagram of a vacuum transmission valve provided by an embodiment of the present invention;

[0028] Figure 5 A schematic diagram of a maintenance structure of a vacuum transmission valve provided in an embodiment of the present invention;

[0029] Figure 6 A schematic diagram of air pressure in a vacuum transmission valve provided by an embodiment of the present invention;

[0030] Figure 7 A schematic diagram of gas detection in a vacuum transmission valve provided by an embodiment of the present invention;

[0031] Figure 8 Another schematic diagram of gas detection in a vacuum transmission valve provided by an embodiment of the present invention;

[0032] Fig. 9 A schematic flow chart of a method for controlling a vacuum transmission valve provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0034] It should be understood that when used in this specification and the appended claims, the terms "include" and "comprises" indicate the presence of described features, integers, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or combinations thereof.

[0035] It should also be understood that the terms used in this specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. As used in the specification of the present invention and the appended claims, unless the context clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms.

[0036] It should be further understood that the term "and / or" used in the present description and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0037] See below Figure 1 and Figure 2 The embodiment of the present invention provides a vacuum transmission valve 1, which is applied to a semiconductor thin film device. The semiconductor thin film device includes a process chamber 2 and a transmission chamber 3. The vacuum transmission valve 1 includes a sealing valve box 11, which is arranged between the process chamber 2 and the transmission chamber 3. A first sealing member 12 is arranged between the sealing valve box 11 and the process chamber 2. The vacuum transmission valve 1 also includes:

[0038] A second sealing member 13 is disposed on the sealing valve box 11 and is located between the first sealing member 12 and the process chamber 2;

[0039] The adapter portion 14 is detachably disposed on the sealing valve box 11 and is used to fix the second sealing member 13 on the sealing valve box 11 .

[0040] In this embodiment, the vacuum transmission valve 1 includes a sealing valve box 11 located between the process chamber 2 and the transmission chamber 3, and a first sealing member 12 and a second sealing member 13 are arranged between the sealing valve box 11 and the process chamber 2, wherein the second sealing member 13 is installed on the sealing valve box 11 through an adapter 14. In this embodiment, an adapter 14 is arranged on the sealing valve box 11 of the vacuum transmission valve 1, and a second sealing member 13 is arranged based on the adapter 14, and the second sealing member 13 is located between the first sealing member 12 and the process chamber 2, so that the second sealing member 13 contacts the gas in the process chamber 2 before the first sealing member 12, so that even when the second sealing member 13 is corroded or gas leakage occurs, the second sealing member 13 can be directly replaced by disassembling the adapter 14, thereby avoiding the problem of disconnecting the sealing valve box 11 from the process chamber 2 when replacing the sealing member, thereby shortening the downtime of the equipment, or even avoiding downtime, and also improving the replacement efficiency of the sealing member, saving a lot of time and manpower costs.

[0041] In actual application scenarios, the vacuum transmission valve 1 may include a driving mechanism, a sealing valve plate 15 and other structures in addition to the sealing valve box 11. At the same time, in addition to a seal between one side of the sealing valve box 11 and the process chamber 2, a corresponding seal (such as a third seal 16) is also provided on the side close to the transmission chamber 3. Since there is no potential risk of corrosion in the transmission chamber 3, only one seal may be provided. The sealing valve box 11 is also specifically provided with a valve box top sealing rubber ring 111, a valve box top maintenance end cover 112, and a top maintenance end cover fixing screw 113 and other structures. Furthermore, the adapter 14 is an adapter plate, and the adapter plate is detachably mounted on the sealing valve box 11 by fixing screws 114. The first seal 12 and the second seal 13 are both sealing rings. In this way, when the second seal 13 needs to be replaced, Figure 5 As shown, the fixing screws 114 of the adapter plate can be removed from the side of the transmission chamber 3 with the aid of auxiliary tools, and then the fixing screws 114 of the adapter plate can be removed according to the maintenance space. Figure 5 Method ① in the above method, remove the top maintenance cover fixing screw 113 to open the valve box top maintenance cover 112, then remove the adapter plate on the sealing valve box 11, and replace the new second sealing member 13, or as follows Figure 5 As shown in method ② in the figure, the adapter plate is directly removed from the side of the transfer chamber 3.

[0042] It can be seen that during the entire process of replacing the second seal 13, it is not necessary to disconnect the process chamber 2 from the sealing valve box 11. This can save the downtime caused by disconnecting the process chamber 2, as well as the additional factory service costs caused by disconnecting the process chamber 2 and resuming the machine, and can also save a lot of time, manpower, expenses and other resource costs.

