Impurity removal device for ITO (indium tin oxide) slurry and working method of impurity removal device

Abstract

The invention discloses an ITO slurry impurity removal device and a working method thereof, and relates to the technical field of impurity removal devices, the impurity removal device comprises a stirring barrel, and a stirring mechanism and a screening mechanism are installed in the stirring barrel; the stirring mechanism comprises a turntable arranged at the top end in the stirring barrel, and the top side of the turntable is connected with a driving mechanism for driving the turntable to rotate; the bottom side of the turntable is connected with a plurality of circumferentially distributed stirring rods; the screening mechanism comprises a barrel-shaped inner supporting frame and a barrel-shaped outer supporting frame, the outer supporting frame is arranged outside the inner supporting frame and located among the stirring rods, the inner supporting frame and the outer supporting frame are inversely fixed to the bottom of the stirring barrel, and through holes are formed in the surfaces of the inner supporting frame and the outer supporting frame; an inner screen is arranged on the surface of the inner supporting frame, and an outer screen is arranged on the surface of the outer supporting frame. A plurality of resin particles are filled between the inner screen and the outer screen, and the particle size of the resin particles is larger than the pore diameter of the inner screen and the outer screen; according to the device, iron impurities and other foreign matters in the I TO slurry can be effectively removed, and the impurity removal effect is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of impurity removal device, and specifically relates to a impurity removal device for ITO slurry and its working method. Background Art

[0002] In the process of ITO target preparation, indium tin oxide slurry needs to be dispersed, emulsified, ground, etc. During this period, iron impurities will be introduced due to equipment wear, and wood chips, paper scraps, rubber, plastic and other environmental foreign matter will be introduced during the feeding process due to the open operation of some equipment.

[0003] At the same time, iron exists in ITO slurry mainly in the form of elemental iron and free iron, and iron will have many adverse effects on the back-end sputtering, such as interfering with the electrical properties of the ITO film, increasing the resistivity and reducing the conductivity, changing the crystal structure of the film or forming scattering centers at the grain boundaries to hinder electron transmission; reducing the purity of the film, affecting the quality of products such as high-precision optoelectronic devices; causing changes in the sputtering rate, resulting in uneven sputtering on the target surface, affecting the uniformity of the film thickness. In addition, the presence of environmental foreign matter and large indium tin oxide particles will also affect the quality of the ITO target.

[0004] Therefore, ITO slurry needs to be removed before it is put into use. However, ordinary strong magnetic iron removal devices in the prior art can only collect elemental iron but cannot remove free iron, and the removal effect on environmental foreign matter and large indium tin oxide particles is not ideal. Based on this, the removal effect of ITO slurry needs to be improved. Summary of the invention

[0005] The object of the present invention is to provide a decompression removal device for ITO slurry and its working method to solve the following technical problems:

[0006] How to improve the impurity removal effect of ITO slurry.

[0007] The purpose of the present invention can be achieved through the following technical solutions:

[0008] In the first aspect, the present invention discloses a decompression device for ITO slurry, including a stirring drum, wherein the stirring mechanism and a screening mechanism are installed;

[0009] The stirring mechanism comprises a turntable arranged at the top of the mixing drum, the top side of the turntable is connected to a driving mechanism for driving the turntable to rotate; the bottom side of the turntable is connected to a plurality of stirring rods distributed circumferentially;

[0010] The screening mechanism comprises an inner support frame and an outer support frame, both of which are barrel-shaped, the outer support frame is arranged outside the inner support frame and is located between a plurality of stirring rods, the inner support frame and the outer support frame are both inverted and fixed to the bottom of the mixing drum, and both have through holes on their surfaces; an inner screen is arranged on the surface of the inner support frame, and an outer screen is arranged on the surface of the outer support frame, and the apertures of the inner screen and the outer screen are both larger than the through holes;

[0011] Several resin particles are filled between the inner screen and the outer screen, and the particle size of the resin particles is larger than the pore size of the inner screen and the outer screen.

[0012] In a further aspect of the present invention, the pore diameter of the outer screen is 40 mesh, the pore diameter of the inner screen is 325 mesh, and the particle diameter of the resin particles is 1 mm.

[0013] In a further aspect of the present invention, the stirring rod is a strong magnetic rod or a superconducting magnet rod.

[0014] In a further aspect of the present invention, the resin particles are chloride ion exchange resin particles or chelating resin particles.

