Method for manufacturing grinding glass substrate
A technology of glass substrates and manufacturing methods, applied in semiconductor/solid-state device manufacturing, instruments, optics, etc., to achieve the effect of inhibiting the growth of dents
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Embodiment 1～9
[0042] Spread sandpaper of appropriate thickness, place an aluminoborosilicate glass cut to 10cm square horizontally on it, and then apply a certain load on it to cause artificial scars on the glass surface, and use it as a sample to verify the dent Inhibitory effect.
[0043] The test device was made with a small substrate storage box 21 simulating Figure 1, a surface smoothing tank 1, a post-grinding tank 3, a first washing tank 2, a second washing tank 4 and a final washing tank 5, and the above-mentioned grinding tank was ground according to the method shown in Figure 1. sample. Table 1 shows the composition, temperature and immersion time of the surface polishing liquid 6 in the surface smoothing tank 1 in the surface smoothing step. In the post-polishing process, the post-polishing liquid 8 in the post-polishing tank 3 is polished using a polishing liquid containing 10% by weight of hydrofluoric acid and 5% by weight of sulfuric acid at room temperature for about 50 min...
Embodiment 10
[0056] Example 10 (results of tests using practical substrates)
[0057] Experiments were carried out using aluminoborosilicate glass substrates (4th generation size). An aqueous solution of 70% by weight of sulfuric acid and 1.3% by weight of hydrofluoric acid was used as the surface polishing liquid 6 , and the glass substrate was immersed in the surface polishing liquid to polish the glass surface. At this time, the temperature of the surface polishing liquid was set at 15° C., the glass substrate was immersed in the polishing liquid for about 15 minutes, and the surface polishing liquid was stirred by gas bubbling. After the surface grinding is completed, the glass substrate is washed with water. Afterwards, processing is carried out with a post-grinding solution containing 10% by weight of hydrofluoric acid and 5% by weight of sulfuric acid until the specified glass thickness is achieved. As a result, the failure rate of practical evaluation criteria was reduced to 1 / 3....
Embodiment 11
[0058] Embodiment 11 (the result that utilizes practical substrate to test):
[0059] Experiments were carried out using aluminoborosilicate glass substrates (4th generation size). An aqueous solution of 60% by weight of sulfuric acid and 1.4% by weight of hydrofluoric acid was used as the surface polishing liquid 6, and the glass substrate was immersed in the surface polishing liquid to perform surface polishing of the glass surface. At this time, the temperature of the surface polishing liquid was set at 15° C., the glass substrate was immersed in the surface polishing liquid for about 70 minutes, and the surface polishing liquid was stirred by gas bubbling. After the surface grinding is completed, the glass substrate is washed with water. Afterwards, processing is carried out with a post-grinding solution containing 10% by weight of hydrofluoric acid and 5% by weight of sulfuric acid until the specified glass thickness is achieved. As a result, the failure rate of practic...
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