[0043] Combination Figure 3 In one embodiment, the space between the first sealing member 12 and the second sealing member 13 is a sealing cavity 17 .

[0044] Furthermore, the vacuum transmission valve 1 further includes a control valve 18, which is connected to the sealed cavity 17 through a first gas pipeline 181 and is used to control the gas state in the sealed cavity 17. In practical applications, the sealed cavity 17 may have a through hole, and the through hole is connected to the first gas pipeline 181 to achieve communication between the control valve 18 and the sealed cavity 17.

[0045] like Figure 6As shown, this embodiment is based on the control valve 18. When the equipment is operating normally, the sealing cavity 17 between the first seal 12 and the second seal 13 can be evacuated through the control valve 18 to make it in a vacuum state, so that the problem of uneven force on the first seal 12 and the second seal 13 affecting the sealing performance and product life can be solved, thereby improving the overall production effect of the equipment. When the second seal 13 needs to be replaced due to corrosion and leakage, the sealing cavity 17 between the first seal 12 and the second seal 13 can be inflated through the control valve 18 to make it in a non-vacuum atmospheric state to avoid affecting the first seal 12, and then the second seal 13 can be replaced by disassembling the adapter 14.

[0046] Specifically, the control valve 18 includes a first diaphragm valve 182, which is in communication with the first gas pipeline 181 and is used to evacuate the sealed cavity 17. In addition, the control valve 18 includes a second diaphragm valve 183, which is in communication with the first gas pipeline 181 and is used to inflate the sealed cavity 17. In practical applications, the first diaphragm valve 182 is a manual diaphragm valve, and the second diaphragm valve 183 is a pneumatic diaphragm valve.

[0047] When the gas state in the sealed cavity 17 is a vacuum state, the first diaphragm valve 182 is opened and the second diaphragm valve 183 is closed; when the gas state in the sealed cavity 17 is a non-vacuum state, the first diaphragm valve 182 is closed and the second diaphragm valve 183 is opened.

[0048] That is to say, the sealing cavity 17 between the first sealing member 12 and the second sealing member 13 is evacuated by opening the first diaphragm valve 182 and closing the second diaphragm valve 183; the sealing cavity 17 between the first sealing member 12 and the second sealing member 13 is inflated by opening the second diaphragm valve 183 and closing the first diaphragm valve 182. The first diaphragm valve 182 may be a manual diaphragm valve, and the second diaphragm valve 183 may be a pneumatic diaphragm valve, so that when the device is operating normally, the manual diaphragm valve is in an open state, and the pneumatic diaphragm valve is in a closed state; when the second sealing member 13 needs to be replaced, the manual diaphragm valve is in a closed state, and the pneumatic diaphragm valve is in an open state.

[0049] In some optional embodiments, a three-way valve 1811 may be provided on the first gas pipeline 181, so that the through hole, the first diaphragm valve 182, and the second diaphragm valve 183 are respectively connected to one end of the three-way valve 1811. Of course, corresponding sub-branches may also be provided on the first gas pipeline 181, so that the first diaphragm valve 182 and the second diaphragm valve 183 are respectively located on different sub-branches.

[0050] Combination Figure 4 In one embodiment, the vacuum transmission valve 1 further includes a gas detection device 19, which is connected to the sealed cavity 17 through a second gas pipeline 191 and is used to detect the gas state in the sealed cavity 17. Here, the second gas pipeline 191 can be another pipeline independent of the first gas pipeline 181, or a sub-branch extending from the first gas pipeline 181.

[0051] Specifically, the gas detection device 19 can be a residual gas analyzer RGA. The residual gas analyzer (RGA) is a branch of the mass spectrometer. It effectively monitors the conditions of the vacuum environment process by dynamically analyzing the changes in the partial pressure of various gases in the vacuum system, ensuring that various vacuum processes achieve measurable, controllable and repeatable effects. The working principle of RGA is that in the vacuum chamber, the RGA ion differentiater ionizes the gas molecules, and the ionized charged particles enter the deflection electric field generated by the quadrupole. Due to the different mass numbers of different particles, the deflection radius formed under the action of a specific electric field is also different. By changing the electric field, the concentration of ions with different mass numbers can be detected, and the electric field scan can be performed to calculate the composition of the gas contained in the vacuum chamber.