[0015] In a further aspect of the present invention, both the outer screen and the inner screen are ultrasonic vibrating screens.

[0016] In a further embodiment of the present invention: the driving mechanism includes a motor and a rotating shaft connected to the output end of the motor, the motor is fixedly arranged at the external top end of the mixing drum, and the rotating shaft is movably arranged through the top wall of the mixing drum and extends to the inside of the mixing drum and is connected to the top side of the turntable.

[0017] In a further aspect of the present invention, the motor is fixedly installed on the outer top of the mixing drum by a connecting plate, and an organic seal is installed between the rotating shaft and the top wall of the mixing drum to ensure sealing performance.

[0018] In a further aspect of the present invention, a pressure adjustment device is installed on the stirring drum to automatically adjust the internal pressure of the stirring drum.

[0019] In a further embodiment of the present invention: a feed port is provided at the upper end of the side wall of the mixing drum, the feed port is connected to a feed pipe, and a discharge port is provided at the bottom of the feed port; the pressure regulating device is a pressure-compensated variable pump installed on the feed pipe.

[0020] In a further aspect of the invention, the pressure regulating device may also be a combination of a constant flow pump and a pressure sensor.

[0021] In a further aspect of the present invention, a pressure gauge is provided on the outer top side of the stirring drum.

[0022] In a further embodiment of the present invention: the bottom circle of the inner support frame is detachably fixed to the bottom side of the mixing drum by threaded engagement, and the discharge port is located at the center of the bottom circle of the inner support frame; the bottom of the outer support frame is detachably fixed to the outer side of the bottom of the inner support frame by a clamp.

[0023] In a further embodiment of the present invention: the outer support frame includes an outer support cylinder and a top cover, the bottom of the outer support cylinder is detachably fixed to the outer side of the bottom of the inner support frame by a clamp, the top cover is detachably fixed to the upper end of the outer support cylinder by threaded engagement, and a handle is also installed on the top of the top cover.

[0024] In a further embodiment of the present invention, the mixing drum comprises a mixing drum body, an upper end cover and a lower end cover, and the upper end cover and the lower end cover are detachably mounted on the upper end and the lower end of the mixing drum body respectively through clamps.

[0025] In the second aspect, the present invention also discloses a working method of a decompression device for ITO slurry as described above, characterized in that it includes the following working steps:

[0026] S1. Open the feed port and discharge port, feed ITO slurry into the mixing drum, and at the same time start the stirring mechanism to keep the stirring shaft rotating;

[0027] S2. When the ITO slurry is stirred by the stirring shaft, the iron-containing impurities therein are adsorbed by the stirring shaft, and the ITO slurry is sent between the outer screen and the inner screen. When passing through the outer screen, the outer screen intercepts the impurities in the ITO slurry; after entering between the outer screen and the inner screen, the ITO slurry is mixed with the resin particles, and the resin particles adsorb and remove the impurities in the ITO slurry;

[0028] S3. The ITO slurry between the outer screen and the inner screen passes through the inner screen and is discharged from the bottom discharge port.

[0029] Beneficial effects of the present invention:

[0030] 1. The stirring shaft in the ITO slurry impurity removal device of the present invention adopts a strong magnetic rod or a superconducting magnetic rod, which can effectively absorb and remove the metal elemental iron in the ITO slurry; a screening mechanism is also provided, in which the outer screen can intercept other environmental foreign impurities (such as wood chips, paper scraps, rubber, plastic, etc.) and large indium tin oxide particles, avoiding internal defects or surface flaws of the target material caused by large particle impurities, and improving the density and uniformity of the target material; the particles between the outer screen and the inner screen can remove the free iron impurities in the ITO slurry, thereby achieving the effect of deep impurity removal, and greatly improving the purity of the ITO slurry.

