MPCVD structure with integrally liftable reaction cavity
By designing an MPCVD structure that can be lifted and lowered, the problem of inconvenient cleaning of the fixed reaction chamber is solved, the internal wall of the chamber is conveniently cleaned and maintained, and the efficiency of equipment and product quality are improved.
Patent Information
- Application Number
- CN202421087265.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-17
- Publication Date
- 2024-12-31
- Estimated Expiration
- 2034-05-17
AI Technical Summary
The reaction chamber of existing MPCVD equipment is fixed and has a constant height, which is inconvenient for cleaning and maintenance of the interior wall of the cavity chamber, affecting the efficiency of the equipment and product quality.
A MPCVD structure in which the reaction chamber can be lifted and lowered as a whole is designed. The microwave source, waveguide transmission system and microwave reaction chamber are driven to lift and lower the microwave reaction chamber through the first lifting mechanism, increase the spacing between the inner wall of the cavity for cleaning, and sealing is achieved through a vacuum sealing ring. Ensure sealing during lifting.
It realizes convenient cleaning and maintenance of the inner wall of the microwave reaction chamber, improves the maintenance efficiency of the equipment and product quality, and ensures the vacuum sealing and working efficiency of the chamber.
Smart Images

Figure CN222274789U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of MPCVD equipment, in particular to an MPCVD structure with a reaction chamber capable of being lifted and lowered as a whole. Background Art
[0002] The MPCVD device is a device used to grow single crystals and polycrystalline diamonds in batches. Chemical vapor deposition (CVD) technology is widely used in the preparation of crystals such as diamond, diamond-like carbon, silicon oxide, amorphous silicon, etc. It has the advantages of low deposition temperature, easy control of thin film composition, and good uniformity. Among them, microwave plasma chemical vapor deposition (MPCVD) has become the most promising technology for preparing high-quality diamonds due to its advantages such as non-polar discharge, less pollution, and high plasma density. The reaction chamber of MPCVD is sealed as a whole, and the substrate stage is lifted and lowered as a whole to facilitate the removal of samples and adjust the position of the substrate stage in the chamber. For example, application number: 202211242465.9 discloses such a design, but the chambers of this type of design are fixed and the height remains unchanged, which is not convenient for cleaning the inner wall of the chamber, so further improvement is needed. Utility Model Content
[0003] Based on this, it is necessary to provide an MPCVD structure in which the reaction chamber can be raised and lowered as a whole to address the above problems.
[0004] An MPCVD structure in which a reaction cavity can be lifted as a whole comprises a chassis, a first lifting mechanism, a microwave source, a waveguide transmission system, a microwave reaction cavity and a substrate stage, wherein the first lifting mechanism is vertically mounted on the side wall of the chassis, and its output end is upward and connected to the bottom of the waveguide transmission system, the output end of the microwave source is connected to the input end of the waveguide transmission system, the output end of the waveguide transmission system is connected to the upper end of the microwave reaction cavity, the upper end of the microwave reaction cavity is sealed by glass, the microwave reaction cavity is located directly above the substrate stage, and the lower end of the microwave reaction cavity is movably abutted against the desktop flange of the chassis.
[0005] Preferably, the output end of the first lifting mechanism is movably connected to the waveguide transmission system via a bearing, and the waveguide transmission system is rotatable.
[0006] Preferably, a molybdenum table is arranged on the table surface of the substrate table.
[0007] Preferably, a second lifting mechanism is installed below the substrate stage, and the second lifting mechanism drives the substrate stage to move up and down in the microwave reaction cavity.
[0008] Preferably, the outer cover of the second lifting mechanism is provided with a vacuum bellows, the upper end of the vacuum bellows is connected to the lower end surface of the substrate table, and the lower end of the vacuum bellows is connected to the second lifting mechanism.
[0009] Preferably, a sealing ring is provided at the edge of the desktop flange, and the sealing ring is interference-fitted between the desktop flange and the end of the microwave reaction cavity.
[0010] Preferably, a power head balancing block is also provided below the microwave source.