[0052] In this embodiment, a gas detection device 19 is provided to detect the gas state in the sealed cavity 17 between the first seal 12 and the second seal 13, so as to determine whether corrosion leakage and the like occur. That is, when the equipment is operating normally, the sealed cavity 17 is in a vacuum state, and when the second seal 13 has corrosion leakage problems, the gas detection device 19 can detect abnormal leakage gas in the sealed cavity 17. In other words, in this embodiment, the gas detection device 19 detects the gas state of the sealed cavity 17, so as to achieve the effect of predicting the service life of the second seal 13 and accurately controlling the replacement cycle, so as to avoid the second seal 13 from causing wafer contamination, affecting product yield or causing damage to other vacuum components due to sudden leakage caused by long-term corrosion.

[0053] Furthermore, the gas detection device 19 can also be connected to a computer system 20, so that the gas detection device 19 can upload the detection results to the computer system 20, so that the computer system 20 can determine whether to turn on the alarm and other functions based on the uploaded detection results, thereby achieving the effect of timely terminating the machine operation and reducing product losses.

[0054] In an actual application scenario, the sealing cavity 17 between the first seal 12 and the second seal 13 is detected by RGA, and the detection result is uploaded to the computer system 20. After receiving the detection result, the computer system 20 determines whether the detection result reaches the first preset threshold; if the detection result is determined to reach the first preset threshold, a first-level alarm Warning is issued; if the detection result is determined to reach the second preset threshold, a second-level alarm Alarm is issued, wherein the first preset threshold is lower than the second preset threshold, and the warning level of the first-level alarm Warning is lower than the warning level of the second-level alarm Alarm. In addition, the first preset threshold and the second preset threshold can be set based on historical experience or historical data. When the detection result reaches the first preset threshold, it is believed that the value detected at this time will not affect the product yield based on past experience, so the equipment can be maintained to continue running. When the detection result reaches the second preset threshold, it is determined that the value detected at this time will affect the product yield, so a second-level alarm Alarm is issued to prompt maintenance personnel to perform downtime replacement of the second seal 13 and subsequent recovery process.

[0055] In another practical application scenario, Figure 7 As shown in Figure 10, after the equipment has been operating normally for a period of time, the gas signal intensity detected by RGA tends to be stable. -11 ~10 -15 When the sealing state of the chamber is destroyed and one or more gases enter the sealed cavity 17 between the first sealing member 12 and the second sealing member 13, as shown in FIG. Figure 8 As shown, the signal intensity corresponding to these gases will suddenly increase, such as >10 -8 At this time, it can be determined that the sealed chamber is leaking, so as to achieve the effect of replacing the seal at the chamber connection in advance, thereby avoiding the second seal 13 from failing due to corrosion and affecting the product yield or causing machine loss, thereby improving the product yield.

[0056] like Fig. 9 As shown, an embodiment of the present invention provides a control method for a vacuum transmission valve 1, wherein the space between the first sealing member 12 and the second sealing member 13 is a sealed cavity 17, and the vacuum transmission valve 1 also includes a gas detection device 19, and the gas detection device 19 is connected to the sealed cavity 17 through a second gas pipeline, and the control method includes: steps S101 to S105.

[0057] Step S101, detecting the gas state of the sealed chamber 17 between the first sealing member 12 and the second sealing member 13 by means of the gas detection device 19;

[0058] Step S102, comparing the gas state of the sealed chamber 17 with a first preset threshold and a second preset threshold; wherein the first preset threshold is lower than the second preset threshold;

[0059] Step S103: If the gas state in the sealed chamber 17 does not reach the first preset threshold, the detection action of the gas detection device is continued;

[0060] Step S104: If the gas state in the sealed chamber 17 reaches the first preset threshold but does not reach the second preset threshold, a first-level alarm is issued;

[0061] Step S105: If the gas state in the sealed chamber 17 reaches a second preset threshold, a level 2 alarm is issued; wherein the warning level of the level 1 alarm is lower than the warning level of the level 2 alarm.

[0062] In this embodiment, the gas state in the space between the first seal 12 and the second seal 13 (i.e., the sealed cavity 17) can be detected by the gas detection device 19 to determine whether corrosion leakage and the like occur, that is, when the equipment is operating normally, the space between the first seal 12 and the second seal 13 is in a vacuum state, and when corrosion leakage occurs in the second seal 13, there will be abnormal leakage gas in the space between the first seal 12 and the second seal 13. In other words, in this embodiment, the gas state detection of the sealed cavity 17 between the first seal 12 and the second seal 13 by the gas detection device 19 can achieve the effect of predicting the service life of the second seal 13 and accurately controlling the replacement cycle, so as to avoid the second seal 13 from causing wafer contamination, affecting product yield, or causing damage to other vacuum components due to sudden leakage due to long-term corrosion. Furthermore, when it is determined that the second seal 13 does not need to be replaced, the control valve 18 can be controlled to continue to maintain the current vacuum state. When it is determined that the second seal 13 needs to be replaced, the sealing cavity 17 can be inflated through the control valve 18 to change it from a vacuum state to a non-vacuum atmospheric state.