[0031] 2. The impurity removal device of the ITO slurry of the present invention can reduce the interference of iron impurities on the crystal structure of the ITO film and the formation of scattering centers at the grain boundaries by reducing the iron content in the ITO slurry, thereby significantly reducing the resistivity of the film, improving the conductivity, and making the prepared ITO target material more stable and excellent in electrical properties, and better meeting the strict requirements of various electronic devices for conductivity; and because the iron impurities are efficiently removed, the problem of sputtering rate changes caused by different sputtering yields of iron and the main components of the target material (indium, tin, etc.) is avoided, and the stability and consistency of the sputtering process are guaranteed. It makes it possible to accurately control the thickness and quality of the film during the sputtering process, improve the controllability and repeatability of the production process, and reduce production costs and scrap rates; it effectively prevents the uneven sputtering phenomenon on the target surface caused by iron impurities, and ensures that the uniformity of the film thickness is significantly improved during the sputtering process. This is crucial for the production of large-area, high-precision ITO films, which can improve the optical performance and display effects of the product. For example, in display technology fields such as liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), it can reduce color difference and uneven brightness on screen displays and enhance the visual experience.

[0032] 3. The ITO slurry impurity removal device of the present invention can effectively reduce the adverse effects of impurities on product quality and performance for application scenarios with extremely high purity requirements such as high-precision optoelectronic devices by improving the purity of the ITO slurry, improve the yield and reliability of the product, and enhance the competitiveness of ITO targets in the high-end market.

[0033] 4. The ITO slurry impurity removal device of the present invention is also provided with a pressure regulating device. For example, the use of a pressure-compensated variable pump effectively prevents the problems of screen deformation and poor ion exchange effect caused by excessive pressure. At the same time, the stirring shaft disturbs the slurry, avoiding the adhesion and clogging of the slurry on the screen, ensuring the continuous and efficient filtration process, which not only extends the service life of the screen and reduces the equipment maintenance cost, but also improves the production efficiency of the entire ITO slurry treatment process, ensuring the stable operation and continuous production capacity of the production line. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The present invention will be further described below in conjunction with the accompanying drawings.

[0035] Figure 1 It is a structural diagram of the decontamination device for ITO slurry in Example 1 of the present invention;

[0036] Figure 2 is a bottom view of the turntable in Embodiment 1 of the present invention;

[0037] Figure 3 It is a side view of the turntable and the stirring shaft in Embodiment 1 of the present invention.

[0038] In the figure: 1. mixing drum; 101. feed port; 102. feed pipe; 103. discharge port; 2. mixing mechanism; 201. motor; 202. rotating shaft; 203. turntable; 204. mixing shaft; 3. screening mechanism; 301. inner support frame; 302. inner screen; 303. outer support frame; 304. outer screen; 4. resin particles; 5. pressure gauge; 6. pressure-compensated variable pump. DETAILED DESCRIPTION

[0039] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0040] Example 1

[0041] See also Figure 1 The present embodiment discloses an impurity removal device for ITO slurry, comprising a mixing drum 1, wherein the mixing drum 1 is composed of a cylindrical mixing drum body with upper and lower openings, a circular upper end cover and a conical lower end cover, wherein the upper end cover and the lower end cover are detachably mounted on the upper end and the lower end of the mixing drum body through clamps, respectively, thereby forming a closed mixing drum; a feed port 101 is mounted at the upper end of the drum body side wall, a feed pipe 102 is connected to the feed port 101, and the ITO slurry enters the mixing drum 1 through the feed pipe 102 and the feed port 101, and a discharge port 103 is mounted at the bottom of the lower end cover for discharging the ITO slurry after impurities are removed, and valves (not shown in the figure) are mounted on the feed port 101 and the discharge port 103 for controlling the feeding and discharging of the ITO slurry.

[0042] See also Figure 2-3 A stirring mechanism 2 is installed at the center of the upper end cover of the mixing drum 1, and the stirring mechanism 2 includes a motor 201, a rotating shaft 202, a rotating disk 203 and a stirring shaft 204; wherein the motor 201 and the rotating shaft 202 are combined to form a driving mechanism, the motor 201 is fixedly installed at the center of the top of the upper end cover through a connecting disk, the rotating shaft 202 is fixedly connected to the output end at the bottom of the motor 201, the rotating shaft 202 is movably arranged at the center of the upper end cover and extends to the center of the top of the mixing drum 1, and the rotating shaft 202 and the upper end cover are sealed by a mechanical seal; the rotating disk 203 is arranged at the center of the top of the mixing drum 1, its disk surface is horizontal with the plane of the upper end cover, and its top side is connected to the lower end of the rotating shaft 202; a plurality of stirring shafts 204 are installed around the edge of the bottom side of the rotating disk 203, and the plurality of stirring shafts 204 are evenly distributed circumferentially, and the stirring shaft 204 is a strong magnetic rod that can absorb metal impurities in the ITO slurry.

