Method for decreasing error measurement in on-line scanning electronic microscope

A technology of electron microscope and microscope, applied in measurement devices, using wave/particle radiation, semiconductor/solid-state device testing/measurement, etc., can solve problems such as mismeasurement, and achieve the effect of reducing mismeasurement and accurate line width data results.

Inactive Publication Date: 2008-10-15
SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

exist Figure 3f In the case of the situation, the width of the adjacent space is mistaken for the width of the line and transmitted to the production management system, resulting in mismeasurement

Method used

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  • Method for decreasing error measurement in on-line scanning electronic microscope
  • Method for decreasing error measurement in on-line scanning electronic microscope
  • Method for decreasing error measurement in on-line scanning electronic microscope

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Embodiment Construction

[0020] In order to better understand the technical content of the present invention, preferred specific embodiments are given together with the attached drawings for description as follows.

[0021] Please also refer to Figure 4 , Figure 5a to Figure 5g as well as Figure 6a to Figure 6i . Figure 4 It is a flow chart of the scanning electron microscope measurement of a preferred embodiment of the present invention; Figure 5a to Figure 5g It is an explanatory diagram of the process of the scanning electron microscope measurement of a preferred embodiment of the present invention, Figure 6a to Figure 6i It is an explanatory diagram of another process of scanning electron microscope measurement in a preferred embodiment of the present invention. From Figure 4 It can be seen that, the scanning electron microscope measurement method of a preferred embodiment of the present invention, its technological process is (take measuring line as example): the first step 200: look ...

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Abstract

In the advanced semiconductor manufacturing technique, the control of bar width is more important; a scanning electronic microscope is used as on-line bar width measuring equipment and is required that false measurement can be reduced furthest so as to ensure true and reliable data; but in actual operation, false measurement is hard to be avoided, especially when measuring thinner dense lines, the condition that the adjacent spacing is measured instead of the lines needed to be measured is easy to occur. The invention provides a method for reducing false measurement of the on-line scanning electronic microscope; a method that a secondary electronic signal of the measured structure is analyzed when in measurement is used for judging that the measured structure is lines or spacing; compared with the structure required by measuring documents, that whether the two are consistent is judged, and if the two are not consistent, half space period is moved towards left or right automatically so as to measure correct structure, thus reducing false measurement effectively.

Description

technical field [0001] The invention relates to a scanning electron microscope measurement method in semiconductor manufacturing process technology, in particular to a method for reducing online scanning electron microscope error measurement in integrated circuit technology. Background technique [0002] Strip width control has always been a top priority in advanced semiconductor manufacturing processes. As an online line width measurement device, a scanning electron microscope is required to minimize mismeasurement and ensure that the data is true and reliable. However, in actual operation, mismeasurement is unavoidable. Especially when measuring thin dense lines, it is easy to appear that the adjacent spacing is measured when the line is intended to be measured. Because in the traditional method, the scanning electron microscope only performs a single operation on the captured secondary electron signal to obtain a value after initially finding the measurement position, a...

Claims

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Application Information

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IPC IPC(8): H01L21/66G01B15/00
Inventor肖慧敏
OwnerSHANGHAI INTEGRATED CIRCUIT RES & DEV CENT