[0063] Specifically, when the detection result in the sealed cavity 17 between the first seal 12 and the second seal 13 is obtained through the gas detection device 19, it is determined whether the detection result reaches the first preset threshold; if it is determined that the detection result reaches the first preset threshold, a first-level alarm Warning is issued; if it is determined that the detection result reaches the second preset threshold, a second-level alarm Alarm is issued, wherein the first preset threshold is lower than the second preset threshold, and the alarm level of the first-level alarm Warning is lower than the alarm level of the second-level alarm Alarm. In addition, the first preset threshold and the second preset threshold can be set based on historical experience or historical data. When the detection result reaches the first preset threshold, it is believed based on past experience that the value detected at this time will not affect the product yield, so the equipment can be maintained to continue operating. When the detection result reaches the second preset threshold, it is determined that the value detected at this time will affect the product yield, so a second-level alarm Alarm is issued to prompt maintenance personnel to perform downtime replacement of the second seal 13 and the subsequent recovery process.

[0064] An embodiment of the present invention provides a semiconductor thin film device, comprising the vacuum transmission valve 1 as described above.

[0065] The various embodiments in the specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same and similar parts between the various embodiments can be referred to each other. For the system disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part description. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of this application, several improvements and modifications can be made to the present application, and these improvements and modifications also fall within the scope of protection of the claims of this application.

[0066] It should also be noted that, in this specification, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprises", "comprising" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the statement "comprising a ..." does not exclude the presence of other identical elements in the process, method, article or device including the element.

Claims

1. A vacuum transmission valve, applied to a semiconductor thin film device, the semiconductor thin film device comprising a process chamber and a transmission chamber, the vacuum transmission valve comprising a sealing valve box, the sealing valve box being arranged between the process chamber and the transmission chamber, a first sealing member being arranged between the sealing valve box and the process chamber, characterized in that: The vacuum transmission valve further comprises: a second sealing member, disposed on the sealing valve box and located between the first sealing member and the process chamber; The adapter is detachably arranged on the sealing valve box and is used for fixing the second sealing member on the sealing valve box.

2. The vacuum transmission valve according to claim 1, characterized in that: The space between the first sealing member and the second sealing member is a sealed cavity.

3. The vacuum transmission valve according to claim 2, characterized in that: It also includes a control valve, which is connected to the sealed cavity through a first gas pipeline and is used to control the gas state in the sealed cavity.

4. The vacuum transmission valve according to claim 3, characterized in that: The control valve includes a first diaphragm valve, which is connected to the first gas pipeline and is used to evacuate the sealed cavity.

5. The vacuum transmission valve according to claim 3, characterized in that: The control valve includes a second diaphragm valve, which is connected to the first gas pipeline and is used to inflate the sealed cavity.

6. The vacuum transmission valve according to claim 2, characterized in that: It also includes a gas detection device, which is connected to the sealed cavity through a second gas pipeline and is used to detect the gas state in the sealed cavity.

7. The vacuum transmission valve according to claim 6, characterized in that: The gas detection device is a residual gas analyzer.

8. The vacuum transmission valve according to claim 1, characterized in that: The adapter part is an adapter plate, and the adapter plate is detachably mounted on the sealing valve box through a fixing piece.

9. A control method for a vacuum transmission valve according to claim 1, wherein the space between the first sealing member and the second sealing member is a sealed cavity, and the vacuum transmission valve further comprises a gas detection device, and the gas detection device is connected to the sealed cavity through a second gas pipeline, characterized in that: The control method comprises: Detecting the gas state of the sealed chamber between the first sealing member and the second sealing member by a gas detection device; Comparing the gas state of the sealed chamber with a first preset threshold and a second preset threshold; wherein the first preset threshold is lower than the second preset threshold; If the gas state in the sealed chamber does not reach the first preset threshold, continuing to maintain the detection action of the gas detection device; If the gas state in the sealed chamber reaches a first preset threshold but does not reach a second preset threshold, a first level alarm is issued; If the gas state in the sealed chamber reaches a second preset threshold, a level 2 alarm is issued; wherein the warning level of the level 1 alarm is lower than the warning level of the level 2 alarm.

10. A semiconductor thin film device, characterized in that: Comprising a vacuum transmission valve as described in any one of claims 1-8.

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