[0043] Specifically, starting the motor 201 in the driving mechanism can drive the rotating shaft 202 to rotate, and the rotating shaft 202 drives the turntable 203 to rotate accordingly, and the turntable 203 drives several stirring shafts 204 on the bottom side to move accordingly, thereby stirring the ITO slurry entering the stirring drum 1; it should be noted that the driving mechanism in the stirring mechanism 2 is not limited to the structure in this embodiment. In other embodiments, the driving mechanism can be other structures, which only needs to satisfy the function of driving the turntable 203 to rotate.

[0044] The mixing drum 1 is also provided with a screening mechanism 3, which is composed of an inner support frame 301, an inner screen 302, an outer support frame 303, and an outer screen 304. The inner support frame 301 and the outer support frame 303 are both barrel-shaped, and both are fixed inverted; wherein, the bottom circle of the inner support frame 301 is detachably fixed to the inner bottom side of the mixing drum 1 by means of threaded engagement, and the discharge port 103 is located at the center of the bottom circle of the inner support frame 301; the bottom of the outer support frame 303 is detachably fixed to the inner support frame 301 by means of a clamp 1 is located outside the bottom and between the plurality of stirring shafts 204, an independent space is formed between the outer support frame 303 and the inner support frame 301, and through holes are opened on the surfaces of both; the inner screen 302 is fitted on the surface of the inner support frame 301, and the outer screen 304 is fitted on the surface of the outer support frame 303; the apertures of the outer screen 304 and the inner screen 302 are respectively smaller than the through holes on the outer support frame 303 and the inner support frame 301. In this embodiment, the aperture of the outer screen 304 is 40 meshes, and the aperture of the inner screen 302 is 325 meshes.

[0045] The independent space formed between the outer support frame 303 and the inner support frame 301 can also be regarded as the independent space formed between the outer screen 304 and the inner screen 302. A number of resin particles 4 are filled in the independent space. The particle size of the resin particles 4 needs to be larger than the aperture of the inner screen 302 and the outer screen 304 to avoid leakage of the resin particles 4. In this embodiment, the resin particles 4 are spherical chloride ion exchange resin particles with a particle size of 1 mm.

[0046] Specifically, after the ITO slurry enters the mixing drum 1, the ITO slurry will be brought into an independent space under the disturbance of the rotating stirring of the stirring mechanism 2. During this process, the ITO slurry first passes through the outer screen 304 to enter the independent space. The outer screen 304 can intercept large particles of impurities in the ITO slurry, and under the disturbance force, it can prevent impurities from clogging the through holes of the outer screen 304. After entering the independent space, the ITO slurry is mixed with chloride ion exchange resin particles. The chloride ion exchange resin particles can absorb free iron impurities in the ITO slurry, so that the ITO slurry is further purified. The purified ITO slurry passes through the inner screen 302 and falls into the bottom of the mixing drum 1 and is discharged from the discharge port 103.

[0047] It should be noted that the sizes of the inner screen 302, the outer screen 304 and the resin particles 4 are not limited to the present embodiment, and other sizes may be selected in other embodiments according to the actual situation, as long as the particle size of the resin particles 4 is larger than the aperture size of the inner screen 302 and the outer screen 304; and in order to allow the purified ITO slurry to be discharged more smoothly, the aperture size of the inner screen 302 is preferably larger than the aperture size of the outer screen 304.

[0048] A pressure-compensating variable pump 6 is installed on the feed pipe 102, and a pressure gauge 5 is also installed on the outside of the upper end cover of the mixing drum 1; the pressure-compensating variable pump 6 serves as a pressure regulating device of the equipment, which can automatically and accurately adjust the pressure inside the mixing drum 1 to ensure the normal operation of the inner screen 302 and the outer screen 304 to avoid their deformation, and also to keep the resin particles 4 in a good working condition.

[0049] The outer support frame 303 is composed of an outer support cylinder and a top cover. The bottom of the outer support cylinder is detachably fixed to the outer side of the bottom of the inner support frame 301 by a clamp, and the top cover is detachably fixed to the upper end of the outer support cylinder by threaded engagement. A handle is also installed on the top of the top cover to facilitate disassembly of the screening mechanism 3.