[0011] The utility model is beneficial in that: the first lifting mechanism is used to drive the microwave source, the waveguide transmission system and the microwave reaction cavity to rise and fall as a whole; when rising, the distance between the microwave reaction cavity and the substrate table increases, which is convenient for cleaning the inner wall of the microwave reaction cavity, thereby facilitating the taking of materials and, more importantly, facilitating the cleaning of the inner wall of the microwave reaction cavity, greatly facilitating equipment maintenance and ensuring product quality; when descending, the vacuum sealing ring between the flange at the lower end of the microwave reaction cavity and the desktop flange is compressed to achieve vacuum sealing of the microwave reaction cavity, thereby improving work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] Figure 1 This is a schematic diagram of a closed state of an MPCVD structure in which a reaction chamber can be raised and lowered as a whole according to one embodiment;
[0013] Figure 2 This is a schematic diagram of the separation state of an MPCVD structure in which the reaction chamber can be raised and lowered as a whole. DETAILED DESCRIPTION
[0014] In order to make the above-mentioned purposes, features and advantages of the utility model more obvious and easy to understand, the specific implementation methods of the utility model are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the utility model. However, the utility model can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the utility model, so the utility model is not limited by the specific embodiments disclosed below.
[0015] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation method.
[0016] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art in the technical field of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.
[0017] like Figures 1-2 As shown, an MPCVD structure in which a reaction cavity can be lifted and lowered as a whole comprises a chassis 1, a first lifting mechanism 2, a microwave source 3, a waveguide transmission system 4, a microwave reaction cavity 5 and a substrate stage 6. The first lifting mechanism 2 is vertically mounted on the side wall of the chassis 1, and its output end is upward and connected to the bottom of the waveguide transmission system 4. The output end of the microwave source 3 is connected to the input end of the waveguide transmission system 4, and the output end of the waveguide transmission system 4 is connected to the upper end of the microwave reaction cavity 5. The upper end of the microwave reaction cavity 5 is closed by a glass 51. The microwave reaction cavity 5 is located directly above the substrate stage 6, and the lower end of the microwave reaction cavity 5 is movably abutted against the desktop flange 11 of the chassis 1. Specifically, in this embodiment, the bottom of the chassis 1 is provided with a pulley to facilitate displacement in the workshop and adjust the position according to production needs. The first lifting mechanism 2 is installed vertically, and the output end is connected to the bottom of the waveguide transmission system 4, the waveguide transmission system 4 is arranged horizontally, the microwave source 3 is connected to the input end of the waveguide transmission system 4, and the output end of the waveguide transmission system 4 is connected to the microwave reaction cavity 5 to form an L shape, so that the lower end of the microwave reaction cavity 5 is located directly above the substrate stage 6. When the first lifting mechanism 2 drives the microwave transmission system 4 to rise and fall, it also drives the microwave reaction cavity 5 to rise and fall synchronously, and the substrate stage 6 moves through the microwave reaction cavity 5. The desktop flange 11 on the chassis 1 is passed through, so that when the microwave reaction cavity 5 is raised or lowered, the flange 52 at the lower end thereof can be closed or separated from the end face of the desktop flange 11. In the closed state, the microwave reaction box 5 is vacuum-sealed and can start working to grow crystals, thereby improving the working efficiency. When separated, it can be understood that the height of the microwave reaction cavity 5 is increased, and the flange 52 at the lower end of the microwave reaction cavity 5 is separated from the desktop flange 11, and the distance between them is increased, which is convenient for maintenance personnel to clean impurities remaining on the inner wall of the microwave reaction cavity 5, and the operation is extremely convenient and quick, thereby improving the working efficiency.
[0018] like Figures 1-2 As shown, the output end of the first lifting mechanism 2 is movably connected to the waveguide transmission system 4 through a bearing. The waveguide transmission system 4 is rotatable. When cleaning is required, the waveguide transmission system 4 can be rotated manually or by a rotating motor, so that the microwave reaction cavity 5 and the substrate stage 6 are misaligned. At the same time, the first lifting mechanism 2 raises the height of the microwave reaction cavity 5, which is convenient for maintenance personnel to clean impurities accumulated on the inner wall of the microwave reaction cavity 5. The operation is extremely convenient and the cleaning difficulty is reduced.