[0050] The working principle of this embodiment is: first, the ITO slurry containing iron impurities, environmental foreign matter and large particles of indium tin oxide is introduced into the impurity removal device, and the motor 201 is started to make the strong magnetic rod start to rotate, so as to capture and collect the elemental iron in the ITO slurry; at the same time, the ITO slurry begins to be disturbed under the action of the strong magnetic rod and flows to the outer screen 304 to enter the independent space. When passing through the outer screen 304, the ITO slurry is filtered, and environmental foreign matter and large particles of indium tin oxide can be screened out; when the ITO slurry passes through the chloride ion exchange resin in the independent space, the free iron is removed. The pressure compensation variable pump 6 monitors and controls the pressure in the ITO slurry filtration process in real time to ensure that the whole process is carried out stably and efficiently, so as to obtain high-quality ITO slurry with iron impurities, environmental foreign matter and large particles removed, so as to meet the requirements of subsequent ITO target material preparation and back-end sputtering process.

[0051] Example 2

[0052] This embodiment is further improved on the basis of Embodiment 1. Compared with Embodiment 1, the only difference is that the stirring rod 204 is replaced by a superconducting magnet rod from a strong magnetic rod. The superconducting magnet has a higher magnetic field strength and a better magnetic field gradient, and can more effectively capture the elemental iron particles in the ITO slurry, and may even produce an adsorption effect on some free iron that is weakly bound to other substances, so it can have a stronger impurity removal effect.

[0053] Example 3

[0054] This embodiment is further improved on the basis of Example 1. Compared with Example 1, the only difference is that the resin particles 4 are replaced by chelating resin particles from chloride ion exchange resin particles. The chelating resin particles can form stable chelates with free iron ions in the ITO slurry through specific functional groups to remove them. However, it should be noted that when using it, it is necessary to screen the appropriate type of chelating resin and optimize its use conditions in the slurry, such as contact time, resin dosage, etc.

[0055] Example 4

[0056] This embodiment is further improved on the basis of Embodiment 1. Compared with Embodiment 1, the only difference is that the inner screen 302 and the outer screen 304 are replaced with ultrasonic vibration screens. The ultrasonic vibration can make the ITO slurry on the screen in a high-frequency vibration state, which is not easy to adhere to the screen. At the same time, the ultrasound may also have a certain dispersing effect on the ITO slurry, which helps to improve the filtering effect.

[0057] Example 5

[0058] This embodiment is further improved on the basis of Embodiment 1. Compared with Embodiment 1, the only difference is that the pressure regulating device is replaced by the pressure-compensating variable pump 6 with a combination of a constant flow pump and a pressure sensor. The constant flow pump conveys the slurry at a constant flow rate, and the pressure sensor monitors the system pressure in real time. When the pressure exceeds the set value, the pressure is adjusted by adjusting the speed or other parameters of the constant flow pump (which belongs to the prior art and the specific connection method will not be described in detail) to achieve the purpose of stabilizing the pressure, protecting the screen and the resin adsorption effect similar to the pressure-compensating variable pump 6.

[0059] Example 6

[0060] This embodiment discloses a working method of a decompression device for ITO slurry as described in any of Examples 1-5, including the following working steps:

[0061] S1 , open the feed port 101 and discharge port 103 , feed ITO slurry into the mixing drum 1 , and simultaneously start the stirring mechanism 2 , so as to keep the stirring shaft 204 rotated;

[0062] S2, under the stirring of the stirring shaft 204, the iron-containing impurities in the ITO slurry are adsorbed by the stirring shaft 204, and the ITO slurry is sent between the outer screen 304 and the inner screen 302. When passing through the outer screen 304, the outer screen 304 intercepts the impurities in the ITO slurry; after entering between the outer screen 304 and the inner screen 302, the ITO slurry is mixed with the resin particles 4, and the resin particles 4 adsorb and remove the impurities in the ITO slurry;

[0063] S3 , the ITO slurry between the outer screen 304 and the inner screen 302 passes through the inner screen 302 and is then discharged from the bottom discharge port 103 .

[0064] In the description of the present invention, it should be understood that the terms "upper", "lower", "left", "right", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction and a specific direction structure and operation, and therefore, cannot be understood as a limitation on the present invention. In addition, "first" and "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0065] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", etc. should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0066] The above is a detailed description of an embodiment of the present invention, but the content is only a preferred embodiment of the present invention and cannot be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made within the scope of the present invention should still fall within the scope of the patent coverage of the present invention.