[0019] like Figures 1-2 As shown, a molybdenum platform 61 is arranged on the platform surface of the substrate platform 6 , which has good microwave absorption and conduction properties so as to effectively convert microwave energy into heat energy and transfer it to the substrate on the molybdenum platform 61 .
[0020] like Figures 1-2 As shown, a second lifting mechanism 62 is installed under the substrate stage 6, and the second lifting mechanism 62 drives the substrate stage 6 to move up and down in the microwave reaction cavity 5, so as to adjust the position of the table top of the substrate stage 6 in the microwave reaction cavity 5, so as to put the substrate in the best growth position and improve the quality of the finished product.
[0021] like Figures 1-2 As shown, the second lifting mechanism 62 is covered with a vacuum bellows 63, the upper end of the vacuum bellows 63 is connected to the lower end surface of the substrate stage 6, and the lower end of the vacuum bellows 63 is connected to the second lifting mechanism 62. Specifically, the vacuum bellows 63 has a certain telescopic performance and can be raised and lowered synchronously with the substrate stage 6 to ensure the sealing of the microwave reaction cavity 5.
[0022] like Figures 1-2 As shown, a sealing ring 12 is provided at the edge of the desktop flange 11, and the sealing ring 12 is interference fit between the desktop flange 11 and the end of the microwave reaction cavity 5, specifically, the flange at the lower end of the microwave reaction cavity 5 cooperates with the desktop flange 11, and the sealing ring 12 is squeezed to enhance the sealing between the desktop flange 11 and the microwave reaction cavity 5 in a closed state.
[0023] like Figures 1-2 As shown, a power head balancing block 31 is also provided below the microwave source 3 as a counterweight to prevent the waveguide transmission system 4 from tilting during the lifting and rotating process.
[0024] The above-mentioned embodiments only express several implementation methods of the utility model, and the description is relatively specific and detailed, but it cannot be understood as limiting the scope of the utility model patent. It should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of the utility model, which all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent shall be based on the attached claims.
Claims
1. An MPCVD structure in which the reaction chamber can be raised and lowered as a whole, characterized in that: The invention comprises a chassis, a first lifting mechanism, a microwave source, a waveguide transmission system, a microwave reaction cavity and a substrate stage. The first lifting mechanism is vertically installed on the side wall of the chassis, and its output end is upward and connected to the bottom of the waveguide transmission system. The output end of the microwave source is connected to the input end of the waveguide transmission system, and the output end of the waveguide transmission system is connected to the upper end of the microwave reaction cavity. The upper end of the microwave reaction cavity is closed by glass. The microwave reaction cavity is located directly above the substrate stage, and the lower end of the microwave reaction cavity is movably abutted against the desktop flange of the chassis.
2. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 1, characterized in that: The output end of the first lifting mechanism is movably connected to the waveguide transmission system through a bearing, and the waveguide transmission system is rotatable.
3. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 1, characterized in that: A molybdenum stage is arranged on the stage surface of the substrate stage.
4. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 3, characterized in that: A second lifting mechanism is installed below the substrate stage, and the second lifting mechanism drives the substrate stage to move up and down in the microwave reaction cavity.
5. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 4, characterized in that: The outer cover of the second lifting mechanism is provided with a vacuum bellows, the upper end of the vacuum bellows is connected to the lower end surface of the substrate table, and the lower end of the vacuum bellows is connected to the second lifting mechanism.
6. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 1, characterized in that: A sealing ring is arranged on the edge of the desktop flange, and the sealing ring is interference-fitted between the desktop flange and the end of the microwave reaction cavity.
7. The MPCVD structure with a reaction chamber that can be raised and lowered as a whole according to claim 2, characterized in that: A power head balancing block is also arranged below the microwave source.