Claims

1. An impurity removal device for ITO slurry, comprising a stirring drum (1), characterized in that: A stirring mechanism (2) and a screening mechanism (3) are installed in the stirring drum; The stirring mechanism (2) comprises a rotating disk (203) arranged at the top end of the stirring drum (1); the top side of the rotating disk (203) is connected to a driving mechanism for driving the rotating disk (203) to rotate; the bottom side of the rotating disk (203) is connected to a plurality of stirring rods (204) distributed in the circumferential direction; The screening mechanism (3) comprises an inner support frame (301) and an outer support frame (303) both of which are barrel-shaped, the outer support frame (303) being arranged outside the inner support frame (302) and between a plurality of stirring rods (204), the inner support frame (301) and the outer support frame (303) being inverted and fixed to the bottom of the stirring drum (1), and having through holes on their surfaces; an inner screen (302) is arranged on the surface of the inner support frame (301), and an outer screen (304) is arranged on the surface of the outer support frame (303), and the apertures of the inner screen (302) and the outer screen (304) are both larger than the through holes; A plurality of resin particles (4) are filled between the inner screen (302) and the outer screen (304), and the particle size of the resin particles (4) is larger than the apertures of the inner screen (302) and the outer screen (304).

2. The impurity removal device for ITO slurry according to claim 1, characterized in that: The stirring rod (204) is a strong magnetic rod or a superconducting magnet rod.

3. The impurity removal device for I TO slurry according to claim 1, characterized in that: The resin particles (4) are chloride ion exchange resin particles or chelating resin particles.

4. The impurity removal device for I TO slurry according to claim 1, characterized in that: The driving mechanism comprises a motor (201) and a rotating shaft (202) connected to the output end of the motor (201); the motor (201) is fixedly arranged at the external top end of the mixing drum (1); the rotating shaft (202) is movably arranged through the top wall of the mixing drum (1) and extends into the interior of the mixing drum (1) to be connected to the top side of a rotating disk (203).

5. The impurity removal device for I TO slurry according to claim 1, characterized in that: The mixing drum (1) is provided with a pressure regulating device for automatically regulating the internal pressure of the mixing drum (1).

6. The impurity removal device for I TO slurry according to claim 5, characterized in that: A feed port (101) is provided at the upper end of the side wall of the mixing drum (1), the feed port (101) is connected to a feed pipe (102), and a discharge port (103) is provided at the bottom of the feed port (101); the pressure regulating device is a pressure-compensated variable pump (6) installed on the feed pipe (102).

7. The impurity removal device for I TO slurry according to claim 1, characterized in that: A pressure gauge (5) is provided on the external top side of the mixing drum (1).

8. The impurity removal device for I TO slurry according to claim 1, characterized in that: The bottom circle of the inner support frame (301) is detachably fixed to the bottom side of the mixing drum (1) by means of threaded engagement, and the discharge port (103) is located at the center of the bottom circle of the inner support frame (301); the bottom of the outer support frame (303) is detachably fixed to the outer side of the bottom of the inner support frame (301) by means of a clamp.

9. The impurity removal device for I TO slurry according to claim 1, characterized in that: The mixing drum (1) comprises a mixing drum body, an upper end cover and a lower end cover, wherein the upper end cover and the lower end cover are detachably mounted on the upper end and the lower end of the mixing drum body respectively through clamps.

10. A working method of the I TO slurry impurity removal device according to any one of claims 1 to 9, characterized in that: The following steps are included: S1, opening the feed port (101) and the discharge port (103), feeding ITO slurry into the stirring drum (1) through (102), and simultaneously starting the stirring mechanism (2) to keep the stirring shaft (204) rotating; S2, when the ITO slurry is stirred by the stirring shaft (204), the iron-containing impurities therein are adsorbed by the stirring shaft (204), and at the same time, the ITO slurry is sent between the outer screen (304) and the inner screen (302), and when passing through the outer screen (304), the outer screen intercepts the impurities in the ITO slurry; after entering between the outer screen (304) and the inner screen (302), the ITO slurry is mixed with the resin particles (4), and the resin particles (4) adsorb and remove the impurities in the ITO slurry; S3. The ITO slurry between the outer screen (304) and the inner screen (302) passes through the inner screen (302) and is then discharged from the discharge port (103) at the bottom.

Images